TWI678529B - 光學薄膜缺陷檢測裝置及方法 - Google Patents

光學薄膜缺陷檢測裝置及方法 Download PDF

Info

Publication number
TWI678529B
TWI678529B TW105102026A TW105102026A TWI678529B TW I678529 B TWI678529 B TW I678529B TW 105102026 A TW105102026 A TW 105102026A TW 105102026 A TW105102026 A TW 105102026A TW I678529 B TWI678529 B TW I678529B
Authority
TW
Taiwan
Prior art keywords
defect
area
optical film
defects
aforementioned
Prior art date
Application number
TW105102026A
Other languages
English (en)
Chinese (zh)
Other versions
TW201631313A (zh
Inventor
金種佑
Jong Woo Kim
朴真用
Jin Yong Park
Original Assignee
南韓商東友精細化工有限公司
Dongwoo Fine-Chem Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 南韓商東友精細化工有限公司, Dongwoo Fine-Chem Co., Ltd. filed Critical 南韓商東友精細化工有限公司
Publication of TW201631313A publication Critical patent/TW201631313A/zh
Application granted granted Critical
Publication of TWI678529B publication Critical patent/TWI678529B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8914—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the material examined
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G01N2021/8858—Flaw counting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G01N2021/8877—Proximity analysis, local statistics
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Textile Engineering (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • General Factory Administration (AREA)
  • Image Analysis (AREA)
TW105102026A 2015-02-25 2016-01-22 光學薄膜缺陷檢測裝置及方法 TWI678529B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020150026616A KR101733017B1 (ko) 2015-02-25 2015-02-25 광학 필름의 불량 검출 장치 및 방법
KR10-2015-0026616 2015-02-25

Publications (2)

Publication Number Publication Date
TW201631313A TW201631313A (zh) 2016-09-01
TWI678529B true TWI678529B (zh) 2019-12-01

Family

ID=56745067

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105102026A TWI678529B (zh) 2015-02-25 2016-01-22 光學薄膜缺陷檢測裝置及方法

Country Status (4)

Country Link
JP (1) JP6703856B2 (ja)
KR (1) KR101733017B1 (ja)
CN (1) CN105910794B (ja)
TW (1) TWI678529B (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101733018B1 (ko) * 2015-02-25 2017-05-24 동우 화인켐 주식회사 광학 필름의 불량 검출 장치 및 방법
KR101876908B1 (ko) * 2018-01-16 2018-07-10 (주) 리드에이텍 디스플레이 패널의 결함 위치 정확도 개선 방법
CN113466256B (zh) * 2021-06-29 2022-04-15 深圳市楠轩光电科技有限公司 一种光学薄膜缺陷批量式检测设备
CN116730056B (zh) * 2023-08-15 2023-10-27 江苏铭丰电子材料科技有限公司 一种可测缺陷的铜箔收卷装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201009328A (en) * 2008-07-18 2010-03-01 Asahi Glass Co Ltd Image data processing apparatus and method for defect inspection, defect inspecting apparatus and method using the image data processing apparatus and method, board-like body manufacturing method using the defect inspecting apparatus and method
KR20110124090A (ko) * 2010-05-10 2011-11-16 동우 화인켐 주식회사 편광 필름 원반의 품질 판정 시스템 및 방법
TW201250267A (en) * 2011-06-07 2012-12-16 Photon Dynamics Inc Apparatus and method for identifying a defect in an electronic circuit having periodic features and computer-readable medium thereof
TW201346249A (zh) * 2012-05-10 2013-11-16 Dongwoo Fine Chem Co Ltd 鑑別光學薄膜缺陷方法
KR20140075042A (ko) * 2012-12-07 2014-06-19 엘지디스플레이 주식회사 표시패널 검사 장치 및 그 방법

