KR102678955B1 - 오버레이 측정을 위한 지형 위상 제어 - Google Patents

오버레이 측정을 위한 지형 위상 제어 Download PDF

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KR102678955B1
KR102678955B1 KR1020217038906A KR20217038906A KR102678955B1 KR 102678955 B1 KR102678955 B1 KR 102678955B1 KR 1020217038906 A KR1020217038906 A KR 1020217038906A KR 20217038906 A KR20217038906 A KR 20217038906A KR 102678955 B1 KR102678955 B1 KR 102678955B1
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optical system
path
beam splitter
target
illumination
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KR20210149885A (ko
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블라디미르 레빈스키
유리 파스코버
암논 마나센
요니 샬리보
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케이엘에이 코포레이션
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605Workpiece metrology
    • G03F7/70616Monitoring the printed patterns
    • G03F7/70633Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/65Raman scattering
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/32Fiducial marks and measuring scales within the optical system
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/28Systems for automatic generation of focusing signals
    • G02B7/36Systems for automatic generation of focusing signals using image sharpness techniques, e.g. image processing techniques for generating autofocus signals
    • G02B7/38Systems for automatic generation of focusing signals using image sharpness techniques, e.g. image processing techniques for generating autofocus signals measured at different points on the optical axis, e.g. focussing on two or more planes and comparing image data
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/80Analysis of captured images to determine intrinsic or extrinsic camera parameters, i.e. camera calibration
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/60Control of cameras or camera modules
    • H04N23/67Focus control based on electronic image sensor signals
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/60Control of cameras or camera modules
    • H04N23/67Focus control based on electronic image sensor signals
    • H04N23/672Focus control based on electronic image sensor signals based on the phase difference signals
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/60Control of cameras or camera modules
    • H04N23/67Focus control based on electronic image sensor signals
    • H04N23/673Focus control based on electronic image sensor signals based on contrast or high frequency components of image signals, e.g. hill climbing method
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/65Raman scattering
    • G01N2021/653Coherent methods [CARS]

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Signal Processing (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Multimedia (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Microscoopes, Condenser (AREA)
KR1020217038906A 2015-05-19 2016-05-19 오버레이 측정을 위한 지형 위상 제어 Active KR102678955B1 (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US201562163783P 2015-05-19 2015-05-19
US62/163,783 2015-05-19
US201562222724P 2015-09-23 2015-09-23
US62/222,724 2015-09-23
PCT/US2016/033353 WO2016187468A1 (en) 2015-05-19 2016-05-19 Topographic phase control for overlay measurement
KR1020177036236A KR102334168B1 (ko) 2015-05-19 2016-05-19 오버레이 측정을 위한 지형 위상 제어

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KR1020177036236A Division KR102334168B1 (ko) 2015-05-19 2016-05-19 오버레이 측정을 위한 지형 위상 제어

Publications (2)

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KR20210149885A KR20210149885A (ko) 2021-12-09
KR102678955B1 true KR102678955B1 (ko) 2024-06-26

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KR1020217038906A Active KR102678955B1 (ko) 2015-05-19 2016-05-19 오버레이 측정을 위한 지형 위상 제어
KR1020217038903A Active KR102665579B1 (ko) 2015-05-19 2016-05-19 오버레이 측정을 위한 지형 위상 제어
KR1020217038910A Active KR102607646B1 (ko) 2015-05-19 2016-05-19 오버레이 측정을 위한 지형 위상 제어
KR1020177036236A Active KR102334168B1 (ko) 2015-05-19 2016-05-19 오버레이 측정을 위한 지형 위상 제어

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KR1020217038910A Active KR102607646B1 (ko) 2015-05-19 2016-05-19 오버레이 측정을 위한 지형 위상 제어
KR1020177036236A Active KR102334168B1 (ko) 2015-05-19 2016-05-19 오버레이 측정을 위한 지형 위상 제어

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US (5) US10520832B2 (https=)
JP (4) JP6879939B2 (https=)
KR (4) KR102678955B1 (https=)
CN (4) CN112859542A (https=)
SG (3) SG10201912816UA (https=)
TW (4) TWI715582B (https=)
WO (1) WO2016187468A1 (https=)

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CN112465694B (zh) * 2020-11-27 2024-10-15 中国科学院西安光学精密机械研究所 基于相位变化的医学图像数据增广方法
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CN117413221A (zh) * 2021-06-09 2024-01-16 Asml荷兰有限公司 用于使用具有孔径变迹的结构照射进行掩模版粒子检测的检查系统
CN113467033A (zh) * 2021-06-24 2021-10-01 南昌欧菲光电技术有限公司 一种摄像头模组及其透镜的定位方法
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