TWI682482B - 具有單一出口流方向的緩衝器站 - Google Patents

具有單一出口流方向的緩衝器站 Download PDF

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Publication number
TWI682482B
TWI682482B TW104133447A TW104133447A TWI682482B TW I682482 B TWI682482 B TW I682482B TW 104133447 A TW104133447 A TW 104133447A TW 104133447 A TW104133447 A TW 104133447A TW I682482 B TWI682482 B TW I682482B
Authority
TW
Taiwan
Prior art keywords
buffer
wafer
wafers
support
storing
Prior art date
Application number
TW104133447A
Other languages
English (en)
Chinese (zh)
Other versions
TW201628118A (zh
Inventor
馬汀 羅勃特 馬拉遜
理查 霍華 古德
德瑞克 約翰 威特科威克
Original Assignee
美商蘭姆研究公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商蘭姆研究公司 filed Critical 美商蘭姆研究公司
Publication of TW201628118A publication Critical patent/TW201628118A/zh
Application granted granted Critical
Publication of TWI682482B publication Critical patent/TWI682482B/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/34—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H10P72/3404—Storage means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/19—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
    • H10P72/1924—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by atmosphere control
    • H10P72/1926—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrier
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/14—Vertical carrier comprising wall type elements whereby the substrates are horizontally supported, e.g. comprising sidewalls

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW104133447A 2014-10-24 2015-10-13 具有單一出口流方向的緩衝器站 TWI682482B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/523,122 US9881826B2 (en) 2014-10-24 2014-10-24 Buffer station with single exit-flow direction
US14/523,122 2014-10-24

Publications (2)

Publication Number Publication Date
TW201628118A TW201628118A (zh) 2016-08-01
TWI682482B true TWI682482B (zh) 2020-01-11

Family

ID=55792562

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104133447A TWI682482B (zh) 2014-10-24 2015-10-13 具有單一出口流方向的緩衝器站

Country Status (4)

Country Link
US (2) US9881826B2 (https=)
JP (1) JP6590632B2 (https=)
KR (1) KR102433494B1 (https=)
TW (1) TWI682482B (https=)

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Also Published As

Publication number Publication date
JP6590632B2 (ja) 2019-10-16
TW201628118A (zh) 2016-08-01
US20180144965A1 (en) 2018-05-24
KR102433494B1 (ko) 2022-08-17
US9881826B2 (en) 2018-01-30
US10297480B2 (en) 2019-05-21
KR20160048655A (ko) 2016-05-04
US20160118282A1 (en) 2016-04-28
JP2016086161A (ja) 2016-05-19

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