TWI625593B - 處理液供給方法、處理液供給裝置及電腦可讀取之記錄媒體 - Google Patents
處理液供給方法、處理液供給裝置及電腦可讀取之記錄媒體 Download PDFInfo
- Publication number
- TWI625593B TWI625593B TW104119267A TW104119267A TWI625593B TW I625593 B TWI625593 B TW I625593B TW 104119267 A TW104119267 A TW 104119267A TW 104119267 A TW104119267 A TW 104119267A TW I625593 B TWI625593 B TW I625593B
- Authority
- TW
- Taiwan
- Prior art keywords
- processing liquid
- liquid supply
- voltage
- supply device
- developing
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/463—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrocoagulation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/46104—Devices therefor; Their operating or servicing
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/02—Non-contaminated water, e.g. for industrial water supply
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/46—Apparatus for electrochemical processes
- C02F2201/461—Electrolysis apparatus
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/46—Apparatus for electrochemical processes
- C02F2201/461—Electrolysis apparatus
- C02F2201/46105—Details relating to the electrolytic devices
- C02F2201/4612—Controlling or monitoring
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/46—Apparatus for electrochemical processes
- C02F2201/461—Electrolysis apparatus
- C02F2201/46105—Details relating to the electrolytic devices
- C02F2201/4616—Power supply
- C02F2201/4617—DC only
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3007—Imagewise removal using liquid means combined with electrical means, e.g. force fields
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Hydrology & Water Resources (AREA)
- Organic Chemistry (AREA)
- Water Supply & Treatment (AREA)
- General Chemical & Material Sciences (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014-130151 | 2014-06-25 | ||
JP2014130151 | 2014-06-25 | ||
JP2015-082541 | 2015-04-14 | ||
JP2015082541A JP6342838B2 (ja) | 2014-06-25 | 2015-04-14 | 処理液供給方法、処理液供給装置及びコンピュータ読み取り可能な記録媒体 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201616217A TW201616217A (zh) | 2016-05-01 |
TWI625593B true TWI625593B (zh) | 2018-06-01 |
Family
ID=54929482
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW104119267A TWI625593B (zh) | 2014-06-25 | 2015-06-15 | 處理液供給方法、處理液供給裝置及電腦可讀取之記錄媒體 |
Country Status (4)
Country | Link |
---|---|
US (1) | US10023477B2 (ja) |
JP (1) | JP6342838B2 (ja) |
KR (1) | KR102376780B1 (ja) |
TW (1) | TWI625593B (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6794730B2 (ja) * | 2015-09-28 | 2020-12-02 | 東京エレクトロン株式会社 | 処理液供給装置及び処理液供給装置の運用方法並びに記憶媒体 |
JP6808960B2 (ja) * | 2016-04-15 | 2021-01-06 | 東京エレクトロン株式会社 | 処理液供給装置 |
JP6711219B2 (ja) * | 2016-09-09 | 2020-06-17 | 東京エレクトロン株式会社 | 処理液供給装置及び処理液供給装置の運用方法並びに記憶媒体 |
KR20200062831A (ko) * | 2018-11-27 | 2020-06-04 | 삼성전자주식회사 | 약액 공급 장치 및 이를 포함하는 반도체 제조 장치 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10305256A (ja) * | 1997-03-03 | 1998-11-17 | Tokyo Electron Ltd | 塗布装置と塗布方法 |
