TWI701458B - 反射折射光學系統、照明光學系統、曝光裝置及物品製造方法 - Google Patents

反射折射光學系統、照明光學系統、曝光裝置及物品製造方法 Download PDF

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Publication number
TWI701458B
TWI701458B TW108102550A TW108102550A TWI701458B TW I701458 B TWI701458 B TW I701458B TW 108102550 A TW108102550 A TW 108102550A TW 108102550 A TW108102550 A TW 108102550A TW I701458 B TWI701458 B TW I701458B
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TW
Taiwan
Prior art keywords
optical system
catadioptric optical
catadioptric
reflecting
refractive
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TW108102550A
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English (en)
Chinese (zh)
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TW201921024A (zh
Inventor
大阪昇
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日商佳能股份有限公司
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW108102550A 2016-12-05 2017-11-21 反射折射光學系統、照明光學系統、曝光裝置及物品製造方法 TWI701458B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2016236244 2016-12-05
JP2016-236244 2016-12-05
JP2017090239A JP6882053B2 (ja) 2016-12-05 2017-04-28 カタディオプトリック光学系、照明光学系、露光装置および物品製造方法
JP2017-090239 2017-04-28

Publications (2)

Publication Number Publication Date
TW201921024A TW201921024A (zh) 2019-06-01
TWI701458B true TWI701458B (zh) 2020-08-11

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Application Number Title Priority Date Filing Date
TW108102550A TWI701458B (zh) 2016-12-05 2017-11-21 反射折射光學系統、照明光學系統、曝光裝置及物品製造方法
TW106140227A TWI657260B (zh) 2016-12-05 2017-11-21 反射折射光學系統、照明光學系統、曝光裝置及物品製造方法

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TW106140227A TWI657260B (zh) 2016-12-05 2017-11-21 反射折射光學系統、照明光學系統、曝光裝置及物品製造方法

Country Status (3)

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JP (2) JP6882053B2 (enExample)
KR (1) KR102239056B1 (enExample)
TW (2) TWI701458B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6820717B2 (ja) 2016-10-28 2021-01-27 株式会社日立ハイテク プラズマ処理装置
WO2021192210A1 (ja) 2020-03-27 2021-09-30 株式会社日立ハイテク 半導体製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6873476B2 (en) * 2000-01-14 2005-03-29 Carl-Zeiss-Stiftung Microlithographic reduction projection catadioptric objective
JP2006049904A (ja) * 2004-07-30 2006-02-16 Asml Holding Nv リソグラフィ用のオフアクシス反射屈折投影光学系
US7085075B2 (en) * 2003-08-12 2006-08-01 Carl Zeiss Smt Ag Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
CN105372799A (zh) * 2015-12-14 2016-03-02 中国科学院光电技术研究所 一种离轴反射型广角光学镜头

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61203419A (ja) 1985-03-06 1986-09-09 Nippon Kogaku Kk <Nikon> 反射縮小投影光学系
JPH0478002A (ja) 1990-07-13 1992-03-12 Toshiba Corp 磁気記録再生装置
JPH07146442A (ja) 1994-08-04 1995-06-06 Canon Inc 反射光学系
JPH11326767A (ja) * 1998-05-07 1999-11-26 Nikon Corp 反射屈折縮小光学系
JP2000227555A (ja) * 1998-07-16 2000-08-15 Olympus Optical Co Ltd 結像光学系
JP2000098228A (ja) * 1998-09-21 2000-04-07 Nikon Corp 投影露光装置及び露光方法、並びに反射縮小投影光学系
WO2002044786A2 (en) 2000-11-28 2002-06-06 Carl Zeiss Smt Ag Catadioptric projection system for 157 nm lithography
JP2003215458A (ja) * 2002-01-23 2003-07-30 Nikon Corp 反射屈折光学系
JP5196869B2 (ja) * 2007-05-15 2013-05-15 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
JP2009025737A (ja) 2007-07-23 2009-02-05 Canon Inc 反射屈折型投影光学系、露光装置及びデバイス製造方法
JP5654735B2 (ja) * 2008-05-15 2015-01-14 カール・ツァイス・エスエムティー・ゲーエムベーハー 結像光学器械及びその結像光学器械を含む投影露光装置
JP5398185B2 (ja) 2008-07-09 2014-01-29 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
JP2011107594A (ja) * 2009-11-20 2011-06-02 Nidec Copal Corp 撮像光学系及び撮像装置
DE102010040030B4 (de) * 2010-08-31 2017-02-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Objektiv und Bildaufnahmesystem

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6873476B2 (en) * 2000-01-14 2005-03-29 Carl-Zeiss-Stiftung Microlithographic reduction projection catadioptric objective
US7085075B2 (en) * 2003-08-12 2006-08-01 Carl Zeiss Smt Ag Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
JP2006049904A (ja) * 2004-07-30 2006-02-16 Asml Holding Nv リソグラフィ用のオフアクシス反射屈折投影光学系
CN105372799A (zh) * 2015-12-14 2016-03-02 中国科学院光电技术研究所 一种离轴反射型广角光学镜头

Also Published As

Publication number Publication date
TWI657260B (zh) 2019-04-21
KR102239056B1 (ko) 2021-04-12
JP6882053B2 (ja) 2021-06-02
JP2018092116A (ja) 2018-06-14
KR20180064306A (ko) 2018-06-14
TW201921024A (zh) 2019-06-01
TW201821857A (zh) 2018-06-16
JP2021113998A (ja) 2021-08-05
JP7029564B2 (ja) 2022-03-03

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