TWI625789B - 矽 Wafer manufacturing method - Google Patents
矽 Wafer manufacturing method Download PDFInfo
- Publication number
- TWI625789B TWI625789B TW105100715A TW105100715A TWI625789B TW I625789 B TWI625789 B TW I625789B TW 105100715 A TW105100715 A TW 105100715A TW 105100715 A TW105100715 A TW 105100715A TW I625789 B TWI625789 B TW I625789B
- Authority
- TW
- Taiwan
- Prior art keywords
- wafer
- processed
- heat treatment
- tantalum wafer
- temperature
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 37
- 238000010438 heat treatment Methods 0.000 claims abstract description 110
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 60
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims abstract description 60
- 239000013078 crystal Substances 0.000 claims abstract description 59
- 238000000034 method Methods 0.000 claims abstract description 54
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims abstract description 39
- 239000002344 surface layer Substances 0.000 claims abstract description 31
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 16
- 239000010703 silicon Substances 0.000 claims abstract description 16
- 238000002844 melting Methods 0.000 claims abstract description 8
- 230000008018 melting Effects 0.000 claims abstract description 8
- 230000005540 biological transmission Effects 0.000 claims abstract 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 61
- 239000001301 oxygen Substances 0.000 claims description 61
- 229910052760 oxygen Inorganic materials 0.000 claims description 61
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 19
- 238000001816 cooling Methods 0.000 claims description 14
- 229910052732 germanium Inorganic materials 0.000 claims description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims description 10
- 229910052724 xenon Inorganic materials 0.000 claims description 8
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 229910052736 halogen Inorganic materials 0.000 claims description 6
- 150000002367 halogens Chemical class 0.000 claims description 6
- 230000003247 decreasing effect Effects 0.000 claims description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 2
- 229910052797 bismuth Inorganic materials 0.000 claims 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 abstract description 5
- 229910052707 ruthenium Inorganic materials 0.000 abstract description 5
- 235000012431 wafers Nutrition 0.000 description 111
- 230000007547 defect Effects 0.000 description 41
- 239000012298 atmosphere Substances 0.000 description 21
- 230000000052 comparative effect Effects 0.000 description 21
- 230000008021 deposition Effects 0.000 description 18
- 239000010410 layer Substances 0.000 description 12
- 239000002244 precipitate Substances 0.000 description 9
- 238000009826 distribution Methods 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 230000002829 reductive effect Effects 0.000 description 6
- 229910000831 Steel Inorganic materials 0.000 description 5
- 125000004429 atom Chemical group 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 150000004767 nitrides Chemical class 0.000 description 5
- 230000001590 oxidative effect Effects 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- 238000000137 annealing Methods 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 230000008030 elimination Effects 0.000 description 2
- 238000003379 elimination reaction Methods 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 230000006911 nucleation Effects 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- -1 Ar or H 2 Chemical class 0.000 description 1
- 241001130469 Tila Species 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 208000012696 congenital leptin deficiency Diseases 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000005224 laser annealing Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/322—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to modify their internal properties, e.g. to produce internal imperfections
- H01L21/3221—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to modify their internal properties, e.g. to produce internal imperfections of silicon bodies, e.g. for gettering
- H01L21/3225—Thermally inducing defects using oxygen present in the silicon body for intrinsic gettering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/322—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to modify their internal properties, e.g. to produce internal imperfections
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
- C30B33/02—Heat treatment
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
- C30B33/08—Etching
- C30B33/12—Etching in gas atmosphere or plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Toxicology (AREA)
- High Energy & Nuclear Physics (AREA)
- Health & Medical Sciences (AREA)
- Plasma & Fusion (AREA)
- Thermal Sciences (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015030213A JP6044660B2 (ja) | 2015-02-19 | 2015-02-19 | シリコンウェーハの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201639036A TW201639036A (zh) | 2016-11-01 |
TWI625789B true TWI625789B (zh) | 2018-06-01 |
Family
ID=56689388
