TWI702109B - Hold stand - Google Patents
Hold stand Download PDFInfo
- Publication number
- TWI702109B TWI702109B TW105140454A TW105140454A TWI702109B TW I702109 B TWI702109 B TW I702109B TW 105140454 A TW105140454 A TW 105140454A TW 105140454 A TW105140454 A TW 105140454A TW I702109 B TWI702109 B TW I702109B
- Authority
- TW
- Taiwan
- Prior art keywords
- holding
- workpiece
- suction
- remaining area
- area
- Prior art date
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q3/00—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
- B23Q3/02—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine for mounting on a work-table, tool-slide, or analogous part
- B23Q3/06—Work-clamping means
- B23Q3/08—Work-clamping means other than mechanically-actuated
- B23Q3/088—Work-clamping means other than mechanically-actuated using vacuum means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q2703/00—Work clamping
- B23Q2703/02—Work clamping means
- B23Q2703/04—Work clamping means using fluid means or a vacuum
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q2703/00—Work clamping
- B23Q2703/12—Accessories for attaching
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Jigs For Machine Tools (AREA)
Abstract
本發明的課題是抑制被加工物的浮起。 The subject of the present invention is to suppress the floating of the workpiece.
本發明的解決手段是一種保持台(20)係保持可撓性之矩形的被加工物(W);該被加工物(W)係於中央具備四角形的配線區域(W1),於外周具備圍繞該配線區域的剩餘區域(W2)。保持台係具備吸引保持被加工物之配線區域的吸引盤(21)、狹持被吸引盤吸引保持之被加工物的剩餘區域的外周緣,並下推至比保持面更方下的下推部、在保持面方向之吸引盤的外周與下推部的邊界,吸引剩餘區域的基座(22)。 The solution of the present invention is that a holding platform (20) is a rectangular workpiece (W) that maintains flexibility; the workpiece (W) is provided with a quadrangular wiring area (W1) in the center and a surrounding area The remaining area of the wiring area (W2). The holding table is equipped with a suction plate (21) that sucks and holds the wiring area of the processed object, and narrowly holds the outer periphery of the remaining area of the processed object sucked and held by the suction plate, and pushes down further than the holding surface Part, the boundary between the outer circumference of the suction plate in the direction of the holding surface and the push-down part, attracts the base (22) of the remaining area.
Description
本發明係關於保持台,尤其關於可適用於旋削裝置的保持台。 The present invention relates to a holding table, and particularly relates to a holding table applicable to a turning device.
先前,公知有使用具有圓弧狀之切刃的切削工具,對被加工物的上面進行旋削的旋削裝置(參照專利文獻1)。在專利文獻1所記載的旋削裝置中,繞垂直軸旋轉之主軸的架座之外周部份的一部分,固定切削工具。然後,利用一邊對保持被加工物的吸盤台(保持手段)以低速進行加工進送,一邊讓切削工具繞主軸的垂直軸旋回,對被保持於吸盤台上的被加工物進行旋削。結果,被加工物被薄化成均勻的高度(厚度)。
Conventionally, there has been known a turning device that uses a cutting tool having an arc-shaped cutting edge to turn the upper surface of a workpiece (see Patent Document 1). In the turning device described in
又,伴隨昨今之電路基板的薄化,旋削對象的被加工物也被要求更進一步的薄化。作為其例子,可舉出不具備核心基板的無芯基板。無芯基板是以配線層及樹脂層等的複數層所形成的層積體,形成為具有可撓性的薄片狀。 In addition, along with the thinning of circuit boards yesterday and today, the workpiece to be turned is also required to be further thinned. As an example, a coreless substrate that does not have a core substrate can be cited. The coreless substrate is a laminate formed of a plurality of layers such as a wiring layer and a resin layer, and is formed in a flexible sheet shape.
