TWI693397B - 檢查管理系統、檢查管理裝置以及檢查管理方法 - Google Patents

檢查管理系統、檢查管理裝置以及檢查管理方法 Download PDF

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Publication number
TWI693397B
TWI693397B TW108111533A TW108111533A TWI693397B TW I693397 B TWI693397 B TW I693397B TW 108111533 A TW108111533 A TW 108111533A TW 108111533 A TW108111533 A TW 108111533A TW I693397 B TWI693397 B TW I693397B
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TW
Taiwan
Prior art keywords
defect
image
inspection
inspection management
same
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TW108111533A
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English (en)
Chinese (zh)
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TW201944059A (zh
Inventor
植田清隆
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日商歐姆龍股份有限公司
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Publication of TW201944059A publication Critical patent/TW201944059A/zh
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/314—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
    • G01N21/3151—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths using two sources of radiation of different wavelengths
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/97—Determining parameters from multiple pictures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N2021/1765—Method using an image detector and processing of image signal
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/20—Special algorithmic details
    • G06T2207/20081—Training; Learning
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/20—Special algorithmic details
    • G06T2207/20084—Artificial neural networks [ANN]
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30168—Image quality inspection
TW108111533A 2018-04-20 2019-04-01 檢查管理系統、檢查管理裝置以及檢查管理方法 TWI693397B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018081064A JP6981352B2 (ja) 2018-04-20 2018-04-20 検査管理システム、検査管理装置及び検査管理方法
JP2018-081064 2018-04-20

Publications (2)

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TW201944059A TW201944059A (zh) 2019-11-16
TWI693397B true TWI693397B (zh) 2020-05-11

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JP (1) JP6981352B2 (ko)
KR (1) KR20190122550A (ko)
CN (1) CN110390661A (ko)
TW (1) TWI693397B (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021060345A (ja) * 2019-10-09 2021-04-15 オムロン株式会社 シート検査装置
KR20220117126A (ko) 2019-12-20 2022-08-23 보에 테크놀로지 그룹 컴퍼니 리미티드 분산형 제품 결함 분석 시스템 및 방법, 및 컴퓨터 판독가능 저장 매체
TWI762271B (zh) * 2020-08-13 2022-04-21 日商名南製作所股份有限公司 板狀木材的缺陷檢測系統、缺陷檢測方法以及缺陷檢測用程式
CN111982929A (zh) * 2020-08-14 2020-11-24 加藤义晴 一种电子部件检测设备及电子部件检测方法
TWI816060B (zh) * 2020-10-28 2023-09-21 友達光電股份有限公司 監測系統及其方法
KR102485878B1 (ko) * 2021-02-01 2023-01-06 김현식 플라스틱 박스 포장기
CN113960071B (zh) * 2021-10-23 2022-08-23 朗升柯式印刷(深圳)有限公司 用于彩印产品的品质检测方法及检测系统
CN115055385B (zh) * 2022-06-09 2024-03-22 黄冈师范学院 机器视觉片材瑕疵自动剔除方法
CN117408931A (zh) * 2022-07-06 2024-01-16 纬创资通(昆山)有限公司 影像缺陷检测系统、其产生方法及计算机可读取记录媒体

Citations (3)

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US7808630B2 (en) * 2008-02-29 2010-10-05 Lg Display Co., Ltd. Inspection apparatus for liquid crystal display device and inspection method using same
TWI357490B (ko) * 2004-11-24 2012-02-01 Asahi Glass Co Ltd
TWI420098B (zh) * 2008-07-18 2013-12-21 Asahi Glass Co Ltd A defect inspection apparatus and method using the image data for defect inspection, a method for manufacturing the same, and a recording medium

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JPS535002A (en) 1976-07-06 1978-01-18 Kobe Steel Ltd Sintering method of iron ore
DE19511534C2 (de) * 1995-03-29 1998-01-22 Fraunhofer Ges Forschung Verfahren und Vorrichtung zur Erfassung von 3D-Fehlstellen bei der automatischen Inspektion von Oberflächen mit Hilfe farbtüchtiger Bildauswertungssysteme
JP4220595B2 (ja) * 1998-08-10 2009-02-04 株式会社日立製作所 欠陥の分類方法並びに教示用データ作成方法
JP2003262593A (ja) * 2002-03-08 2003-09-19 Mitsubishi Rayon Co Ltd 欠陥検出装置及び欠陥検出方法
JP2003329596A (ja) * 2002-05-10 2003-11-19 Mitsubishi Rayon Co Ltd 欠陥検査装置及び欠陥検査方法
JP2004286532A (ja) * 2003-03-20 2004-10-14 Olympus Corp 外観検査方法及びその装置
JP2009036747A (ja) * 2007-07-06 2009-02-19 Toray Ind Inc 回路パターンの欠陥検査装置および欠陥検査方法
JP6314557B2 (ja) 2014-03-12 2018-04-25 オムロン株式会社 シート検査装置
JP2017215277A (ja) * 2016-06-02 2017-12-07 住友化学株式会社 欠陥検査システム、フィルム製造装置及び欠陥検査方法
CN107656986A (zh) * 2017-09-12 2018-02-02 武汉华星光电技术有限公司 微观缺陷整合预警方法及装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI357490B (ko) * 2004-11-24 2012-02-01 Asahi Glass Co Ltd
US7808630B2 (en) * 2008-02-29 2010-10-05 Lg Display Co., Ltd. Inspection apparatus for liquid crystal display device and inspection method using same
TWI420098B (zh) * 2008-07-18 2013-12-21 Asahi Glass Co Ltd A defect inspection apparatus and method using the image data for defect inspection, a method for manufacturing the same, and a recording medium

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Publication number Publication date
KR20190122550A (ko) 2019-10-30
JP6981352B2 (ja) 2021-12-15
CN110390661A (zh) 2019-10-29
TW201944059A (zh) 2019-11-16
JP2019190891A (ja) 2019-10-31

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