TWI600781B - 蒸鍍裝置 - Google Patents

蒸鍍裝置 Download PDF

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Publication number
TWI600781B
TWI600781B TW102117717A TW102117717A TWI600781B TW I600781 B TWI600781 B TW I600781B TW 102117717 A TW102117717 A TW 102117717A TW 102117717 A TW102117717 A TW 102117717A TW I600781 B TWI600781 B TW I600781B
Authority
TW
Taiwan
Prior art keywords
vapor deposition
deposition material
opening
material storage
plating resist
Prior art date
Application number
TW102117717A
Other languages
English (en)
Chinese (zh)
Other versions
TW201402845A (zh
Inventor
古屋英二
高坂健兒
Original Assignee
中外爐工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 中外爐工業股份有限公司 filed Critical 中外爐工業股份有限公司
Publication of TW201402845A publication Critical patent/TW201402845A/zh
Application granted granted Critical
Publication of TWI600781B publication Critical patent/TWI600781B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
TW102117717A 2012-07-04 2013-05-20 蒸鍍裝置 TWI600781B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2012/067107 WO2014006706A1 (fr) 2012-07-04 2012-07-04 Dispositif de dépôt en phase vapeur

Publications (2)

Publication Number Publication Date
TW201402845A TW201402845A (zh) 2014-01-16
TWI600781B true TWI600781B (zh) 2017-10-01

Family

ID=49881497

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102117717A TWI600781B (zh) 2012-07-04 2013-05-20 蒸鍍裝置

Country Status (3)

Country Link
JP (1) JP5832650B2 (fr)
TW (1) TWI600781B (fr)
WO (1) WO2014006706A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11807935B2 (en) 2018-11-30 2023-11-07 Ferrotec (Usa) Corporation Crucible cover for coating with an electron beam source

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08225927A (ja) * 1995-02-22 1996-09-03 Nikon Corp 蒸発物るつぼ
US20020040682A1 (en) * 2000-06-01 2002-04-11 Ramsay Bruce G. Multiple pocket electron beam source

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07166335A (ja) * 1993-12-15 1995-06-27 Nikon Corp イオンプレーティング装置
JP4701486B2 (ja) * 2000-09-18 2011-06-15 エプソントヨコム株式会社 電子ビーム蒸着用電子銃、蒸着材料保持装置、及び蒸着装置
KR100615302B1 (ko) * 2005-01-21 2006-08-25 삼성에스디아이 주식회사 가열용기 지지대 및 이를 구비한 증착장치
JP2007332433A (ja) * 2006-06-16 2007-12-27 Seiko Epson Corp 真空蒸着装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08225927A (ja) * 1995-02-22 1996-09-03 Nikon Corp 蒸発物るつぼ
US20020040682A1 (en) * 2000-06-01 2002-04-11 Ramsay Bruce G. Multiple pocket electron beam source

Also Published As

Publication number Publication date
JPWO2014006706A1 (ja) 2016-06-02
JP5832650B2 (ja) 2015-12-16
WO2014006706A1 (fr) 2014-01-09
TW201402845A (zh) 2014-01-16

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees