TWI588623B - 投影光學系統、曝光設備及裝置製造方法 - Google Patents

投影光學系統、曝光設備及裝置製造方法 Download PDF

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Publication number
TWI588623B
TWI588623B TW104138518A TW104138518A TWI588623B TW I588623 B TWI588623 B TW I588623B TW 104138518 A TW104138518 A TW 104138518A TW 104138518 A TW104138518 A TW 104138518A TW I588623 B TWI588623 B TW I588623B
Authority
TW
Taiwan
Prior art keywords
optical system
convex mirror
projection optical
reflective surface
support member
Prior art date
Application number
TW104138518A
Other languages
English (en)
Chinese (zh)
Other versions
TW201621476A (zh
Inventor
佐佐木康人
関美津留
中嶋猛
Original Assignee
佳能股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 佳能股份有限公司 filed Critical 佳能股份有限公司
Publication of TW201621476A publication Critical patent/TW201621476A/zh
Application granted granted Critical
Publication of TWI588623B publication Critical patent/TWI588623B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/0615—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors off-axis or unobscured systems in wich all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/28—Reflectors in projection beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Optical Elements Other Than Lenses (AREA)
TW104138518A 2014-12-02 2015-11-20 投影光學系統、曝光設備及裝置製造方法 TWI588623B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014244333A JP6386896B2 (ja) 2014-12-02 2014-12-02 投影光学系、露光装置、および、デバイス製造方法

Publications (2)

Publication Number Publication Date
TW201621476A TW201621476A (zh) 2016-06-16
TWI588623B true TWI588623B (zh) 2017-06-21

Family

ID=56091280

Family Applications (2)

Application Number Title Priority Date Filing Date
TW104138518A TWI588623B (zh) 2014-12-02 2015-11-20 投影光學系統、曝光設備及裝置製造方法
TW106111174A TWI609251B (zh) 2014-12-02 2015-11-20 投影光學系統、曝光設備及裝置製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW106111174A TWI609251B (zh) 2014-12-02 2015-11-20 投影光學系統、曝光設備及裝置製造方法

Country Status (6)

Country Link
US (1) US10495978B2 (cg-RX-API-DMAC7.html)
JP (1) JP6386896B2 (cg-RX-API-DMAC7.html)
KR (1) KR101968432B1 (cg-RX-API-DMAC7.html)
CN (1) CN107003615B (cg-RX-API-DMAC7.html)
TW (2) TWI588623B (cg-RX-API-DMAC7.html)
WO (1) WO2016088314A1 (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7075302B2 (ja) 2018-07-23 2022-05-25 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法
JP7204400B2 (ja) * 2018-09-28 2023-01-16 キヤノン株式会社 露光装置及び物品の製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005345582A (ja) * 2004-06-01 2005-12-15 Dainippon Screen Mfg Co Ltd 投影光学系およびパターン描画装置
US20060092393A1 (en) * 2004-10-28 2006-05-04 Asml Holding N.V. Lithographic apparatus having an adjustable projection system and device manufacturing method
TW200935188A (en) * 2007-12-26 2009-08-16 Canon Kk Exposure apparatus and equipment manufacturing method
JP2011108793A (ja) * 2009-11-16 2011-06-02 Canon Inc 露光装置およびデバイス製造方法
TW201350902A (zh) * 2012-06-04 2013-12-16 Canon Kk 光學系統、曝光裝置及製造設備的方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0689844A (ja) * 1992-09-09 1994-03-29 Toshiba Corp 露光装置
JP2001326160A (ja) * 2000-05-16 2001-11-22 Seiko Epson Corp 反射投影露光装置の歪み検出機構
JP2008311498A (ja) * 2007-06-15 2008-12-25 Orc Mfg Co Ltd 反射型露光装置
TW200841134A (en) 2007-04-13 2008-10-16 Orc Mfg Co Ltd Projection exposure apparatus
JP2008263092A (ja) 2007-04-13 2008-10-30 Orc Mfg Co Ltd 投影露光装置
JP5398185B2 (ja) * 2008-07-09 2014-01-29 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
US8508735B2 (en) * 2008-09-22 2013-08-13 Nikon Corporation Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method
US8773635B2 (en) * 2008-12-19 2014-07-08 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP5116726B2 (ja) 2009-06-01 2013-01-09 キヤノン株式会社 露光装置およびデバイス製造方法
JP5595001B2 (ja) * 2009-10-06 2014-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
JP6410406B2 (ja) 2012-11-16 2018-10-24 キヤノン株式会社 投影光学系、露光装置および物品の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005345582A (ja) * 2004-06-01 2005-12-15 Dainippon Screen Mfg Co Ltd 投影光学系およびパターン描画装置
US20060092393A1 (en) * 2004-10-28 2006-05-04 Asml Holding N.V. Lithographic apparatus having an adjustable projection system and device manufacturing method
TW200935188A (en) * 2007-12-26 2009-08-16 Canon Kk Exposure apparatus and equipment manufacturing method
JP2011108793A (ja) * 2009-11-16 2011-06-02 Canon Inc 露光装置およびデバイス製造方法
TW201350902A (zh) * 2012-06-04 2013-12-16 Canon Kk 光學系統、曝光裝置及製造設備的方法

Also Published As

Publication number Publication date
CN107003615B (zh) 2019-01-25
KR101968432B1 (ko) 2019-04-11
CN107003615A (zh) 2017-08-01
JP6386896B2 (ja) 2018-09-05
US10495978B2 (en) 2019-12-03
TWI609251B (zh) 2017-12-21
JP2016109741A (ja) 2016-06-20
KR20170088938A (ko) 2017-08-02
US20170315448A1 (en) 2017-11-02
TW201621476A (zh) 2016-06-16
TW201734668A (zh) 2017-10-01
WO2016088314A1 (en) 2016-06-09

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