TWI633376B - Light source apparatus and ultra-violet irradiation apparatus - Google Patents

Light source apparatus and ultra-violet irradiation apparatus Download PDF

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TWI633376B
TWI633376B TW104109536A TW104109536A TWI633376B TW I633376 B TWI633376 B TW I633376B TW 104109536 A TW104109536 A TW 104109536A TW 104109536 A TW104109536 A TW 104109536A TW I633376 B TWI633376 B TW I633376B
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light
emitting element
light source
source device
ultraviolet rays
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TW104109536A
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TW201612601A (en
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加藤剛雄
前田祥平
藤岡純
日野弘喜
田中貴章
田内亮彦
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日商東芝照明技術股份有限公司
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Priority claimed from JP2014193063A external-priority patent/JP6507543B2/en
Priority claimed from JP2014195959A external-priority patent/JP6439351B2/en
Priority claimed from JP2014202038A external-priority patent/JP6413570B2/en
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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21VFUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V29/00Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
    • F21V29/50Cooling arrangements
    • F21V29/70Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21SNON-PORTABLE LIGHTING DEVICES; SYSTEMS THEREOF; VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLE EXTERIORS
    • F21S2/00Systems of lighting devices, not provided for in main groups F21S4/00 - F21S10/00 or F21S19/00, e.g. of modular construction
    • F21S2/005Systems of lighting devices, not provided for in main groups F21S4/00 - F21S10/00 or F21S19/00, e.g. of modular construction of modular construction
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21VFUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V29/00Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
    • F21V29/85Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems characterised by the material
    • F21V29/89Metals
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21VFUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V9/00Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters
    • F21V9/14Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters for producing polarised light
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B47/00Circuit arrangements for operating light sources in general, i.e. where the type of light source is not relevant
    • H05B47/10Controlling the light source
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02BCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B20/00Energy efficient lighting technologies, e.g. halogen lamps or gas discharge lamps
    • Y02B20/30Semiconductor lamps, e.g. solid state lamps [SSL] light emitting diodes [LED] or organic LED [OLED]

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Led Device Packages (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Testing Resistance To Weather, Investigating Materials By Mechanical Methods (AREA)

Abstract

本發明提供一種光源裝置,能夠抑制紫外線照射性能的經年下降。光源裝置201具備發光元件205、陶瓷基板210及散熱構件220。發光元件205放出在紫外線區域具有主波長的光。陶瓷基板210在一面側配設有發光元件205,將陶瓷作為基材,且在配設發光元件205的一側的面上,形成有由導體構成的導電圖案211以及至少覆蓋導電圖案211的外塗層218。散熱構件220配設在陶瓷基板210中的配設發光元件205的一側的面的相反側,且由金屬材料構成。 The present invention provides a light source device capable of suppressing a decline in ultraviolet irradiation performance over the years. The light source device 201 includes a light emitting element 205, a ceramic substrate 210, and a heat dissipation member 220. The light emitting element 205 emits light having a dominant wavelength in the ultraviolet region. The ceramic substrate 210 is provided with a light-emitting element 205 on one surface side, using ceramics as a base material, and a conductive pattern 211 made of a conductor is formed on a surface of the side on which the light-emitting element 205 is disposed, and at least an outer portion covering the conductive pattern 211 is formed. Coating 218. The heat radiating member 220 is disposed on the opposite side of the surface on which the light emitting element 205 is disposed in the ceramic substrate 210 and is made of a metal material.

Description

光源裝置及紫外線照射裝置 Light source device and ultraviolet irradiation device

本發明的實施方式涉及一種光源裝置及紫外線照射裝置。 Embodiments of the present invention relate to a light source device and an ultraviolet irradiation device.

對於光源使用發光二極體(Light Emitting Diode,LED)或雷射二極體(Laser Diode,LD)等發光元件的光源裝置而言,為了確保照射區域(area)或獲得所需的光強度‧均勻度,多使用多個發光元件。發光元件是通過調整電流來調整光輸出,但由於Vf(正向電壓)存在個體差異,因此在電性並聯連接時,有時會因流經各發光元件的電流的差導致光輸出產生差異,從而對均勻度造成不良影響。因此,發光元件較佳為電性串聯連接,但在串聯地電性連接多個發光元件時,施加電壓變高。在此種情況(case)下,若要使用通常所用的鋁基板來作為安裝基板,則必須加厚基板的絕緣層以確保耐電壓,但若加厚基板的絕緣層,則導熱性會下降,因此發光元件的溫度容易上升,也成為效率下降的原因。因此,在光源裝置中,有的使用對基材使用陶瓷的基板來作為安 裝發光元件的基板。 For a light source device using a light emitting element such as a light emitting diode (LED) or a laser diode (LD) as a light source, in order to ensure an illuminated area or obtain a required light intensity ‧ Uniformity, using multiple light-emitting elements. The light emitting element adjusts the light output by adjusting the current, but due to individual differences in Vf (forward voltage), when electrically connected in parallel, there may be differences in light output due to the difference in current flowing through each light emitting element. As a result, the uniformity is adversely affected. Therefore, the light emitting elements are preferably electrically connected in series, but when a plurality of light emitting elements are electrically connected in series, the applied voltage becomes high. In this case, if the commonly used aluminum substrate is used as the mounting substrate, the insulation layer of the substrate must be thickened to ensure the withstand voltage. However, if the insulation layer of the substrate is thickened, the thermal conductivity will decrease. Therefore, the temperature of the light-emitting element is likely to rise, which also causes a decrease in efficiency. Therefore, in a light source device, a substrate using ceramics as a base material is used as a security device. A substrate on which a light emitting element is mounted.

而且,在用於液晶的固化等時,使用具備多個固態發光元件的光源裝置。當前,在液晶面板的固化或重疊、貼合等光反應工序中,使用具有放出紫外線的固態發光元件的光源裝置。光源裝置是將多個固態發光元件列並聯連接,以對規定的面積照射紫外線,所述固態發光元件列是將多個固態發光元件串聯連接而構成。 When used for curing liquid crystal or the like, a light source device including a plurality of solid-state light-emitting elements is used. Currently, a light source device having a solid-state light-emitting element that emits ultraviolet rays is used in a photoreaction step such as curing, lamination, or bonding of a liquid crystal panel. The light source device is configured by connecting a plurality of solid-state light-emitting element rows in parallel to irradiate ultraviolet rays to a predetermined area, and the solid-state light-emitting element row is configured by connecting a plurality of solid-state light-emitting elements in series.

進而,當前,作為取代液晶面板的取向膜的取向處理即摩擦(rubbing)工序的技術,光取向技術(例如參照專利文獻3及專利文獻4)正備受矚目。在光取向技術中所用的紫外線照射裝置具備作為光源的棒狀燈與偏振元件。此種的紫外線照射裝置中,偏振元件使棒狀燈所照射的紫外線中的規定方向的偏振軸的紫外線通過,將通過的紫外線照射至工件等,由此來進行取向膜的取向處理。 Furthermore, photo-alignment technology (for example, see Patent Literature 3 and Patent Literature 4) is currently attracting attention as a technology that replaces the rubbing process, which is an alignment treatment of an alignment film of a liquid crystal panel. The ultraviolet irradiation device used in the photo-alignment technology includes a rod-shaped lamp as a light source and a polarizing element. In such an ultraviolet irradiation device, the polarizing element passes the ultraviolet rays in a predetermined direction among the ultraviolet rays irradiated by the rod-shaped lamp, and irradiates the passing ultraviolet rays to a workpiece or the like, thereby performing an alignment treatment of the alignment film.

[現有技術文獻] [Prior Art Literature] [專利文獻] [Patent Literature]

專利文獻1:日本專利特開2012-89553號公報 Patent Document 1: Japanese Patent Laid-Open No. 2012-89553

專利文獻2:國際公開第2014/103598號 Patent Document 2: International Publication No. 2014/103598

專利文獻3:日本專利特開2009-265290號公報 Patent Document 3: Japanese Patent Laid-Open No. 2009-265290

專利文獻4:日本專利特開2011-145381號公報 Patent Document 4: Japanese Patent Laid-Open No. 2011-145381

光源裝置不僅照射可見光,而且對被照射物照射紫外線,由此,也有時被用於進行光反應或紫外線固化的情況。如此般照射紫外線時所用的光源裝置中,作為發光元件,使用放出紫外線的發光元件。此種光源裝置多在高輸出狀態下使用,發熱量容易變大,因此必須提高冷卻性能。 The light source device not only irradiates visible light, but also irradiates ultraviolet rays to an object to be irradiated. Therefore, the light source device may be used in the case of performing photoreaction or ultraviolet curing. In the light source device used when irradiating ultraviolet rays in this manner, a light emitting element that emits ultraviolet rays is used as a light emitting element. Such light source devices are often used in a high-output state, and the amount of heat generated tends to increase. Therefore, the cooling performance must be improved.

作為用於提高光源裝置的冷卻性能的方法,例如可列舉通過使冷卻水迴圈來進行冷卻的水冷,在進行水冷的情況下,較佳為使基板或散熱構件由鋁等導熱率高的材料形成。在如此般對於安裝發光元件的基板的基材使用鋁時,為了防止配線導體層的氧化或腐蝕、及為了保護絕緣層不受在鋁基板上安裝電子零件時的熱破壞,而包覆形成阻焊劑(solder resist)層。 As a method for improving the cooling performance of the light source device, for example, water cooling is performed by circulating the cooling water. In the case of water cooling, the substrate or the heat dissipation member is preferably made of a material having high thermal conductivity such as aluminum form. When aluminum is used as the base material of the substrate on which the light-emitting element is mounted, in order to prevent oxidation or corrosion of the wiring conductor layer, and to protect the insulating layer from thermal damage when electronic components are mounted on the aluminum substrate, the coating forms a resistance. Solder resist layer.

但是,在採用通過水冷來冷卻光源裝置的結構時,有時會產生結露,另一方面,阻焊劑的吸水性高,因此有時會吸收因結露所產生的水分。此時,考慮阻焊劑的絕緣電阻會下降而使配線導體間短路,或者因吸收的水分而導致配線導體發生腐蝕。因此,通過使用放出紫外線的發光元件的燈具來長期且效率良好地照射紫外線變得非常困難。 However, when a structure in which the light source device is cooled by water cooling is used, dew condensation may occur, and on the other hand, the solder resist has high water absorption, and therefore may absorb moisture generated by the dew condensation. At this time, it is considered that the insulation resistance of the solder resist may decrease and short circuit between the wiring conductors, or the wiring conductors may be corroded due to the absorbed moisture. Therefore, it is very difficult to irradiate ultraviolet rays efficiently for a long period of time by using a lamp using a light emitting element that emits ultraviolet rays.

本發明是有鑒於所述情況而完成,其目的之一在於提供一種光源裝置,所述光源裝置抑制紫外線照射性能的經年下降。 The present invention has been made in view of the circumstances described above, and an object of the present invention is to provide a light source device that suppresses a decline in ultraviolet radiation performance over time.

而且,在以往的光源裝置中,由於點亮時的固態發光元件列間的溫度偏差,有時會以不均勻的照度來照射紫外線。因此, 在光源裝置中,要求抑制針對被照射物的紫外線的不均勻照射。 In addition, in the conventional light source device, ultraviolet rays may be irradiated with uneven illumination due to a temperature deviation between the rows of solid-state light-emitting elements during lighting. therefore, In the light source device, it is required to suppress uneven irradiation of ultraviolet rays with respect to an object to be irradiated.

本發明的目的之一在於提供一種光源裝置,所述光源裝置抑制針對被照射物的紫外線的不均勻照射。 An object of the present invention is to provide a light source device that suppresses uneven irradiation of ultraviolet rays to an object to be irradiated.

進而,近年來,正推進使用吸收型偏振元件的紫外線照射裝置的開發,所述吸收型偏振元件可獲得比反射型偏振元件高的偏振特性。但是,吸收型偏振元件的耐熱性弱,例如在使用汞燈或金屬鹵素燈(metal halide lamp)等放電燈來作為光源的紫外線照射裝置中,因從放電燈放出的熱,吸收型偏振元件的劣化顯著,無法耐受紫外線照射裝置的實用。 Furthermore, in recent years, development of an ultraviolet irradiation device using an absorption-type polarizing element is being advanced, and the absorption-type polarizing element can obtain higher polarization characteristics than the reflection-type polarizing element. However, the absorption type polarizing element has weak heat resistance. For example, in an ultraviolet irradiation device using a discharge lamp such as a mercury lamp or a metal halide lamp as a light source, the absorption type The deterioration is remarkable, and it cannot withstand the practical use of an ultraviolet irradiation device.

本發明的目的之一在於提供一種紫外線照射裝置,所述紫外線照射裝置抑制吸收型偏振元件的劣化。 An object of the present invention is to provide an ultraviolet irradiation device that suppresses deterioration of an absorption-type polarizing element.

實施方式的光源裝置具備發光元件、陶瓷基板及散熱構件。發光元件放出在紫外線區域具有主波長的光。陶瓷基板在一面側配設有發光元件,將陶瓷作為基材,且在配設發光元件的一側的面上,形成有由導體構成的導電圖案以及至少覆蓋導電圖案的外塗層(overcoat)。散熱構件配設在陶瓷基板中的配設發光元件的一側的面的相反側,且由金屬材料構成。 A light source device according to an embodiment includes a light emitting element, a ceramic substrate, and a heat dissipation member. The light emitting element emits light having a dominant wavelength in the ultraviolet region. A ceramic substrate is provided with a light emitting element on one surface side, and ceramics is used as a base material. A conductive pattern made of a conductor and an overcoat covering at least the conductive pattern are formed on the surface of the side on which the light emitting element is disposed. . The heat radiating member is disposed on the opposite side of the surface on which the light emitting element is disposed in the ceramic substrate, and is made of a metal material.

發光元件配設有多個所照射的光的主波長不同的發光元件。 The light emitting element is provided with a plurality of light emitting elements having different dominant wavelengths of the irradiated light.

陶瓷基板對於基材使用氧化鋁或氮化鋁。 For the ceramic substrate, alumina or aluminum nitride is used for the substrate.

外塗層反射紫外線。 The outer coating reflects ultraviolet rays.

外塗層吸收紫外線。 The outer coating absorbs ultraviolet light.

實施方式的光源裝置具備發光部、電流調整單元、散熱單元及控制單元。發光部具備固態發光元件列,該固態發光元件列具有多個固態發光元件,所述多個固態發光元件串聯連接且配置在規定的線上並放出紫外線。發光部將多個固態發光元件列沿著與規定的線交叉的方向排列配置。電流調整單元設置有兩個以上,與發光部的1個以上的固態發光元件列對應,且可對流經對應的固態發光元件列的固態發光元件的電流值進行變更。散熱單元使流體沿與規定的線交叉的方向流動,以對發光部的在交叉方向上相鄰的兩個以上的固態發光元件列的固態發光元件發出的熱進行散熱。控制單元控制電流調整單元。控制單元使電流調整單元變更流經固態發光元件列的固態發光元件的電流值,以使多個固態發光元件列的固態發光元件放出的紫外線的相對照度變得相等。 The light source device according to the embodiment includes a light emitting section, a current adjustment unit, a heat radiation unit, and a control unit. The light-emitting section includes a solid-state light-emitting element row including a plurality of solid-state light-emitting elements which are connected in series and arranged on a predetermined line and emit ultraviolet rays. The light-emitting section arranges a plurality of solid-state light-emitting element rows in a direction intersecting a predetermined line. The current adjustment unit is provided with two or more, corresponding to one or more solid-state light-emitting element rows of the light-emitting section, and the current value of the solid-state light-emitting elements flowing through the corresponding solid-state light-emitting element row can be changed. The heat dissipating unit allows a fluid to flow in a direction crossing a predetermined line to dissipate heat emitted from the solid-state light-emitting elements of two or more solid-state light-emitting element rows adjacent to each other in the crossing direction of the light-emitting portion. The control unit controls the current adjustment unit. The control unit causes the current adjustment unit to change the current value of the solid-state light-emitting elements flowing through the solid-state light-emitting element rows so that the relative degrees of ultraviolet rays emitted by the solid-state light-emitting elements in the plurality of solid-state light-emitting elements rows become equal.

光源裝置具備溫度檢測單元,該溫度檢測單元設置在發光部的規定位置且可檢測規定位置的溫度。控制單元基於溫度檢測單元的檢測結果,來使電流調整單元變更流經固態發光元件列的固態發光元件的電流值。 The light source device includes a temperature detection unit that is provided at a predetermined position of the light emitting section and can detect the temperature of the predetermined position. The control unit causes the current adjustment unit to change a current value of the solid-state light-emitting elements flowing through the solid-state light-emitting element row based on a detection result of the temperature detection unit.

光源裝置沿著流體的流動方向而隔開間隔地設置有多個溫度檢測單元。 The light source device is provided with a plurality of temperature detection units at intervals along the flow direction of the fluid.

