KR102678955B1 - 오버레이 측정을 위한 지형 위상 제어 - Google Patents
오버레이 측정을 위한 지형 위상 제어 Download PDFInfo
- Publication number
- KR102678955B1 KR102678955B1 KR1020217038906A KR20217038906A KR102678955B1 KR 102678955 B1 KR102678955 B1 KR 102678955B1 KR 1020217038906 A KR1020217038906 A KR 1020217038906A KR 20217038906 A KR20217038906 A KR 20217038906A KR 102678955 B1 KR102678955 B1 KR 102678955B1
- Authority
- KR
- South Korea
- Prior art keywords
- optical system
- path
- beam splitter
- target
- illumination
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/65—Raman scattering
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/32—Fiducial marks and measuring scales within the optical system
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/28—Systems for automatic generation of focusing signals
- G02B7/36—Systems for automatic generation of focusing signals using image sharpness techniques, e.g. image processing techniques for generating autofocus signals
- G02B7/38—Systems for automatic generation of focusing signals using image sharpness techniques, e.g. image processing techniques for generating autofocus signals measured at different points on the optical axis, e.g. focussing on two or more planes and comparing image data
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/80—Analysis of captured images to determine intrinsic or extrinsic camera parameters, i.e. camera calibration
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/60—Control of cameras or camera modules
- H04N23/67—Focus control based on electronic image sensor signals
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/60—Control of cameras or camera modules
- H04N23/67—Focus control based on electronic image sensor signals
- H04N23/672—Focus control based on electronic image sensor signals based on the phase difference signals
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/60—Control of cameras or camera modules
- H04N23/67—Focus control based on electronic image sensor signals
- H04N23/673—Focus control based on electronic image sensor signals based on contrast or high frequency components of image signals, e.g. hill climbing method
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/65—Raman scattering
- G01N2021/653—Coherent methods [CARS]
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Signal Processing (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Multimedia (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analytical Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Microscoopes, Condenser (AREA)
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201562163783P | 2015-05-19 | 2015-05-19 | |
| US62/163,783 | 2015-05-19 | ||
| US201562222724P | 2015-09-23 | 2015-09-23 | |
| US62/222,724 | 2015-09-23 | ||
| PCT/US2016/033353 WO2016187468A1 (en) | 2015-05-19 | 2016-05-19 | Topographic phase control for overlay measurement |
| KR1020177036236A KR102334168B1 (ko) | 2015-05-19 | 2016-05-19 | 오버레이 측정을 위한 지형 위상 제어 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020177036236A Division KR102334168B1 (ko) | 2015-05-19 | 2016-05-19 | 오버레이 측정을 위한 지형 위상 제어 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20210149885A KR20210149885A (ko) | 2021-12-09 |
| KR102678955B1 true KR102678955B1 (ko) | 2024-06-26 |
Family
ID=57320785
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020217038906A Active KR102678955B1 (ko) | 2015-05-19 | 2016-05-19 | 오버레이 측정을 위한 지형 위상 제어 |
| KR1020217038903A Active KR102665579B1 (ko) | 2015-05-19 | 2016-05-19 | 오버레이 측정을 위한 지형 위상 제어 |
| KR1020217038910A Active KR102607646B1 (ko) | 2015-05-19 | 2016-05-19 | 오버레이 측정을 위한 지형 위상 제어 |
| KR1020177036236A Active KR102334168B1 (ko) | 2015-05-19 | 2016-05-19 | 오버레이 측정을 위한 지형 위상 제어 |
Family Applications After (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020217038903A Active KR102665579B1 (ko) | 2015-05-19 | 2016-05-19 | 오버레이 측정을 위한 지형 위상 제어 |
| KR1020217038910A Active KR102607646B1 (ko) | 2015-05-19 | 2016-05-19 | 오버레이 측정을 위한 지형 위상 제어 |