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3758150A (en) * 1972-06-28 1973-09-11 P Williams Collapsible wheel chair
CA2359379A1 (en) * 2001-10-19 2003-04-19 Richard Eakins Raisable leg rest
KR100838724B1 (ko) 2001-12-05 2008-06-16 주식회사 포스코 산세강판의 롤마크 표면결함 검출시스템
JP4516884B2 (ja) * 2005-04-28 2010-08-04 新日本製鐵株式会社 周期性欠陥検査方法及び装置
KR101211352B1 (ko) * 2005-06-21 2012-12-11 군제 가부시키가이샤 필름검사장치 및 필름검사방법
DE602006005628D1 (de) * 2006-06-13 2009-04-23 Abb Oy Verfahren und Vorrichtung zur Erkennung von sich wiederholenden Mustern
WO2011112427A1 (en) * 2010-03-10 2011-09-15 3M Innovative Properties Company Application-specific repeat defect detection in web manufacturing processes
WO2011148790A1 (ja) * 2010-05-25 2011-12-01 東レ株式会社 フィルムの欠陥検査装置、欠陥検査方法および離型フィルム
JP2013228297A (ja) * 2012-04-26 2013-11-07 Toppan Printing Co Ltd 自動欠陥検査システム
CN103913461A (zh) * 2013-01-07 2014-07-09 北京兆维电子(集团)有限责任公司 一种tft-lcd点灯自动光学检测的图像处理方法
CN104048599B (zh) * 2013-03-13 2018-06-01 以操作-试验名义经营的索夫泰克系统配套公司 用于对发光器件进行特征分析的方法和系统
KR20140148067A (ko) * 2013-06-21 2014-12-31 동우 화인켐 주식회사 광학 필름의 결함 판별 방법
JP6285658B2 (ja) 2013-08-02 2018-02-28 住友化学株式会社 欠陥検査システム及びフィルム製造装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201009328A (en) * 2008-07-18 2010-03-01 Asahi Glass Co Ltd Image data processing apparatus and method for defect inspection, defect inspecting apparatus and method using the image data processing apparatus and method, board-like body manufacturing method using the defect inspecting apparatus and method
KR20110124090A (ko) * 2010-05-10 2011-11-16 동우 화인켐 주식회사 편광 필름 원반의 품질 판정 시스템 및 방법
TW201250267A (en) * 2011-06-07 2012-12-16 Photon Dynamics Inc Apparatus and method for identifying a defect in an electronic circuit having periodic features and computer-readable medium thereof
TW201346249A (zh) * 2012-05-10 2013-11-16 Dongwoo Fine Chem Co Ltd 鑑別光學薄膜缺陷方法
KR20140075042A (ko) * 2012-12-07 2014-06-19 엘지디스플레이 주식회사 표시패널 검사 장치 및 그 방법

Also Published As

Publication number Publication date
JP6703856B2 (ja) 2020-06-03
JP2016156821A (ja) 2016-09-01
CN105910794B (zh) 2021-02-09
CN105910794A (zh) 2016-08-31
KR20160103795A (ko) 2016-09-02
TW201631313A (zh) 2016-09-01
KR101733017B1 (ko) 2017-05-24

Similar Documents

Publication Publication Date Title
TWI678529B (zh) 光學薄膜缺陷檢測裝置及方法
US9916653B2 (en) Detection of defects embedded in noise for inspection in semiconductor manufacturing
JP2016161576A (ja) 光学フィルムの検査システム及び検査方法、並びに光学フィルムの品質管理装置及び品質管理方法
US9171364B2 (en) Wafer inspection using free-form care areas
JP6465682B2 (ja) 情報処理装置、情報処理方法及びプログラム
US9165193B2 (en) Video processing apparatus and method for managing tracking object
JP2015082326A5 (ja)
JP2017091009A (ja) 異常作業検出システムおよび異常作業検出方法
US20220044383A1 (en) Learned model generation method, learned model, surface defect inspection method, steel manufacturing method, pass/fail determination method, grade determination method, surface defect determination program, pass/fail determination program, determination system, and steel manufacturing equipment
TWI705241B (zh) 光學薄膜缺陷檢測裝置及方法
US8483487B2 (en) Image processing device and method for capturing object outline
JP2018124177A (ja) 床面判断方法
CN102339464A (zh) 线搜索式角点检测方法
JP2015215183A (ja) 欠陥分析装置及び欠陥分析方法
US20230133242A1 (en) Work assignment status monitoring system, work assignment status monitoring method, and work assignment status monitoring program
US11120541B2 (en) Determination device and determining method thereof
CN114003034A (zh) 一种巡检机器人巡检规划的制定方法、设备及存储介质
TWI812697B (zh) 圖像識別裝置、及具有圖像識別裝置的物品製造裝置
JP2009080572A (ja) 動物体検出装置及び動物体検出方法
KR20190052785A (ko) 객체 검출 방법, 장치 및 컴퓨터 프로그램
JP6930157B2 (ja) フィルム検査システム及びフィルムの製造方法
US20230196773A1 (en) Object detection device, object detection method, and computer-readable storage medium
US11231571B2 (en) Determining an erroneous movement of a microscope
JP2023022814A (ja) 鋼帯コイルの巻き形状判定モデルの生成方法、巻き形状判定方法および処置工程設定方法、ならびに鋼帯コイルの製造方法
JP6028354B2 (ja) ウエハ検査方法とウエハ検査装置