[專利文獻1]日本特開2013-056397號公報 [Patent Document 1] JP 2013-056397 A
話說,在以旋削裝置對俯視矩形狀之無芯基板進行加工時,於保持台上載置並吸引保持無芯基板。此時,考量以從保持台不會捲起無芯基板之方式,壓住並保持無芯基板的四邊。然而,因無芯基板具有可撓性,故無芯基板的外緣部附近會有從保持面浮起之狀況。因此,會有如實施旋削加工的話,浮起的部分卡到切削工具,無法適切進行加工的問題。 In other words, when processing a rectangular coreless substrate in a plan view with a turning device, the coreless substrate is placed on a holding table and sucked and held. At this time, consider pressing and holding the four sides of the coreless substrate so that the coreless substrate will not be rolled up from the holding table. However, since the coreless substrate has flexibility, the vicinity of the outer edge of the coreless substrate may float from the holding surface. Therefore, there is a problem that the floating part is caught in the cutting tool when the turning is performed, and the processing cannot be performed properly.
本發明係有鑑於此種問題點所發明者,目的為提供可抑制被加工物從保持面浮起的保持台。 The present invention was made in view of such problems, and its object is to provide a holding table that can suppress the floating of the workpiece from the holding surface.
本發明的保持台,係保持可撓性之矩形的被加工物;該被加工物,係於中央具備四角形的配線區域,於外周具備圍繞配線區域的剩餘區域;保持台係具備:第1吸引保持部,係具有吸引保持被加工物的配線區域之四角形的保持面;下推部,係挾持被第1吸引保持部吸引保持之被加工物的該剩餘區域的外周緣,並下推至比該保持面更下方;及第2吸引保持部,係在保持面方向之該第1 吸引保持部的外周與該下推部的邊界,吸引剩餘區域。 The holding stand of the present invention is a rectangular to-be-processed object that maintains flexibility; the to-be-processed object is provided with a quadrangular wiring area in the center and a remaining area surrounding the wiring area on the outer periphery; the holding stand system has: first suction The holding part has a quadrangular holding surface that sucks and holds the wiring area of the processed object; the push-down part clamps the outer periphery of the remaining area of the processed object sucked and held by the first suction and holding part, and pushes down to The holding surface is further below; and the second suction holding portion is the first in the direction of the holding surface The boundary between the outer circumference of the suction holding portion and the push-down portion is sucked to the remaining area.
依據該構造,被加工物的配線區域,係利用藉由第1吸引保持部吸引保持,另一方面,被加工物的剩餘區域被下推至比保持面更下方,於第1吸引保持部的外周與下推部的邊界(外周側)中被加工物會彎曲而產生膨脹。此時,利用藉由第2吸引保持部,在第1吸引保持部的外周與下推部的邊界,吸引被加工物(剩餘區域),將前述膨脹拉到下推部側。藉此,可抑制被加工物從保持面浮起之狀況。 According to this structure, the wiring area of the workpiece is sucked and held by the first suction and holding portion. On the other hand, the remaining area of the workpiece is pushed down below the holding surface, and is in the first suction and holding portion. The workpiece at the boundary (outer peripheral side) between the outer periphery and the push-down portion is bent and swells. At this time, by the second suction and holding part, the workpiece (remaining area) is sucked at the boundary between the outer periphery of the first suction and holding part and the push-down part, and the expansion is pulled to the push-down part side. Thereby, it is possible to suppress the situation in which the object to be processed floats from the holding surface.
依據本發明,可藉由吸引因為彎曲而產生之被加工物的膨脹,抑制被加工物從保持面浮起之狀況。 According to the present invention, it is possible to suppress the floating of the workpiece from the holding surface by attracting the expansion of the workpiece due to bending.
11‧‧‧移動板 11‧‧‧Mobile Board
12‧‧‧防水護蓋 12‧‧‧Waterproof cover
15‧‧‧支柱 15‧‧‧Pillars
20‧‧‧保持台 20‧‧‧Holding station
21‧‧‧吸引盤(第1吸引保持部) 21‧‧‧Suction plate (1st suction and holding part)
21a‧‧‧保持面 21a‧‧‧Keep the surface
21b‧‧‧貫通口 21b‧‧‧through opening
22‧‧‧基座(第2吸引保持部) 22‧‧‧Base (Second suction and holding part)
22a‧‧‧矩形凹部 22a‧‧‧Rectangular recess
22b‧‧‧連通路徑 22b‧‧‧Connecting path
22c‧‧‧連通路徑 22c‧‧‧Connecting path
23‧‧‧第1吸引源 23‧‧‧First Attraction Source
24‧‧‧第2吸引源 24‧‧‧The second source of attraction
25‧‧‧傾斜部(支承部:下推部) 25‧‧‧Tilt section (support section: push down section)
25a‧‧‧傾斜面 25a‧‧‧inclined surface
26‧‧‧推壓部(下推部) 26‧‧‧Pushing part (Pushing down)
26a‧‧‧傾斜面 26a‧‧‧inclined surface
30‧‧‧進給手段 30‧‧‧Feeding means
31‧‧‧導引軌道 31‧‧‧Guide track
32‧‧‧Z軸台 32‧‧‧Z axis table
33‧‧‧滾珠螺桿 33‧‧‧Ball screw
40‧‧‧旋削手段 40‧‧‧Rotating method
41‧‧‧殼體 41‧‧‧Shell
42‧‧‧旋轉主軸 42‧‧‧Rotating spindle
43‧‧‧架座 43‧‧‧Frame seat
44‧‧‧凸緣 44‧‧‧Flange
45‧‧‧切削工具安裝部 45‧‧‧Cutting Tool Installation Department
46‧‧‧切削工具 46‧‧‧Cutting Tools
B‧‧‧膨脹 B‧‧‧Expansion
W‧‧‧被加工物 W‧‧‧Processed object
W1‧‧‧配線區域 W1‧‧‧Wiring area
W2‧‧‧剩餘區域 W2‧‧‧Remaining area
[圖1]適用本實施形態之保持台的旋削裝置的立體圖。 [Fig. 1] A perspective view of a turning device to which the holding table of this embodiment is applied.
[圖2]本實施形態之保持台的上面模式圖。 [Fig. 2] A schematic top view of the holding table of this embodiment.
[圖3]本實施形態之保持台的剖面模式圖。 [Fig. 3] A schematic cross-sectional view of the holding table of this embodiment.
[圖4]揭示本實施形態之保持台的吸引保持動作的圖。 [Fig. 4] A diagram showing the suction and holding operation of the holding table of this embodiment.
[圖5]本實施形態之保持台的吸引保持動作的部分放大圖。 [Fig. 5] A partial enlarged view of the suction and holding operation of the holding table in this embodiment.
以下,參照添附圖面,針對適用本實施形態之保持台的旋削裝置進行說明。圖1係適用本實施形態之保持台的旋削裝置的立體圖。再者,本實施形態的保持台,並如如圖1所示限定於旋削裝置,適用於研磨裝置等之其他類型的加工裝置亦可。再者,圖1所示之保持台,為了便利說明,省略一部分的構造。 Hereinafter, with reference to the attached drawings, the turning device to which the holding table of this embodiment is applied will be described. Fig. 1 is a perspective view of a turning device to which a holding table of this embodiment is applied. Furthermore, the holding table of this embodiment is limited to a turning device as shown in FIG. 1, and may be applied to other types of processing devices such as a polishing device. In addition, for the holding stand shown in FIG. 1, a part of the structure is omitted for convenience of description.
如圖1所示,旋削裝置1係以一邊將保持被加工物W的保持台20以低速向X軸方向加工進送,一邊藉由單一切削工具46,對被加工物W的上面以深進緩給(Creep feed)方式進行旋削之方式構成。
As shown in FIG. 1, the
被加工物W係以層積配線層及樹脂層、矽層等的複數層所形成之薄片狀的無芯基板所構成。被加工物W係形成為俯視矩形狀,具有可撓性。於被加工物W的中央,形成有四角形的配線區域W1。又,於被加工物W的外周,以圍繞配線區域W之方式形成環狀的剩餘區域W2。該剩餘區域W2成為不作為產品所使用的端材。再者,被加工物W並不限定於無芯基板,只要是具有可撓性之薄面狀者,任意構成亦可。 The workpiece W is composed of a sheet-like coreless substrate formed by laminating multiple layers of wiring layers, resin layers, and silicon layers. The workpiece W is formed in a rectangular shape in plan view, and has flexibility. In the center of the workpiece W, a quadrangular wiring region W1 is formed. In addition, on the outer periphery of the workpiece W, a ring-shaped residual area W2 is formed so as to surround the wiring area W. The remaining area W2 becomes an end material that is not used as a product. In addition, the to-be-processed object W is not limited to a coreless board|substrate, As long as it has a flexible thin-surface shape, it may have any structure.
於旋削裝置1的基台10的上面,形成延伸於X軸方向之矩形狀的開口,該開口被可與保持台20一起移動的移動板11及蛇腹狀的防水護蓋12覆蓋。於防水護蓋12的下方,設置有使保持台20往X軸方向移動之滾珠
螺桿式的進退手段(未圖示)。於保持台20的表面,形成有吸引保持被加工物W的保持面21a(參照圖3)。保持面21a透過保持台20內的流通路徑,連接於吸引源(未圖示),藉由保持面21a所產生的負壓,吸引保持被加工物W。關於保持台20的詳細構造,於後敘述。
On the upper surface of the
於基台10上的支柱15,設置有使旋削手段40對於保持台20在Z軸方向接近及離開的進給手段30。進給手段30具有配置於支柱15之與Z軸方向平行的一對導引軌道31,與可滑動於一對導引軌道31地設置之馬達驅動的Z軸台32。於Z軸台32的背面側形成未圖示的螺帽部,於該等螺帽部,螺合滾珠螺桿33。藉由連結於滾珠螺桿33之一端部的驅動馬達34,旋轉驅動滾珠螺桿33,藉此,旋削手段40沿著導引軌道31往Z軸方向移動。
The
旋削手段40係透過殼體41安裝於Z軸台32的前面,並於圓筒狀的旋轉主軸42的下端設置架座43所構成。於旋轉主軸42設置凸緣44,透過凸緣44,旋削手段40被支持於殼體41。於架座43的下面之外周側的一部分,設置有切削工具安裝部45,於切削工具安裝部45,安裝有切削工具46。於切削工具46,可使用超硬切削工具或鑽石切削工具等。
The turning means 40 is mounted on the front surface of the Z-
在如此構成的旋削裝置1中,一邊藉由旋轉主軸42,切削工具46旋回移動於Z軸周圍,一邊旋削手段40接近保持台20。然後,利用一邊朝被加工物W供給
加工水或者空氣,冷卻切削工具46的前端,一邊切削工具46旋轉接觸於被加工物W的上面,切削工具46的前端與被加工物W相對性滑動,對被加工物W進行旋削。利用一邊使切削工具46旋轉,一邊保持台20以低速水平移動於X軸方向,對被加工物W整面地進行旋削。
In the
接著,參照圖2及圖3,針對本實施形態的保持台進行說明。圖2係本實施形態之保持台的上面模式圖。圖3係本實施形態之保持台的剖面模式圖。再者,圖2及圖3所示之保持台僅為模式圖,誇張表現各部的尺寸及形狀。 Next, referring to FIG. 2 and FIG. 3, the holding table of this embodiment will be described. Fig. 2 is a schematic top view of the holding table of this embodiment. Fig. 3 is a schematic cross-sectional view of the holding table of this embodiment. Furthermore, the holding table shown in FIGS. 2 and 3 are only schematic diagrams, exaggerating the size and shape of each part.
