TWI667462B - 用於處理靶材之裝置 - Google Patents
用於處理靶材之裝置 Download PDFInfo
- Publication number
- TWI667462B TWI667462B TW107110312A TW107110312A TWI667462B TW I667462 B TWI667462 B TW I667462B TW 107110312 A TW107110312 A TW 107110312A TW 107110312 A TW107110312 A TW 107110312A TW I667462 B TWI667462 B TW I667462B
- Authority
- TW
- Taiwan
- Prior art keywords
- sample
- target
- capture unit
- inlet
- capture
- Prior art date
Links
- 238000000608 laser ablation Methods 0.000 claims abstract description 21
- 230000003287 optical effect Effects 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 16
- 238000012545 processing Methods 0.000 claims description 12
- 239000002245 particle Substances 0.000 claims description 8
- 239000000443 aerosol Substances 0.000 claims description 7
- 230000008878 coupling Effects 0.000 claims description 6
- 238000010168 coupling process Methods 0.000 claims description 6
- 238000005859 coupling reaction Methods 0.000 claims description 6
- 239000012159 carrier gas Substances 0.000 abstract description 75
- 238000002347 injection Methods 0.000 abstract description 50
- 239000007924 injection Substances 0.000 abstract description 50
- 239000012530 fluid Substances 0.000 abstract description 49
- 239000013077 target material Substances 0.000 abstract description 35
- 238000004458 analytical method Methods 0.000 abstract description 24
- 239000000523 sample Substances 0.000 description 208
- 239000007789 gas Substances 0.000 description 33
- 210000002381 plasma Anatomy 0.000 description 23
- 238000002360 preparation method Methods 0.000 description 22
- 230000007704 transition Effects 0.000 description 14
- 239000000463 material Substances 0.000 description 13
- 238000012546 transfer Methods 0.000 description 13
- 230000005540 biological transmission Effects 0.000 description 11
- 238000004807 desolvation Methods 0.000 description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 230000007246 mechanism Effects 0.000 description 9
- 238000004891 communication Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 238000009616 inductively coupled plasma Methods 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 5
- 239000012636 effector Substances 0.000 description 5
- 239000001307 helium Substances 0.000 description 5
- 229910052734 helium Inorganic materials 0.000 description 5
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000000095 laser ablation inductively coupled plasma mass spectrometry Methods 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000005070 sampling Methods 0.000 description 4
- 230000032258 transport Effects 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 230000033001 locomotion Effects 0.000 description 3
- 239000002105 nanoparticle Substances 0.000 description 3
- 239000006199 nebulizer Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 238000001636 atomic emission spectroscopy Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000012472 biological sample Substances 0.000 description 2
- 210000004027 cell Anatomy 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- -1 polytetrafluoroethylene Polymers 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000010146 3D printing Methods 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000004166 bioassay Methods 0.000 description 1
- 239000012620 biological material Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000000112 cooling gas Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004993 emission spectroscopy Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 239000004811 fluoropolymer Substances 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000008177 pharmaceutical agent Substances 0.000 description 1
- 239000006187 pill Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
- H01J49/0459—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components for solid samples
- H01J49/0463—Desorption by laser or particle beam, followed by ionisation as a separate step
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
- G01N1/38—Diluting, dispersing or mixing samples
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/02—Devices for withdrawing samples
- G01N1/04—Devices for withdrawing samples in the solid state, e.g. by cutting
- G01N2001/045—Laser ablation; Microwave vaporisation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
- G01N1/38—Diluting, dispersing or mixing samples
- G01N2001/383—Diluting, dispersing or mixing samples collecting and diluting in a flow of liquid
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
- H01J49/105—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Immunology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Pathology (AREA)
- Optics & Photonics (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Sampling And Sample Adjustment (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361764976P | 2013-02-14 | 2013-02-14 | |
| US61/764,976 | 2013-02-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201827806A TW201827806A (zh) | 2018-08-01 |
| TWI667462B true TWI667462B (zh) | 2019-08-01 |
Family
ID=51354519
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW107110312A TWI667462B (zh) | 2013-02-14 | 2014-02-12 | 用於處理靶材之裝置 |
| TW103104709A TW201447259A (zh) | 2013-02-14 | 2014-02-12 | 用於組成分析系統的雷射剝蝕單元和火炬系統 |
| TW107125366A TWI668422B (zh) | 2013-02-14 | 2014-02-12 | 用於處理從靶材的雷射剝蝕位置被移除的靶材材料之裝置 |
| TW103104712A TWI614488B (zh) | 2013-02-14 | 2014-02-12 | 注入器、注入器裝置、樣本準備裝置以及將氣溶膠樣本注入電漿火炬的方法 |
Family Applications After (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103104709A TW201447259A (zh) | 2013-02-14 | 2014-02-12 | 用於組成分析系統的雷射剝蝕單元和火炬系統 |
| TW107125366A TWI668422B (zh) | 2013-02-14 | 2014-02-12 | 用於處理從靶材的雷射剝蝕位置被移除的靶材材料之裝置 |
| TW103104712A TWI614488B (zh) | 2013-02-14 | 2014-02-12 | 注入器、注入器裝置、樣本準備裝置以及將氣溶膠樣本注入電漿火炬的方法 |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP2956756B1 (https=) |
| JP (3) | JP6463279B2 (https=) |
| KR (1) | KR20150114963A (https=) |
| CN (1) | CN105074419B (https=) |
| TW (4) | TWI667462B (https=) |
| WO (1) | WO2014127034A1 (https=) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3240014A1 (en) | 2016-04-29 | 2017-11-01 | ETH Zurich | Laser ablation cell |
| WO2018026898A1 (en) | 2016-08-02 | 2018-02-08 | Fluidigm Canada Inc. | Laser ablation system |
| WO2018026910A1 (en) | 2016-08-02 | 2018-02-08 | Fluidigm Canada Inc. | Sample imaging apparatus and method |
| AT519146B1 (de) | 2016-10-05 | 2020-03-15 | Univ Wien Tech | Vorrichtung zur Analyse eines Feststoff-Probenmaterials |
| EP3612809A4 (en) * | 2017-04-20 | 2020-11-04 | Elemental Scientific Lasers, LLC | ADAPTABLE SAMPLE FLOOR FOR ULTRA-FAST SIGNAL DETECTION |
