TWI621719B - Metal mask material and metal mask - Google Patents

Metal mask material and metal mask Download PDF

Info

Publication number
TWI621719B
TWI621719B TW105131996A TW105131996A TWI621719B TW I621719 B TWI621719 B TW I621719B TW 105131996 A TW105131996 A TW 105131996A TW 105131996 A TW105131996 A TW 105131996A TW I621719 B TWI621719 B TW I621719B
Authority
TW
Taiwan
Prior art keywords
metal mask
rolling
metal
mask material
jis
Prior art date
Application number
TW105131996A
Other languages
English (en)
Chinese (zh)
Other versions
TW201718904A (zh
Inventor
Yuko Kondo
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of TW201718904A publication Critical patent/TW201718904A/zh
Application granted granted Critical
Publication of TWI621719B publication Critical patent/TWI621719B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
    • C22C38/105—Ferrous alloys, e.g. steel alloys containing cobalt containing Co and Ni
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metal Rolling (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
TW105131996A 2015-11-04 2016-10-04 Metal mask material and metal mask TWI621719B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015216849A JP6177299B2 (ja) 2015-11-04 2015-11-04 メタルマスク材料及びメタルマスク

Publications (2)

Publication Number Publication Date
TW201718904A TW201718904A (zh) 2017-06-01
TWI621719B true TWI621719B (zh) 2018-04-21

Family

ID=58740561

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105131996A TWI621719B (zh) 2015-11-04 2016-10-04 Metal mask material and metal mask

Country Status (4)

Country Link
JP (1) JP6177299B2 (ko)
KR (1) KR101879052B1 (ko)
CN (1) CN106917063B (ko)
TW (1) TWI621719B (ko)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7156279B2 (ja) * 2017-06-20 2022-10-19 日立金属株式会社 メタルマスク用薄板の製造方法及びメタルマスク用薄板
KR102300029B1 (ko) * 2017-07-27 2021-09-09 삼성디스플레이 주식회사 마스크 프레임 조립체와 이의 제조 방법 및 표시 장치의 제조 방법
KR102358039B1 (ko) * 2017-09-07 2022-02-04 엘지이노텍 주식회사 Oled 화소 증착을 위한 금속재의 증착용 마스크
CN117187746A (zh) * 2017-11-14 2023-12-08 大日本印刷株式会社 金属板的制造方法和蒸镀掩模的制造方法
JP6704540B1 (ja) 2018-09-27 2020-06-03 日鉄ケミカル＆マテリアル株式会社 メタルマスク材料及びその製造方法とメタルマスク
KR102371177B1 (ko) * 2020-04-27 2022-03-08 주식회사 오럼머티리얼 마스크 금속막, 마스크 금속막 지지 템플릿 및 프레임 일체형 마스크
JPWO2022244701A1 (ko) 2021-05-17 2022-11-24
TWI772066B (zh) * 2021-06-16 2022-07-21 達運精密工業股份有限公司 金屬遮罩基材的製備方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003221651A (ja) * 2001-11-20 2003-08-08 Nippon Mining & Metals Co Ltd シャドウマスク用Ｆｅ−Ｎｉ系およびＦｅ−Ｎｉ−Ｃｏ系合金条
JP2010214447A (ja) * 2009-03-18 2010-09-30 Hitachi Metals Ltd エッチング加工用素材の製造方法及びエッチング加工用素材
CN103429388A (zh) * 2011-03-28 2013-12-04 Jx日矿日石金属株式会社 Co-Si系铜合金板
JP2014101543A (ja) * 2012-11-20 2014-06-05 Jx Nippon Mining & Metals Corp メタルマスク材料及びメタルマスク
WO2015030209A1 (ja) * 2013-08-29 2015-03-05 Jx日鉱日石金属株式会社 表面処理金属材、キャリア付金属箔、コネクタ、端子、積層体、シールドテープ、シールド材、プリント配線板、金属加工部材、電子機器、及び、プリント配線板の製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1050478A (ja) 1996-04-19 1998-02-20 Toray Ind Inc 有機電界発光素子およびその製造方法
JP3545684B2 (ja) * 2000-07-17 2004-07-21 日鉱金属加工株式会社 エッチング穿孔性に優れたＦｅ−Ｎｉ系合金シャドウマスク用素材
JP4090467B2 (ja) * 2002-05-13 2008-05-28 三井金属鉱業株式会社 チップオンフィルム用フレキシブルプリント配線板
JP4126648B2 (ja) 2002-07-01 2008-07-30 日立金属株式会社 メタルマスク用部材の製造方法
JP2004039628A (ja) 2003-06-04 2004-02-05 Hitachi Metals Ltd メタルマスク
CN1980792A (zh) * 2004-07-02 2007-06-13 A.舒尔曼因维深公司 共挤出的掩模层
WO2011152178A1 (ja) * 2010-05-31 2011-12-08 東洋紡績株式会社 フレキシブル金属張積層体
WO2012082269A1 (en) * 2010-11-18 2012-06-21 3M Innovative Properties Company Methods for imparting an image to a surface and kits for use therewith
JP5758254B2 (ja) * 2011-09-27 2015-08-05 Jx日鉱日石金属株式会社 圧延銅箔
CN104024156B (zh) * 2011-11-04 2016-03-30 Jx日矿日石金属株式会社 石墨烯制造用铜箔及其制造方法、以及石墨烯的制造方法
CN104769165B (zh) * 2012-11-09 2017-08-25 Jx日矿日石金属株式会社 表面处理铜箔及使用其的积层板、覆铜积层板、印刷配线板以及电子机器