如圖2及圖3所示,本實施形態的保持台20,係以吸引保持薄片狀的被加工物W之方式構成,具備吸引保持被加工物W之配線區域W1的第1吸引保持部(吸引盤21),與吸引保持被加工物W之剩餘區域W2的第2吸引保持部(基座22)。具體來說,保持台20係形成為在表面中央形成矩形凹部22a的基座22,安裝矩形狀之吸引盤21的俯視矩形狀。
As shown in FIGS. 2 and 3, the holding table 20 of the present embodiment is configured to suck and hold a sheet-shaped workpiece W, and includes a first suction and holding portion ( The suction plate 21) and the second suction and holding portion (base 22) that sucks and holds the remaining area W2 of the workpiece W. Specifically, the holding
吸引盤21的上面成為吸引保持被加工物W之配線區域W1的保持面21a。保持面21a具有與被加工物W的配線區域W1大略相同的大小(面積)。又,於吸引盤21,從上面朝下面形成有複數貫通口21b。貫通口21b係透過形成於矩形凹部22a的底面的連通路徑22b(第1連通路徑),連接於第1吸引源23。吸引盤21利用被第1吸引源23吸引,於保持面21a產生負壓,可吸引保持被加工
物W。
The upper surface of the
又,在吸引盤21的外側面與矩形凹部22a的內側面之間,稍微形成間隙。該間隙係透過形成於基座22的連通路徑22c(第2連通路徑),連接於第2吸引源24。再者,第1吸引源23及第2吸引源24,係可從未圖示的閥,自由調整個別的吸引時機。
In addition, a slight gap is formed between the outer surface of the
於矩形凹部22a的外周,形成有隨著朝向外周側而往下方傾斜的傾斜部25。傾斜部25係以圍繞矩形凹部22a之方式形成為俯視四角環狀。雖於後詳述,該傾斜部25具有作為支承被加工物W之剩餘區域的支承部的作用。
On the outer periphery of the
又,於基座22的四邊部上方,設置有將被加工物W的外周緣(剩餘區域W2)朝向基座22推壓的複數推壓部26(在本實施形態中,於基座22的各邊上各有一個,合計4個)。推壓部26係以沿著基座22的各邊的長條狀板形成,具有與傾斜部25的傾斜面25a對向的傾斜面26a(參照圖5)。被加工物W的剩餘區域W2,藉由被基座22的傾斜部25與推壓部26挾持,來進行保持。再者,雖於後詳述,傾斜部25及推壓部26,係構成將被加工物W的剩餘區域W2下推至比保持面21a更下方的下推部。
In addition, above the four sides of the
話說,在如無芯基板般之具有可撓性的被加工物W,有於外周側產生翹曲之狀況。因此,僅將被加工物W在保持面21a上吸引保持,會有被加工物W的外緣部從保持面21a彈起之狀況。在該狀態下實施旋削加工的
話,可想像切削工具46(參照圖1)卡到彈起的被加工物W,無法對被加工物W適切地進行加工之狀況。
In other words, the workpiece W, which is flexible like a coreless substrate, may warp on the outer peripheral side. Therefore, only when the workpiece W is sucked and held on the holding
作為該對策,考量利用按壓被加工物W的外緣部(剩餘區域W2),矯正被加工物W的翹曲。然而,被加工物W的外緣部被下推至比保持面21a更下方的位置的話,於被下推的被加工物W產生彎曲,被加工物W會從保持面21a浮起(例如,參照圖5A)。因此,實施旋削加工的話,與前述相同,切削工具46會卡到從保持面21a浮起的被加工物W,無法對被加工物W適切地進行加工。假設即使切削工具46未卡到被加工物W,浮起的部分多對被加工物W進行旋削加工的結果,可想像無法將被加工物W加工成所希望之厚度之狀況。
As a countermeasure, it is considered to correct the warpage of the workpiece W by pressing the outer edge portion (the remaining area W2) of the workpiece W. However, if the outer edge portion of the workpiece W is pushed down to a position lower than the holding
因此,在本實施形態中,利用吸引盤21(第1吸引保持部)吸引保持被加工物W的配線區域W1,並在基座22的傾斜部25與推壓部26之間挾持被加工物W的剩餘區域W2。此時,因為剩餘區域W2被下推至比保持面21a更下方,在吸引盤21與基座22(矩形凹部22a)的邊界部分中被加工物W形成彎曲,而產生膨脹。然而,藉由吸引吸引盤21與矩形凹部22a的間隙,可將該膨脹拉往下方。結果,可抑制被加工物W從保持面21a往上方浮起之狀況。
Therefore, in this embodiment, the wiring area W1 of the workpiece W is sucked and held by the suction plate 21 (first suction and holding portion), and the workpiece is held between the
接著,參照圖4及圖5,針對使用本實施形態的保持台,吸引保持被加工物時的動作進行說明。圖4係揭示本實施形態之保持台的吸引保持動作的圖。圖5係本 實施形態之保持台的吸引保持動作的部分放大圖。圖4A至圖4C係揭示吸引保持的動作遷移圖。圖5A係圖4B的X部的部分放大圖,圖5B係圖4C的Y部的部分放大圖。 Next, referring to FIGS. 4 and 5, the operation when the workpiece is sucked and held using the holding table of this embodiment will be described. Fig. 4 is a diagram showing the suction and holding operation of the holding table of the present embodiment. Figure 5 Series An enlarged view of a part of the suction and holding operation of the holding table of the embodiment. 4A to 4C are diagrams showing the movement transition of suction and hold. FIG. 5A is a partially enlarged view of the X portion in FIG. 4B, and FIG. 5B is a partially enlarged view of the Y portion in FIG. 4C.