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105100715A TWI625789B (zh) | 2015-02-19 | 2016-01-11 | 矽 Wafer manufacturing method |
Country Status (7)
Country | Link |
---|---|
US (1) | US10297463B2 (de) |
JP (1) | JP6044660B2 (de) |
KR (1) | KR102317547B1 (de) |
CN (1) | CN107210223B (de) |
DE (1) | DE112016000465B4 (de) |
TW (1) | TWI625789B (de) |
WO (1) | WO2016132661A1 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2710371C2 (ru) * | 2015-09-29 | 2019-12-26 | Кимберли-Кларк Ворлдвайд, Инк. | Материалы, которые стягиваются в одном направлении и расширяются в другом направлении |
JP6810591B2 (ja) * | 2016-12-12 | 2021-01-06 | 株式会社Screenホールディングス | シリコン基板の熱処理方法 |
DE102016225138A1 (de) * | 2016-12-15 | 2018-06-21 | Siltronic Ag | Halbleiterscheibe aus einkristallinem Silizium und Verfahren zur Herstellung einer Halbleiterscheibe aus einkristallinem Silizium |
CN109576795A (zh) * | 2017-09-29 | 2019-04-05 | 胜高股份有限公司 | 硅外延晶片的制备方法 |
CN109576796A (zh) * | 2017-09-29 | 2019-04-05 | 胜高股份有限公司 | 硅外延晶片的制备方法 |
JP7057122B2 (ja) | 2017-12-22 | 2022-04-19 | グローバルウェーハズ・ジャパン株式会社 | 金属汚染評価方法 |
JP6897598B2 (ja) * | 2018-02-16 | 2021-06-30 | 信越半導体株式会社 | シリコン単結晶ウェーハの熱処理方法 |
DE102018203945B4 (de) | 2018-03-15 | 2023-08-10 | Siltronic Ag | Verfahren zur Herstellung von Halbleiterscheiben |
CN110571172A (zh) * | 2019-09-06 | 2019-12-13 | 大同新成新材料股份有限公司 | 一种硅晶圆制造方法及制造装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090242843A1 (en) * | 2006-06-20 | 2009-10-01 | Shin-Etsu Handotai Co., Ltd | Method for Manufacturing Silicon Wafer and Silicon Wafer Manufactured by this Method |
US20100105191A1 (en) * | 2007-02-26 | 2010-04-29 | Shin-Etsu Handotai Co., Ltd. | Method for manufacturing silicon single crystal wafer |
US20120001301A1 (en) * | 2009-04-13 | 2012-01-05 | Shin-Etsu Handotai Co., Ltd. | Annealed wafer, method for producing annealed wafer and method for fabricating device |
US20130093060A1 (en) * | 2010-07-14 | 2013-04-18 | Shin-Etsu Handotai Co., Ltd. | Method for producing silicon wafer and silicon wafer |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS503009B1 (de) | 1968-12-19 | 1975-01-30 | ||
US6485807B1 (en) | 1997-02-13 | 2002-11-26 | Samsung Electronics Co., Ltd. | Silicon wafers having controlled distribution of defects, and methods of preparing the same |
DE69841714D1 (de) | 1997-04-09 | 2010-07-22 | Memc Electronic Materials | Silicium mit niedriger Fehlerdichte und idealem Sauerstoffniederschlag |
US5882989A (en) | 1997-09-22 | 1999-03-16 | Memc Electronic Materials, Inc. | Process for the preparation of silicon wafers having a controlled distribution of oxygen precipitate nucleation centers |
KR100378184B1 (ko) | 1999-11-13 | 2003-03-29 | 삼성전자주식회사 | 제어된 결함 분포를 갖는 실리콘 웨이퍼, 그의 제조공정및 단결정 실리콘 잉곳의 제조를 위한 초크랄스키 풀러 |
JP4720058B2 (ja) * | 2000-11-28 | 2011-07-13 | 株式会社Sumco | シリコンウェーハの製造方法 |
JP2003297839A (ja) * | 2002-04-03 | 2003-10-17 | Sumitomo Mitsubishi Silicon Corp | シリコンウエーハの熱処理方法 |
JP4699675B2 (ja) * | 2002-10-08 | 2011-06-15 | 信越半導体株式会社 | アニールウェーハの製造方法 |
US20080292523A1 (en) * | 2007-05-23 | 2008-11-27 | Sumco Corporation | Silicon single crystal wafer and the production method |
JP5211550B2 (ja) * | 2007-05-25 | 2013-06-12 | 株式会社Sumco | シリコン単結晶ウェーハの製造方法 |
JP5613994B2 (ja) * | 2009-04-14 | 2014-10-29 | 株式会社Sumco | シリコンウェーハおよびその製造方法 |
KR101422713B1 (ko) * | 2009-03-25 | 2014-07-23 | 가부시키가이샤 사무코 | 실리콘 웨이퍼 및 그 제조방법 |
JP5572569B2 (ja) | 2011-02-24 | 2014-08-13 | 信越半導体株式会社 | シリコン基板の製造方法及びシリコン基板 |
-
2015
- 2015-02-19 JP JP2015030213A patent/JP6044660B2/ja active Active
-
2016
- 2016-01-07 KR KR1020177022568A patent/KR102317547B1/ko active IP Right Grant
- 2016-01-07 WO PCT/JP2016/000050 patent/WO2016132661A1/ja active Application Filing
- 2016-01-07 US US15/544,359 patent/US10297463B2/en active Active
- 2016-01-07 DE DE112016000465.6T patent/DE112016000465B4/de active Active
- 2016-01-07 CN CN201680006293.1A patent/CN107210223B/zh active Active
- 2016-01-11 TW TW105100715A patent/TWI625789B/zh active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090242843A1 (en) * | 2006-06-20 | 2009-10-01 | Shin-Etsu Handotai Co., Ltd | Method for Manufacturing Silicon Wafer and Silicon Wafer Manufactured by this Method |
US20100105191A1 (en) * | 2007-02-26 | 2010-04-29 | Shin-Etsu Handotai Co., Ltd. | Method for manufacturing silicon single crystal wafer |
US20120001301A1 (en) * | 2009-04-13 | 2012-01-05 | Shin-Etsu Handotai Co., Ltd. | Annealed wafer, method for producing annealed wafer and method for fabricating device |
US20130093060A1 (en) * | 2010-07-14 | 2013-04-18 | Shin-Etsu Handotai Co., Ltd. | Method for producing silicon wafer and silicon wafer |
Also Published As
Publication number | Publication date |
---|---|
WO2016132661A1 (ja) | 2016-08-25 |
KR102317547B1 (ko) | 2021-10-27 |
US10297463B2 (en) | 2019-05-21 |
TW201639036A (zh) | 2016-11-01 |
CN107210223B (zh) | 2020-08-21 |
JP2016152370A (ja) | 2016-08-22 |
CN107210223A (zh) | 2017-09-26 |
DE112016000465B4 (de) | 2022-01-27 |
JP6044660B2 (ja) | 2016-12-14 |
US20180247830A1 (en) | 2018-08-30 |
DE112016000465T5 (de) | 2017-09-28 |
KR20170117418A (ko) | 2017-10-23 |
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