TWI640832B - 感光性樹脂組合物 - Google Patents

感光性樹脂組合物 Download PDF

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Publication number
TWI640832B
TWI640832B TW106109122A TW106109122A TWI640832B TW I640832 B TWI640832 B TW I640832B TW 106109122 A TW106109122 A TW 106109122A TW 106109122 A TW106109122 A TW 106109122A TW I640832 B TWI640832 B TW I640832B
Authority
TW
Taiwan
Prior art keywords
meth
acrylate
resin composition
photosensitive resin
group
Prior art date
Application number
TW106109122A
Other languages
English (en)
Chinese (zh)
Other versions
TW201740197A (zh
Inventor
金俓錄
曺伯鉉
趙庸桓
Original Assignee
東友精細化工有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 東友精細化工有限公司 filed Critical 東友精細化工有限公司
Publication of TW201740197A publication Critical patent/TW201740197A/zh
Application granted granted Critical
Publication of TWI640832B publication Critical patent/TWI640832B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Nonlinear Science (AREA)
  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
TW106109122A 2016-03-23 2017-03-20 感光性樹脂組合物 TWI640832B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020160034428A KR101979980B1 (ko) 2016-03-23 2016-03-23 감광성 수지 조성물
??10-2016-0034428 2016-03-23

Publications (2)

Publication Number Publication Date
TW201740197A TW201740197A (zh) 2017-11-16
TWI640832B true TWI640832B (zh) 2018-11-11

Family

ID=59934555

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106109122A TWI640832B (zh) 2016-03-23 2017-03-20 感光性樹脂組合物

Country Status (4)

Country Link
JP (1) JP6431947B2 (ko)
KR (1) KR101979980B1 (ko)
CN (1) CN107229188B (ko)
TW (1) TWI640832B (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI657311B (zh) * 2017-12-29 2019-04-21 住華科技股份有限公司 感光性樹脂組成物、及應用其之彩色光阻結構和顯示器
CN111324011B (zh) * 2018-12-14 2023-01-10 北京鼎材科技有限公司 一种反应型碱溶性树脂、包含其的树脂组合物及用途
JP7081696B2 (ja) * 2020-01-21 2022-06-07 東レ株式会社 ポジ型感光性樹脂組成物、硬化膜、積層体、導電パターン付き基板、積層体の製造方法、タッチパネル及び有機ｅｌ表示装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100134729A1 (en) * 2008-11-28 2010-06-03 Seiko Epson Corporation Color filter ink, color filter ink manufacturing method, color filter ink set, color filter, image display device, and electronic device

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5700620A (en) * 1993-12-24 1997-12-23 Fuji Photo Film Co., Ltd. Radiation ray sensitive resin compostion containing at least two different naphthoquinonediazide sulfonic acid esters and an alkali-soluble low-molecular compound
WO2009078336A1 (ja) * 2007-12-14 2009-06-25 Asahi Kasei E-Materials Corporation 感光性樹脂組成物
KR101249681B1 (ko) * 2008-01-23 2013-04-05 주식회사 엘지화학 바인더 수지 및 이를 포함하는 감광성 수지조성물과, 이감광성 수지조성물에 의해 제조된 컬럼스페이서
TWI477904B (zh) * 2010-03-26 2015-03-21 Sumitomo Chemical Co Photosensitive resin composition
JP2012078528A (ja) * 2010-09-30 2012-04-19 Fujifilm Corp 感光性組成物、感光性樹脂転写フィルム、樹脂パターン及び樹脂パターンの製造方法、並びに液晶表示装置用基板及び液晶表示装置
JP2012215833A (ja) * 2011-03-31 2012-11-08 Toyo Ink Sc Holdings Co Ltd 感光性樹脂組成物およびタッチパネル用絶縁膜
TW201308003A (zh) 2011-07-29 2013-02-16 Sanyo Chemical Ind Ltd 感光性樹脂組成物、硬化物及間隔物
JP5772642B2 (ja) * 2012-02-09 2015-09-02 Jsr株式会社 硬化性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法及び表示素子
JP6001877B2 (ja) * 2012-02-28 2016-10-05 株式会社日本触媒 フォトスペーサー用硬化性樹脂組成物および柱状スペーサー
KR101391224B1 (ko) * 2013-05-28 2014-05-02 동우 화인켐 주식회사 스페이서 형성용 감광성 수지 조성물 및 이로부터 제조되는 스페이서
CN104865794A (zh) * 2014-02-20 2015-08-26 上海飞凯光电材料股份有限公司 一种光刻胶
JP6221862B2 (ja) * 2014-03-14 2017-11-01 Jsr株式会社 感放射線性組成物、表示素子用スペーサーまたは層間絶縁膜及びそれらの形成方法
KR101609234B1 (ko) 2015-01-13 2016-04-05 동우 화인켐 주식회사 감광성 수지 조성물, 이로부터 형성된 광경화 패턴 및 이를 포함하는 화상 표시 장치

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100134729A1 (en) * 2008-11-28 2010-06-03 Seiko Epson Corporation Color filter ink, color filter ink manufacturing method, color filter ink set, color filter, image display device, and electronic device

Also Published As

Publication number Publication date
CN107229188B (zh) 2020-10-09
KR20170110276A (ko) 2017-10-11
TW201740197A (zh) 2017-11-16
JP2017173823A (ja) 2017-09-28
CN107229188A (zh) 2017-10-03
KR101979980B1 (ko) 2019-05-17
JP6431947B2 (ja) 2018-11-28

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