| WO2019236698A1 (en) * | 2018-06-05 | 2019-12-12 | Wilkins Jay N | Apparatus and method to bypass a sample chamber in laser assisted spectroscopy |
| US11264221B2 (en) | 2018-06-18 | 2022-03-01 | Fluidigm Canada Inc. | High resolution imaging apparatus and method |
| JP7651453B2 (ja) | 2018-09-10 | 2025-03-26 | フリューダイム カナダ インコーポレイテッド | オートフォーカスサンプルイメージング装置及び方法 |
| CN109444248B (zh) * | 2018-11-20 | 2020-10-30 | 中国地质大学（武汉） | 一种基于激光的溶液剥蚀进样分析方法 |
| GB2582751B (en) * | 2019-03-29 | 2021-07-07 | Thermo Fisher Scient Ecublens Sarl | Improved spark stand for optical emission spectrometry |
| JP6652212B2 (ja) * | 2019-04-15 | 2020-02-19 | 株式会社島津製作所 | サンプルプレート移動機構及びそれを備えたレーザ脱離イオン化質量分析装置 |
| CA3140663A1 (en) | 2019-06-18 | 2020-12-24 | Paul Corkum | Improved mass cytometry |
| JP7349632B2 (ja) * | 2019-06-28 | 2023-09-25 | 株式会社エス・テイ・ジャパン | レーザーアブレーション用のセルおよび分析装置 |
| KR102229252B1 (ko) * | 2019-08-19 | 2021-03-18 | 한국과학기술연구원 | 에어로졸 발생 장치 |
| KR20240004586A (ko) * | 2021-04-26 | 2024-01-11 | 엘리멘탈 사이언티픽, 인코포레이티드 | 보호된 주입기를 갖는 유도 결합 플라스마 토치 구조물 |
| WO2024224612A1 (ja) * | 2023-04-28 | 2024-10-31 | 株式会社 イアス | レーザーアブレーションｉｃｐ分析方法及び分析装置 |
| WO2026022960A1 (ja) * | 2024-07-24 | 2026-01-29 | ロ－ツェイアス株式会社 | 試料吸引エジェクター |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995017656A1 (fr) * | 1993-12-23 | 1995-06-29 | Compagnie Generale Des Matieres Nucleaires | Procede de controle de la contamination surfacique d'un solide et dispositif de mise en ×uvre |
| US5537206A (en) * | 1993-11-02 | 1996-07-16 | Nkk Corporation | Method for analyzing steel and apparatus therefor |
| TW201211291A (en) * | 2010-06-03 | 2012-03-16 | Ulvac Inc | Sputter film forming apparatus |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1574812A (en) * | 1976-05-06 | 1980-09-10 | Barringer Research Ltd | Spectrochemical analysis |
| JPS6070960A (ja) * | 1983-09-26 | 1985-04-22 | Nec Corp | フイ−ドスル− |
| JPH0622719B2 (ja) * | 1985-05-13 | 1994-03-30 | 小野田セメント株式会社 | 複ト−チ型プラズマ溶射方法及びその装置 |
| JPS62281755A (ja) * | 1986-05-29 | 1987-12-07 | Anelva Corp | 動力導入機 |
| JP2643031B2 (ja) * | 1991-04-10 | 1997-08-20 | 動力炉・核燃料開発事業団 | 固体発光分光分析装置 |
| EP0560537A1 (en) * | 1992-03-10 | 1993-09-15 | Mds Health Group Limited | Apparatus and method for liquid sample introduction |
| US5850089A (en) * | 1992-03-13 | 1998-12-15 | American Research Corporation Of Virginia | Modulated-structure of PZT/PT ferroelectric thin films for non-volatile random access memories |
| JP2804873B2 (ja) * | 1992-12-17 | 1998-09-30 | 三菱電機株式会社 | 微粒子分析装置および微粒子分析方法 |
| FR2700852B1 (fr) * | 1993-01-27 | 1995-03-03 | Commissariat Energie Atomique | Cellule d'ablation d'un échantillon au laser. |
| US5504327A (en) * | 1993-11-04 | 1996-04-02 | Hv Ops, Inc. (H-Nu) | Electrospray ionization source and method for mass spectrometric analysis |
| JPH085555A (ja) * | 1994-06-17 | 1996-01-12 | Hitachi Ltd | 元素分析用プラズマトーチ及びこれを用いた元素分析方法 |
| JP4095646B2 (ja) * | 1995-12-27 | 2008-06-04 | 日本電信電話株式会社 | 元素分析装置 |
| JPH1151904A (ja) * | 1997-08-05 | 1999-02-26 | Jeol Ltd | Ｉｃｐ−ｍｓのレーザーアブレーション方法及び装置 |
| JP2001272349A (ja) * | 2000-03-24 | 2001-10-05 | Shimadzu Corp | Ｉｃｐ発光分光分析用プラズマトーチ |
| EP1402762B1 (en) * | 2001-07-03 | 2013-09-25 | Agilent Technologies Australia (M) Pty Ltd | Plasma torch |