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003221651A (ja) * 2001-11-20 2003-08-08 Nippon Mining & Metals Co Ltd シャドウマスク用Ｆｅ−Ｎｉ系およびＦｅ−Ｎｉ−Ｃｏ系合金条
JP2010214447A (ja) * 2009-03-18 2010-09-30 Hitachi Metals Ltd エッチング加工用素材の製造方法及びエッチング加工用素材
CN103429388A (zh) * 2011-03-28 2013-12-04 Jx日矿日石金属株式会社 Co-Si系铜合金板
JP2014101543A (ja) * 2012-11-20 2014-06-05 Jx Nippon Mining & Metals Corp メタルマスク材料及びメタルマスク
WO2015030209A1 (ja) * 2013-08-29 2015-03-05 Jx日鉱日石金属株式会社 表面処理金属材、キャリア付金属箔、コネクタ、端子、積層体、シールドテープ、シールド材、プリント配線板、金属加工部材、電子機器、及び、プリント配線板の製造方法

Also Published As

Publication number Publication date
KR20170052472A (ko) 2017-05-12
CN106917063B (zh) 2019-04-02
JP2017088915A (ja) 2017-05-25
KR101879052B1 (ko) 2018-07-16
TW201718904A (zh) 2017-06-01
JP6177299B2 (ja) 2017-08-09
CN106917063A (zh) 2017-07-04

Similar Documents

Publication Publication Date Title
TWI621719B (zh) Metal mask material and metal mask
TWI612160B (zh) 金屬遮罩材料及金屬遮罩
JP6814420B2 (ja) 蒸着マスクを製造するための金属板、金属板の検査方法、金属板の製造方法、蒸着マスク、蒸着マスク装置及び蒸着マスクの製造方法
JP5455099B1 (ja) 金属板、金属板の製造方法、および金属板を用いてマスクを製造する方法
JP5516816B1 (ja) 金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法
TWI429762B (zh) 導電膜形成用銀合金濺鍍靶及其製造方法
TWI535876B (zh) 導電膜形成用銀合金濺鍍靶及其製造方法
KR20190127384A (ko) 판 형상이 우수한 철-니켈(Fe-Ni) 합금 박 제조방법
TW202405203A (zh) 熔融鍍敷鋼板