TWI625593B - 處理液供給方法、處理液供給裝置及電腦可讀取之記錄媒體 - Google Patents

處理液供給方法、處理液供給裝置及電腦可讀取之記錄媒體 Download PDF

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Publication number
TWI625593B
TWI625593B TW104119267A TW104119267A TWI625593B TW I625593 B TWI625593 B TW I625593B TW 104119267 A TW104119267 A TW 104119267A TW 104119267 A TW104119267 A TW 104119267A TW I625593 B TWI625593 B TW I625593B
Authority
TW
Taiwan
Prior art keywords
processing liquid
liquid supply
voltage
supply device
developing
Prior art date
Application number
TW104119267A
Other languages
English (en)
Chinese (zh)
Other versions
TW201616217A (zh
Inventor
林聖人
靍田豊久
梶原正幸
Original Assignee
東京威力科創股份有限公司
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Publication date
Application filed by 東京威力科創股份有限公司 filed Critical 東京威力科創股份有限公司
Publication of TW201616217A publication Critical patent/TW201616217A/zh
Application granted granted Critical
Publication of TWI625593B publication Critical patent/TWI625593B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/463—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrocoagulation
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/02—Non-contaminated water, e.g. for industrial water supply
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/46—Apparatus for electrochemical processes
    • C02F2201/461—Electrolysis apparatus
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/46—Apparatus for electrochemical processes
    • C02F2201/461—Electrolysis apparatus
    • C02F2201/46105—Details relating to the electrolytic devices
    • C02F2201/4612—Controlling or monitoring
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/46—Apparatus for electrochemical processes
    • C02F2201/461—Electrolysis apparatus
    • C02F2201/46105—Details relating to the electrolytic devices
    • C02F2201/4616—Power supply
    • C02F2201/4617—DC only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3007—Imagewise removal using liquid means combined with electrical means, e.g. force fields
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Hydrology & Water Resources (AREA)
  • Organic Chemistry (AREA)
  • Water Supply & Treatment (AREA)
  • General Chemical & Material Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
TW104119267A 2014-06-25 2015-06-15 處理液供給方法、處理液供給裝置及電腦可讀取之記錄媒體 TWI625593B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2014130151 2014-06-25
JP2014-130151 2014-06-25
JP2015-082541 2015-04-14
JP2015082541A JP6342838B2 (ja) 2014-06-25 2015-04-14 処理液供給方法、処理液供給装置及びコンピュータ読み取り可能な記録媒体

Publications (2)

Publication Number Publication Date
TW201616217A TW201616217A (zh) 2016-05-01
TWI625593B true TWI625593B (zh) 2018-06-01

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW104119267A TWI625593B (zh) 2014-06-25 2015-06-15 處理液供給方法、處理液供給裝置及電腦可讀取之記錄媒體

Country Status (4)

Country Link
US (1) US10023477B2 (ja)
JP (1) JP6342838B2 (ja)
KR (1) KR102376780B1 (ja)
TW (1) TWI625593B (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6794730B2 (ja) * 2015-09-28 2020-12-02 東京エレクトロン株式会社 処理液供給装置及び処理液供給装置の運用方法並びに記憶媒体
JP6808960B2 (ja) * 2016-04-15 2021-01-06 東京エレクトロン株式会社 処理液供給装置
KR20200062831A (ko) * 2018-11-27 2020-06-04 삼성전자주식회사 약액 공급 장치 및 이를 포함하는 반도체 제조 장치

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10305256A (ja) * 1997-03-03 1998-11-17 Tokyo Electron Ltd 塗布装置と塗布方法
CN101759254A (zh) * 2008-12-22 2010-06-30 三星电子株式会社 去离子设备及其控制方法
JP2013030707A (ja) * 2011-07-29 2013-02-07 Tokyo Electron Ltd 処理液供給装置、処理液供給方法、プログラム及びコンピュータ記憶媒体
TW201334847A (zh) * 2012-02-24 2013-09-01 Wei-Ping Li 離子能發電淨水器及其組合
TWM462743U (zh) * 2013-06-03 2013-10-01 Univ Hungkuang 用於改善水中濁度的電混凝設備
TW201350440A (zh) * 2012-06-14 2013-12-16 Wei-Ping Li 電透析污水處理裝置及其處理方法

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JPS53126574A (en) * 1977-04-12 1978-11-04 Kleentek Ind Method of electrostatically purifying insulating liquid and apparatus therefor
JPS6094162A (ja) * 1983-10-28 1985-05-27 Hitachi Plant Eng & Constr Co Ltd 純水の静電浄化装置
JPS60238172A (ja) * 1984-05-14 1985-11-27 Kazuji Yanagimoto 廃油等の静電捕捉式清浄化装置における電極板の付着物の剥離方法
US5149422A (en) * 1990-12-20 1992-09-22 Analytic Laboratories, Inc. Finite particle removal system
US5425858A (en) * 1994-05-20 1995-06-20 The Regents Of The University Of California Method and apparatus for capacitive deionization, electrochemical purification, and regeneration of electrodes
JP3663048B2 (ja) * 1998-05-12 2005-06-22 株式会社東芝 ウェット処理方法
JP2000279900A (ja) * 1999-03-30 2000-10-10 Matsushita Electric Ind Co Ltd 化学処理装置
JP2004342841A (ja) * 2003-05-15 2004-12-02 Sharp Corp 洗浄方法および洗浄装置
EP1838900A2 (en) * 2004-11-02 2007-10-03 The Water Company LLC Electronic components associated and apparatus for deionization and electrochemical purification and regeneration of electrodes
JP4126307B2 (ja) * 2005-03-16 2008-07-30 株式会社コガネイ 循環水の浄化方法とその装置
JP4696276B2 (ja) * 2007-09-19 2011-06-08 本田技研工業株式会社 電解水生成方法及び装置
US20140124428A1 (en) * 2010-10-08 2014-05-08 Ipc Eagle Corporation Unihousing portable water filtration system

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10305256A (ja) * 1997-03-03 1998-11-17 Tokyo Electron Ltd 塗布装置と塗布方法
CN101759254A (zh) * 2008-12-22 2010-06-30 三星电子株式会社 去离子设备及其控制方法
JP2013030707A (ja) * 2011-07-29 2013-02-07 Tokyo Electron Ltd 処理液供給装置、処理液供給方法、プログラム及びコンピュータ記憶媒体
TW201334847A (zh) * 2012-02-24 2013-09-01 Wei-Ping Li 離子能發電淨水器及其組合
TW201350440A (zh) * 2012-06-14 2013-12-16 Wei-Ping Li 電透析污水處理裝置及其處理方法
TWM462743U (zh) * 2013-06-03 2013-10-01 Univ Hungkuang 用於改善水中濁度的電混凝設備

Also Published As

Publication number Publication date
TW201616217A (zh) 2016-05-01
JP2016027616A (ja) 2016-02-18
US10023477B2 (en) 2018-07-17
JP6342838B2 (ja) 2018-06-13
KR102376780B1 (ko) 2022-03-21
US20150375170A1 (en) 2015-12-31
KR20160000859A (ko) 2016-01-05

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