如圖4A所示,在推壓部26從基座22(傾斜部25)退避之狀態下,首先,將被加工物W載置於吸引盤21。此時,使被加工物W的配線區域W1位於移到保持面21a上。然後,利用藉由第1吸引源23吸引吸引盤21,被加工物W的配線區域W1被吸引保持於保持面21a。再者,此時,並未實施第2吸引源24所致之吸引。
As shown in FIG. 4A, in the state where the
接著,如圖4B及圖5A所示,藉由推壓部26,被加工物W的外緣部(剩餘區域W2)被往下方下推,被加工物W(剩餘區域W2)被挾持於傾斜部25的傾斜面25a與推壓部26的傾斜面26a之間。此時,被加工物W的外緣部被下推至比保持面21a更下方的結果,在配線區域W1與剩餘區域W2的邊界部分,亦即,在吸引盤21的外側面與矩形凹部22a的內側面之間,於被加工物W形成彎曲。
Next, as shown in FIGS. 4B and 5A, the outer edge portion (remaining area W2) of the workpiece W is pushed downward by the
結果,被加工物W產生膨脹B。尤其,如圖5A所示,因為膨脹B,在保持面21a與被加工物W之間稍微產生間隙。此時,膨脹B的頂點位於比無間隙地被吸引保持於保持面21a上之被加工物W的表面更上方。
As a result, swelling B occurs in the workpiece W. In particular, as shown in FIG. 5A, due to the expansion B, a gap is slightly generated between the holding
接著,實施第2吸引源24所致之吸引,於吸引盤21之外側面與矩形凹部22a之內側面的間隙產生負
壓。結果,如圖4C及圖5B所示,配線區域W1與剩餘區域W2的邊界部分朝向下方被吸引。此時,保持面21a與被加工物W(配線區域W1)的間隙消失,並且膨脹B的頂點往傾斜部25側移動。尤其,如圖5B所示,膨脹B的頂點位於比保持面21a更下方。結果,可抑制被加工物W的配線區域W1從保持面21a浮起之狀況。
Next, the suction by the
如此,即使在挾持被加工物W的外周緣時產生彎曲,也可利用從吸引盤21與矩形凹部22a之間吸引彎曲得部分(膨脹B),以膨脹B的頂點不會超出保持面21a上之方式,使膨脹B的位置往外周側錯開。藉此,抑制被加工物W的浮起,在進行旋削加工時,可防止切削工具46(參照圖1)卡到被加工物W之狀況,可將被加工物W旋削加工成所希望的厚度。
In this way, even if bending occurs when the outer peripheral edge of the workpiece W is clamped, the bent portion (expansion B) can be attracted from between the
如上所述,依據本實施形態,被加工物W的配線區域W1,係利用藉由第1吸引保持部(吸引盤21)吸引保持,另一方面,被加工物W的剩餘區域W2被下推至比保持面21a更下方,於吸引盤21的外周與下推部(傾斜部25)的邊界(外周側)中被加工物W會彎曲而產生膨脹B。此時,藉由在吸引盤21的外周與矩形凹部22a的邊界中吸引被加工物W(剩餘區域W2),前述膨脹B會被拉往下推部(傾斜部25及推壓部26)側。藉此,可抑制被加工物W從保持面21a浮起之狀況。
As described above, according to this embodiment, the wiring area W1 of the workpiece W is sucked and held by the first suction and holding portion (suction plate 21), while the remaining area W2 of the workpiece W is pushed down Below the holding
再者,本發明並不限定於前述實施形態,可進行各種變更來實施。於前述實施形態中,關於添附圖面 所圖示之大小及形狀,並不限定於此,在可發揮本發明的效果的範圍內,可適切變更。此外,只要不脫離本發明的目的範圍,可適當變更來實施。 In addition, the present invention is not limited to the aforementioned embodiment, and can be implemented with various modifications. In the foregoing embodiment, regarding the additional drawings The size and shape shown in the figure are not limited to these, and can be appropriately changed within the range where the effects of the present invention can be exhibited. Moreover, as long as it does not deviate from the objective range of this invention, it can change suitably and implement.