實施方式的紫外線照射裝置包括:光源,具有放出紫外線的發光元件;以及吸收型偏振元件,使從光源放出的紫外線中 偏振軸與預定的基準方向平行的偏振光透射。 The ultraviolet irradiation device according to the embodiment includes a light source including a light emitting element that emits ultraviolet rays, and an absorption-type polarizing element that suppresses ultraviolet rays emitted from the light source. Polarized light whose polarization axis is parallel to a predetermined reference direction is transmitted.

紫外線照射裝置在光源與吸收型偏振元件之間具有光學構件。 The ultraviolet irradiation device includes an optical member between the light source and the absorption-type polarizing element.

根據本發明,能夠提供一種光源裝置,所述光源裝置抑制紫外線照射性能的經年下降。 According to the present invention, it is possible to provide a light source device that suppresses a decline in ultraviolet irradiation performance over the years.

根據本發明,能夠提供一種光源裝置,所述光源裝置抑制針對被照射物的紫外線的不均勻照射。 According to the present invention, it is possible to provide a light source device that suppresses uneven irradiation of ultraviolet rays to an object to be irradiated.

根據本發明,能夠提供一種紫外線照射裝置,所述紫外線照射裝置抑制吸收型偏振元件的劣化。 According to the present invention, it is possible to provide an ultraviolet irradiation device that suppresses deterioration of an absorption-type polarizing element.

1、1-1、1-2、2、3、4、5、6、6-1、6-2‧‧‧光源裝置 1, 1-1, 1-2, 2, 3, 4, 5, 6, 6-1, 6-2 ‧‧‧ light source device

10‧‧‧載台 10‧‧‧ carrier

10a‧‧‧載置面 10a‧‧‧mounting surface

20‧‧‧發光部 20‧‧‧Lighting Department

21‧‧‧安裝基板(基板) 21‧‧‧Mounting substrate (substrate)

21a‧‧‧安裝基板的表面(外周面) 21a‧‧‧ surface of mounting substrate (outer peripheral surface)

21b‧‧‧安裝基板的背面 21b‧‧‧ Back side of mounting substrate

22‧‧‧固態發光元件列 22‧‧‧Solid-state light-emitting element array

23‧‧‧固態發光元件 23‧‧‧Solid-state light-emitting element

24‧‧‧直流電源 24‧‧‧DC Power

30‧‧‧電流調整單元 30‧‧‧Current adjustment unit

40‧‧‧散熱單元 40‧‧‧cooling unit

41‧‧‧吸熱器 41‧‧‧ heat sink

41a‧‧‧基板安裝部 41a‧‧‧Board mounting section

41b‧‧‧鰭片 41b‧‧‧ Fin

42‧‧‧散熱風扇 42‧‧‧cooling fan

43‧‧‧風扇 43‧‧‧fan

44‧‧‧排出口 44‧‧‧Exhaust

50‧‧‧框體 50‧‧‧Frame

50a、50b‧‧‧開口部 50a, 50b‧‧‧ opening

60‧‧‧溫度檢測單元 60‧‧‧Temperature detection unit

70‧‧‧控制單元 70‧‧‧control unit

100‧‧‧紫外線照射裝置 100‧‧‧ ultraviolet irradiation device

101‧‧‧鏡 101‧‧‧Mirror

201‧‧‧光源裝置 201‧‧‧light source device

205‧‧‧發光元件 205‧‧‧Light-emitting element

210‧‧‧陶瓷基板 210‧‧‧ceramic substrate

211‧‧‧導電圖案 211‧‧‧ conductive pattern

212‧‧‧焊料 212‧‧‧Solder

215‧‧‧供電部 215‧‧‧Power Supply Department

218‧‧‧外塗層 218‧‧‧Outer coating

220‧‧‧散熱構件 220‧‧‧Heat dissipation component

221‧‧‧流路 221‧‧‧flow

223‧‧‧流入口 223‧‧‧Inlet

224‧‧‧流出口 224‧‧‧ Outlet

230‧‧‧封裝 230‧‧‧Packaging

232‧‧‧反射體 232‧‧‧Reflector

301、301-1、301-2‧‧‧紫外線照射裝置 301, 301-1, 301-2‧‧‧ ultraviolet irradiation device

310‧‧‧光源 310‧‧‧light source

311‧‧‧基體 311‧‧‧matrix

312‧‧‧發光元件 312‧‧‧light-emitting element

314‧‧‧第1發光元件 314‧‧‧1st light emitting element

314a‧‧‧第1發光晶片 314a‧‧‧1st light emitting chip

314b、316b‧‧‧反射體 314b, 316b‧‧‧Reflector

314c、316c‧‧‧透鏡(光學構件) 314c, 316c‧‧‧ lens (optical member)

316‧‧‧第2發光元件 316‧‧‧Second light emitting element

316a‧‧‧第2發光晶片 316a‧‧‧Second light emitting chip

320‧‧‧吸收型偏振元件 320‧‧‧ Absorptive Polarizing Element

330‧‧‧光學構件(透鏡) 330‧‧‧Optical component (lens)

340‧‧‧線柵偏振元件 340‧‧‧Wire grid polarizing element

K‧‧‧箭頭 K‧‧‧ Arrow

W‧‧‧被照射物(工件、對象物) W‧‧‧Irradiated object (workpiece, object)

U‧‧‧紫外線(光) U‧‧‧ Ultraviolet (light)

UA‧‧‧紫外線(光) UA‧‧‧ Ultraviolet (light)

PA‧‧‧偏振軸 PA‧‧‧ polarization axis

圖1是實施方式1的光源裝置的剖面圖。 FIG. 1 is a sectional view of a light source device according to the first embodiment.

圖2是實施方式1的光源裝置的變形例,是使用封裝(package)時的剖面圖。 FIG. 2 is a modification of the light source device according to Embodiment 1, and is a cross-sectional view when a package is used.

圖3是表示具備實施方式2的光源裝置的紫外線照射裝置的概略結構的圖。 3 is a diagram showing a schematic configuration of an ultraviolet irradiation device including a light source device according to a second embodiment.

圖4是圖3中的II-II線的剖面圖。 4 is a cross-sectional view taken along a line II-II in FIG. 3.

圖5是表示從下方展示實施方式2的光源裝置的發光部的概略結構的方塊圖。 5 is a block diagram showing a schematic configuration of a light emitting unit of a light source device according to Embodiment 2 from below.

圖6是表示從下方展示實施方式2的變形例1的光源裝置的 概略結構的概略結構的方塊圖。 FIG. 6 is a diagram showing a light source device according to a first modification of the second embodiment shown from below; Block diagram of a rough structure.

圖7是表示從下方展示實施方式2的變形例2的光源裝置的概略結構的概略結構的方塊圖。 FIG. 7 is a block diagram showing a schematic configuration of a light source device according to a second modification of the second embodiment.

圖8是表示從下方展示實施方式3的光源裝置的概略結構的概略結構的方塊圖。 8 is a block diagram showing a schematic configuration showing a schematic configuration of a light source device according to Embodiment 3 from below.

圖9是表示從下方展示實施方式4的光源裝置的概略結構的概略結構的方塊圖。 FIG. 9 is a block diagram showing a schematic configuration showing a schematic configuration of a light source device according to Embodiment 4 from below.

圖10是表示從下方展示實施方式5的光源裝置的概略結構的概略結構的方塊圖。 FIG. 10 is a block diagram showing a schematic configuration showing a schematic configuration of a light source device according to Embodiment 5 from below.

圖11(a)、圖11(b)是表示實施方式6的光源裝置的結構的圖。 11 (a) and 11 (b) are diagrams showing a configuration of a light source device according to a sixth embodiment.

圖12是具備實施方式7的光源裝置的紫外線照射裝置的沿Y軸方向觀察的側面圖。 FIG. 12 is a side view of the ultraviolet irradiation device including the light source device according to the seventh embodiment as viewed in the Y-axis direction.

圖13是表示實施方式7的光源裝置的概略結構的立體圖。 FIG. 13 is a perspective view showing a schematic configuration of a light source device according to Embodiment 7. FIG.

圖14是實施方式7的光源裝置的側面圖。 14 is a side view of a light source device according to a seventh embodiment.

圖15是表示實施方式7的變形例1的光源裝置的概略結構的立體圖。 15 is a perspective view showing a schematic configuration of a light source device according to a first modification of the seventh embodiment.

圖16是表示實施方式7的變形例2的光源裝置的概略結構的立體圖。 16 is a perspective view showing a schematic configuration of a light source device according to a second modification of the seventh embodiment.

圖17是表示實施方式8的紫外線照射裝置的概略結構的立體圖。 FIG. 17 is a perspective view showing a schematic configuration of an ultraviolet irradiation apparatus according to Embodiment 8. FIG.

圖18是從Y軸方向觀察實施方式8的紫外線照射裝置的圖。 FIG. 18 is a view of the ultraviolet irradiation device according to Embodiment 8 as viewed from the Y-axis direction.

圖19是從Z軸方向觀察實施方式8的紫外線照射裝置的光源310的圖。 FIG. 19 is a diagram of the light source 310 of the ultraviolet irradiation apparatus according to Embodiment 8 as viewed from the Z-axis direction.

圖20是從Y軸方向觀察第9實施方式的紫外線照射裝置的圖。 FIG. 20 is a view of the ultraviolet irradiation device according to the ninth embodiment as viewed from the Y-axis direction.

圖21是從Y軸方向觀察第9實施方式的紫外線照射裝置的變形例的圖。 FIG. 21 is a view of a modification of the ultraviolet irradiation device according to the ninth embodiment as viewed from the Y-axis direction.

以下說明的實施方式1的光源裝置201具備發光元件205、陶瓷基板210及散熱構件220。發光元件205放出在紫外線區域具有主波長的光。陶瓷基板210在一面側配設有發光元件205,且將陶瓷作為基材,且在配設發光元件205的一側的面上,形成有由導體構成的導電圖案211以及至少覆蓋導電圖案211的外塗層218。散熱構件220配設在陶瓷基板210中的配設發光元件205的一側的面的相反側,且由金屬材料構成。 The light source device 201 of the first embodiment described below includes a light emitting element 205, a ceramic substrate 210, and a heat dissipation member 220. The light emitting element 205 emits light having a dominant wavelength in the ultraviolet region. The ceramic substrate 210 is provided with a light-emitting element 205 on one surface side, and ceramics is used as a base material, and a conductive pattern 211 made of a conductor is formed on a surface of the side on which the light-emitting element 205 is disposed, and a conductive pattern Outer coating 218. The heat radiating member 220 is disposed on the opposite side of the surface on which the light emitting element 205 is disposed in the ceramic substrate 210 and is made of a metal material.

而且,以下說明的實施方式1的光源裝置201中,發光元件205配設有多個所照射的光的主波長不同的發光元件205。 In the light source device 201 of the first embodiment described below, the light-emitting element 205 is provided with a plurality of light-emitting elements 205 having different dominant wavelengths of the emitted light.

而且,以下說明的實施方式1的光源裝置201中,陶瓷基板210對於基材使用氧化鋁或氮化鋁。 In the light source device 201 of the first embodiment described below, the ceramic substrate 210 uses alumina or aluminum nitride as a base material.

而且,以下說明的實施方式1的光源裝置201中,外塗層218反射紫外線。 In the light source device 201 of the first embodiment described below, the overcoat layer 218 reflects ultraviolet rays.

而且,以下說明的實施方式1的光源裝置201中,外塗 層218吸收紫外線。 In the light source device 201 of the first embodiment described below, the outer coating The layer 218 absorbs ultraviolet rays.

[實施方式1] [Embodiment 1]

接下來,基於圖式來說明實施方式1的光源裝置。圖1是實施方式1的光源裝置的剖面圖。圖1所示的光源裝置201具有多個發光元件205,該發光元件205是光源裝置201中的光源,多個發光元件205被配設在陶瓷基板210的一面側,該陶瓷基板210是將陶瓷作為基材且形成為板狀。作為陶瓷基板210的基材,例如在需要反射特性的情況下,較佳為使用白色且高反射率的氧化鋁。而且,在要確保更高的散熱性能的情況下,較佳為使用導熱率高的氮化鋁。即,陶瓷基板210包含無機材料。 Next, a light source device according to the first embodiment will be described based on the drawings. FIG. 1 is a sectional view of a light source device according to the first embodiment. The light source device 201 shown in FIG. 1 includes a plurality of light emitting elements 205. The light emitting elements 205 are light sources in the light source device 201. The plurality of light emitting elements 205 are arranged on one side of a ceramic substrate 210. The ceramic substrate 210 is a ceramic substrate. It is formed into a plate shape as a base material. As the base material of the ceramic substrate 210, for example, when reflection characteristics are required, it is preferable to use white and high reflectance alumina. Furthermore, in order to ensure higher heat radiation performance, it is preferable to use aluminum nitride with high thermal conductivity. That is, the ceramic substrate 210 contains an inorganic material.

發光元件205可放出在紫外線區域具有主波長的光,例如照射主波長為240nm以上且405nm以下的光。而且,多個發光元件205設置有多個所照射的光的主波長在紫外線的波段內不同的發光元件205,由此,發光元件205可通過多個發光元件205來照射紫外線波段內的廣範圍的波長。另外,對於該多個發光元件205而言,也可並非所有發光元件205的主波長都不同,只要在從多個發光元件205整體來看時,包括發光元件205彼此照射的光的主波長不同的發光元件205即可。 The light emitting element 205 can emit light having a dominant wavelength in the ultraviolet region, for example, irradiate light having a dominant wavelength of 240 nm or more and 405 nm or less. In addition, the plurality of light-emitting elements 205 are provided with a plurality of light-emitting elements 205 whose main wavelengths of the irradiated light are different in the ultraviolet wavelength band. Therefore, the light-emitting element 205 can irradiate a wide range of ultraviolet rays in the ultraviolet band through the plurality of light-emitting elements 205. wavelength. In addition, for the plurality of light-emitting elements 205, the dominant wavelengths of all the light-emitting elements 205 may not be different, as long as the plurality of light-emitting elements 205 are viewed as a whole, the main wavelengths of light including the light-emitting elements 205 are different from each other. The light emitting element 205 is sufficient.

在陶瓷基板210中的配設有發光元件205的一側的面上,形成有導電圖案211與外塗層218。導電圖案211包含導體,例如將銅或銀等導電性高的材料作為主成分。包含導體的導電圖案211以任意的電路圖案而形成在陶瓷基板210上,本實施方式1 的光源裝置201中,多個發光元件205的電連接狀態以成為串聯的方式而形成。各發光元件205通過焊料212而連接至該導電圖案211,由此,發光元件205與導電圖案211電連接。即,本實施方式1的光源裝置201中,為了防止因將多個發光元件205並聯連接而引起的對均勻度的不良影響,將多個發光元件205串聯連接。 A conductive pattern 211 and an overcoat layer 218 are formed on the side of the ceramic substrate 210 on which the light emitting element 205 is disposed. The conductive pattern 211 includes a conductor, and for example, a material having high conductivity such as copper or silver is used as a main component. The conductive pattern 211 including a conductor is formed on the ceramic substrate 210 with an arbitrary circuit pattern. This Embodiment 1 In the light source device 201, the electrical connection states of the plurality of light-emitting elements 205 are formed in series. Each light-emitting element 205 is connected to the conductive pattern 211 by a solder 212, and thus the light-emitting element 205 is electrically connected to the conductive pattern 211. That is, in the light source device 201 of the first embodiment, in order to prevent adverse effects on uniformity caused by connecting a plurality of light-emitting elements 205 in parallel, a plurality of light-emitting elements 205 are connected in series.

外塗層218由用於防止絕緣與腐蝕的無機物的物質構成,且至少覆蓋導電圖案211而形成。即,外塗層218是在陶瓷基板210中的配設有發光元件205的一側的面上,形成在除了安裝部及供電部215等的部分,且覆蓋陶瓷基板210。因此,外塗層218是在形成有導電圖案211的部分,在導電圖案211中的陶瓷基板210所處一側的面的相反側的面上,形成在發光元件205及焊料212所處部分以外的部分。外塗層218是將玻璃作為主成分,且包含反射或吸收紫外線的粒子。另外,外塗層218既可包含反射紫外線的構件,也可包含吸收紫外線的構件。總之,外塗層218只要能夠抑制紫外線到達導體圖案211,則採用任何結構皆可。 The overcoat layer 218 is made of an inorganic substance for preventing insulation and corrosion, and is formed by covering at least the conductive pattern 211. That is, the overcoat layer 218 is formed on the surface of the ceramic substrate 210 on the side where the light emitting element 205 is disposed, and is formed on a portion other than the mounting portion, the power feeding portion 215, and the like, and covers the ceramic substrate 210. Therefore, the overcoat layer 218 is formed on a portion of the conductive pattern 211 where the conductive pattern 211 is formed, and on the opposite side of the surface on which the ceramic substrate 210 is located in the conductive pattern 211, and other than the portion where the light emitting element 205 and solder 212 are located part. The overcoat layer 218 contains glass as a main component and contains particles that reflect or absorb ultraviolet rays. The overcoat layer 218 may include a member that reflects ultraviolet rays or a member that absorbs ultraviolet rays. In short, the outer coating layer 218 may have any structure as long as it can suppress ultraviolet rays from reaching the conductor pattern 211.

而且,在陶瓷基板210上,設置有電連接至外部電源(圖示省略)的供電部215。該供電部215在陶瓷基板210上設置有一對,一對供電部215被配設在陶瓷基板210中的配設發光元件205及導電圖案211的一側的面上。例如,一對供電部215被配設在陶瓷基板210的彼此相向的端部附近的、配設發光元件205及導電圖案211的一側的面上,且電連接至導電圖案211。另外,供電 部215也可設置在除此以外的部分,只要是電連接於導電圖案211且能夠接受從電源供給的電力的形態,則配設位置不受限制。 The ceramic substrate 210 is provided with a power supply section 215 that is electrically connected to an external power source (not shown). A pair of power supply sections 215 is provided on the ceramic substrate 210, and the pair of power supply sections 215 is arranged on the side of the ceramic substrate 210 on which the light emitting element 205 and the conductive pattern 211 are provided. For example, the pair of power supply sections 215 is disposed on the side of the ceramic substrate 210 near the ends facing each other on the side where the light emitting element 205 and the conductive pattern 211 are disposed, and is electrically connected to the conductive pattern 211. In addition, power The part 215 may be provided in other parts, and the arrangement position is not limited as long as it is in a form electrically connected to the conductive pattern 211 and capable of receiving power supplied from a power source.

而且,在陶瓷基板210中的配設發光元件205的一側的面的相反側,配設有由金屬材料構成的散熱構件220。該散熱構件220成為使用冷卻水來作為冷卻介質的所謂水冷式的散熱構件220。該散熱構件220例如由導熱率高的材料即鋁構成,且形成為端部被封閉的方筒狀的形狀。形成為方筒狀形狀的散熱構件220是以如下狀態而配設,即,方筒的外周面的一面與陶瓷基板210中的配設發光元件205的一側的面的相反側的面相接觸。 A heat dissipating member 220 made of a metal material is disposed on the ceramic substrate 210 on the side opposite to the surface on which the light emitting element 205 is disposed. The heat radiating member 220 is a so-called water-cooled heat radiating member 220 using cooling water as a cooling medium. The heat radiating member 220 is made of, for example, aluminum, which is a material having a high thermal conductivity, and is formed in a rectangular tube shape with closed ends. The heat dissipation member 220 formed in a rectangular tube shape is disposed in a state where one surface of the outer peripheral surface of the rectangular tube is in contact with the surface on the opposite side of the surface on the ceramic substrate 210 where the light emitting element 205 is disposed.

而且,在散熱構件220上,設置有供冷卻水流入的流入口223及供散熱構件220內的冷卻水流出的流出口224。例如,流入口223被設置在散熱構件220的長度方向上的一端,流出口224被設置在散熱構件220的長度方向上的另一端。散熱構件220的內部成為冷卻水的流路221,冷卻水從流入口223流入散熱構件220內,流入至散熱構件220內的冷卻水能夠通過散熱構件220內的流路221而從流出口224流出。流入口223與流出口224連接於冷卻路徑,該冷卻路徑具有抽吸並送出冷卻水的泵(pump)(圖示省略)與對冷卻水進行冷卻的散熱器(radiator)等熱交換器(圖示省略),由此,在散熱構件220內的流路221中流動的冷卻水在熱交換器中受到冷卻且迴圈。 In addition, the heat dissipation member 220 is provided with an inflow port 223 through which cooling water flows in and an outflow port 224 through which the cooling water in the heat radiation member 220 flows out. For example, the inflow port 223 is provided at one end in the longitudinal direction of the heat dissipation member 220, and the outflow port 224 is provided at the other end in the longitudinal direction of the heat dissipation member 220. The inside of the heat radiating member 220 becomes a flow path 221 of cooling water. The cooling water flows into the heat radiating member 220 from the inflow port 223, and the cooling water flowing into the heat radiating member 220 can flow out of the flow outlet 224 through the flow path 221 in the heat radiating member 220. . The inflow port 223 and the outflow port 224 are connected to a cooling path. The cooling path includes a pump (not shown) that sucks and sends cooling water, and a heat exchanger (such as a radiator) that cools the cooling water. (The illustration is omitted). As a result, the cooling water flowing in the flow path 221 in the heat radiating member 220 is cooled and looped in the heat exchanger.

本實施方式1的光源裝置1由如上所述的結構構成,以下,對其作用進行說明。在使光源裝置201點亮時,從外部的電 源對一對供電部215供給電力。被供給至供電部215的電力經由導電圖案211與焊料212而供給至發光元件205。發光元件205通過如此般供給的電力而點亮,以照射在紫外線區域具有主波長的光(以下稱作紫外線)。從發光元件205照射的紫外線一邊從光源裝置201中的配設有發光元件205的一側的面擴散一邊照射,從而照射至被照射物。 The light source device 1 according to the first embodiment is configured as described above, and its operation will be described below. When the light source device 201 is turned on, electricity from the outside The source supplies power to the pair of power supply sections 215. The power supplied to the power supply section 215 is supplied to the light emitting element 205 via the conductive pattern 211 and the solder 212. The light-emitting element 205 is lit by the power supplied in this manner, and irradiates light having a dominant wavelength in the ultraviolet region (hereinafter referred to as ultraviolet rays). The ultraviolet light radiated from the light emitting element 205 is irradiated while being diffused from the surface of the light source device 201 on the side where the light emitting element 205 is disposed, and is irradiated to the object to be irradiated.

發光元件205通過如此般供給的電力而點亮,但本實施方式1的光源裝置201中,多個發光元件205是串聯地連接。因此,在使發光元件205點亮時,要通過施加高電壓來點亮,但設置有發光元件205的基板是由陶瓷構成的陶瓷基板210,因此能夠使發光元件205持續點亮而不會產生絕緣破壞。即,在設置有發光元件205的基板是由如鋁般耐電壓低的材料所形成時,視基板的厚度,若對發光元件205施加高電壓,則有時會產生絕緣破壞,但陶瓷的耐電壓高。因此,即使對發光元件205施加高電壓,也不會產生絕緣破壞,而能夠使發光元件205點亮以持續照射紫外線。 The light emitting element 205 is lit by the power supplied in this manner. However, in the light source device 201 of the first embodiment, the plurality of light emitting elements 205 are connected in series. Therefore, when the light-emitting element 205 is turned on, it is lit by applying a high voltage. However, the substrate on which the light-emitting element 205 is provided is a ceramic substrate 210 made of ceramic. Therefore, the light-emitting element 205 can be continuously lit without being generated. Damage to insulation. That is, when the substrate provided with the light-emitting element 205 is formed of a material having a low withstand voltage such as aluminum, depending on the thickness of the substrate, if a high voltage is applied to the light-emitting element 205, insulation breakdown may occur. The voltage is high. Therefore, even if a high voltage is applied to the light-emitting element 205, insulation damage does not occur, and the light-emitting element 205 can be turned on to continuously irradiate ultraviolet rays.

而且,如此般照射紫外線的發光元件205在點亮時會產生熱,因此在本實施方式1的光源裝置201中,一邊通過散熱構件220來抑制溫度的上升一邊使發光元件205點亮。詳細而言,在發光元件205點亮時由發光元件205所產生的熱經由焊料212及導電圖案211而傳遞至陶瓷基板210,並從陶瓷基板210進一步傳遞至散熱構件220。傳遞至散熱構件220的熱被傳遞至散熱構件 220內的冷卻水。 In addition, the light-emitting element 205 irradiated with ultraviolet rays generates heat when it is lighted. Therefore, in the light source device 201 according to the first embodiment, the light-emitting element 205 is lighted while suppressing an increase in temperature by the heat dissipation member 220. Specifically, when the light-emitting element 205 is turned on, heat generated by the light-emitting element 205 is transmitted to the ceramic substrate 210 via the solder 212 and the conductive pattern 211, and further transmitted from the ceramic substrate 210 to the heat dissipation member 220. The heat transmitted to the heat radiating member 220 is transmitted to the heat radiating member. 220 cooling water.

另一方面,在發光元件205點亮時,散熱構件220通過配設在冷卻路徑中的泵的驅動,使冷卻水從流入口223流入至散熱構件220內,散熱構件220內的冷卻水從流出口224流出。因此,因發光元件205所產生的熱的傳遞而溫度上升的冷卻水從流出口224流出。 On the other hand, when the light emitting element 205 is turned on, the heat dissipation member 220 causes the cooling water to flow from the inflow port 223 into the heat dissipation member 220 by driving of a pump provided in the cooling path, and the cooling water in the heat dissipation member 220 flows from the flow. The outlet 224 flows out. Therefore, the cooling water whose temperature rises due to the heat transfer generated by the light emitting element 205 flows out from the outflow port 224.

從流出口224流出的冷卻水通過在配設於冷卻路徑中的熱交換器中進行熱交換而受到冷卻。由此,由發光元件205產生的熱被放出至光源裝置1的外部。在熱交換器中受到冷卻的冷卻水從流入口223再次流入散熱構件220內,一邊在散熱構件220內的流路221中流動,一邊接受來自發光元件205的熱而溫度上升,並從流出口224流出。散熱構件220一邊使冷卻水如此般迴圈,一邊將熱放出至光源裝置201的外部,由此來抑制因發光元件205產生的熱而導致光源裝置201的溫度上升的現象。即,散熱構件220進行光源裝置201的冷卻。另外,作為在散熱構件220內的流路221中通過的冷卻介質,並不限定於冷卻水,既可為液體,也可為例如壓縮空氣或氮氣等氣體。 The cooling water flowing out of the outflow port 224 is cooled by performing heat exchange in a heat exchanger provided in the cooling path. Accordingly, the heat generated by the light emitting element 205 is released to the outside of the light source device 1. The cooling water cooled in the heat exchanger flows into the heat radiating member 220 from the inflow port 223 again, and flows through the flow path 221 in the heat radiating member 220 while receiving the heat from the light emitting element 205 and the temperature rises. 224 out. The heat radiating member 220 radiates the heat to the outside of the light source device 201 while circulating the cooling water in this manner, thereby suppressing a temperature rise of the light source device 201 due to the heat generated by the light emitting element 205. That is, the heat radiating member 220 cools the light source device 201. The cooling medium passing through the flow path 221 in the heat radiating member 220 is not limited to cooling water, and may be a liquid or a gas such as compressed air or nitrogen.

此處,在如此般通過散熱構件220來進行冷卻的情況下,視光源裝置201使用時的環境或散熱構件220中的冷卻狀態,有時會產生結露。在產生結露的情況下,水分會附著於光源裝置201的表面,但陶瓷基板210包含無機材料,導電圖案211由外塗層218予以覆蓋。因此,即使在因結露而導致水分附著於光源裝置 201表面的情況下,陶瓷基板210及導電圖案211也難以因該水分而發生腐蝕。 Here, when cooling is performed by the heat radiating member 220 as described above, depending on the environment in which the light source device 201 is used or the cooling state in the heat radiating member 220, dew condensation may occur. When dew condensation occurs, moisture may adhere to the surface of the light source device 201, but the ceramic substrate 210 includes an inorganic material, and the conductive pattern 211 is covered with an overcoat layer 218. Therefore, even when moisture adheres to the light source device due to dew condensation In the case of the 201 surface, it is also difficult for the ceramic substrate 210 and the conductive pattern 211 to be corroded by the moisture.

而且,散熱構件220是使用導熱率高的材料即鋁而形成,因此散熱性雖高,但有時會產生銹。儘管在散熱構件220中有時會如此般產生銹,但散熱構件220是在其與發光元件205及導電圖案211之間介隔有由陶瓷構成的陶瓷基板210的狀態下配設。因此,即使在散熱構件220中產生了鏽的情況下,該鏽也會被陶瓷基板210阻隔,因此難以產生因鏽引起的絕緣破壞或光源裝置201中的電氣路徑的腐蝕等問題。 In addition, since the heat radiating member 220 is formed using aluminum, which is a material with high thermal conductivity, although heat dissipation is high, rust may be generated. Although rust may be generated in such a manner in the heat radiating member 220, the heat radiating member 220 is disposed in a state where a ceramic substrate 210 made of ceramic is interposed between the heat radiating member 220 and the light emitting element 205 and the conductive pattern 211. Therefore, even when rust is generated in the heat radiating member 220, the rust is blocked by the ceramic substrate 210, and thus it is difficult to cause problems such as insulation damage due to rust or corrosion of electrical paths in the light source device 201.

而且,在將紫外線照射至被照射物以進行光反應或紫外線固化時,有時要從近距離對被照射物照射紫外線。因此,在本實施方式1的光源裝置201中,當在被照射物中進行光反應或紫外線固化時,有時也會從近距離對被照射物照射紫外線,但在被照射物的光反應時或紫外線固化時,會因化學反應而產生被稱作雜質的物質。若該雜質附著於構成散熱構件220的金屬材料,則容易從附著的部分產生銹,但陶瓷基板210位於對被照射物照射紫外線時的散熱構件220與被照射物之間。因此,即使在因被照射物的化學反應而產生了雜質的情況下,也可抑制該雜質到達散熱構件220,即使在因被照射物的化學反應而容易產生雜質的狀況下,也難以產生因該雜質的產生而引起的散熱構件220的鏽。 In addition, when irradiating ultraviolet rays to an irradiated object for photoreaction or ultraviolet curing, the irradiated objects may be irradiated with ultraviolet rays from a short distance. Therefore, in the light source device 201 of the first embodiment, when a photoreaction or ultraviolet curing is performed on an object to be irradiated, the object may be irradiated with ultraviolet rays from a short distance. In the case of UV curing, substances called impurities are generated by chemical reactions. If this impurity adheres to the metal material constituting the heat radiation member 220, rust is likely to be generated from the adhered portion, but the ceramic substrate 210 is located between the heat radiation member 220 and the object when the object is irradiated with ultraviolet rays. Therefore, even when impurities are generated due to the chemical reaction of the object to be irradiated, the impurities can be prevented from reaching the heat radiating member 220, and even under conditions where impurities are likely to be generated due to the chemical reaction of the object to be irradiated, it is difficult to cause the impurities. Rust generation of the heat dissipation member 220 due to the generation of the impurities.

以上的實施方式1的光源裝置201是使用陶瓷基板210來作為基板,且將對發光元件205點亮時產生的熱進行冷卻的散 熱構件220配設在陶瓷基板210中的配設發光元件205的一側的面的相反側。而且,導電圖案211由外塗層218予以覆蓋。通過這些措施,既能確保冷卻性能,而且即使在冷卻時產生了結露的情況下,也能夠抑制因結露的水分引起的腐蝕。其結果,能夠抑制紫外線照射性能的經年下降。 The light source device 201 of the first embodiment described above uses the ceramic substrate 210 as a substrate and dissipates the heat generated when the light-emitting element 205 is lit. The thermal member 220 is disposed on the side of the ceramic substrate 210 opposite to the surface on which the light emitting element 205 is disposed. Further, the conductive pattern 211 is covered by an overcoat layer 218. These measures not only ensure the cooling performance, but also suppress the corrosion caused by the moisture of the condensation even when condensation occurs during cooling. As a result, it is possible to suppress the deterioration of the ultraviolet irradiation performance over the years.

而且,導電圖案211由外塗層218予以覆蓋,由此可防止導電圖案211暴露於從發光元件205放出並從被照射物等反射而到達導電圖案211的紫外線,因此可抑制紫外線照射性能的經年劣化。 Further, the conductive pattern 211 is covered with the overcoat layer 218, thereby preventing the conductive pattern 211 from being exposed to ultraviolet rays emitted from the light-emitting element 205 and reflected from the object to be irradiated to reach the conductive pattern 211, thereby suppressing the effect of ultraviolet irradiation performance. Annual deterioration.

而且,對於基板,使用將陶瓷用於基材的陶瓷基板210,該陶瓷的絕緣性高,無須在基材中形成以樹脂等作為主成分的導熱層,因此即使在安裝有多個發光元件205的情況下,也能夠維持導熱性並確保高的耐電壓。而且,陶瓷比起樹脂具有耐紫外線性,因此即使在對基板照射紫外線的結構中也能夠抑制劣化。這些措施的結果為,能夠抑制紫外線照射性能的經年下降。 Further, as the substrate, a ceramic substrate 210 using ceramics as a base material is used. The ceramic has high insulation properties, and it is not necessary to form a heat conductive layer containing a resin or the like as a main component in the base material. In this case, it is possible to maintain high thermal conductivity and ensure high withstand voltage. Furthermore, ceramics are more UV-resistant than resins, so that deterioration can be suppressed even in a structure where substrates are irradiated with ultraviolet rays. As a result of these measures, it is possible to suppress the decline in ultraviolet irradiation performance over the years.

