TWI650410B - 矽晶圓硏磨用組成物 - Google Patents

矽晶圓硏磨用組成物 Download PDF

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Publication number
TWI650410B
TWI650410B TW103117769A TW103117769A TWI650410B TW I650410 B TWI650410 B TW I650410B TW 103117769 A TW103117769 A TW 103117769A TW 103117769 A TW103117769 A TW 103117769A TW I650410 B TWI650410 B TW I650410B
Authority
TW
Taiwan
Prior art keywords
group
polishing
silicon wafer
polymer
containing polymer
Prior art date
Application number
TW103117769A
Other languages
English (en)
Chinese (zh)
Other versions
TW201510197A (zh
Inventor
Kohsuke Tsuchiya
土屋公亮
Hisanori Tansho
丹所久典
Taiki ICHITSUBO
市坪大輝
Yoshio Mori
森嘉男
Original Assignee
Fujimi Incorporated
日商福吉米股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujimi Incorporated, 日商福吉米股份有限公司 filed Critical Fujimi Incorporated
Publication of TW201510197A publication Critical patent/TW201510197A/zh
Application granted granted Critical
Publication of TWI650410B publication Critical patent/TWI650410B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1436—Composite particles, e.g. coated particles
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/10—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H10P70/15—Cleaning before device manufacture, i.e. Begin-Of-Line process by wet cleaning only
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P90/00—Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
    • H10P90/12—Preparing bulk and homogeneous wafers
    • H10P90/129—Preparing bulk and homogeneous wafers by polishing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Composite Materials (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW103117769A 2013-06-07 2014-05-21 矽晶圓硏磨用組成物 TWI650410B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2013120328 2013-06-07
JP2013-120328 2013-06-07
JP2014010836 2014-01-23
JP2014-010836 2014-01-23

Publications (2)

Publication Number Publication Date
TW201510197A TW201510197A (zh) 2015-03-16
TWI650410B true TWI650410B (zh) 2019-02-11

Family

ID=52007952

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103117769A TWI650410B (zh) 2013-06-07 2014-05-21 矽晶圓硏磨用組成物

Country Status (8)

Country Link
US (2) US20160122591A1 (https=)
EP (1) EP3007213B1 (https=)
JP (2) JP6037416B2 (https=)
KR (1) KR102239045B1 (https=)
CN (1) CN105264647B (https=)
SG (1) SG11201508398TA (https=)
TW (1) TWI650410B (https=)
WO (1) WO2014196299A1 (https=)

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JP6403324B2 (ja) * 2014-12-25 2018-10-10 花王株式会社 シリコンウェーハ用研磨液組成物
JP6366139B2 (ja) * 2014-12-25 2018-08-01 花王株式会社 シリコンウェーハ用研磨液組成物の製造方法
EP3258483A4 (en) * 2015-02-12 2018-02-28 Fujimi Incorporated Method for polishing silicon wafer and surface treatment composition
US10748778B2 (en) 2015-02-12 2020-08-18 Fujimi Incorporated Method for polishing silicon wafer and surface treatment composition
WO2017011115A1 (en) * 2015-07-10 2017-01-19 Ferro Corporation Slurry composition and additives and method for polishing organic polymer-based ophthalmic substrates
JP6801964B2 (ja) * 2016-01-19 2020-12-16 株式会社フジミインコーポレーテッド 研磨用組成物及びシリコン基板の研磨方法
KR102645587B1 (ko) * 2016-02-29 2024-03-11 가부시키가이샤 후지미인코퍼레이티드 연마용 조성물 및 이것을 사용한 연마 방법
SG11201901590SA (en) * 2016-09-21 2019-03-28 Fujimi Inc Composition for surface treatment
WO2018180479A1 (ja) * 2017-03-31 2018-10-04 株式会社フジミインコーポレーテッド 研磨用組成物
JP6916039B2 (ja) * 2017-06-05 2021-08-11 Ａｔシリカ株式会社 研磨用組成物
US11421131B2 (en) 2017-11-06 2022-08-23 Fujimi Incorporated Polishing composition and method for producing same
JP7353051B2 (ja) * 2019-03-26 2023-09-29 株式会社フジミインコーポレーテッド シリコンウェーハ研磨用組成物
JP7356248B2 (ja) * 2019-03-28 2023-10-04 株式会社フジミインコーポレーテッド リンス用組成物およびリンス方法
CN110922897B (zh) * 2019-11-18 2024-03-08 宁波日晟新材料有限公司 一种用于硅化合物的低雾值无损伤抛光液及其制备方法
JP7512035B2 (ja) * 2019-12-24 2024-07-08 ニッタ・デュポン株式会社 研磨用組成物
JP7752601B2 (ja) * 2020-03-13 2025-10-10 株式会社フジミインコーポレーテッド 研磨用組成物
US20230143074A1 (en) * 2020-03-13 2023-05-11 Fujimi Incorporated Polishing composition and polishing method
JP7562453B2 (ja) 2021-03-12 2024-10-07 キオクシア株式会社 研磨液、研磨装置、及び研磨方法
US20220396715A1 (en) * 2021-06-14 2022-12-15 Entegris, Inc. Grinding of hard substrates
CN118985038A (zh) 2022-03-23 2024-11-19 福吉米株式会社 研磨用组合物
JPWO2024195575A1 (https=) * 2023-03-20 2024-09-26
WO2024263357A1 (en) * 2023-06-21 2024-12-26 Corning Incorporated Coated articles, methods of polishing, and methods of making the same
WO2025115883A1 (ja) * 2023-11-28 2025-06-05 大阪有機化学工業株式会社 研磨組成物