又,在前述之實施形態中,設為分別設置第1吸引源23與第2吸引源24的構造,但並不限定於該構造。讓第1吸引源23與第2吸引源24共通亦可。
In addition, in the foregoing embodiment, the structure in which the
又,在前述之實施形態中,設為吸引保持俯視矩形狀的被加工物W的構造,但並不限定於該構造。被加工物W係例如形成為圓形狀亦可。此時,配合被加工物W的形狀,保持台20的形狀也適當變更為佳。又,吸引保持矩形狀的被加工物W時,利用預先切下被加工物W的四隅的剩餘區域W2,在挾持剩餘區域W2時,可防止四隅產生皺紋(從保持面21a的浮起)之狀況。
In addition, in the aforementioned embodiment, the structure is configured to suck and hold the workpiece W having a rectangular shape in plan view, but it is not limited to this structure. The workpiece W may be formed in a circular shape, for example. At this time, the shape of the holding table 20 should also be appropriately changed according to the shape of the workpiece W. In addition, when sucking and holding the rectangular workpiece W, the remaining area W2 of the four corners of the workpiece W is cut in advance. When the remaining area W2 is pinched, the four corners can be prevented from wrinkles (lifting from the holding
如以上所說明般,本發明係具有可抑制被加工物的浮起的效果,尤其,有助於可適用於旋削裝置的保持台。 As described above, the present invention has the effect of suppressing the floating of the workpiece, and in particular, contributes to a holding table applicable to a turning device.
21‧‧‧吸引盤 21‧‧‧Attract disk
21a‧‧‧保持面 21a‧‧‧Keep the surface
21b‧‧‧貫通口 21b‧‧‧through opening
22‧‧‧基座 22‧‧‧Pedestal
22a‧‧‧矩形凹部 22a‧‧‧Rectangular recess
25‧‧‧傾斜部 25‧‧‧Sloping part
25a‧‧‧傾斜面 25a‧‧‧inclined surface
26‧‧‧推壓部 26‧‧‧Pushing part
26a‧‧‧傾斜面 26a‧‧‧inclined surface
B‧‧‧膨脹 B‧‧‧Expansion
W‧‧‧被加工物 W‧‧‧Processed object
W1‧‧‧配線區域 W1‧‧‧Wiring area
W2‧‧‧剩餘區域 W2‧‧‧Remaining area
Claims (1)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016010222A JP6661385B2 (en) | 2016-01-22 | 2016-01-22 | Holding table |
JP2016-010222 | 2016-01-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201726295A TW201726295A (en) | 2017-08-01 |
TWI702109B true TWI702109B (en) | 2020-08-21 |
Family
ID=59396474
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105140454A TWI702109B (en) | 2016-01-22 | 2016-12-07 | Hold stand |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6661385B2 (en) |
KR (1) | KR102457547B1 (en) |
TW (1) | TWI702109B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102382051B1 (en) * | 2017-10-17 | 2022-04-04 | 삼성디스플레이 주식회사 | Laser apparatus |
JP7055557B2 (en) * | 2018-02-26 | 2022-04-18 | 株式会社ディスコ | Package substrate frame and package substrate grinding method |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11245163A (en) * | 1998-03-03 | 1999-09-14 | Fujikoshi Mach Corp | Method and device for adhering wafer |
TW201440949A (en) * | 2013-03-12 | 2014-11-01 | Disco Corp | Jig tray |
CN204308420U (en) * | 2014-06-19 | 2015-05-06 | 大族激光科技产业集团股份有限公司 | A kind of vacuum absorption device of automatic adjusting range |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10235482B3 (en) * | 2002-08-02 | 2004-01-22 | Süss Microtec Lithography Gmbh | Device for fixing thin and flexible substrates |