而且,作為發光元件205,配設所照射的光的主波長不同的多個發光元件205,由此,在被照射物中進行光反應或紫外線固化等化學反應時,能夠更確實地進行反應。即,通過照射紫外線引起的化學反應視被照射物的材質,容易引起化學反應的光的波長有時不同,但通過配設光的主波長不同的多個發光元件205,從而無論被照射物的材質是何種材質,均能夠使化學反應容易地進行。其結果,通過對被照射物照射紫外線而能夠抑制化學反應的 不均勻。 Furthermore, as the light-emitting element 205, a plurality of light-emitting elements 205 having different dominant wavelengths of the light to be irradiated are arranged, whereby the reaction can be performed more reliably when a chemical reaction such as photoreaction or ultraviolet curing is performed on the object to be irradiated. That is, depending on the material of the object to be irradiated by the chemical reaction caused by ultraviolet radiation, the wavelength of light that is likely to cause chemical reaction may be different. However, by arranging a plurality of light-emitting elements 205 having different main wavelengths of light, Whatever the material is, a chemical reaction can be easily performed. As a result, a chemical reaction can be suppressed by irradiating the object with ultraviolet rays. Uneven.

而且,陶瓷基板210包含無機材料,但在對陶瓷基板210的基材使用氧化鋁的情況下,能夠以高反射率來反射從發光元件205照射的紫外線,因此能夠提高紫外線的照射性能。而且,在對陶瓷基板210的基材使用氮化鋁的情況下,能夠通過氮化鋁的高導熱率來將發光元件205點亮時的熱更確實地傳遞至散熱構件220,從而能夠提高散熱性能。進而,在對陶瓷基板210的基材使用氧化鋁與氮化鋁中的任一種的情況下,當散熱構件220中產生了鏽時,也能夠防止該鏽延伸至陶瓷基板210中的配設有發光元件205及導電圖案211的一側的面。由此,能夠更確實地抑制因散熱構件220中產生的鏽而導致光源裝置201的電氣路徑產生腐蝕等問題。這些措施的結果為,能夠抑制紫外線照射性能的經年下降。 Further, the ceramic substrate 210 includes an inorganic material. However, when alumina is used as the base material of the ceramic substrate 210, the ultraviolet rays irradiated from the light emitting element 205 can be reflected with a high reflectance, and thus the ultraviolet irradiation performance can be improved. Furthermore, when aluminum nitride is used as the base material of the ceramic substrate 210, the heat of the light-emitting element 205 can be more reliably transmitted to the heat dissipation member 220 due to the high thermal conductivity of the aluminum nitride, thereby improving heat dissipation. performance. Furthermore, when any one of alumina and aluminum nitride is used as the base material of the ceramic substrate 210, when rust is generated in the heat dissipation member 220, it is possible to prevent the rust from extending into the ceramic substrate 210. One surface of the light emitting element 205 and the conductive pattern 211. As a result, problems such as corrosion of the electrical path of the light source device 201 due to rust generated in the heat dissipation member 220 can be more reliably suppressed. As a result of these measures, it is possible to suppress the decline in ultraviolet irradiation performance over the years.

而且,作為發光元件205,使用照射主波長為240nm以上且405nm以下的光的發光元件,因此在對被照射物照射紫外線而進行化學反應時,能夠更確實地進行反應。其結果,在使用光源裝置201來作為使被照射物進行光反應或紫外線固化的燈具的情況下,能夠抑制化學反應的不均勻。 In addition, as the light-emitting element 205, a light-emitting element that irradiates light having a main wavelength of 240 nm to 405 nm is used. Therefore, when the object to be irradiated is irradiated with ultraviolet rays to perform a chemical reaction, the reaction can be performed more reliably. As a result, when the light source device 201 is used as a lamp for subjecting an irradiated object to a photoreaction or ultraviolet curing, it is possible to suppress unevenness in the chemical reaction.

而且,外塗層218反射大部分的紫外線,由此能夠進一步抑制紫外線到達導電圖案211。其結果,能夠抑制紫外線照射性能的經年下降。 In addition, the overcoat layer 218 reflects most of the ultraviolet rays, and thereby can further suppress the ultraviolet rays from reaching the conductive pattern 211. As a result, it is possible to suppress the deterioration of the ultraviolet irradiation performance over the years.

而且,外塗層218吸收大部分的紫外線,由此能夠進一 步抑制紫外線到達導電圖案211。其結果,能夠抑制紫外線照射性能的經年下降。 Moreover, the outer coating layer 218 absorbs most of the ultraviolet rays, thereby enabling further advancement. The ultraviolet rays are prevented from reaching the conductive pattern 211 in steps. As a result, it is possible to suppress the deterioration of the ultraviolet irradiation performance over the years.

[變形例] [Modification]

另外,所述光源裝置201中,發光元件205通過焊料212直接連接於導電圖案211,但發光元件205也可不直接連接於導電圖案211。圖2是實施方式1的光源裝置的變形例,是使用封裝時的剖面圖。發光元件205例如也可如圖2所示,作為封裝230,使用與反射體232成一體者,將該封裝230通過焊料212而連接於導電圖案211,由此配設於陶瓷基板210上。對於發光元件205成為光源的封裝230的封裝材料,為了防止因紫外線造成的劣化而使用陶瓷。即,反射體232對於基材使用陶瓷。 In the light source device 201, the light emitting element 205 is directly connected to the conductive pattern 211 through the solder 212, but the light emitting element 205 may not be directly connected to the conductive pattern 211. FIG. 2 is a modification of the light source device according to Embodiment 1, and is a cross-sectional view when a package is used. For example, as shown in FIG. 2, the light-emitting element 205 may be provided as a package 230 that is integrated with the reflector 232, and the package 230 is connected to the conductive pattern 211 through the solder 212, thereby being disposed on the ceramic substrate 210. For the packaging material of the package 230 in which the light-emitting element 205 serves as a light source, ceramics are used in order to prevent deterioration due to ultraviolet rays. That is, the reflector 232 uses ceramics as a base material.

通過使用發光元件205與反射體232如此般成為一體的封裝230來配設於陶瓷基板210,從而能夠使發光元件205點亮時的紫外線被反射體232反射而進行照射。由此,能夠抑制從發光元件205照射的紫外線過度擴散,從而能夠效率良好地照射至所需的方向。其結果,能夠提高紫外線的照射性能,且能夠長期維持高的照射性能。而且,封裝230對於封裝材料使用了陶瓷,因此熱膨脹與陶瓷基板210的熱膨脹等同。其結果,能夠降低安裝部的破損,能夠提高耐久性。另外,發光元件205的配設樣式並不限定於圖2。即,圖2中,在一個封裝230內配設有一個發光元件205,但例如也可在一個封裝230內配設有所照射的光的主波長不同的多個發光元件205。 When the light-emitting element 205 and the reflector 232 are integrated into the ceramic substrate 210 by using the package 230 thus integrated, the ultraviolet light when the light-emitting element 205 is lit can be reflected by the reflector 232 and irradiated. Thereby, it is possible to suppress the excessive diffusion of the ultraviolet rays irradiated from the light emitting element 205, and it is possible to efficiently irradiate the desired direction. As a result, the ultraviolet irradiation performance can be improved, and high irradiation performance can be maintained for a long period of time. Furthermore, since the package 230 uses ceramics as the packaging material, the thermal expansion is equivalent to the thermal expansion of the ceramic substrate 210. As a result, breakage of the mounting portion can be reduced, and durability can be improved. The arrangement pattern of the light emitting elements 205 is not limited to that shown in FIG. 2. That is, in FIG. 2, one light-emitting element 205 is arranged in one package 230. For example, a plurality of light-emitting elements 205 having different dominant wavelengths of light to be irradiated may be arranged in one package 230.

以下說明的實施方式2~實施方式7等的光源裝置1、1-1、1-2、2、3、4、5、6、6-1、6-2具備發光部20、電流調整單元30、散熱單元40及控制單元70。發光部20具備固態發光元件列22,該固態發光元件列22具有多個固態發光元件23,所述多個固態發光元件23串聯連接且配置在規定的線上並放出紫外線。發光部20將多個固態發光元件列22沿著與規定的線交叉的方向排列配置。電流調整單元30設置有兩個以上,與發光部20的1個以上的固態發光元件列22對應且可對流經對應的固態發光元件列22的固態發光元件23的電流值進行變更。散熱單元40使流體沿與規定的線交叉的方向流動,以對發光部20的在交叉的方向上相鄰的兩個以上的固態發光元件列22的固態發光元件23發出的熱進行散熱。控制單元70控制電流調整單元30。控制單元70使電流調整單元30變更流經固態發光元件列22的固態發光元件23的電流值,以使多個固態發光元件列22的固態發光元件23放出的紫外線的相對照度變得相等。 The light source devices 1, 1-1, 1-2, 2, 3, 4, 5, 6, 6-1, and 6-2 described in Embodiments 2 to 7 described below include a light emitting unit 20 and a current adjustment unit 30. 。 Cooling unit 40 and control unit 70. The light emitting section 20 includes a solid-state light-emitting element row 22 having a plurality of solid-state light-emitting elements 23 connected in series and arranged on a predetermined line and emitting ultraviolet rays. The light-emitting section 20 includes a plurality of solid-state light-emitting element rows 22 arranged in a direction crossing a predetermined line. The current adjustment unit 30 is provided with two or more, corresponding to one or more solid-state light-emitting element rows 22 of the light-emitting section 20 and capable of changing the current value of the solid-state light-emitting elements 23 flowing through the corresponding solid-state light-emitting element rows 22. The heat radiating unit 40 allows a fluid to flow in a direction crossing a predetermined line to dissipate heat emitted from the solid state light emitting elements 23 of the two or more solid state light emitting element rows 22 adjacent to each other in the crossing direction of the light emitting section 20. The control unit 70 controls the current adjustment unit 30. The control unit 70 causes the current adjustment unit 30 to change the current value of the solid-state light-emitting elements 23 flowing through the solid-state light-emitting element rows 22 so that the relative degrees of ultraviolet rays emitted from the solid-state light-emitting elements 23 of the plurality of solid-state light-emitting elements rows 22 become equal.

而且,以下說明的實施方式2~實施方式7等的光源裝置1、1-1、1-2、2、3、4、5、6、6-1、6-2中,具備溫度檢測單元60,該溫度檢測單元60被設置在發光部20的規定位置且可檢測規定位置的溫度,控制單元70基於溫度檢測單元60的檢測結果,使電流調整單元30變更流經對應的固態發光元件列22的固態發光元件23的電流值。 Further, the light source devices 1, 1-1, 1-2, 2, 3, 4, 5, 6, 6-1, and 6-2 described in Embodiments 2 to 7 described below include a temperature detection unit 60. The temperature detection unit 60 is disposed at a predetermined position of the light emitting unit 20 and can detect the temperature of the predetermined position. Based on the detection result of the temperature detection unit 60, the control unit 70 causes the current adjustment unit 30 to change the current flowing through the corresponding solid-state light emitting element row 22 Current value of the solid-state light-emitting element 23.

而且,以下說明的實施方式2~實施方式7等的光源裝置 1、1-1、1-2、2、3、4、5、6、6-1、6-2中,將多個溫度檢測單元60沿著流體的流動方向而隔開間隔地設置。 In addition, the light source devices according to Embodiments 2 to 7 and the like described below In 1, 1-1, 1-2, 2, 3, 4, 5, 6, 6-1, and 6-2, a plurality of temperature detection units 60 are provided at intervals along the flow direction of the fluid.

[實施方式2] [Embodiment 2]

接下來,基於圖式來說明本發明的實施方式2的光源裝置1。圖3是表示具備實施方式2的光源裝置的紫外線照射裝置的概略結構的圖,圖4是圖3中的II-II線的剖面圖,圖5是表示從下方展示實施方式2的光源裝置的發光部的概略結構的方塊圖。 Next, a light source device 1 according to a second embodiment of the present invention will be described based on the drawings. 3 is a diagram showing a schematic configuration of an ultraviolet irradiation device including a light source device according to Embodiment 2. FIG. 4 is a cross-sectional view taken along the line II-II in FIG. 3. FIG. 5 is a view showing the light source device according to Embodiment 2 from below. A block diagram of the general structure of the light emitting section.

實施方式2的光源裝置1(以下簡稱作光源裝置)構成圖3所示的紫外線照射裝置100。紫外線照射裝置100例如是被用於液晶面板的固化或重疊、貼合等光反應工序,且將規定波長的紫外線照射至被照射物W(圖3所示)的裝置。 The light source device 1 according to the second embodiment (hereinafter simply referred to as a light source device) constitutes an ultraviolet irradiation device 100 shown in FIG. 3. The ultraviolet irradiation device 100 is, for example, a device used for a photo-reaction step such as curing, lamination, or lamination of a liquid crystal panel, and irradiates ultraviolet light of a predetermined wavelength to an object to be irradiated W (shown in FIG. 3).

紫外線照射裝置100如圖3所示,具備光源裝置1以及將被照射物W載置於載置面10a上的載台(stage)10等。另外,以下,將與載置面10a平行的彼此正交的方向稱作X軸方向、Y軸方向,將與載置面10a正交的方向稱作Z軸方向。光源裝置1具備發光部20、多個電流調整單元30(圖5所示)、散熱單元40、框體50、溫度檢測單元60及控制單元70。 As shown in FIG. 3, the ultraviolet irradiation device 100 includes a light source device 1, a stage 10 on which an object to be irradiated W is placed on the mounting surface 10 a, and the like. Hereinafter, directions orthogonal to each other parallel to the mounting surface 10a are referred to as X-axis direction and Y-axis direction, and directions orthogonal to the mounting surface 10a are referred to as Z-axis direction. The light source device 1 includes a light emitting unit 20, a plurality of current adjustment units 30 (shown in FIG. 5), a heat radiation unit 40, a housing 50, a temperature detection unit 60, and a control unit 70.

發光部20如圖3及圖5所示,具備安裝基板21(相當於基板)及多個固態發光元件列22。安裝基板21是與X軸方向及Y軸方向、即載置面10a平行地配置。安裝基板21在沿著Z軸方向與載置面10a相向的表面21a上,安裝有構成固態發光元件列22的多個固態發光元件23。安裝基板21將固態發光元件23沿著X 軸方向與Y軸方向這兩個方向而排列在表面21a上且配置在面上。安裝基板21按照預定的圖案來連接固態發光元件23。 As shown in FIGS. 3 and 5, the light emitting section 20 includes a mounting substrate 21 (corresponding to a substrate) and a plurality of solid-state light emitting element rows 22. The mounting substrate 21 is arranged parallel to the X-axis direction and the Y-axis direction, that is, the mounting surface 10a. The mounting substrate 21 has a plurality of solid-state light-emitting elements 23 constituting a solid-state light-emitting element row 22 mounted on a surface 21 a facing the mounting surface 10 a along the Z-axis direction. The mounting substrate 21 moves the solid-state light-emitting element 23 along X The two directions, the axial direction and the Y-axis direction, are arranged on the surface 21 a and arranged on the surface. The mounting substrate 21 connects the solid-state light-emitting elements 23 in a predetermined pattern.

多個固態發光元件列22具有被安裝在安裝基板21的表面21a上的多個固態發光元件23。構成各固態發光元件列22的固態發光元件23在安裝基板21上配置在與作為規定的線上的X軸方向平行的直線上,且陽極(anode)與陰極(cathode)串聯連接。固態發光元件23放出紫外線。對於構成固態發光元件列22的固態發光元件23,供給來自直流電源24(圖5所示)的電力。發光部20將多個固態發光元件列22沿著與作為規定的線的X軸方向正交(交叉)的Y軸方向排列配置。多個固態發光元件列22彼此並聯連接,且相對於直流電源24而並聯連接。因此,使從直流電源24供給的電力沿著與X軸方向平行的圖3~圖5所示的箭頭K而作為電流流經多個固態發光元件列22。這樣,發光部20具有n(自然數)個固態發光元件列22。即,發光部20具有第1固態發光元件列22、第2固態發光元件列22、…、第n-1固態發光元件列22、第n固態發光元件列22作為固態發光元件列。 The plurality of solid-state light-emitting element rows 22 include a plurality of solid-state light-emitting elements 23 mounted on the surface 21 a of the mounting substrate 21. The solid-state light-emitting elements 23 constituting each solid-state light-emitting element row 22 are arranged on a mounting substrate 21 on a straight line parallel to the X-axis direction as a predetermined line, and an anode and a cathode are connected in series. The solid-state light-emitting element 23 emits ultraviolet rays. The solid-state light-emitting elements 23 constituting the solid-state light-emitting element row 22 are supplied with electric power from a DC power source 24 (shown in FIG. 5). The light-emitting section 20 includes a plurality of solid-state light-emitting element rows 22 arranged in a Y-axis direction orthogonal (intersecting) to the X-axis direction as a predetermined line. The plurality of solid-state light-emitting element rows 22 are connected in parallel to each other, and are connected in parallel to the DC power source 24. Therefore, the electric power supplied from the DC power source 24 is caused to flow as a current through the plurality of solid-state light-emitting element rows 22 along the arrow K shown in FIGS. 3 to 5 parallel to the X-axis direction. In this way, the light-emitting section 20 includes n (natural numbers) solid-state light-emitting element rows 22. That is, the light emitting section 20 includes the first solid-state light-emitting element row 22, the second solid-state light-emitting element row 22, ..., the n-1th solid-state light-emitting element row 22, and the n-th solid-state light-emitting element row 22 as the solid-state light-emitting element row.

