TWI626337B - Hard gold plating solution - Google Patents

Hard gold plating solution Download PDF

Info

Publication number
TWI626337B
TWI626337B TW105143297A TW105143297A TWI626337B TW I626337 B TWI626337 B TW I626337B TW 105143297 A TW105143297 A TW 105143297A TW 105143297 A TW105143297 A TW 105143297A TW I626337 B TWI626337 B TW I626337B
Authority
TW
Taiwan
Prior art keywords
gold
gold plating
plating solution
solution
hard
Prior art date
Application number
TW105143297A
Other languages
English (en)
Chinese (zh)
Other versions
TW201736644A (zh
Inventor
Yoshinori Murakami
Hajime Terashima
Hideto Watanabe
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of TW201736644A publication Critical patent/TW201736644A/zh
Application granted granted Critical
Publication of TWI626337B publication Critical patent/TWI626337B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/62Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
TW105143297A 2016-04-07 2016-12-27 Hard gold plating solution TWI626337B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016077335A JP2017186627A (ja) 2016-04-07 2016-04-07 硬質金めっき溶液

Publications (2)

Publication Number Publication Date
TW201736644A TW201736644A (zh) 2017-10-16
TWI626337B true TWI626337B (zh) 2018-06-11

Family

ID=60000966

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105143297A TWI626337B (zh) 2016-04-07 2016-12-27 Hard gold plating solution

Country Status (3)

Country Link
JP (1) JP2017186627A (ja)
TW (1) TWI626337B (ja)
WO (1) WO2017175428A1 (ja)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102131962A (zh) * 2008-08-25 2011-07-20 日本电镀工程股份有限公司 硬质金系镀液

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4396471A (en) * 1981-12-14 1983-08-02 American Chemical & Refining Company, Inc. Gold plating bath and method using maleic anhydride polymer chelate
US4795534A (en) * 1986-09-25 1989-01-03 Vanguard Research Associates, Inc. Electrolyte solution and process for gold electroplating
CN101550571A (zh) * 2008-03-31 2009-10-07 恩伊凯慕凯特股份有限公司 用于部分电镀的含有金的电镀液
JP5025815B1 (ja) * 2011-08-10 2012-09-12 小島化学薬品株式会社 硬質金めっき液

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102131962A (zh) * 2008-08-25 2011-07-20 日本电镀工程股份有限公司 硬质金系镀液

Also Published As

Publication number Publication date
TW201736644A (zh) 2017-10-16
JP2017186627A (ja) 2017-10-12
WO2017175428A1 (ja) 2017-10-12

Similar Documents

Publication Publication Date Title
JP4945193B2 (ja) 硬質金合金めっき液
CN102758230B (zh) 一种电镀金溶液及电镀金方法
EP2014801B1 (en) An acidic gold alloy plating solution
CN102021613B (zh) 电解质组合物
TWI495766B (zh) 硬質金系電鍍液
EP3030698B1 (en) Electrolyte for the electrolytic deposition of silver-palladium alloys and method for deposition thereof
EP2458036B1 (en) Gold electroplating solution
JP2007051358A (ja) 錫電気めっき液および錫電気めっき方法
CN108441902B (zh) 基于生物碱复合配位的一价金无氰镀金电镀液及其应用
CN112111761B (zh) 一种高延伸率电解铜箔的电解液及其应用
JP6773079B2 (ja) ノンシアン系電解金めっき液
KR20140033908A (ko) 니켈 도금액, 및 이를 이용한 니켈 도금층 형성 방법
TWI626337B (zh) Hard gold plating solution
CN108251824A (zh) 一种环保型化学沉镍溶液
JP2019026894A (ja) 電解銅めっき用陽極、及びそれを用いた電解銅めっき装置
TWI434964B (zh) A plating solution containing gold
US20070297937A1 (en) Method of Forming Sn-Ag-Cu Ternary Alloy Thin-Film on Base Material
KR102295180B1 (ko) 전기전도성, 내식성 및 내구성 향상을 위한 은-나노 합금 도금액 조성물 및 이를 이용한 도금 방법
JP5025815B1 (ja) 硬質金めっき液
KR102055883B1 (ko) Pd-Ni 합금 도금액 조성물 및 이를 이용한 도금 방법
EP3842572A1 (en) Tin alloy electroplating bath and plating method using same
KR101392627B1 (ko) 전해 경질 금도금액, 도금 방법 및 금-철 합금 피막의 제조 방법
TWI846730B (zh) 熱穩定銀合金層
CN110770371A (zh) 贵金属盐制剂、其生产方法及用于电镀的用途
TWI717360B (zh) 電解硬質金鍍敷液用置換抑制劑及含其之電解硬質金鍍敷液