| JP3800621B2 (ja) * | 2002-01-18 | 2006-07-26 | 株式会社島津製作所 | Ｉｃｐ分析装置 |
| JP4232951B2 (ja) * | 2002-11-07 | 2009-03-04 | 独立行政法人産業技術総合研究所 | 誘導結合プラズマトーチ |
| US7460225B2 (en) * | 2004-03-05 | 2008-12-02 | Vassili Karanassios | Miniaturized source devices for optical and mass spectrometry |
| JP2006038729A (ja) * | 2004-07-29 | 2006-02-09 | National Institute Of Advanced Industrial & Technology | 誘導結合プラズマトーチ |
| US7649170B2 (en) * | 2006-10-03 | 2010-01-19 | Academia Sinica | Dual-polarity mass spectrometer |
| KR100801708B1 (ko) * | 2006-12-22 | 2008-02-11 | 삼성전자주식회사 | 웨이퍼 오염물질 분석장비 및 방법 |
| US8174691B1 (en) * | 2007-03-15 | 2012-05-08 | Arkansas State University—Jonesboro | Detection of a component of interest with an ultraviolet laser and method of using the same |
| JP4982891B2 (ja) * | 2007-04-12 | 2012-07-25 | 独立行政法人産業技術総合研究所 | 反応性プラズマ中におけるラジカル及びダスト濃度測定方法 |
| US8207472B2 (en) * | 2008-06-18 | 2012-06-26 | Electro Scientific Industries, Inc. | Debris capture and removal for laser micromachining |
| US20100207038A1 (en) | 2009-02-13 | 2010-08-19 | Loughborough University | Apparatus and method for laser irradiation |
| US20110089320A1 (en) * | 2009-10-19 | 2011-04-21 | Wiederin Daniel R | Direct injection nebulizer |
| JP5482599B2 (ja) * | 2010-09-17 | 2014-05-07 | トヨタ自動車株式会社 | レーザーアブレーション質量分析装置 |
| JP2013024806A (ja) * | 2011-07-25 | 2013-02-04 | Toyota Motor Corp | レーザーアブレーション質量分析装置 |
-
2014
- 2014-02-12 KR KR1020157022052A patent/KR20150114963A/ko not_active Ceased
- 2014-02-12 TW TW107110312A patent/TWI667462B/zh active
- 2014-02-12 CN CN201480008569.0A patent/CN105074419B/zh active Active
- 2014-02-12 TW TW103104709A patent/TW201447259A/zh unknown
- 2014-02-12 WO PCT/US2014/016085 patent/WO2014127034A1/en not_active Ceased
- 2014-02-12 EP EP14751410.3A patent/EP2956756B1/en active Active
- 2014-02-12 TW TW107125366A patent/TWI668422B/zh active
- 2014-02-12 JP JP2015558111A patent/JP6463279B2/ja active Active
- 2014-02-12 TW TW103104712A patent/TWI614488B/zh active
-
2018
- 2018-12-28 JP JP2018246559A patent/JP6776323B2/ja active Active
-
2020
- 2020-10-07 JP JP2020169532A patent/JP2021039107A/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5537206A (en) * | 1993-11-02 | 1996-07-16 | Nkk Corporation | Method for analyzing steel and apparatus therefor |
| WO1995017656A1 (fr) * | 1993-12-23 | 1995-06-29 | Compagnie Generale Des Matieres Nucleaires | Procede de controle de la contamination surfacique d'un solide et dispositif de mise en ×uvre |
| TW201211291A (en) * | 2010-06-03 | 2012-03-16 | Ulvac Inc | Sputter film forming apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20150114963A (ko) | 2015-10-13 |
| JP2016513254A (ja) | 2016-05-12 |
| WO2014127034A1 (en) | 2014-08-21 |
| TW201447261A (zh) | 2014-12-16 |
| JP6463279B2 (ja) | 2019-01-30 |
| EP2956756B1 (en) | 2024-09-04 |
| CN105074419A (zh) | 2015-11-18 |
| JP6776323B2 (ja) | 2020-10-28 |
| TWI614488B (zh) | 2018-02-11 |
| TW201840962A (zh) | 2018-11-16 |
| CN105074419B (zh) | 2019-02-01 |
| JP2019082483A (ja) | 2019-05-30 |
| TW201447259A (zh) | 2014-12-16 |
| EP2956756A4 (en) | 2016-10-12 |
| EP2956756A1 (en) | 2015-12-23 |
| TWI668422B (zh) | 2019-08-11 |
| JP2021039107A (ja) | 2021-03-11 |
| TW201827806A (zh) | 2018-08-01 |
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