構成固態發光元件列22的固態發光元件23放出一樣地朝所有方向振動的紫外線,且包含LED(Light Emitting Diode)、LD(Laser Diode)等。固態發光元件23放出峰值(peak)波長為240nm以上且450nm以下的紫外線。另外,本說明書中所說的峰值波長,是指固態發光元件23放出的紫外線中的相對照度最強的紫外線的波長。而且,本發明中所說的相對照度,是指表示從發 光部20、即從固態發光元件23放出的紫外線的相對照度的指標。相對照度例如可將使用牛尾(USHIO)電機制的紫外線累計光量計UIT-250、受光器UVD-S365等所謂的照度計所測定的照度標準化而用作相對的照度。另外,照度計並不限定於所述,例如也可使用奧克(ORC)製作所製造的UV-MO3A、受光器UV-SN35。而且,對於相對照度,例如也可在放置被照射物W的位置,使用接收紫外線並輸出電信號的受光元件來相對地檢測紫外線的強度變化。 The solid-state light-emitting elements 23 constituting the solid-state light-emitting element array 22 emit ultraviolet rays that vibrate in all directions uniformly, and include LEDs (Light Emitting Diodes), LDs (Laser Diodes), and the like. The solid-state light-emitting element 23 emits ultraviolet rays having a peak wavelength of 240 nm or more and 450 nm or less. In addition, the peak wavelength referred to in this specification refers to the wavelength of the ultraviolet rays having the strongest contrast among the ultraviolet rays emitted from the solid-state light-emitting element 23. In addition, the relative degree in the present invention means An index of the degree of contrast of the light portion 20, that is, the ultraviolet rays emitted from the solid-state light-emitting element 23. As the relative illuminance, for example, the illuminance measured by a so-called illuminance meter such as a UV integrated light meter UIT-250 and a photoreceptor UVD-S365 using a USHIO electrical mechanism can be used as the relative illuminance. The illuminance meter is not limited to the above, and for example, UV-MO3A and UV-SN35 manufactured by ORC can be used. For the contrast, for example, at a position where the object to be irradiated W is placed, a light receiving element that receives ultraviolet rays and outputs an electric signal may be used to relatively detect the intensity change of the ultraviolet rays.

電流調整單元30設置有兩個以上,且與發光部20的1個以上的固態發光元件列22對應地設置。實施方式2中,電流調整單元30是與固態發光元件列22一對一地對應。電流調整單元30例如包含電阻值可變更的可變電阻器等,且與構成對應的固態發光元件列22的多個固態發光元件23串聯連接。電流調整單元30通過變更電阻值,從而能夠變更流經對應的固態發光元件列22的固態發光元件23的電流值。電流調整單元30既可安裝於安裝基板21上,也可配置在安裝基板21外。 The current adjustment unit 30 is provided in two or more, and is provided corresponding to one or more solid-state light-emitting element rows 22 of the light-emitting section 20. In the second embodiment, the current adjustment units 30 correspond to the solid-state light-emitting element rows 22 one-to-one. The current adjustment unit 30 includes, for example, a variable resistor whose resistance value can be changed, and is connected in series with a plurality of solid-state light-emitting elements 23 constituting the corresponding solid-state light-emitting element row 22. By changing the resistance value, the current adjustment unit 30 can change the current value flowing through the solid-state light-emitting elements 23 of the corresponding solid-state light-emitting element row 22. The current adjustment unit 30 may be mounted on or mounted outside the mounting substrate 21.

散熱單元40使作為流體的氣體在相對於作為規定的線的X軸方向而正交(交叉)的Y軸方向上沿著安裝基板21的背面21b而流動,以將發光部20的在作為交叉方向的Y軸方向上相鄰的兩個以上的固態發光元件列22的固態發光元件23發出的熱釋放至光源裝置1外。實施方式2中,散熱單元40使氣體沿Y軸方向流動,以將所有固態發光元件列22的固態發光元件23發出的 熱釋放至光源裝置1外。散熱單元40如圖3及圖4所示,包含吸熱器(heat sink)41及散熱風扇(fan)42等。吸熱器41被安裝在發光部20的安裝基板21的表面21a背側的背面21b。吸熱器41包含鋁合金等熱阻低的材料(金屬等)。本實施方式2中,吸熱器41一體地具備:平板狀的基板安裝部41a,被安裝於安裝基板21的背面21b;以及多個鰭片(fin)41b,從基板安裝部41a朝遠離載台10的方向突出。鰭片41b從基板安裝部41a朝Z軸方向突出且形成為沿Y軸方向呈直線狀地延伸的平板狀,在X軸方向上隔開間隔且等間隔地設置有多個鰭片41b。 The heat radiating unit 40 flows a gas as a fluid along the back surface 21b of the mounting substrate 21 in a Y-axis direction orthogonal (intersecting) with respect to the X-axis direction as a predetermined line, so that The heat emitted from the solid-state light-emitting elements 23 of two or more adjacent solid-state light-emitting element rows 22 in the Y-axis direction of the direction is released to the outside of the light source device 1. In the second embodiment, the heat dissipation unit 40 causes the gas to flow in the Y-axis direction so that all the solid-state light-emitting elements 23 of the solid-state light-emitting element rows 22 emit light. Heat is released outside the light source device 1. As shown in FIGS. 3 and 4, the heat dissipation unit 40 includes a heat sink 41, a heat dissipation fan 42, and the like. The heat sink 41 is mounted on the back surface 21 b on the back side of the surface 21 a of the mounting substrate 21 of the light emitting section 20. The heat sink 41 includes a material (metal or the like) having a low thermal resistance such as an aluminum alloy. In the second embodiment, the heat sink 41 is integrally provided with a flat substrate mounting portion 41a mounted on the back surface 21b of the mounting substrate 21, and a plurality of fins 41b facing away from the stage from the substrate mounting portion 41a. The direction of 10 stands out. The fins 41b protrude from the substrate mounting portion 41a in the Z-axis direction and are formed in a flat plate shape extending linearly in the Y-axis direction. A plurality of fins 41b are provided at regular intervals in the X-axis direction.

散熱風扇42被安裝在吸熱器41的Y軸方向的一端部,通過旋轉而將光源裝置1外的作為流體的氣體導入至吸熱器41的鰭片41b間等,使其在鰭片41b間流動後,排出至光源裝置1外。散熱風扇42通過使氣體在鰭片41b間流動,從而將固態發光元件列22的固態發光元件23發出的熱經由安裝基板21、吸熱器41等而釋放至光源裝置1外。 The heat radiating fan 42 is attached to one end portion of the heat sink 41 in the Y-axis direction, and rotates to introduce a gas outside the light source device 1 as a fluid between the fins 41b of the heat sink 41, and to flow between the fins 41b After that, it is discharged out of the light source device 1. The heat-dissipating fan 42 releases heat from the solid-state light-emitting elements 23 of the solid-state light-emitting element row 22 to the outside of the light source device 1 through the mounting substrate 21, the heat sink 41, and the like by flowing gas between the fins 41b.

而且,本發明中,散熱單元40也可包含箱狀的熱管以及泵等,所述箱狀的熱管被安裝在安裝基板21的背面21b且內側密閉,並使作為流體的液體在內側流動,所述泵使熱管內的液體流動。 Further, in the present invention, the heat radiating unit 40 may include a box-shaped heat pipe, a pump, and the like. The box-shaped heat pipe is mounted on the back surface 21b of the mounting substrate 21 and sealed inside, and the liquid as a fluid flows inside. The pump moves the liquid in the heat pipe.

框體50覆蓋安裝基板21的背面21b及散熱單元40的吸熱器41。本實施方式2中,框體50形成為Y軸方向的兩端部開口的箱狀。框體50通過散熱單元40的散熱風扇42旋轉,從而通 過遠離散熱風扇42的一側的其中一個開口部50a導入作為流體的氣體,並從靠近散熱風扇42的另一個開口部50b將經吸熱器41加熱的氣體排出至外部。 The frame 50 covers the back surface 21 b of the mounting substrate 21 and the heat sink 41 of the heat radiation unit 40. In the second embodiment, the frame 50 is formed in a box shape with both ends in the Y-axis direction open. The housing 50 is rotated by the heat radiating fan 42 of the heat radiating unit 40, so that A gas as a fluid is introduced through one of the openings 50 a on a side remote from the heat radiating fan 42, and the gas heated by the heat absorber 41 is discharged to the outside from the other opening 50 b near the heat radiating fan 42.

溫度檢測單元60被設置在發光部20的規定位置且可檢測規定位置的溫度。實施方式2中,多個溫度檢測單元60在作為散熱單元40中的流體的氣體的流動方向即Y軸方向上隔開間隔地設置於發光部20中。實施方式2中,溫度檢測單元60被分別設置在安裝基板21的表面21a的靠近框體50的其中一個開口部50a的端部的X軸方向的中央、與安裝基板21的表面21a的靠近框體50的另一個開口部50b的端部的X軸方向的中央,合計設置有兩個。溫度檢測單元60將檢測結果輸出至控制單元70。 The temperature detection unit 60 is provided at a predetermined position of the light emitting section 20 and can detect the temperature of the predetermined position. In the second embodiment, the plurality of temperature detection units 60 are provided in the light emitting unit 20 at intervals in the Y-axis direction, which is the flow direction of the gas as the fluid in the heat radiating unit 40. In the second embodiment, the temperature detection unit 60 is provided at the center of the X-axis direction of the end of one of the openings 50 a of the frame 50 near the surface 21 a of the mounting substrate 21 and the frame close to the surface 21 a of the mounting substrate 21. The center of the X-axis direction of the end of the other opening portion 50 b of the body 50 is two in total. The temperature detection unit 60 outputs a detection result to the control unit 70.

控制單元70控制紫外線照射裝置100對紫外線的照射動作。控制單元70例如是以未圖示的微處理器(micro processor)作為主體而構成,所述微處理器具備包含中央處理器(Central Processing Unit,CPU)等的運算處理裝置或唯讀記憶體(Read Only Memory,ROM)、隨機存取記憶體(Random Access Memory,RAM)等,且與顯示處理動作的狀態的顯示單元、及操作員(operator)登記處理內容資訊等時所用的操作單元相連接。 The control unit 70 controls the ultraviolet irradiation operation of the ultraviolet irradiation device 100. The control unit 70 is constituted, for example, by a microprocessor (not shown) as a main body, which includes an arithmetic processing device including a central processing unit (CPU) or a read-only memory ( Read Only Memory (ROM), Random Access Memory (RAM), etc., and are connected to a display unit that displays the status of processing operations, and an operation unit used by the operator to register processing content information, etc. .

控制單元70對與光源裝置1的發光部20的各固態發光元件列22對應地設置的電流調整單元30進行控制,以對流經各固態發光元件列22內的固態發光元件23的電流值進行變更。控制單元70在對流經各固態發光元件列22內的固態發光元件23的 電流值進行變更時,基於溫度檢測單元60的檢測結果,使各電流調整單元30變更流經對應的固態發光元件列22內的固態發光元件23的電流值,以使多個固態發光元件列22的固態發光元件23放出的紫外線的相對照度變得相等。 The control unit 70 controls the current adjustment unit 30 provided corresponding to each of the solid-state light-emitting element rows 22 of the light-emitting section 20 of the light source device 1 to change a current value flowing through the solid-state light-emitting elements 23 in each of the solid-state light-emitting element rows 22. . The control unit 70 controls the flow of the solid-state light-emitting elements 23 passing through the solid-state light-emitting element rows 22 When the current value is changed, based on the detection result of the temperature detection unit 60, each current adjustment unit 30 is caused to change the current value flowing through the solid-state light-emitting elements 23 in the corresponding solid-state light-emitting element row 22 so that a plurality of solid-state light-emitting element rows 22 The relative degrees of ultraviolet rays emitted from the solid-state light-emitting element 23 are equal.

接下來,對紫外線照射裝置100的被照射物W的處理動作進行說明。首先,操作員將處理內容資訊登記到控制單元70中,在有處理動作的開始指示時,開始處理動作。當處理動作開始時,控制單元70使光源裝置1的散熱單元40的散熱風扇42工作。 Next, a processing operation of the object W to be irradiated by the ultraviolet irradiation apparatus 100 will be described. First, the operator registers the processing content information in the control unit 70 and starts a processing operation when there is an instruction to start the processing operation. When the processing operation is started, the control unit 70 causes the heat radiation fan 42 of the heat radiation unit 40 of the light source device 1 to operate.

並且,紫外線照射裝置100在使散熱單元40的散熱風扇42工作後經過規定時間時,在載台10的載置面10a上載置被照射物W,從發光部20的各固態發光元件列22的各固態發光元件23放出紫外線,以對載置面10a上的被照射物W照射紫外線。控制單元70控制電流調整單元30,以對各固態發光元件列22施加電力。將以固定時間經紫外線照射的被照射物W從載台10的載置面10a上予以拆卸,並將紫外線照射前的被照射物W載置於載台10的載置面10a上。與前述的工序同樣地照射紫外線。 In addition, when a predetermined period of time has elapsed after the heat radiation fan 42 of the heat radiation unit 40 is operated, the ultraviolet irradiation device 100 places the object W on the mounting surface 10 a of the stage 10 from the solid-state light-emitting element rows 22 of the light-emitting section 20. Each solid-state light-emitting element 23 emits ultraviolet rays to irradiate the object W on the mounting surface 10 a with ultraviolet rays. The control unit 70 controls the current adjustment unit 30 to apply power to each of the solid-state light-emitting element rows 22. The object W to be irradiated with ultraviolet rays for a fixed time is detached from the mounting surface 10 a of the stage 10, and the object W to be irradiated with ultraviolet rays is placed on the mounting surface 10 a of the stage 10. Ultraviolet rays were irradiated in the same manner as in the aforementioned step.

本發明的紫外線照射裝置100可視需要而在光源裝置1與載台10之間設置濾光器(filter)或光學元件。 The ultraviolet irradiation device 100 of the present invention may be provided with a filter or an optical element between the light source device 1 and the stage 10 as necessary.

前述結構的實施方式2的光源裝置1中,控制單元70使各電流調整單元30變更流經對應的固態發光元件列22的固態發光元件23的電流值,以使多個固態發光元件列22的固態發光元件23所放出的紫外線的相對照度變得相等。因此,光源裝置1能 夠抑制對被照射物W照射的紫外線的照度偏差。因而,光源裝置1能夠抑制針對被照射物W的紫外線的不均勻照射。 In the light source device 1 of the second embodiment configured as described above, the control unit 70 causes the current adjustment units 30 to change the current value of the solid-state light-emitting elements 23 flowing through the corresponding solid-state light-emitting element rows 22 so that the The relative degrees of ultraviolet rays emitted from the solid-state light-emitting element 23 become equal. Therefore, the light source device 1 can It is sufficient to suppress variations in the illuminance of ultraviolet rays irradiated onto the object to be irradiated. Therefore, the light source device 1 can suppress uneven irradiation of ultraviolet rays with respect to the object W to be irradiated.

而且,光源裝置1具備溫度檢測單元60,該溫度檢測單元60對發光部20的作為規定位置的安裝基板21的表面21a上的溫度進行檢測,控制單元70基於溫度檢測單元60的檢測結果來控制各電流調整單元30。因此,光源裝置1能夠抑制對被照射物W照射的紫外線的照度偏差。因此,光源裝置1能夠使多個固態發光元件列22的固態發光元件23放出的紫外線的相對照度盡可能相等,能夠抑制對被照射物W照射的紫外線的照度偏差。因而,光源裝置1能夠抑制針對被照射物W的紫外線的不均勻照射。 Further, the light source device 1 includes a temperature detection unit 60 that detects the temperature on the surface 21 a of the mounting substrate 21 that is the predetermined position of the light emitting section 20, and the control unit 70 controls based on the detection result of the temperature detection unit 60. Each current adjustment unit 30. Therefore, the light source device 1 can suppress variations in the illuminance of ultraviolet rays irradiated onto the object to be irradiated W. Therefore, the light source device 1 can make the relative degrees of ultraviolet rays emitted from the solid-state light-emitting elements 23 of the plurality of solid-state light-emitting element rows 22 as equal as possible, and can suppress variations in the illuminance of ultraviolet rays irradiated to the object to be irradiated. Therefore, the light source device 1 can suppress uneven irradiation of ultraviolet rays with respect to the object W to be irradiated.

