TWI587903B - 供應目標材料至目標位置的裝置和過濾器及過濾方法 - Google Patents

供應目標材料至目標位置的裝置和過濾器及過濾方法 Download PDF

Info

Publication number
TWI587903B
TWI587903B TW101110362A TW101110362A TWI587903B TW I587903 B TWI587903 B TW I587903B TW 101110362 A TW101110362 A TW 101110362A TW 101110362 A TW101110362 A TW 101110362A TW I587903 B TWI587903 B TW I587903B
Authority
TW
Taiwan
Prior art keywords
filter
target
holes
cross
mixture
Prior art date
Application number
TW101110362A
Other languages
English (en)
Chinese (zh)
Other versions
TW201304850A (zh
Inventor
伊格爾Ｖ 佛蒙柯維
威廉Ｎ 派特洛
喬治Ｏ 維斯晨庫
威廉 奧德姆
Original Assignee
Ａｓｍｌ荷蘭公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ａｓｍｌ荷蘭公司 filed Critical Ａｓｍｌ荷蘭公司
Publication of TW201304850A publication Critical patent/TW201304850A/zh
Application granted granted Critical
Publication of TWI587903B publication Critical patent/TWI587903B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/50—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition
    • B01D29/56—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition in series connection
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/10—Sintering only
    • B22F3/105—Sintering only by using electric current other than for infrared radiant energy, laser radiation or plasma ; by ultrasonic bonding
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Filtering Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW101110362A 2011-05-20 2012-03-26 供應目標材料至目標位置的裝置和過濾器及過濾方法 TWI587903B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/112,784 US9029813B2 (en) 2011-05-20 2011-05-20 Filter for material supply apparatus of an extreme ultraviolet light source

Publications (2)

Publication Number Publication Date
TW201304850A TW201304850A (zh) 2013-02-01
TWI587903B true TWI587903B (zh) 2017-06-21

Family

ID=47174252

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101110362A TWI587903B (zh) 2011-05-20 2012-03-26 供應目標材料至目標位置的裝置和過濾器及過濾方法

Country Status (7)

