TWI693478B - 無罩曝光裝置及曝光方法 - Google Patents
無罩曝光裝置及曝光方法 Download PDFInfo
- Publication number
- TWI693478B TWI693478B TW105116222A TW105116222A TWI693478B TW I693478 B TWI693478 B TW I693478B TW 105116222 A TW105116222 A TW 105116222A TW 105116222 A TW105116222 A TW 105116222A TW I693478 B TWI693478 B TW I693478B
- Authority
- TW
- Taiwan
- Prior art keywords
- exposure
- substrate
- pattern data
- divided
- pattern
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015-111364 | 2015-06-01 | ||
JP2015111364A JP6554330B2 (ja) | 2015-06-01 | 2015-06-01 | マスクレス露光装置および露光方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201702758A TW201702758A (zh) | 2017-01-16 |
TWI693478B true TWI693478B (zh) | 2020-05-11 |
Family
ID=57574805
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105116222A TWI693478B (zh) | 2015-06-01 | 2016-05-25 | 無罩曝光裝置及曝光方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6554330B2 (ko) |
KR (1) | KR102439362B1 (ko) |
TW (1) | TWI693478B (ko) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7041482B2 (ja) * | 2017-09-13 | 2022-03-24 | 株式会社オーク製作所 | 露光装置 |
JPWO2021229992A1 (ko) * | 2020-05-09 | 2021-11-18 | ||
JP7446687B2 (ja) | 2020-07-22 | 2024-03-11 | 株式会社オーク製作所 | ダイレクト露光装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006106505A (ja) * | 2004-10-07 | 2006-04-20 | Fuji Photo Film Co Ltd | 画像記録装置及び画像記録方法 |
JP2011221241A (ja) * | 2010-04-08 | 2011-11-04 | V Technology Co Ltd | 露光方法及び露光装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10239613A (ja) * | 1997-02-28 | 1998-09-11 | Asahi Optical Co Ltd | レーザ描画装置 |
JP3648516B2 (ja) | 1999-02-05 | 2005-05-18 | ペンタックスインダストリアルインスツルメンツ株式会社 | 走査式描画装置 |
JP4324645B2 (ja) * | 2001-08-21 | 2009-09-02 | 株式会社オーク製作所 | 多重露光描画装置および多重露光描画方法 |
JP4362847B2 (ja) | 2004-04-09 | 2009-11-11 | 株式会社オーク製作所 | 描画装置 |
JP5258226B2 (ja) * | 2007-08-10 | 2013-08-07 | 株式会社オーク製作所 | 描画装置および描画方法 |
JP5210199B2 (ja) * | 2009-02-23 | 2013-06-12 | 大日本スクリーン製造株式会社 | 画像記録方法 |
-
2015
- 2015-06-01 JP JP2015111364A patent/JP6554330B2/ja active Active
-
2016
- 2016-05-20 KR KR1020160062154A patent/KR102439362B1/ko active IP Right Grant
- 2016-05-25 TW TW105116222A patent/TWI693478B/zh active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006106505A (ja) * | 2004-10-07 | 2006-04-20 | Fuji Photo Film Co Ltd | 画像記録装置及び画像記録方法 |
JP2011221241A (ja) * | 2010-04-08 | 2011-11-04 | V Technology Co Ltd | 露光方法及び露光装置 |
Also Published As
Publication number | Publication date |
---|---|
KR102439362B1 (ko) | 2022-09-02 |
JP6554330B2 (ja) | 2019-07-31 |
KR20160141652A (ko) | 2016-12-09 |
TW201702758A (zh) | 2017-01-16 |
JP2016224301A (ja) | 2016-12-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101136444B1 (ko) | 노광 방법 및 노광 장치 | |
JP2015222370A (ja) | 露光装置 | |
TWI693478B (zh) | 無罩曝光裝置及曝光方法 | |
JP2007310209A (ja) | 露光装置 | |
JP7389885B2 (ja) | 両面露光装置及び両面露光方法 | |
TWI481971B (zh) | 曝光方法及曝光裝置 | |
JP2007121425A (ja) | 露光方法及び露光装置 | |
TW201516580A (zh) | 具有主動對準之卷對卷無光罩微影 | |
JP3376961B2 (ja) | マスクを移動させて位置合わせを行う露光装置 | |
TW201035696A (en) | Alignment method, exposure method, electronic device fabrication method, alignment device, and exposure device | |
JP6723831B2 (ja) | 露光装置 | |
JP5961429B2 (ja) | 露光描画装置及び露光描画方法 | |
JP2003091069A (ja) | 蛇行修正機構を備えた帯状ワークの露光装置 | |
JP7412872B2 (ja) | 両面露光装置 | |
JP7175150B2 (ja) | 露光装置 | |
TWI772549B (zh) | 兩面曝光裝置及兩面曝光方法 | |
TWI475189B (zh) | Wiring board measuring device and wiring board measurement method | |
JP7364754B2 (ja) | 露光方法 | |
JP7234426B2 (ja) | マスク対及び両面露光装置 | |
JPH0346244A (ja) | Tab部品の実装装置における教示方法 | |
KR102671167B1 (ko) | 양면 노광 장치 및 양면 노광 방법 | |
JP7023620B2 (ja) | 露光装置及び基板載置方法 | |
JP4868119B2 (ja) | 露光装置 | |
JP2009294616A (ja) | 露光描画装置 | |
JP2020052283A (ja) | 露光装置および露光方法 |