而且,在光源裝置1中,通過沿著流體的流動方向而隔開間隔地設置多個溫度檢測單元60,從而能夠使各電流調整單元30變更流經對應的固態發光元件列22的固態發光元件23的電流值。因此,光源裝置1能夠使多個固態發光元件列22的固態發光元件23放出的紫外線的相對照度盡可能相等,能夠抑制對被照射物W照射的紫外線的照度偏差。因而,光源裝置1能夠抑制針對被照射物W的紫外線的不均勻照射。 Furthermore, in the light source device 1, by providing a plurality of temperature detection units 60 at intervals along the flow direction of the fluid, each of the current adjustment units 30 can change the solid-state light-emitting element flowing through the corresponding solid-state light-emitting element row 22 23 current value. Therefore, the light source device 1 can make the relative degrees of ultraviolet rays emitted from the solid-state light-emitting elements 23 of the plurality of solid-state light-emitting element rows 22 as equal as possible, and can suppress variations in the illuminance of ultraviolet rays irradiated to the object to be irradiated. Therefore, the light source device 1 can suppress uneven irradiation of ultraviolet rays with respect to the object W to be irradiated.

而且,在光源裝置1中,通過放出固態發光元件22的峰值波長為240nm以上且450nm以下的紫外線,能夠抑制針對被照射物W的紫外線的不均勻照射。 Further, in the light source device 1, by emitting ultraviolet rays having a peak wavelength of 240 nm or more and 450 nm or less, the solid-state light-emitting element 22 can suppress uneven irradiation of ultraviolet rays to the object to be irradiated.

[變形例1] [Modification 1]

接下來,基於圖式來說明本發明的實施方式2的變形例1 的光源裝置1-1。圖6是表示從下方展示實施方式2的變形例1的光源裝置的概略結構的概略結構的方塊圖。圖6中,對於與前述的實施方式2相同的部分,標注相同的標號並省略說明。 Next, a first modification of the second embodiment of the present invention will be described based on the drawings. 的 光光 装置 1-1. FIG. 6 is a block diagram showing a schematic configuration of a light source device according to a first modification of the second embodiment. In FIG. 6, the same portions as those in the aforementioned second embodiment are denoted by the same reference numerals, and descriptions thereof are omitted.

實施方式2的變形例1的光源裝置1-1如圖6所示,不具備溫度檢測單元60。進而,光源裝置1-1的控制單元70基於預先儲存的值來控制電流調整單元30。 As shown in FIG. 6, the light source device 1-1 according to the first modification of the second embodiment does not include a temperature detection unit 60. Furthermore, the control unit 70 of the light source device 1-1 controls the current adjustment unit 30 based on a value stored in advance.

實施方式2的變形例1的光源裝置1-1與實施方式2同樣地,能夠抑制對被照射物W照射的紫外線的照度偏差,能夠抑制針對被照射物W的紫外線的不均勻照射。 The light source device 1-1 according to the first modification of the second embodiment can suppress variations in the illuminance of ultraviolet rays irradiated on the object W as in the second embodiment, and can suppress uneven irradiation of ultraviolet rays on the object W.

[變形例2] [Modification 2]

接下來,基於圖式來說明本發明的實施方式2的變形例2的光源裝置1-2。圖7是表示從下方展示實施方式2的變形例2的光源裝置的概略結構的概略結構的方塊圖。圖7中,對於與前述的實施方式2相同的部分,標注相同的標號並省略說明。 Next, a light source device 1-2 according to a second modification of the second embodiment of the present invention will be described based on the drawings. FIG. 7 is a block diagram showing a schematic configuration of a light source device according to a second modification of the second embodiment. In FIG. 7, the same portions as those in the aforementioned second embodiment are denoted by the same reference numerals and descriptions thereof are omitted.

實施方式2的變形例2的光源裝置1-2如圖7所示,具備與各固態發光元件列22對應的溫度檢測單元60。即,變形例2的光源裝置1-2中,固態發光元件列22與溫度檢測單元60是一對一地對應,對應的固態發光元件列22與溫度檢測單元60配置在接近的位置。 As shown in FIG. 7, the light source device 1-2 according to the second modification of the second embodiment includes a temperature detection unit 60 corresponding to each solid-state light-emitting element row 22. That is, in the light source device 1-2 according to the second modification, the solid-state light-emitting element rows 22 and the temperature detection unit 60 correspond one-to-one, and the corresponding solid-state light-emitting element rows 22 and the temperature detection unit 60 are disposed at close positions.

實施方式2的變形例2的光源裝置1-2與實施方式2同樣地,能夠抑制對被照射物W照射的紫外線的照度偏差,能夠抑制針對被照射物W的紫外線的不均勻照射。 The light source device 1-2 according to the second modification of the second embodiment can suppress variations in the illuminance of ultraviolet rays irradiated on the object W as in the second embodiment, and can suppress uneven irradiation of ultraviolet rays on the object W.

[實施方式3] [Embodiment 3]

接下來,基於圖式來說明本發明的實施方式3的光源裝置2。圖8是表示從下方展示實施方式3的光源裝置的概略結構的概略結構的方塊圖。圖8中,對於與前述的實施方式2等相同的部分,標注相同的標號並省略說明。 Next, a light source device 2 according to a third embodiment of the present invention will be described based on the drawings. 8 is a block diagram showing a schematic configuration showing a schematic configuration of a light source device according to Embodiment 3 from below. In FIG. 8, the same portions as those in Embodiment 2 and the like described above are denoted by the same reference numerals and descriptions thereof will be omitted.

實施方式3的光源裝置2如圖8所示,各固態發光元件列22配置有固態發光元件23,該固態發光元件23串聯連接在與X軸方向平行的多條直線上。而且,圖8中省略了溫度檢測單元60,但在實施方式3中,也可與實施方式2、實施方式2的變形例2同樣地配置溫度檢測單元60。 As shown in FIG. 8, the light source device 2 according to the third embodiment includes solid-state light-emitting elements 23 arranged in each solid-state light-emitting element row 22. The solid-state light-emitting elements 23 are connected in series on a plurality of straight lines parallel to the X-axis direction. Although the temperature detection unit 60 is omitted in FIG. 8, in the third embodiment, the temperature detection unit 60 may be arranged in the same manner as the second modification of the second embodiment and the second embodiment.

實施方式3的光源裝置2與實施方式2同樣地,能夠抑制對被照射物W照射的紫外線的照度偏差,能夠抑制針對被照射物W的紫外線的不均勻照射。 The light source device 2 according to the third embodiment can suppress variations in the illuminance of the ultraviolet rays irradiated on the object W as in the second embodiment, and can suppress uneven irradiation of the ultraviolet rays on the object to be irradiated.

[實施方式4] [Embodiment 4]

接下來,基於圖式來說明本發明的實施方式4的光源裝置3。圖9是表示從下方展示實施方式4的光源裝置的概略結構的概略結構的方塊圖。圖9中,對於與前述的實施方式2、實施方式3等相同的部分,標注相同的標號並省略說明。 Next, a light source device 3 according to a fourth embodiment of the present invention will be described based on the drawings. FIG. 9 is a block diagram showing a schematic configuration showing a schematic configuration of a light source device according to Embodiment 4 from below. In FIG. 9, the same portions as those of the aforementioned Embodiment 2, Embodiment 3, and the like are denoted by the same reference numerals and descriptions thereof will be omitted.

實施方式4的光源裝置3如圖9所示,各固態發光元件列22配置有固態發光元件23,該固態發光元件23串聯連接在與X軸方向平行的多條直線上。另外,在實施方式4中,也可與實施方式2同樣地,對於各固態發光元件列22,將固態發光元件23 配置在與X軸方向平行的1條直線上。而且,圖9中省略了溫度檢測單元60,但在實施方式4中,也可與實施方式2、實施方式2的變形例2同樣地配置溫度檢測單元60。 As shown in FIG. 9, a light source device 3 according to Embodiment 4 is provided with solid-state light-emitting elements 23 in each solid-state light-emitting element row 22. The solid-state light-emitting elements 23 are connected in series on a plurality of straight lines parallel to the X-axis direction. In the fourth embodiment, as in the second embodiment, the solid-state light-emitting elements 23 may be replaced with the solid-state light-emitting elements 23. Arranged on a straight line parallel to the X-axis direction. Although the temperature detection unit 60 is omitted in FIG. 9, in the fourth embodiment, the temperature detection unit 60 may be arranged in the same manner as the second modification of the second embodiment and the second embodiment.

進而,實施方式4的光源裝置3的散熱單元40如圖9所示,在Y軸方向的兩端設置有將氣體抽吸至框體50內的風扇43,並設置有從Y軸方向的中央將氣體排出至框體50外的排出口44。 Furthermore, as shown in FIG. 9, the heat radiation unit 40 of the light source device 3 according to the fourth embodiment is provided with fans 43 for sucking gas into the housing 50 at both ends in the Y-axis direction, and is provided with a center from the Y-axis direction. The gas is discharged to a discharge port 44 outside the casing 50.

實施方式4的光源裝置3與實施方式2等同樣地,能夠抑制對被照射物W照射的紫外線的照度偏差,能夠抑制針對被照射物W的紫外線的不均勻照射。 The light source device 3 according to the fourth embodiment can suppress variations in the illuminance of ultraviolet rays irradiated on the object to be irradiated, and can suppress uneven irradiation of ultraviolet rays on the object to be irradiated, as in the second embodiment and the like.

[實施方式5] [Embodiment 5]

接下來,基於圖式來說明本發明的實施方式5的光源裝置4。圖10是表示從下方展示實施方式5的光源裝置的概略結構的概略結構的方塊圖。圖10中,對於與前述的實施方式2等相同的部分,標注相同的標號並省略說明。 Next, a light source device 4 according to a fifth embodiment of the present invention will be described based on the drawings. FIG. 10 is a block diagram showing a schematic configuration showing a schematic configuration of a light source device according to Embodiment 5 from below. In FIG. 10, the same parts as those in the aforementioned second embodiment and the like are denoted by the same reference numerals and descriptions thereof will be omitted.

實施方式5的光源裝置4將各固態發光元件列22形成為與X軸方向平行的直線狀,且如圖10所示,使流經彼此相鄰的各固態發光元件列22的電流的方向相反。而且,圖10中省略了溫度檢測單元60,但實施方式5中,也可與實施方式2、實施方式2的變形例2同樣地配置溫度檢測單元60。進而,圖10中省略了電流調整單元30,但在本發明中,與各固態發光元件列22對應地設置有電流調整單元30。而且,圖10中省略了控制單元70。 The light source device 4 of Embodiment 5 forms each solid-state light-emitting element row 22 in a straight line parallel to the X-axis direction, and as shown in FIG. 10, the direction of the current flowing through each solid-state light-emitting element row 22 adjacent to each other is reversed. . Although the temperature detection unit 60 is omitted in FIG. 10, in the fifth embodiment, the temperature detection unit 60 may be arranged in the same manner as in the second modification of the second embodiment and the second embodiment. Furthermore, although the current adjustment unit 30 is omitted in FIG. 10, in the present invention, the current adjustment unit 30 is provided corresponding to each solid-state light-emitting element row 22. Moreover, the control unit 70 is omitted in FIG. 10.

實施方式5的光源裝置4與實施方式2等同樣地,能夠 抑制對被照射物W照射的紫外線的照度偏差,能夠抑制針對被照射物W的紫外線的不均勻照射。 The light source device 4 according to the fifth embodiment can be similar to the second embodiment and the like, It is possible to suppress variations in the illuminance of ultraviolet rays irradiated on the object to be irradiated W, and to suppress uneven irradiation of ultraviolet rays to the object to be irradiated W.

[實施方式6] [Embodiment 6]

接下來,基於圖式來說明本發明的實施方式6的光源裝置5。圖11(a)是實施方式6的光源裝置的側面圖,圖11(b)是從下方展示實施方式6的光源裝置的概略結構的平面圖。圖11中,對於與前述的實施方式2等相同的部分,標注相同的標號並省略說明。 Next, a light source device 5 according to a sixth embodiment of the present invention will be described based on the drawings. 11 (a) is a side view of a light source device according to Embodiment 6, and FIG. 11 (b) is a plan view showing a schematic configuration of the light source device according to Embodiment 6 from below. In FIG. 11, the same portions as those in the aforementioned second embodiment and the like are denoted by the same reference numerals and descriptions thereof will be omitted.

實施方式6的光源裝置5如圖11(a)所示,以背面21b彼此隔開間隔地相向的方式設置有一對安裝基板21,在各安裝基板21的表面21a上設置有與X軸方向平行的多個固態發光元件列22。而且,框體50連結安裝基板21的X軸方向的兩端,散熱單元40使氣體在安裝基板21間沿著Y軸方向流動。而且,圖11(a)、圖11(b)中省略了溫度檢測單元60,但在實施方式6中,也可與實施方式2、實施方式2的變形例2同樣地配置溫度檢測單元60。進而,圖11(a)、圖11(b)中省略了電流調整單元30,但在本發明中,與各固態發光元件列22對應地設置有電流調整單元30。而且,圖11中省略了控制單元70。 As shown in FIG. 11 (a), a light source device 5 according to Embodiment 6 is provided with a pair of mounting substrates 21 so that the back surfaces 21b face each other at intervals, and a surface 21a of each mounting substrate 21 is provided parallel to the X-axis direction. Of a plurality of solid-state light-emitting element rows 22. The housing 50 connects the two ends of the mounting substrate 21 in the X-axis direction, and the heat dissipation unit 40 allows gas to flow between the mounting substrates 21 in the Y-axis direction. Although the temperature detection unit 60 is omitted in FIGS. 11 (a) and 11 (b), in the sixth embodiment, the temperature detection unit 60 may be arranged in the same manner as the second modification of the second embodiment and the second embodiment. Furthermore, although the current adjustment unit 30 is omitted in FIGS. 11 (a) and 11 (b), in the present invention, the current adjustment unit 30 is provided corresponding to each solid-state light-emitting element row 22. Moreover, the control unit 70 is omitted in FIG. 11.

實施方式6的光源裝置5與實施方式2等同樣地,能夠抑制對被照射物W照射的紫外線的照度偏差,能夠抑制針對被照射物W的紫外線的不均勻照射。 The light source device 5 according to the sixth embodiment can suppress variations in the illuminance of ultraviolet rays irradiated on the object to be irradiated in the same manner as in the second embodiment and the like, and can suppress uneven irradiation of ultraviolet rays on the object to be irradiated.

[實施方式7] [Embodiment 7]

接下來,基於圖式來說明本發明的實施方式7的光源裝置6。圖12是具備實施方式7的光源裝置的紫外線照射裝置的沿Y軸方向觀察的側面圖,圖13是表示實施方式7的光源裝置的概略結構的立體圖,圖14是實施方式7的光源裝置的側面圖。圖15是表示實施方式7的變形例1的光源裝置的概略結構的立體圖,圖16是表示實施方式7的變形例2的光源裝置的概略結構的立體圖。在圖12~圖16中,對於與前述的實施方式2等相同的部分,標注相同的標號並省略說明。 Next, a light source device 6 according to a seventh embodiment of the present invention will be described based on the drawings. FIG. 12 is a side view of the ultraviolet irradiation device including the light source device according to the seventh embodiment as viewed in the Y-axis direction. FIG. 13 is a perspective view showing a schematic configuration of the light source device according to the seventh embodiment. side view. 15 is a perspective view showing a schematic configuration of a light source device according to a first modification of the seventh embodiment, and FIG. 16 is a perspective view showing a schematic configuration of a light source device according to the second modification of the seventh embodiment. In FIG. 12 to FIG. 16, the same portions as those in the aforementioned second embodiment and the like are denoted by the same reference numerals, and descriptions thereof will be omitted.

實施方式7的光源裝置6如圖13及圖14所示,在剖面圓環狀的安裝基板21的外周面21a設置有多個固態發光元件列22。固態發光元件列22具有多個固態發光元件23,該多個固態發光元件23是在安裝基板21的表面(外周面)21a上配置在作為規定的線的圓周上且串聯連接。多個固態發光元件列22沿著與規定的線正交(交叉)的Y軸方向排列配置有多個。散熱單元40使作為流體的氣體沿著Y軸方向在安裝基板21的內側流動,以對固態發光元件23發出的熱進行散熱。而且,在安裝基板21的表面(外周面)21a的Y軸方向的兩端設置有溫度檢測單元60。進而,具備實施方式7的光源裝置6的紫外線照射裝置100具備鏡(mirror)101,該鏡101將光源裝置6的固態發光元件23放出的紫外線朝向載台10的載置面10a上的被照射物W反射。 As shown in FIGS. 13 and 14, in the light source device 6 according to the seventh embodiment, a plurality of solid-state light-emitting element rows 22 are provided on the outer peripheral surface 21 a of the mounting substrate 21 having a circular cross-section. The solid-state light-emitting element row 22 includes a plurality of solid-state light-emitting elements 23 which are arranged on a surface (outer peripheral surface) 21 a of the mounting substrate 21 on a circumference as a predetermined line and are connected in series. The plurality of solid-state light-emitting element rows 22 are arranged in a plurality along the Y-axis direction orthogonal (intersecting) to a predetermined line. The heat radiating unit 40 causes a gas as a fluid to flow along the Y-axis direction inside the mounting substrate 21 to dissipate heat generated by the solid-state light-emitting element 23. In addition, temperature detection units 60 are provided at both ends in the Y-axis direction of the surface (outer peripheral surface) 21 a of the mounting substrate 21. Furthermore, the ultraviolet irradiation device 100 including the light source device 6 according to the seventh embodiment includes a mirror 101 that irradiates ultraviolet rays emitted from the solid-state light-emitting element 23 of the light source device 6 toward the mounting surface 10 a of the stage 10. Object W reflection.