Country Link
US (2) US9029813B2 (enExample)
EP (1) EP2709743A4 (enExample)
JP (1) JP6117188B2 (enExample)
KR (1) KR101899418B1 (enExample)
CN (1) CN103561839B (enExample)
TW (1) TWI587903B (enExample)
WO (1) WO2012161860A1 (enExample)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012216768A (ja) * 2011-03-30 2012-11-08 Gigaphoton Inc レーザシステム、極端紫外光生成システム、およびレーザ光生成方法
US9029813B2 (en) 2011-05-20 2015-05-12 Asml Netherlands B.V. Filter for material supply apparatus of an extreme ultraviolet light source
NL2009358A (en) 2011-09-23 2013-03-26 Asml Netherlands Bv Radiation source.
JP2013140771A (ja) * 2011-12-09 2013-07-18 Gigaphoton Inc ターゲット供給装置
JP6087105B2 (ja) * 2012-10-23 2017-03-01 ギガフォトン株式会社 極端紫外光生成装置
JP6168797B2 (ja) * 2013-03-08 2017-07-26 ギガフォトン株式会社 極端紫外光生成装置
US9699876B2 (en) * 2013-03-14 2017-07-04 Asml Netherlands, B.V. Method of and apparatus for supply and recovery of target material
WO2014189055A1 (ja) 2013-05-21 2014-11-27 ギガフォトン株式会社 極端紫外光生成装置
JP6416766B2 (ja) 2013-08-01 2018-10-31 ギガフォトン株式会社 ターゲット供給装置
JP6275731B2 (ja) 2013-09-17 2018-02-07 ギガフォトン株式会社 ターゲット供給装置およびｅｕｖ光生成装置
WO2015087454A1 (ja) * 2013-12-13 2015-06-18 ギガフォトン株式会社 ターゲット供給装置
US9611163B2 (en) * 2014-03-05 2017-04-04 Owens-Brockway Glass Container Inc. Process and apparatus for refining molten glass
WO2016071972A1 (ja) * 2014-11-05 2016-05-12 ギガフォトン株式会社 フィルタ構造体、ターゲット生成装置およびフィルタ構造体の製造方法
CN104493127B (zh) * 2014-12-18 2017-12-19 绍兴柯桥恒松针纺有限公司 一种压铸铝合金液的过滤装置
JP6513106B2 (ja) 2015-01-28 2019-05-15 ギガフォトン株式会社 ターゲット供給装置
NL2017835A (en) * 2015-12-17 2017-07-07 Asml Netherlands Bv Droplet generator for lithographic apparatus, euv source and lithographic apparatus
CN105771354B (zh) * 2016-03-04 2018-05-01 绍兴南燕染整有限公司 一种印染水液颗粒过滤装置
JP6237825B2 (ja) * 2016-05-27 2017-11-29 ウシオ電機株式会社 高温プラズマ原料供給装置および極端紫外光光源装置
CN106334365B (zh) * 2016-10-08 2018-03-09 黄正集 一种水能制氢用水体初步过滤除杂装置
US10499485B2 (en) 2017-06-20 2019-12-03 Asml Netherlands B.V. Supply system for an extreme ultraviolet light source
JP7078706B2 (ja) 2017-07-06 2022-05-31 インテグリス・インコーポレーテッド 炭化ケイ素フィルター膜および使用方法
US10437162B2 (en) * 2017-09-21 2019-10-08 Asml Netherlands B.V. Methods and apparatuses for protecting a seal in a pressure vessel of a photolithography system
US10331035B2 (en) * 2017-11-08 2019-06-25 Taiwan Semiconductor Manufacturing Co., Ltd. Light source for lithography exposure process
US11404256B2 (en) 2018-02-09 2022-08-02 Hamamatsu Photonics K.K. Sample support, ionization method, and mass spectrometry method
CN111656180A (zh) * 2018-02-09 2020-09-11 浜松光子学株式会社 试样支承体、试样的离子化方法及质谱分析方法
NL2024077A (en) 2018-10-25 2020-05-13 Asml Netherlands Bv Target material supply apparatus and method
NL2024324A (en) * 2018-12-31 2020-07-10 Asml Netherlands Bv Apparatus for controlling introduction of euv target material into an euv chamber
WO2020187617A1 (en) * 2019-03-15 2020-09-24 Asml Netherlands B.V. Target material control in an euv light source
JP7660572B2 (ja) * 2019-12-17 2025-04-11 エーエスエムエル ネザーランズ ビー．ブイ． 極端紫外光源用のターゲット材料タンク
JP7491737B2 (ja) * 2020-05-21 2024-05-28 ギガフォトン株式会社 ターゲット供給装置、ターゲット供給方法、及び電子デバイスの製造方法
JP2022006351A (ja) * 2020-06-24 2022-01-13 ギガフォトン株式会社 ターゲット供給装置、ターゲット供給方法、及び電子デバイスの製造方法
CN112138452A (zh) * 2020-10-14 2020-12-29 杭州师范大学钱江学院 一种中药渣药液分离器及其分离方法
ES2938351B2 (es) * 2021-10-06 2024-03-12 Univ Navarra Publica Filtro de material cerámico electroconductor
CN116264753B (zh) * 2021-12-15 2025-09-12 北京锐德康科技有限公司 用于重频激光打靶的靶片及可装卸靶盘
US12133318B2 (en) * 2022-06-10 2024-10-29 Kla Corporation Rotating target for extreme ultraviolet source with liquid metal
US12214303B2 (en) * 2022-11-18 2025-02-04 Collins Engine Nozzles, Inc. Airfoil last chance screen utilizing EDM and AFM
JP2026505976A (ja) 2023-02-17 2026-02-20 エーエスエムエル ネザーランズ ビー．ブイ． Ｅｕｖ放射源用のターゲット材料格納及び搬送システム
CN120677368A (zh) * 2023-08-08 2025-09-19 株式会社日立高新技术 过滤装置、过滤系统及过滤方法
WO2025224250A1 (de) * 2024-04-25 2025-10-30 Carl Zeiss Smt Gmbh Strahlführungseinsatz für eine quellkammer einer euv-strahlungsquelle

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060192153A1 (en) * 2005-02-25 2006-08-31 Cymer, Inc. Source material dispenser for EUV light source
US20070125702A1 (en) * 2005-12-07 2007-06-07 General Electric Company Membrane structure and method of making