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TW200942602A (en) * 2007-11-14 2009-10-16 Showa Denko Kk Polishing composition
TW201346017A (zh) * 2012-04-17 2013-11-16 花王股份有限公司 矽晶圓用研磨液組合物

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WO2009107472A1 (ja) * 2008-02-27 2009-09-03 Jsr株式会社 化学機械研磨用水系分散体およびそれを用いた化学機械研磨方法、化学機械研磨用水系分散体の再生方法
CN104178088B (zh) * 2008-04-23 2016-08-17 日立化成株式会社 研磨剂及使用该研磨剂的基板研磨方法
JP5413456B2 (ja) * 2009-04-20 2014-02-12 日立化成株式会社 半導体基板用研磨液及び半導体基板の研磨方法
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KR101359092B1 (ko) * 2009-11-11 2014-02-05 가부시키가이샤 구라레 화학적 기계적 연마용 슬러리 및 그것을 이용하는 기판의 연마 방법
JP4772156B1 (ja) 2010-07-05 2011-09-14 花王株式会社 シリコンウエハ用研磨液組成物
SG192220A1 (en) * 2011-02-03 2013-09-30 Nitta Haas Inc Polishing composition and polishing method using the same
SG10201606827RA (en) * 2012-02-21 2016-10-28 Hitachi Chemical Co Ltd Polishing agent, polishing agent set, and substrate polishing method

Patent Citations (2)

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Publication number Priority date Publication date Assignee Title
TW200942602A (en) * 2007-11-14 2009-10-16 Showa Denko Kk Polishing composition
TW201346017A (zh) * 2012-04-17 2013-11-16 花王股份有限公司 矽晶圓用研磨液組合物

Also Published As

Publication number Publication date
US10745588B2 (en) 2020-08-18
JP6360108B2 (ja) 2018-07-18
TW201510197A (zh) 2015-03-16
CN105264647A (zh) 2016-01-20
JP2016201557A (ja) 2016-12-01
EP3007213A1 (en) 2016-04-13
KR102239045B1 (ko) 2021-04-12
SG11201508398TA (en) 2015-11-27
EP3007213B1 (en) 2020-03-18
JP6037416B2 (ja) 2016-12-07
US20170253767A1 (en) 2017-09-07
EP3007213A4 (en) 2017-02-22
KR20160013896A (ko) 2016-02-05
CN105264647B (zh) 2018-01-09
JPWO2014196299A1 (ja) 2017-02-23
US20160122591A1 (en) 2016-05-05
WO2014196299A1 (ja) 2014-12-11

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