TWI611996B - 基板處理裝置 - Google Patents

基板處理裝置 Download PDF

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Publication number
TWI611996B
TWI611996B TW102101597A TW102101597A TWI611996B TW I611996 B TWI611996 B TW I611996B TW 102101597 A TW102101597 A TW 102101597A TW 102101597 A TW102101597 A TW 102101597A TW I611996 B TWI611996 B TW I611996B
Authority
TW
Taiwan
Prior art keywords
substrate
photomask
rotating
rotation axis
mask
Prior art date
Application number
TW102101597A
Other languages
English (en)
Chinese (zh)
Other versions
TW201348106A (zh
Inventor
鈴木智也
小宮山弘樹
Original Assignee
尼康股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 尼康股份有限公司 filed Critical 尼康股份有限公司
Publication of TW201348106A publication Critical patent/TW201348106A/zh
Application granted granted Critical
Publication of TWI611996B publication Critical patent/TWI611996B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
TW102101597A 2012-05-18 2013-01-16 基板處理裝置 TWI611996B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261648956P 2012-05-18 2012-05-18
US61/648,956 2012-05-18

Publications (2)

Publication Number Publication Date
TW201348106A TW201348106A (zh) 2013-12-01
TWI611996B true TWI611996B (zh) 2018-01-21

Family

ID=49583474

Family Applications (4)

Application Number Title Priority Date Filing Date
TW108128698A TWI733162B (zh) 2012-05-18 2013-01-16 圓筒狀之光罩單元
TW102101597A TWI611996B (zh) 2012-05-18 2013-01-16 基板處理裝置
TW106142756A TWI653187B (zh) 2012-05-18 2013-01-16 基板處理裝置
TW108101214A TWI672258B (zh) 2012-05-18 2013-01-16 曝光裝置

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW108128698A TWI733162B (zh) 2012-05-18 2013-01-16 圓筒狀之光罩單元

Family Applications After (2)

Application Number Title Priority Date Filing Date
TW106142756A TWI653187B (zh) 2012-05-18 2013-01-16 基板處理裝置
TW108101214A TWI672258B (zh) 2012-05-18 2013-01-16 曝光裝置

Country Status (3)

Country Link
JP (4) JP6123797B2 (fr)
TW (4) TWI733162B (fr)
WO (1) WO2013172048A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI733162B (zh) * 2012-05-18 2021-07-11 日商尼康股份有限公司 圓筒狀之光罩單元

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6019037U (ja) * 1983-07-18 1985-02-08 株式会社リコー 露光装置
JPH04150784A (ja) * 1990-10-12 1992-05-25 Hishifusa Miura 磁力動力装置
US6454908B1 (en) * 1997-12-22 2002-09-24 Unaxis Trading Ag Vacuum treatment system
JP2008290812A (ja) * 2007-05-22 2008-12-04 Shoei Koki:Kk 搬送装置
JP2011033907A (ja) * 2009-08-04 2011-02-17 Nikon Corp 照明装置、露光装置、照明方法、露光方法及びデバイス製造方法

Family Cites Families (19)

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Publication number Priority date Publication date Assignee Title
JPH02293754A (ja) * 1989-05-08 1990-12-04 Sumitomo Bakelite Co Ltd 連続露光装置
JPH0442159A (ja) * 1990-06-08 1992-02-12 Kato Hatsujo Kaisha Ltd フォトレジストにおける露光方法および装置
TW556044B (en) * 2001-02-15 2003-10-01 Sipix Imaging Inc Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web
JP2003041361A (ja) * 2001-08-02 2003-02-13 Sony Corp 成膜装置
JP4143866B2 (ja) * 2006-01-30 2008-09-03 国際技術開発株式会社 非接触テープガイド装置
JP4984810B2 (ja) * 2006-02-16 2012-07-25 株式会社ニコン 露光方法、露光装置及びフォトマスク
TWI457723B (zh) * 2006-09-08 2014-10-21 尼康股份有限公司 A mask, an exposure device, and an element manufacturing method
JP2008235470A (ja) * 2007-03-19 2008-10-02 Nikon Corp 平面モータ装置、ステージ装置、露光装置及びデバイスの製造方法
JP2009026933A (ja) * 2007-07-19 2009-02-05 Konica Minolta Holdings Inc 電磁波遮蔽フィルムの製造方法及び電磁波遮蔽フィルム
JP2009214381A (ja) * 2008-03-10 2009-09-24 Fujifilm Corp 円筒内部表面の加工方法および凹凸部品の製造方法
JP2009237305A (ja) * 2008-03-27 2009-10-15 Mitsubishi Paper Mills Ltd マスクパターンフィルムの巻き付け機構及び露光装置
JP2009283694A (ja) * 2008-05-22 2009-12-03 Nikon Corp 駆動装置、ステージ装置、露光装置、及びデバイス製造方法
JP5151949B2 (ja) * 2008-12-10 2013-02-27 株式会社ニコン 移動体装置及び移動体駆動方法、露光装置、並びにデバイス製造方法
JP5761034B2 (ja) * 2010-02-12 2015-08-12 株式会社ニコン 基板処理装置
JP2011183588A (ja) * 2010-03-05 2011-09-22 Seiko Epson Corp スタンプ作成装置
JP5724564B2 (ja) * 2010-04-13 2015-05-27 株式会社ニコン マスクケース、マスクユニット、露光装置、基板処理装置及びデバイス製造方法
JP2011221536A (ja) * 2010-04-13 2011-11-04 Nikon Corp マスク移動装置、露光装置、基板処理装置及びデバイス製造方法
WO2012100120A2 (fr) 2011-01-20 2012-07-26 Purdue Research Foundation (Prf) Synchronisation de la production d'ions avec le cyclage d'une interface atmosphérique discontinue
TWI733162B (zh) * 2012-05-18 2021-07-11 日商尼康股份有限公司 圓筒狀之光罩單元

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6019037U (ja) * 1983-07-18 1985-02-08 株式会社リコー 露光装置
JPH04150784A (ja) * 1990-10-12 1992-05-25 Hishifusa Miura 磁力動力装置
US6454908B1 (en) * 1997-12-22 2002-09-24 Unaxis Trading Ag Vacuum treatment system
JP2008290812A (ja) * 2007-05-22 2008-12-04 Shoei Koki:Kk 搬送装置
JP2011033907A (ja) * 2009-08-04 2011-02-17 Nikon Corp 照明装置、露光装置、照明方法、露光方法及びデバイス製造方法

Also Published As

Publication number Publication date
JPWO2013172048A1 (ja) 2016-01-12
WO2013172048A1 (fr) 2013-11-21
JP2019144596A (ja) 2019-08-29
JP6123797B2 (ja) 2017-05-10
TW201919974A (zh) 2019-06-01
TWI653187B (zh) 2019-03-11
JP2017126084A (ja) 2017-07-20
TW201348106A (zh) 2013-12-01
JP6531847B2 (ja) 2019-06-19
TW201940399A (zh) 2019-10-16
TWI672258B (zh) 2019-09-21
JP2018116289A (ja) 2018-07-26
JP6773174B2 (ja) 2020-10-21
TWI733162B (zh) 2021-07-11
TW201808761A (zh) 2018-03-16
JP6304423B2 (ja) 2018-04-04

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