而且,實施方式7的變形例1的光源裝置6-1如圖15所示,與各固態發光元件列22對應地設置有溫度檢測單元60,實施 方式7的變形例2的光源裝置6-2如圖16所示,未設置溫度檢測單元60。 Further, as shown in FIG. 15, the light source device 6-1 according to the first modification of the seventh embodiment is provided with a temperature detection unit 60 corresponding to each solid-state light-emitting element row 22, and is implemented. As shown in FIG. 16, the light source device 6-2 according to the second modification of the seventh aspect is not provided with a temperature detection unit 60.

實施方式7、實施方式7的變形例1及變形例2的光源裝置6、6-1、6-2與實施方式2等同樣地,能夠抑制對被照射物W照射的紫外線的照度偏差,能夠抑制針對被照射物W的紫外線的不均勻照射。 The light source devices 6, 6-1, and 6-2 of the seventh embodiment, the first modification and the second modification of the seventh embodiment can suppress variations in illuminance of ultraviolet rays irradiated to the object W in the same manner as in the second embodiment and the like. Non-uniform irradiation of ultraviolet rays to the object W is suppressed.

前述的實施方式2~實施方式7等的光源裝置1、1-1、1-2、2、3、4、5、6、6-1、6-2展示了構成被用於液晶面板的固化或重疊、貼合等光反應工序的紫外線照射裝置100的例子。但是,本發明的光源裝置1、1-1、1-2、2、3、4、5、6、6-1、6-2例如也可構成半導體製造裝置或化學物質的光化學反應等多種多樣的裝置。 The light source devices 1, 1-1, 1-2, 2, 3, 4, 5, 6, 6-1, and 6-2 of the foregoing Embodiments 2 to 7 and the like have been shown to be used for curing the liquid crystal panel. An example of the ultraviolet irradiation device 100 in a photoreaction step such as overlapping or bonding. However, the light source device 1, 1-1, 1-2, 2, 3, 4, 5, 6, 6-1, and 6-2 of the present invention may also constitute a semiconductor manufacturing device or a photochemical reaction of a chemical substance. Diverse devices.

而且,前述的實施方式2~實施方式6中,將串聯連接的多個固態發光元件23排列在與X軸方向平行的直線上而構成固態發光元件列22,但在本發明中並不限定於此。例如也可將串聯連接的多個固態發光元件23排列在作為規定的線的圓上而構成固態發光元件列22。此時,理想的是多個固態發光元件列22被配置在同心圓上。 Furthermore, in the aforementioned second to sixth embodiments, a plurality of solid-state light-emitting elements 23 connected in series are arranged on a straight line parallel to the X-axis direction to form a solid-state light-emitting element row 22, but the present invention is not limited to this. this. For example, a plurality of solid-state light-emitting elements 23 connected in series may be arranged on a circle as a predetermined line to form a solid-state light-emitting element row 22. At this time, it is desirable that the plurality of solid-state light-emitting element rows 22 are arranged on a concentric circle.

以下說明的實施方式8~實施方式9的紫外線照射裝置301、301-1、301-2具有:光源310,具有放出紫外線U的發光元件312;以及吸收型偏振元件320,使從光源310放出的紫外線U中偏振軸PA與預定的基準方向平行的偏振光UA透射。 The ultraviolet irradiation apparatuses 301, 301-1, and 301-2 described below in Embodiments 8 to 9 include a light source 310 having a light-emitting element 312 that emits ultraviolet U, and an absorption-type polarizing element 320 that emits light from the light source 310. The polarized light UA whose polarization axis PA is parallel to a predetermined reference direction in the ultraviolet U is transmitted.

而且,在以下說明的實施方式8~實施方式9的紫外線照射裝置301、301-1、301-2中,在光源310、基體311與吸收型偏振元件320之間具有光學構件(透鏡314c、透鏡316c、透鏡330、線柵偏振元件340)。 Furthermore, in the ultraviolet irradiation devices 301, 301-1, and 301-2 of the eighth to ninth embodiments described below, there are optical members (lens 314c, lens) between the light source 310, the base 311, and the absorption-type polarizing element 320. 316c, lens 330, wire grid polarizing element 340).

[實施方式8] [Embodiment 8]

接下來,基於圖式來說明本發明的實施方式8的紫外線照射裝置301。圖17是表示實施方式8的紫外線照射裝置的概略結構的立體圖,圖18是從Y軸方向觀察實施方式8的紫外線照射裝置的圖,圖19是從Z軸方向觀察實施方式8的紫外線照射裝置的光源310的圖。 Next, the ultraviolet irradiation device 301 according to the eighth embodiment of the present invention will be described based on the drawings. FIG. 17 is a perspective view showing a schematic configuration of the ultraviolet irradiation device according to the eighth embodiment. FIG. 18 is a view of the ultraviolet irradiation device according to the eighth embodiment viewed from the Y-axis direction. FIG. 19 is a view showing the ultraviolet irradiation device according to the eighth embodiment from the Z-axis direction. Of light source 310.

圖17所示的實施方式8的紫外線照射裝置301是對被照射物W即作為取向處理對象物的工件的表面,照射與預定的基準方向平行的偏振軸PA(圖17中以箭頭表示,也稱作振動方向)的紫外線UA的裝置。實施方式8的紫外線照射裝置301例如被用於液晶面板的取向膜、視角補償膜(film)的取向膜或偏振膜等的製造。紫外線照射裝置301主要將作為所需波長的波長為365(nm)的紫外線UA照射至被照射物W即工件的表面。另外,本實施方式8中所說的「紫外線」例如是指240(nm)至450(nm)為止的波段的光。 The ultraviolet irradiation device 301 according to the eighth embodiment shown in FIG. 17 irradiates a polarization axis PA parallel to a predetermined reference direction on the surface of the object to be irradiated W, that is, the workpiece as an alignment processing object (indicated by arrows in FIG. (Referred to as vibration direction). The ultraviolet irradiation device 301 according to the eighth embodiment is used, for example, for manufacturing an alignment film of a liquid crystal panel, an alignment film of a viewing angle compensation film, or a polarizing film. The ultraviolet irradiation device 301 mainly irradiates ultraviolet light UA having a wavelength of 365 (nm), which is a desired wavelength, to the surface of the workpiece W, which is the object to be irradiated. The "ultraviolet rays" referred to in the eighth embodiment refer to light in a wavelength range from 240 (nm) to 450 (nm), for example.

另外,對被照射物W即工件的表面照射的紫外線UA的偏振軸PA是根據被照射物W即工件的結構、用途或所要求的規格而適當設定。以下,將被照射物W即工件的寬度方向稱作X軸 方向,將與X軸方向正交且被照射物W即工件的長邊方向稱作Y軸方向,將與Y軸方向及X軸方向正交的方向稱作Z軸方向。另外,對於與Z軸平行的方向,將表示Z軸方向的箭頭的前端所朝的方向稱作上方,將與表示Z軸方向的箭頭的前端所朝的方向相對的方向稱作下方。 The polarization axis PA of the ultraviolet light UA that is irradiated to the surface of the workpiece W, which is the object to be irradiated, is appropriately set according to the structure, use, or required specification of the workpiece, which is the object to be irradiated W. Hereinafter, the width direction of the workpiece W, that is, the workpiece, is referred to as the X-axis. The direction is called the Y-axis direction, and the direction orthogonal to the X-axis direction and the workpiece W, that is, the long side direction of the workpiece, is called the Z-axis direction. In the direction parallel to the Z axis, the direction facing the tip of the arrow indicating the Z axis direction is referred to as upward, and the direction opposite to the direction facing the tip of the arrow indicating the Z axis direction is referred to as the downward direction.

紫外線照射裝置301如圖17所示,具有:光源310,具有發光元件312,該發光元件312放出一樣地朝所有方向振動且波長為365(nm)左右的紫外線U;以及吸收型偏振元件320。 As shown in FIG. 17, the ultraviolet irradiation device 301 includes a light source 310 having a light-emitting element 312 that emits ultraviolet U that vibrates in all directions and has a wavelength of about 365 (nm), and an absorption-type polarizing element 320.

光源310使用發光元件312。光源310所放出的紫外線U包含波長為365(nm)左右的紫外線,是具有各種偏振軸成分的所謂的非偏振的光。本實施方式8中,光源310設置有一個,且被配置在吸收型偏振元件320及被照射物W即工件的上方。 The light source 310 uses a light emitting element 312. The ultraviolet rays U emitted from the light source 310 include ultraviolet rays having a wavelength of about 365 (nm), and are so-called unpolarized lights having various polarization axis components. In the eighth embodiment, one light source 310 is provided, and the light source 310 is disposed above the workpiece, that is, the absorption-type polarizing element 320 and the object W to be irradiated.

吸收型偏振元件320照射從光源310放出的紫外線U。吸收型偏振元件320使紫外線U中偏振軸PA與基準方向平行的偏振光(紫外線UA)朝向被照射物W即工件透射。即,吸收型偏振元件320從具有偏振軸PA的紫外線U中導出偏振軸PA僅朝基準方向振動的紫外線UA。另外,一般將偏振軸PA僅朝基準方向振動的紫外線UA稱作直線偏振光。另外,紫外線UA的偏振軸PA是指該紫外線UA的電場及磁場的振動方向。 The absorption-type polarizing element 320 irradiates ultraviolet rays U emitted from the light source 310. The absorption-type polarizing element 320 transmits polarized light (ultraviolet light UA) whose polarization axis PA is parallel to the reference direction among the ultraviolet rays U toward the object to be irradiated W, that is, the workpiece. That is, the absorption-type polarizing element 320 derives, from the ultraviolet rays U having the polarization axis PA, ultraviolet rays UA whose polarization axis PA vibrates only in the reference direction. In addition, ultraviolet rays UA whose polarization axis PA vibrates only in the reference direction are generally referred to as linearly polarized light. The polarization axis PA of the ultraviolet UA refers to a vibration direction of an electric field and a magnetic field of the ultraviolet UA.

本實施方式8中,吸收型偏振元件320被設置在光源310的下方且被照射物W即工件表面的上方。吸收型偏振元件320是形成有玻璃板中所含的朝固定方向排齊的金屬奈米粒子的元件, 且是吸收從光源310放出的紫外線U中的偏振軸與基準方向交叉的紫外線,並使偏振軸PA與基準方向平行的紫外線UA透射的偏振元件。作為吸收型偏振元件320,例如可使用科迪(CODIXX)公司製造的卡拉珀(colorpol)(注冊商標)UV375BC5。 In the eighth embodiment, the absorption-type polarizing element 320 is provided below the light source 310 and above the surface of the workpiece W that is the object to be irradiated. The absorption-type polarizing element 320 is an element in which metallic nano particles included in a glass plate are aligned in a fixed direction. The polarizing element absorbs ultraviolet rays whose polarization axis in the ultraviolet rays U emitted from the light source 310 intersects the reference direction, and transmits ultraviolet rays UA whose polarization axis PA is parallel to the reference direction. As the absorption-type polarizing element 320, for example, Colorpol (registered trademark) UV375BC5 manufactured by CODIXX can be used.

接下來,使用圖18及圖19來詳細說明光源310。 Next, the light source 310 will be described in detail using FIGS. 18 and 19.

在實施方式8的紫外線照射裝置301中,光源310是在基體311上設置有多個發光元件312而構成。基體311保持多個發光元件312。而且,基體311將從多個發光元件312放出的熱傳遞至紫外線照射裝置301的外部,由此來抑制多個發光元件312的溫度上升。另外,基體311也可包含鋁等金屬或陶瓷基板等散熱性佳的材料。而且,在基體311的內部,也可具有使未圖示的散熱介質流動的散熱介質流路,所述散熱介質用於使從多個發光元件312放出的熱儘快傳遞。而且,對於散熱介質,也可具有未圖示的供給散熱介質的散熱介質供給口與放出散熱介質的散熱介質放出口。而且,對於散熱介質,也可通過未圖示的迴圈機構來使散熱介質迴圈。 In the ultraviolet irradiation device 301 of Embodiment 8, the light source 310 is configured by providing a plurality of light-emitting elements 312 on a base 311. The base 311 holds a plurality of light emitting elements 312. In addition, the base 311 transmits heat emitted from the plurality of light emitting elements 312 to the outside of the ultraviolet irradiation device 301, thereby suppressing a temperature rise of the plurality of light emitting elements 312. In addition, the base 311 may include a metal such as aluminum or a material having good heat dissipation properties such as a ceramic substrate. In addition, the base body 311 may include a heat-radiating medium flow path through which a heat-radiating medium (not shown) flows, and the heat-radiating medium is used to transmit heat emitted from the plurality of light-emitting elements 312 as soon as possible. In addition, the heat radiation medium may include a heat radiation medium supply port for supplying the heat radiation medium and a heat radiation medium discharge port for releasing the heat radiation medium. In addition, the heat dissipation medium may be looped by a loop mechanism (not shown).

發光元件312被設置在基體311上,且放出紫外線U。發光元件312至少放出紫外線U,且包含LED(Light Emitting Diode)或LD(Laser Diode)等半導體。發光元件312具有:第1發光元件314,放出第1峰值波長的紫外線;以及第2發光元件316,放出與第1峰值波長不同的第2峰值波長的紫外線。第1發光元件314是圍繞放出第1峰值波長的紫外線的發光晶片314a而 形成,且具備具有開口部分的反射體314b。發光晶片314a的周圍及配置有發光晶片314a的反射體314b的開口部分由未圖示的玻璃罩(glass cover)予以密閉。第2發光元件316是圍繞放出第2峰值波長的紫外線的發光晶片316a而形成,且具備具有開口部分的反射體316b。發光晶片316a的周圍及配置有發光晶片316a的反射體316b的開口部分由未圖示的玻璃罩予以密閉。發光元件312使從第1發光元件314放出的第1峰值波長的紫外線與從第2發光元件316放出的第2峰值波長的紫外線混合,以放出紫外線U。 The light emitting element 312 is provided on the base 311 and emits ultraviolet rays U. The light emitting element 312 emits at least ultraviolet U and includes a semiconductor such as an LED (Light Emitting Diode) or an LD (Laser Diode). The light emitting element 312 includes a first light emitting element 314 that emits ultraviolet rays having a first peak wavelength, and a second light emitting element 316 that emits ultraviolet rays having a second peak wavelength different from the first peak wavelength. The first light-emitting element 314 surrounds the light-emitting wafer 314a that emits ultraviolet light having a first peak wavelength. It is formed and includes a reflector 314b having an opening portion. The periphery of the light-emitting wafer 314a and the opening portion of the reflector 314b in which the light-emitting wafer 314a is arranged are sealed by a glass cover (not shown). The second light-emitting element 316 is formed around a light-emitting wafer 316a that emits ultraviolet rays of a second peak wavelength, and includes a reflector 316b having an opening portion. The periphery of the light-emitting wafer 316a and the opening portion of the reflector 316b in which the light-emitting wafer 316a is arranged are sealed by a glass cover (not shown). The light emitting element 312 mixes ultraviolet rays of a first peak wavelength emitted from the first light emitting element 314 and ultraviolet rays of a second peak wavelength emitted from the second light emitting element 316 to emit ultraviolet rays U.

接下來,對實施方式8的紫外線照射裝置1的作用進行說明。前述結構的實施方式8的紫外線照射裝置301是將被照射物W即工件定位於吸收型偏振元件320的下方,並從光源310放出紫外線U。於是,光源310放出的紫外線U被直接朝向吸收型偏振元件320放出。而且,紫外線照射裝置301中,吸收型偏振元件320使紫外線U中偏振軸PA與基準方向平行的紫外線UA朝向被照射物W即工件表面的光照射區域透射,以對被照射物W即工件的表面實施取向處理。 Next, an operation of the ultraviolet irradiation device 1 according to the eighth embodiment will be described. The ultraviolet irradiation device 301 according to the eighth embodiment has a structure in which the workpiece W to be irradiated, that is, the workpiece is positioned below the absorption-type polarizing element 320, and emits ultraviolet rays U from the light source 310. Then, the ultraviolet light U emitted from the light source 310 is directly emitted toward the absorption-type polarizing element 320. Further, in the ultraviolet irradiation device 301, the absorption-type polarizing element 320 transmits ultraviolet rays UA having a polarization axis PA parallel to the reference direction in the ultraviolet rays U toward the light irradiation area on the surface of the object W to be irradiated, so that the object W, which is the The surface is subjected to an orientation treatment.