US20090075459A1 (en) * | 2007-09-06 | 2009-03-19 | Kabushiki Kaisha Shinkawa | Apparatus and method for picking-up semiconductor dies |
JP5755979B2 (en) | 2011-09-08 | 2015-07-29 | 株式会社ディスコ | Processing equipment equipped with a bite tool |
JP6194227B2 (en) * | 2013-10-29 | 2017-09-06 | 東京応化工業株式会社 | Holding device and holding method |
-
2016
- 2016-01-22 JP JP2016010222A patent/JP6661385B2/en active Active
- 2016-12-07 TW TW105140454A patent/TWI702109B/en active
-
2017
- 2017-01-06 KR KR1020170002232A patent/KR102457547B1/en active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11245163A (en) * | 1998-03-03 | 1999-09-14 | Fujikoshi Mach Corp | Method and device for adhering wafer |
TW201440949A (en) * | 2013-03-12 | 2014-11-01 | Disco Corp | Jig tray |
CN204308420U (en) * | 2014-06-19 | 2015-05-06 | 大族激光科技产业集团股份有限公司 | A kind of vacuum absorption device of automatic adjusting range |
Also Published As
Publication number | Publication date |
---|---|
KR20170088288A (en) | 2017-08-01 |
TW201726295A (en) | 2017-08-01 |
JP2017127945A (en) | 2017-07-27 |
JP6661385B2 (en) | 2020-03-11 |
KR102457547B1 (en) | 2022-10-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6765751B2 (en) | Work piece holding mechanism and processing equipment | |
JP2012109358A5 (en) | ||
TW201600246A (en) | Grinding device and grinding method of rectangular substrate | |
KR102348542B1 (en) | Workpiece transporting tray | |
JP6495054B2 (en) | Package substrate grinding method | |
TWI702109B (en) | Hold stand | |
TW202034445A (en) | Transfer apparatus | |
JP6318033B2 (en) | Grinding device and protective tape attaching method | |
JP2014223708A (en) | Processing device | |
JP2015207579A (en) | Cleavage device | |
TW201931452A (en) | Cutting method of workpiece and chuck table of the cutting device to suppress the generation of back surface chipping or corner crack in the workpiece with a simple structure even for a thin workpiece or a workpiece with a small wafer size | |
CN104103568A (en) | Chuck Workbench | |
KR102359141B1 (en) | Machining apparatus | |
JP6695225B2 (en) | Transport unit | |
TWI655053B (en) | Blade cover device | |
CN106997864B (en) | Chuck working table | |
JP2009076773A (en) | Chuck table mechanism | |
JP6821254B2 (en) | Cutting equipment | |
JP2017079284A (en) | Laser beam machining device | |
JP2017098465A (en) | Processing device | |
JP7463032B2 (en) | Workpiece holding mechanism and processing device | |
JP7246904B2 (en) | Conveyor | |
TW202401641A (en) | Transfer apparatus and method for memorizing position information capable of storing the position information of the holding unit while transferring a wafer by a robot from a first position to a second position | |
TW202343649A (en) | Conveying pad capable of preventing sagging of the outer peripheral and central portions of the wafer and preventing debris from adhering to the conveying pad even if the wafer is cut within the range of the atmospheric open area | |
JP2015220276A (en) | Support jig |