TWI627128B - Surface enhanced Raman scattering element - Google Patents
Surface enhanced Raman scattering element Download PDFInfo
- Publication number
- TWI627128B TWI627128B TW102128772A TW102128772A TWI627128B TW I627128 B TWI627128 B TW I627128B TW 102128772 A TW102128772 A TW 102128772A TW 102128772 A TW102128772 A TW 102128772A TW I627128 B TWI627128 B TW I627128B
- Authority
- TW
- Taiwan
- Prior art keywords
- raman scattering
- enhanced raman
- scattering element
- substrate
- gap
- Prior art date
Links
- 238000004416 surface enhanced Raman spectroscopy Methods 0.000 title claims abstract description 95
- 239000000758 substrate Substances 0.000 claims abstract description 75
- 239000004020 conductor Substances 0.000 claims abstract description 34
- 230000003287 optical effect Effects 0.000 claims abstract description 23
- 230000003247 decreasing effect Effects 0.000 claims description 12
- 238000001069 Raman spectroscopy Methods 0.000 abstract description 9
- 230000002708 enhancing effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 53
- 239000011347 resin Substances 0.000 description 11
- 229920005989 resin Polymers 0.000 description 11
- 238000000034 method Methods 0.000 description 10
- 238000007740 vapor deposition Methods 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 230000005284 excitation Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000000465 moulding Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000010287 polarization Effects 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- RJGDLRCDCYRQOQ-UHFFFAOYSA-N anthrone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3CC2=C1 RJGDLRCDCYRQOQ-UHFFFAOYSA-N 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 238000004611 spectroscopical analysis Methods 0.000 description 3
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 239000006059 cover glass Substances 0.000 description 2
- 238000004049 embossing Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- DDNRNCSGIYDEMC-UHFFFAOYSA-N ethanol;formic acid Chemical compound CCO.OC=O DDNRNCSGIYDEMC-UHFFFAOYSA-N 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000000479 surface-enhanced Raman spectrum Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- NBOMNTLFRHMDEZ-UHFFFAOYSA-N thiosalicylic acid Chemical compound OC(=O)C1=CC=CC=C1S NBOMNTLFRHMDEZ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/65—Raman scattering
- G01N21/658—Raman scattering enhancement Raman, e.g. surface plasmons
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/068—Optics, miscellaneous
Landscapes
- Health & Medical Sciences (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012178767A JP5908370B2 (ja) | 2012-08-10 | 2012-08-10 | 表面増強ラマン散乱ユニット |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201410591A TW201410591A (zh) | 2014-03-16 |
| TWI627128B true TWI627128B (zh) | 2018-06-21 |
Family
ID=50068246
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102128772A TWI627128B (zh) | 2012-08-10 | 2013-08-09 | Surface enhanced Raman scattering element |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9976961B2 (enExample) |
| JP (1) | JP5908370B2 (enExample) |
| CN (1) | CN104508467B (enExample) |
| DE (1) | DE112013004006B4 (enExample) |
| TW (1) | TWI627128B (enExample) |
| WO (1) | WO2014025030A1 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014025035A1 (ja) | 2012-08-10 | 2014-02-13 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱素子 |
| JP6023509B2 (ja) * | 2012-08-10 | 2016-11-09 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱ユニット |
| WO2014025037A1 (ja) | 2012-08-10 | 2014-02-13 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱素子及びその製造方法 |
| CN104541158B (zh) | 2012-08-10 | 2017-05-24 | 浜松光子学株式会社 | 表面增强拉曼散射元件、以及制造表面增强拉曼散射元件的方法 |
| JP6294797B2 (ja) * | 2014-09-10 | 2018-03-14 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱ユニット |
| US10527494B2 (en) * | 2014-09-26 | 2020-01-07 | Korea Intitute of Machinery & Materials | Substrate on which multiple nanogaps are formed, and manufacturing method therefor |
| JP6564203B2 (ja) * | 2015-02-26 | 2019-08-21 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱素子及びその製造方法 |
| CN109470682B (zh) * | 2017-09-08 | 2024-12-10 | 清华大学 | 用于分子检测的分子载体 |
| WO2019221298A1 (ja) * | 2018-05-18 | 2019-11-21 | Ｓｃｉｖａｘ株式会社 | 電磁波増強素子およびその製造方法並びに電磁波増強素子を用いた検出方法およびアミノ酸配列決定方法 |
| TWI856328B (zh) * | 2022-06-10 | 2024-09-21 | 國立臺北科技大學 | 一具有頂角薄膜光柵結構的基板 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110166045A1 (en) * | 2009-12-01 | 2011-07-07 | Anuj Dhawan | Wafer scale plasmonics-active metallic nanostructures and methods of fabricating same |
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| US7267948B2 (en) | 1997-11-26 | 2007-09-11 | Ut-Battelle, Llc | SERS diagnostic platforms, methods and systems microarrays, biosensors and biochips |
| EP0984269A1 (de) | 1998-08-04 | 2000-03-08 | Alusuisse Technology & Management AG (Alusuisse Technology & Management SA) (Alusuisse Technology & Management Ltd.) | Trägersubstrat für Raman-spektrometrische Analysen |
| US20040023046A1 (en) | 1998-08-04 | 2004-02-05 | Falko Schlottig | Carrier substrate for Raman spectrometric analysis |
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| JP6023509B2 (ja) * | 2012-08-10 | 2016-11-09 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱ユニット |
| JP6055234B2 (ja) * | 2012-08-10 | 2016-12-27 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱ユニット |
| WO2014025037A1 (ja) * | 2012-08-10 | 2014-02-13 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱素子及びその製造方法 |
| CN104541158B (zh) * | 2012-08-10 | 2017-05-24 | 浜松光子学株式会社 | 表面增强拉曼散射元件、以及制造表面增强拉曼散射元件的方法 |
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| CN109342395B (zh) | 2012-08-10 | 2021-07-20 | 浜松光子学株式会社 | 表面增强拉曼散射单元 |
| JP5945192B2 (ja) * | 2012-08-10 | 2016-07-05 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱ユニット |
| WO2014025035A1 (ja) * | 2012-08-10 | 2014-02-13 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱素子 |
-
2012
- 2012-08-10 JP JP2012178767A patent/JP5908370B2/ja not_active Expired - Fee Related
-
2013
- 2013-08-09 DE DE112013004006.9T patent/DE112013004006B4/de not_active Expired - Fee Related
- 2013-08-09 US US14/420,404 patent/US9976961B2/en active Active
- 2013-08-09 WO PCT/JP2013/071699 patent/WO2014025030A1/ja not_active Ceased
- 2013-08-09 CN CN201380041032.XA patent/CN104508467B/zh not_active Expired - Fee Related
- 2013-08-09 TW TW102128772A patent/TWI627128B/zh not_active IP Right Cessation
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110166045A1 (en) * | 2009-12-01 | 2011-07-07 | Anuj Dhawan | Wafer scale plasmonics-active metallic nanostructures and methods of fabricating same |
Also Published As
| Publication number | Publication date |
|---|---|
| US20150211999A1 (en) | 2015-07-30 |
| CN104508467A (zh) | 2015-04-08 |
| JP5908370B2 (ja) | 2016-04-26 |
| WO2014025030A1 (ja) | 2014-02-13 |
| CN104508467B (zh) | 2017-10-20 |
| JP2014037971A (ja) | 2014-02-27 |
| DE112013004006T5 (de) | 2015-04-23 |
| US9976961B2 (en) | 2018-05-22 |
| TW201410591A (zh) | 2014-03-16 |
| DE112013004006B4 (de) | 2021-11-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |