TWI623519B - 新穎化合物、含有該化合物之光酸產生劑及含有該光酸產生劑之感光性樹脂組合物 - Google Patents

新穎化合物、含有該化合物之光酸產生劑及含有該光酸產生劑之感光性樹脂組合物 Download PDF

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Publication number
TWI623519B
TWI623519B TW104104805A TW104104805A TWI623519B TW I623519 B TWI623519 B TW I623519B TW 104104805 A TW104104805 A TW 104104805A TW 104104805 A TW104104805 A TW 104104805A TW I623519 B TWI623519 B TW I623519B
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TW
Taiwan
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group
ring
formula
compound
atom
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TW104104805A
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English (en)
Chinese (zh)
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TW201538464A (zh
Inventor
河合壯
中島琢也
土江健太
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日本化藥股份有限公司
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D417/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
    • C07D417/14—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing three or more hetero rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Plural Heterocyclic Compounds (AREA)
TW104104805A 2014-02-19 2015-02-12 新穎化合物、含有該化合物之光酸產生劑及含有該光酸產生劑之感光性樹脂組合物 TWI623519B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014030102 2014-02-19
JP2014-030102 2014-02-19

Publications (2)

Publication Number Publication Date
TW201538464A TW201538464A (zh) 2015-10-16
TWI623519B true TWI623519B (zh) 2018-05-11

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Family Applications (1)

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TW104104805A TWI623519B (zh) 2014-02-19 2015-02-12 新穎化合物、含有該化合物之光酸產生劑及含有該光酸產生劑之感光性樹脂組合物

Country Status (3)

Country Link
JP (1) JP6352387B2 (ja)
TW (1) TWI623519B (ja)
WO (1) WO2015125745A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108997329B (zh) * 2018-08-25 2021-06-04 湘潭大学 多取代3-(3-苯并[b]硒吩基)-1H-2-芳基吲哚及衍生物及其合成方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110008732A1 (en) * 2006-04-21 2011-01-13 Cornell Research Foundation, Inc. Photoacid generator compounds and compositions

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1516512A (en) * 1974-05-02 1978-07-05 Gen Electric Chalcogenium salts
JP3024621B2 (ja) * 1990-01-30 2000-03-21 和光純薬工業株式会社 レジスト材料用酸発生剤
JPH04282378A (ja) * 1991-03-08 1992-10-07 Kanebo Ltd ジアリールエテン化合物
JPH09118663A (ja) * 1995-08-22 1997-05-06 Nippon Soda Co Ltd 新規スルホニウム塩化合物、重合開始剤、該化合物を含有する硬化性組成物および硬化方法
JPH09241254A (ja) * 1996-03-08 1997-09-16 Masahiro Irie アモルファスフォトクロミック材料とこれを用いた光記録媒体
JP2005250463A (ja) * 2004-02-05 2005-09-15 Mitsubishi Chemicals Corp 光学記録媒体及び光学記録方法
JP5219076B2 (ja) * 2008-09-09 2013-06-26 国立大学法人 奈良先端科学技術大学院大学 フォトクロミック化合物及び追記型光記録分子材料
WO2013093890A2 (en) * 2011-12-23 2013-06-27 L'oreal Method for making up the skin

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110008732A1 (en) * 2006-04-21 2011-01-13 Cornell Research Foundation, Inc. Photoacid generator compounds and compositions

Also Published As

Publication number Publication date
WO2015125745A1 (ja) 2015-08-27
TW201538464A (zh) 2015-10-16
JPWO2015125745A1 (ja) 2017-03-30
JP6352387B2 (ja) 2018-07-04

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