CN101759254A (zh) * | 2008-12-22 | 2010-06-30 | 三星电子株式会社 | 去离子设备及其控制方法 |
JP2013030707A (ja) * | 2011-07-29 | 2013-02-07 | Tokyo Electron Ltd | 処理液供給装置、処理液供給方法、プログラム及びコンピュータ記憶媒体 |
TW201334847A (zh) * | 2012-02-24 | 2013-09-01 | Wei-Ping Li | 離子能發電淨水器及其組合 |
TWM462743U (zh) * | 2013-06-03 | 2013-10-01 | Univ Hungkuang | 用於改善水中濁度的電混凝設備 |
TW201350440A (zh) * | 2012-06-14 | 2013-12-16 | Wei-Ping Li | 電透析污水處理裝置及其處理方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53126574A (en) * | 1977-04-12 | 1978-11-04 | Kleentek Ind | Method of electrostatically purifying insulating liquid and apparatus therefor |
JPS6094162A (ja) * | 1983-10-28 | 1985-05-27 | Hitachi Plant Eng & Constr Co Ltd | 純水の静電浄化装置 |
JPS60238172A (ja) * | 1984-05-14 | 1985-11-27 | Kazuji Yanagimoto | 廃油等の静電捕捉式清浄化装置における電極板の付着物の剥離方法 |
US5149422A (en) * | 1990-12-20 | 1992-09-22 | Analytic Laboratories, Inc. | Finite particle removal system |
US5425858A (en) * | 1994-05-20 | 1995-06-20 | The Regents Of The University Of California | Method and apparatus for capacitive deionization, electrochemical purification, and regeneration of electrodes |
JP3663048B2 (ja) * | 1998-05-12 | 2005-06-22 | 株式会社東芝 | ウェット処理方法 |
JP2000279900A (ja) * | 1999-03-30 | 2000-10-10 | Matsushita Electric Ind Co Ltd | 化学処理装置 |
JP2004342841A (ja) * | 2003-05-15 | 2004-12-02 | Sharp Corp | 洗浄方法および洗浄装置 |
MX2007005278A (es) * | 2004-11-02 | 2007-11-23 | Water Company Llc | Componentes electronicos asociados y aparato para desionizacion y purificacion electroquimica y regeneracion de electrodos. |
JP4126307B2 (ja) * | 2005-03-16 | 2008-07-30 | 株式会社コガネイ | 循環水の浄化方法とその装置 |
JP4696276B2 (ja) * | 2007-09-19 | 2011-06-08 | 本田技研工業株式会社 | 電解水生成方法及び装置 |
US20140124428A1 (en) * | 2010-10-08 | 2014-05-08 | Ipc Eagle Corporation | Unihousing portable water filtration system |
-
2015
- 2015-04-14 JP JP2015082541A patent/JP6342838B2/ja active Active
- 2015-05-29 US US14/724,922 patent/US10023477B2/en active Active
- 2015-06-15 TW TW104119267A patent/TWI625593B/zh active
- 2015-06-22 KR KR1020150088360A patent/KR102376780B1/ko active IP Right Grant
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10305256A (ja) * | 1997-03-03 | 1998-11-17 | Tokyo Electron Ltd | 塗布装置と塗布方法 |
CN101759254A (zh) * | 2008-12-22 | 2010-06-30 | 三星电子株式会社 | 去离子设备及其控制方法 |
JP2013030707A (ja) * | 2011-07-29 | 2013-02-07 | Tokyo Electron Ltd | 処理液供給装置、処理液供給方法、プログラム及びコンピュータ記憶媒体 |
TW201334847A (zh) * | 2012-02-24 | 2013-09-01 | Wei-Ping Li | 離子能發電淨水器及其組合 |
TW201350440A (zh) * | 2012-06-14 | 2013-12-16 | Wei-Ping Li | 電透析污水處理裝置及其處理方法 |
TWM462743U (zh) * | 2013-06-03 | 2013-10-01 | Univ Hungkuang | 用於改善水中濁度的電混凝設備 |
Also Published As
Publication number | Publication date |
---|---|
US20150375170A1 (en) | 2015-12-31 |
JP6342838B2 (ja) | 2018-06-13 |
US10023477B2 (en) | 2018-07-17 |
KR20160000859A (ko) | 2016-01-05 |
JP2016027616A (ja) | 2016-02-18 |
TW201616217A (zh) | 2016-05-01 |
KR102376780B1 (ko) | 2022-03-21 |
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