| KR1020177036236A Active KR102334168B1 (ko) | 2015-05-19 | 2016-05-19 | 오버레이 측정을 위한 지형 위상 제어 |
Country Status (7)
| Country | Link |
|---|---|
| US (5) | US10520832B2 (https=) |
| JP (4) | JP6879939B2 (https=) |
| KR (4) | KR102678955B1 (https=) |
| CN (4) | CN112859542A (https=) |
| SG (3) | SG10201912816UA (https=) |
| TW (4) | TWI715582B (https=) |
| WO (1) | WO2016187468A1 (https=) |
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| TWI715582B (zh) | 2015-05-19 | 2021-01-11 | 美商克萊譚克公司 | 用於疊對測量之形貌相位控制 |
| US9989806B2 (en) * | 2015-09-10 | 2018-06-05 | Samsung Display Co., Ltd. | Color conversion panel and display device including the same |
| JP6789295B2 (ja) * | 2015-12-08 | 2020-11-25 | ケーエルエー コーポレイション | 偏光ターゲットおよび偏光照明を用いた回折光の振幅および位相の制御 |
| JP7179742B2 (ja) * | 2017-02-10 | 2022-11-29 | ケーエルエー コーポレイション | 散乱計測オーバーレイターゲット及び方法 |
| WO2018226215A1 (en) * | 2017-06-06 | 2018-12-13 | Kla-Tencor Corporation | Reticle optimization algorithms and optimal target design |
| EP3454123A1 (en) * | 2017-09-06 | 2019-03-13 | ASML Netherlands B.V. | Metrology method and apparatus |
| EP3499312A1 (en) * | 2017-12-15 | 2019-06-19 | ASML Netherlands B.V. | Metrology apparatus and a method of determining a characteristic of interest |
| IL304744B2 (en) * | 2017-11-07 | 2024-09-01 | Asml Netherlands Bv | Metrology system and method for determining a characteristic of an area of interest |
| US11085754B2 (en) * | 2017-12-12 | 2021-08-10 | Kla Corporation | Enhancing metrology target information content |
| EP3521929A1 (en) | 2018-02-02 | 2019-08-07 | ASML Netherlands B.V. | Method of determining an optimal focus height for a metrology apparatus |
| CN112005157B (zh) * | 2018-02-27 | 2023-03-03 | Asml荷兰有限公司 | 用于确定衬底上的一个或更多个结构的特性的量测设备和方法 |
| IL277294B2 (en) * | 2018-03-19 | 2024-05-01 | Kla Corp | Overlay measurement using multiple wavelengths |
| US10677588B2 (en) | 2018-04-09 | 2020-06-09 | Kla-Tencor Corporation | Localized telecentricity and focus optimization for overlay metrology |
| WO2019236084A1 (en) * | 2018-06-07 | 2019-12-12 | Kla-Tencor Corporation | Overlay measurement using phase and amplitude modeling |
| US11281111B2 (en) | 2018-08-28 | 2022-03-22 | Kla-Tencor Corporation | Off-axis illumination overlay measurement using two-diffracted orders imaging |
| US12130246B2 (en) * | 2018-12-31 | 2024-10-29 | Asml Netherlands B.V. | Method for overlay metrology and apparatus thereof |
| WO2020168142A1 (en) | 2019-02-14 | 2020-08-20 | Kla Corporation | System and method for measuring misregistration of semiconductor device wafers utilizing induced topography |
| WO2020190318A1 (en) * | 2019-03-21 | 2020-09-24 | Kla Corporation | Parameter-stable misregistration measurement amelioration in semiconductor devices |
| US11703460B2 (en) * | 2019-07-09 | 2023-07-18 | Kla Corporation | Methods and systems for optical surface defect material characterization |
| US11914290B2 (en) | 2019-07-24 | 2024-02-27 | Kla Corporation | Overlay measurement targets design |
| US11346657B2 (en) * | 2020-05-22 | 2022-05-31 | Kla Corporation | Measurement modes for overlay |
| KR102825815B1 (ko) * | 2020-06-18 | 2025-06-27 | 삼성전자주식회사 | 스루-포커스 이미지 기반 계측 장치, 그것의 동작 방법, 및 그 동작을 실행하는 컴퓨팅 장치 |
| CN112465694B (zh) * | 2020-11-27 | 2024-10-15 | 中国科学院西安光学精密机械研究所 | 基于相位变化的医学图像数据增广方法 |
| US11713959B2 (en) * | 2021-03-17 | 2023-08-01 | Kla Corporation | Overlay metrology using spectroscopic phase |
| CN117413221A (zh) * | 2021-06-09 | 2024-01-16 | Asml荷兰有限公司 | 用于使用具有孔径变迹的结构照射进行掩模版粒子检测的检查系统 |
| CN113467033A (zh) * | 2021-06-24 | 2021-10-01 | 南昌欧菲光电技术有限公司 | 一种摄像头模组及其透镜的定位方法 |
| CN113777731A (zh) * | 2021-08-11 | 2021-12-10 | 中国工程物理研究院应用电子学研究所 | 一种共轴反转环型连续变密度衰减器装置及其工作方法 |
| CN113985711B (zh) * | 2021-10-28 | 2024-02-02 | 无锡卓海科技股份有限公司 | 一种套刻测量装置 |
| KR102874693B1 (ko) * | 2023-08-17 | 2025-10-29 | (주) 오로스테크놀로지 | 이미지 기반 오버레이 시스템에서 위상 이미지 획득 장치 및 방법 |
| US12411420B2 (en) * | 2023-09-29 | 2025-09-09 | Kla Corporation | Small in-die target design for overlay measurement |
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