前述結構的實施方式8的紫外線照射裝置301中,在使用線柵(wire grid)型偏振元件的情況下,具有形成有線柵的面與未形成線柵的面即所謂的背表,因線柵偏振元件具有背表,消光比發生變化。但是,吸收型偏振元件320中,形成在吸收型偏振元件320內部的金屬奈米粒子吸收朝基準方向以外的方向振動的光,因此並無如線柵偏振元件般的所謂背表,因此容易操作。 In the ultraviolet irradiation device 301 according to the eighth embodiment described above, when a wire grid type polarizing element is used, a surface having a wire grid formed and a surface without a wire grid formed are so-called backsheets. The polarizer has a back surface and the extinction ratio changes. However, in the absorptive polarizing element 320, the metal nano-particles formed inside the absorptive polarizing element 320 absorb light oscillating in a direction other than the reference direction, so there is no so-called back surface like a wire grid polarizing element, so it is easy to handle .

而且,在紫外線照射裝置301中,光源310僅放出第1峰值波長的紫外線及第2峰值波長的紫外線,而不放出第1峰值波長的紫外線及第2峰值波長的紫外線以外的光。即,限制對吸收型偏振元件320照射紫外線U以外的光。因此,紫外線照射裝置1可減少吸收型偏振元件320所吸收的光,具體而言,可減少形成在吸收型偏振元件320內部的金屬奈米粒子所吸收的光的量。只要能夠減少金屬奈米粒子所吸收的光的量,便能夠抑制吸收型偏振元件320的溫度上升,吸收型偏振元件320達到高溫的可能性下降,因此例如可抑制吸收型偏振元件320發生破裂的問題。因此,紫外線照射裝置301即便使用吸收型偏振元件320,也能夠抑制吸收型偏振元件320的破裂等問題。 In the ultraviolet irradiation device 301, the light source 310 emits only ultraviolet rays of the first peak wavelength and ultraviolet rays of the second peak wavelength, and does not emit light other than ultraviolet rays of the first peak wavelength and ultraviolet rays of the second peak wavelength. That is, irradiation of light other than the ultraviolet U to the absorption-type polarizing element 320 is restricted. Therefore, the ultraviolet irradiation device 1 can reduce the light absorbed by the absorption-type polarizing element 320, and specifically, can reduce the amount of light absorbed by the metal nano-particles formed inside the absorption-type polarization element 320. As long as the amount of light absorbed by the metal nano-particles can be reduced, the temperature of the absorption-type polarizing element 320 can be suppressed from increasing, and the possibility of the absorption-type polarizing element 320 reaching a high temperature can be reduced. problem. Therefore, even if the ultraviolet irradiation device 301 uses the absorption-type polarizing element 320, problems such as cracking of the absorption-type polarizing element 320 can be suppressed.

而且,在紫外線照射裝置301中,對於吸收型偏振元件320照射紫外線U,而限制照射紫外線U以外的波長的光,因此比起對吸收型偏振元件320照射紫外線U以外的光的情況,能夠抑制吸收型偏振元件320的消光比下降的現象。另外,消光比ER是指表示偏振光的品質的數值,使用P偏振光強度Ip與S偏振光強度Is,以ER=Ip/Is來表示。 Further, in the ultraviolet irradiation device 301, the absorption-type polarizing element 320 is irradiated with ultraviolet U, and light of a wavelength other than the ultraviolet U is restricted. Therefore, it is possible to suppress the absorption of the light other than the ultraviolet-U into the absorption-type polarizing element 320. A phenomenon in which the extinction ratio of the absorption-type polarizing element 320 decreases. The extinction ratio ER is a numerical value indicating the quality of polarized light, and is expressed by using P-polarized light intensity Ip and S-polarized light intensity Is and ER = Ip / Is.

紫外線照射裝置301可抑制將第1峰值波長的紫外線及第2峰值波長的紫外線以外的光照射至吸收型偏振元件320的現象。即,紫外線照射裝置301抑制將長波長的紫外線、可見光線、紅外線照射至吸收型偏振元件320的現象,因此可抑制將長波長的紫外線、可見光線、紅外線照射至吸收型偏振元件320。因此, 紫外線照射裝置1可抑制吸收型偏振元件320的吸收型偏振元件的劣化。 The ultraviolet irradiation device 301 can suppress a phenomenon in which light other than ultraviolet rays of the first peak wavelength and ultraviolet rays of the second peak wavelength is irradiated to the absorption-type polarizing element 320. That is, the ultraviolet irradiation device 301 suppresses the phenomenon that long-wavelength ultraviolet rays, visible rays, and infrared rays are irradiated to the absorption-type polarizing element 320. Therefore, it is possible to suppress the long-wavelength ultraviolet rays, visible rays, and infrared rays from being irradiated to the absorption-type polarization element 320. therefore, The ultraviolet irradiation device 1 can suppress deterioration of the absorption-type polarizing element of the absorption-type polarizing element 320.

而且,紫外線照射裝置301中,作為光源310,使用發光元件312,該發光元件312具有放出第1峰值波長的紫外線的第1發光元件314及第2發光元件316,因此既能抑制吸收型偏振元件320的壽命與消光比的下降,又能將足夠光量的紫外線U照射至被照射物W即工件,從而能夠抑制對於物件物照射光的所需時間。 Further, in the ultraviolet irradiation device 301, as the light source 310, a light-emitting element 312 is used. The light-emitting element 312 includes a first light-emitting element 314 and a second light-emitting element 316 that emit ultraviolet rays of a first peak wavelength. Therefore, the absorption-type polarizing element can be suppressed. The decrease in the lifespan and extinction ratio of 320, and the sufficient amount of ultraviolet light U can be irradiated to the irradiated object W, that is, the workpiece, so that the time required to irradiate light to the object can be suppressed.

而且,紫外線照射裝置301使用放出第1峰值波長的紫外線的第1發光元件及放出第2峰值波長的紫外線的第2發光元件,由此,比起僅使用放出單一峰值波長的紫外線的發光元件的情況,給予被照射物的能量進一步提高。 Further, the ultraviolet irradiation device 301 uses a first light-emitting element that emits ultraviolet rays having a first peak wavelength and a second light-emitting element that emits ultraviolet rays having a second peak wavelength. Therefore, compared with a light-emitting element that emits only ultraviolet rays having a single peak wavelength, In some cases, the energy given to the irradiated object is further increased.

而且,發光元件312放出的光的主波長為240nm~450nm,由此能夠更確實地進行針對被照射物的紫外線照射,能夠抑制被照射物的光化學反應的不均勻。 In addition, the main wavelength of the light emitted from the light-emitting element 312 is 240 nm to 450 nm, so that the ultraviolet irradiation on the object to be irradiated can be performed more reliably, and the unevenness of the photochemical reaction of the object to be irradiated can be suppressed.

另外,發光元件312並不限定於所述結構。例如,也可將構成第1發光元件314的第1發光晶片314a與構成第2發光元件316的第2發光晶片316a收容在同一反射體314a內,以構成為發光元件314。 The light-emitting element 312 is not limited to the above-mentioned structure. For example, the first light-emitting wafer 314 a constituting the first light-emitting element 314 and the second light-emitting wafer 316 a constituting the second light-emitting element 316 may be housed in the same reflector 314 a to constitute the light-emitting element 314.

另外,吸收型偏振元件320並不限定於所述結構。例如也可將多個吸收型偏振元件320重合而構成一體的吸收型偏振元件320。 The absorption-type polarizing element 320 is not limited to the above structure. For example, a plurality of absorption-type polarizing elements 320 may be superposed to form an integrated absorption-type polarizing element 320.

(實施方式9) (Embodiment 9)

圖20是表示實施方式9的紫外線照射裝置的變形例的概略結構的側面圖。 20 is a side view showing a schematic configuration of a modified example of the ultraviolet irradiation device according to Embodiment 9. FIG.

本實施方式9中,展示了在光源310與吸收型偏振元件320之間具有作為光學構件的透鏡314c、透鏡316c、透鏡330的紫外線照射裝置301-1。 In the ninth embodiment, an ultraviolet irradiation device 301-1 having a lens 314c, a lens 316c, and a lens 330 as optical members between the light source 310 and the absorption-type polarizing element 320 is shown.

透鏡314c是與第1發光元件314的反射體314b接觸地設置,調整從第1發光元件314放出的光的方向。而且,透鏡316c是與第2發光元件316的反射體316b接觸地設置,調整從第2發光元件316放出的光的方向。透鏡314c及透鏡316c例如包含使從第1發光晶片314a及第2發光晶片316a放出的紫外線透射的石英玻璃等材料。 The lens 314c is provided in contact with the reflector 314b of the first light emitting element 314, and adjusts the direction of light emitted from the first light emitting element 314. The lens 316c is provided in contact with the reflector 316b of the second light-emitting element 316, and adjusts the direction of light emitted from the second light-emitting element 316. The lens 314c and the lens 316c include, for example, a material such as quartz glass that transmits ultraviolet rays emitted from the first light-emitting wafer 314a and the second light-emitting wafer 316a.

透鏡330作為調整從第1發光元件314及第2發光元件316放出的光的所謂准直透鏡(collimate lens)而發揮功能。透鏡330被設置在吸收型偏振元件320附近,調整從光源310放出的光的方向。透鏡330是與透鏡314c及透鏡316c同樣地,例如包含使從光源310放出的紫外線U透射的石英玻璃等材料。 The lens 330 functions as a so-called collimate lens that adjusts light emitted from the first light-emitting element 314 and the second light-emitting element 316. The lens 330 is provided near the absorption-type polarizing element 320 and adjusts the direction of light emitted from the light source 310. The lens 330 is made of a material such as quartz glass that transmits ultraviolet rays U emitted from the light source 310 in the same manner as the lenses 314c and 316c.

採用此種結構,也能夠與實施方式8同樣地抑制吸收型偏振元件的劣化。 With this configuration, it is possible to suppress deterioration of the absorption-type polarizing element in the same manner as in the eighth embodiment.

而且,在光源310與吸收型偏振元件320之間具有光學構件,由此能夠調整紫外線U的方向,直至到達吸收型偏振元件320為止,因此與未設置光學構件時相比,能夠抑制相對於被照射物的偏振軸與消光比的劣化。 Furthermore, since an optical member is provided between the light source 310 and the absorptive polarizing element 320, the direction of the ultraviolet rays U can be adjusted until it reaches the absorptive polarizing element 320. Therefore, it is possible to suppress the Deterioration of the polarization axis and extinction ratio of the irradiated object.

圖21是表示實施方式9的紫外線照射裝置的另一變形例的概略結構的側面圖。 FIG. 21 is a side view showing a schematic configuration of another modification of the ultraviolet irradiation apparatus according to Embodiment 9. FIG.

本變形例中,展示了在光源310與吸收型偏振元件320之間設置有線柵偏振元件340的紫外線照射裝置301-2。採用此種結構,也能夠與實施方式9同樣地抑制消光比的劣化。 In this modification, an ultraviolet irradiation device 301-2 in which a wire grid polarizing element 340 is provided between the light source 310 and the absorption-type polarizing element 320 is shown. With this configuration, it is possible to suppress deterioration of the extinction ratio in the same manner as in the ninth embodiment.

進而,通過使用線柵偏振元件340,能夠減少作為非偏振光的紫外線U的光量,因此能夠減少照射至吸收型偏振元件320的非所需的紫外線U的光量,結果能夠進一步抑制吸收型偏振元件的劣化。 Furthermore, by using the wire-grid polarizing element 340, the amount of ultraviolet U that is unpolarized light can be reduced. Therefore, the amount of undesired ultraviolet U that is irradiated to the absorption-type polarizing element 320 can be reduced. As a result, the absorption-type polarizing element can be further suppressed Degradation.

對本發明的若干實施方式及變形例進行了說明,但這些實施方式及變形例僅為例示,並不意圖限定發明的範圍。這些實施方式能以其他的各種方式來實施,在不脫離發明主旨的範圍內,可進行各種省略、置換、變更。這些實施方式及其變形包含在發明的範圍或主旨內,同樣包含在申請專利範圍所記載的發明及其均等的範圍內。 Although some embodiments and modifications of the present invention have been described, these embodiments and modifications are merely examples and are not intended to limit the scope of the invention. These embodiments can be implemented in various other ways, and various omissions, substitutions, and changes can be made without departing from the spirit of the invention. These embodiments and modifications thereof are included in the scope or gist of the invention, and are also included in the invention described in the scope of patent application and its equivalent scope.

Claims (9)

一種光源裝置,其特徵在於包括:發光元件,放出在紫外線區域具有主波長的光;陶瓷基板,在一面側配設有所述發光元件,將陶瓷作為基材,且在配設所述發光元件的一側的面上,形成有由導體構成的導電圖案、以及至少覆蓋所述導電圖案且抑制所述光到達所述導電圖案的外塗層;散熱構件,配設在所述陶瓷基板中的配設所述發光元件的一側的面的相反側,且由金屬材料構成;兩個以上的電流調整單元,能夠對流經的所述發光元件的電流值進行變更;控制單元,控制所述電流調整單元;以及所述控制單元使所述電流調整單元變更流經所述發光元件的電流值,以使所述發光元件放出的紫外線的相對照度變得相等。A light source device comprising: a light-emitting element emitting light having a dominant wavelength in an ultraviolet region; a ceramic substrate, the light-emitting element is arranged on one side, ceramic is used as a base material, and the light-emitting element is arranged A conductive pattern composed of a conductor and an overcoat layer that covers at least the conductive pattern and suppresses the light from reaching the conductive pattern are formed on one side of the surface; a heat dissipation member disposed in the ceramic substrate; The side opposite to the one-side surface of the light-emitting element is made of a metal material; two or more current adjusting units can change the value of the current flowing through the light-emitting element; a control unit controls the current An adjusting unit; and the control unit causing the current adjusting unit to change a current value flowing through the light emitting element so that the relative degrees of ultraviolet rays emitted by the light emitting element become equal. 如申請專利範圍第1項所述的光源裝置,其中所述發光元件配設有多個所照射的光的主波長不同的發光元件。The light source device according to item 1 of the scope of patent application, wherein the light emitting element is provided with a plurality of light emitting elements having different dominant wavelengths of the irradiated light. 如申請專利範圍第1項或第2項所述的光源裝置,其中所述陶瓷基板對於基材使用氧化鋁或氮化鋁。The light source device according to claim 1 or claim 2, wherein the ceramic substrate uses alumina or aluminum nitride for a substrate. 如申請專利範圍第1項或第2項所述的光源裝置,其中所述外塗層反射紫外線。The light source device according to claim 1 or claim 2, wherein the outer coating layer reflects ultraviolet rays. 如申請專利範圍第1項或第2項所述的光源裝置,其中所述外塗層吸收紫外線。The light source device according to claim 1 or claim 2, wherein the outer coating layer absorbs ultraviolet rays. 如申請專利範圍第1項所述的光源裝置,其包括:發光部,將多個固態發光元件列沿著與規定的線交叉的方向排列配置,所述多個固態發光元件列具有多個所述發光元件,多個所述發光元件串聯連接且配置在所述規定的線上並放出紫外線;以及散熱單元,使流體沿與所述規定的線交叉的方向流動,以對所述發光部的在所述交叉方向上相鄰的兩個以上的所述固態發光元件列的所述發光元件發出的熱進行散熱。The light source device according to item 1 of the scope of patent application, includes a light-emitting section in which a plurality of solid-state light-emitting element rows are arranged in a direction crossing a predetermined line, and the plurality of solid-state light-emitting element rows has a plurality of The light-emitting element, wherein a plurality of the light-emitting elements are connected in series and are disposed on the predetermined line and emit ultraviolet rays; and a heat dissipation unit that causes a fluid to flow in a direction crossing the predetermined line to Heat emitted from the light-emitting elements of the two or more adjacent solid-state light-emitting element rows in the cross direction is dissipated. 如申請專利範圍第6項所述的光源裝置,其中沿著所述流體的流動方向而隔開間隔地設置有多個溫度檢測單元。The light source device according to item 6 of the scope of patent application, wherein a plurality of temperature detection units are provided at intervals along the flow direction of the fluid. 一種紫外線照射裝置,其特徵在於包括:如申請專利範圍第1項所述的光源裝置;以及吸收型偏振元件,使從所述光源裝置放出的紫外線中偏振軸與預定的基準方向平行的偏振光透射。An ultraviolet irradiation device, comprising: the light source device according to item 1 of the scope of patent application; and an absorption-type polarizing element that polarizes the polarization axis of ultraviolet rays emitted from the light source device in parallel with a predetermined reference direction transmission. 如申請專利範圍第8項所述的紫外線照射裝置,其中在所述光源裝置與所述吸收型偏振元件之間具有光學構件。The ultraviolet irradiation device according to item 8 of the scope of patent application, wherein an optical member is provided between the light source device and the absorption-type polarizing element.
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