JP6590632B2 - 排出流の方向が単一のバッファステーション - Google Patents

排出流の方向が単一のバッファステーション Download PDF

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Publication number
JP6590632B2
JP6590632B2 JP2015205143A JP2015205143A JP6590632B2 JP 6590632 B2 JP6590632 B2 JP 6590632B2 JP 2015205143 A JP2015205143 A JP 2015205143A JP 2015205143 A JP2015205143 A JP 2015205143A JP 6590632 B2 JP6590632 B2 JP 6590632B2
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Prior art keywords
buffer
wafer
support
purge gas
fins
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Japanese (ja)
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JP2016086161A5 (https=
JP2016086161A (ja
Inventor
マーチン・ロバート・マラスキン
リチャード・ハワード・グールド
デレク・ジョン・ウィトコウィッキ
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Lam Research Corp
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Lam Research Corp
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Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/34Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H10P72/3404Storage means
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/19Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
    • H10P72/1924Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by atmosphere control
    • H10P72/1926Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrier
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/14Vertical carrier comprising wall type elements whereby the substrates are horizontally supported, e.g. comprising sidewalls

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2015205143A 2014-10-24 2015-10-19 排出流の方向が単一のバッファステーション Active JP6590632B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/523,122 US9881826B2 (en) 2014-10-24 2014-10-24 Buffer station with single exit-flow direction
US14/523,122 2014-10-24

Publications (3)

Publication Number Publication Date
JP2016086161A JP2016086161A (ja) 2016-05-19
JP2016086161A5 JP2016086161A5 (https=) 2018-12-27
JP6590632B2 true JP6590632B2 (ja) 2019-10-16

Family

ID=55792562

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015205143A Active JP6590632B2 (ja) 2014-10-24 2015-10-19 排出流の方向が単一のバッファステーション

Country Status (4)

Country Link
US (2) US9881826B2 (https=)
JP (1) JP6590632B2 (https=)
KR (1) KR102433494B1 (https=)
TW (1) TWI682482B (https=)

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Also Published As

Publication number Publication date
TW201628118A (zh) 2016-08-01
US20180144965A1 (en) 2018-05-24
KR102433494B1 (ko) 2022-08-17
US9881826B2 (en) 2018-01-30
US10297480B2 (en) 2019-05-21
KR20160048655A (ko) 2016-05-04
TWI682482B (zh) 2020-01-11
US20160118282A1 (en) 2016-04-28
JP2016086161A (ja) 2016-05-19

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