Family Cites Families (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3955953A (en) 1974-07-31 1976-05-11 Teletype Corporation Methods of making self filtering nozzles
US5045111A (en) * 1986-06-27 1991-09-03 The Carborundum Company Filtration of molten ferrous metal
DE3742770A1 (de) * 1987-12-17 1989-06-29 Akzo Gmbh Mikro-/ultrafiltrationsmembranen mit definierter porengroesse durch bestrahlung mit gepulsten lasern und verfahren zur herstellung
US5503721A (en) * 1991-07-18 1996-04-02 Hri Research, Inc. Method for photoactivation
DE4012093C1 (enExample) * 1990-04-14 1991-07-04 Didier-Werke Ag, 6200 Wiesbaden, De
US5590383A (en) * 1993-03-12 1996-12-31 Micropyretics Heaters International, Inc. Porous membranes and methods for making
NL9401260A (nl) * 1993-11-12 1995-06-01 Cornelis Johannes Maria Van Ri Membraan voor microfiltratie, ultrafiltratie, gasscheiding en katalyse, werkwijze ter vervaardiging van een dergelijk membraan, mal ter vervaardiging van een dergelijk membraan, alsmede diverse scheidingssystemen omvattende een dergelijk membraan.
JP3769739B2 (ja) * 1994-11-17 2006-04-26 住友電気工業株式会社 多孔質セラミックス膜及びその製造方法
US5673902A (en) * 1996-02-01 1997-10-07 Selee Corporation Dual stage ceramic foam filtration system and method
US5973902A (en) * 1998-08-13 1999-10-26 King; Kenneth A. Modified surge protector
JP3291487B2 (ja) * 1999-05-27 2002-06-10 三洋電機株式会社 流体の被除去物除去方法
JP3291488B2 (ja) * 1999-05-27 2002-06-10 三洋電機株式会社 流体の被除去物除去方法
US6491872B1 (en) * 1999-09-17 2002-12-10 The United States Of America As Represented By The Secretary Of The Army Method and system for detecting and recording submicron sized particles
US6331351B1 (en) 1999-09-22 2001-12-18 Gore Enterprise Holdings, Inc. Chemically active filter material
CN101362058B (zh) 1999-12-08 2011-10-12 巴克斯特国际公司 制造微孔滤膜的方法
US7491954B2 (en) 2006-10-13 2009-02-17 Cymer, Inc. Drive laser delivery systems for EUV light source
US20060255298A1 (en) 2005-02-25 2006-11-16 Cymer, Inc. Laser produced plasma EUV light source with pre-pulse
US7405416B2 (en) * 2005-02-25 2008-07-29 Cymer, Inc. Method and apparatus for EUV plasma source target delivery
US7465946B2 (en) * 2004-03-10 2008-12-16 Cymer, Inc. Alternative fuels for EUV light source
DE10153284A1 (de) 2001-10-29 2003-05-15 Emitec Emissionstechnologie Filterverbund und Verfahren zu seiner Herstellung
US20030150294A1 (en) * 2002-01-25 2003-08-14 Njall Stefansson Filters for filtering molten metals and alloys field
US20030150791A1 (en) * 2002-02-13 2003-08-14 Cho Steven T. Micro-fluidic anti-microbial filter
US20050133613A1 (en) * 2002-03-10 2005-06-23 Yaron Mayer System and method for more efficient automatic irrigation based on a large number of cheap humidity sensors and automatic faucets
US6835944B2 (en) 2002-10-11 2004-12-28 University Of Central Florida Research Foundation Low vapor pressure, low debris solid target for EUV production
JP4637476B2 (ja) 2002-12-19 2011-02-23 東京応化工業株式会社 ホトレジスト組成物の製造方法
JP2004316428A (ja) * 2003-02-26 2004-11-11 Ngk Insulators Ltd 排気ガス浄化フィルタのスート堆積量予測方法およびプログラム
DE10353894B4 (de) 2003-07-11 2007-02-15 Nft Nanofiltertechnik Gmbh Filterelement und Verfahren zu dessen Herstellung
US7906023B2 (en) * 2005-01-25 2011-03-15 Pss Acquisitionco Llc Wastewater treatment method and apparatus
US20050172896A1 (en) 2004-02-10 2005-08-11 Tihiro Ohkawa Injector for plasma mass filter
US20050199560A1 (en) * 2004-03-11 2005-09-15 Blasch Precision Ceramics, Inc. Interchangeable ceramic filter assembly and molten metal processing apparatus including same
JP4878108B2 (ja) * 2004-07-14 2012-02-15 キヤノン株式会社 露光装置、デバイス製造方法、および測定装置
US7303603B2 (en) 2004-11-12 2007-12-04 General Motors Corporation Diesel particulate filter system with meta-surface cavity
US7449703B2 (en) 2005-02-25 2008-11-11 Cymer, Inc. Method and apparatus for EUV plasma source target delivery target material handling
JP2010502546A (ja) * 2006-08-29 2010-01-28 コーニング インコーポレイテッド ガラス結合セラミック構造体
JP5007214B2 (ja) * 2006-12-12 2012-08-22 花王株式会社 溶湯異物除去用部品
US8308851B2 (en) * 2007-03-27 2012-11-13 David Roberts Removal of contaminants from water and gas by filtration
KR100917271B1 (ko) * 2007-10-30 2009-09-21 대창공업 주식회사 금속 용탕 중의 불순물 제거를 위한 다층구조를 가지는필터
RU2010129965A (ru) * 2007-12-20 2012-01-27 Члены Правления Университета Калифорнии (Us) Спеченная пористая структура и способ получения такой структуры
AT506640B1 (de) * 2008-03-17 2010-07-15 Siemens Vai Metals Tech Gmbh Verfahren und vorrichtung zur herstellung von flüssigem roheisen oder flüssigen stahlvorprodukten
US7872245B2 (en) 2008-03-17 2011-01-18 Cymer, Inc. Systems and methods for target material delivery in a laser produced plasma EUV light source
US8940173B2 (en) * 2008-05-29 2015-01-27 Lawrence Livermore National Security, Llc Membranes with functionalized carbon nanotube pores for selective transport
JP5455661B2 (ja) * 2009-01-29 2014-03-26 ギガフォトン株式会社 極端紫外光源装置
US20110097215A1 (en) * 2009-10-23 2011-04-28 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Flexible Solid-State Pump Constructed of Surface-Modified Glass Fiber Filters and Metal Mesh Electrodes
EP2516036A4 (en) * 2009-12-21 2013-07-03 Geo2 Technologies Inc FIBER REINFORCED, POROUS SUBSTRATE
MY163935A (en) * 2010-05-05 2017-11-15 Basf Corp Catalyzed soot filter and emissions treatment systems and methods
US9029813B2 (en) * 2011-05-20 2015-05-12 Asml Netherlands B.V. Filter for material supply apparatus of an extreme ultraviolet light source

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060192153A1 (en) * 2005-02-25 2006-08-31 Cymer, Inc. Source material dispenser for EUV light source
US20070125702A1 (en) * 2005-12-07 2007-06-07 General Electric Company Membrane structure and method of making

Also Published As

Publication number Publication date
KR101899418B1 (ko) 2018-10-04
TW201304850A (zh) 2013-02-01
CN103561839B (zh) 2017-03-01
JP2014522302A (ja) 2014-09-04
US20120292527A1 (en) 2012-11-22
KR20140036223A (ko) 2014-03-25
EP2709743A1 (en) 2014-03-26
JP6117188B2 (ja) 2017-04-19
US9029813B2 (en) 2015-05-12
US20150209701A1 (en) 2015-07-30
EP2709743A4 (en) 2015-05-27
CN103561839A (zh) 2014-02-05
US9669334B2 (en) 2017-06-06
WO2012161860A1 (en) 2012-11-29

Similar Documents

Publication Publication Date Title
TW201304850A (zh) 材料供應裝置之過濾器
TWI528993B (zh) 材料供應裝置之過濾器
JP6784737B2 (ja) レーザ生成プラズマｅｕｖ光源におけるソース材料送出の装置及び方法
JP5597993B2 (ja) レーザ生成プラズマｅｕｖ光源
TWI639721B (zh) 用於極紫外光源之靶材供給裝置
EP2181449B1 (en) System managing gas flow between chambers of an extreme ultraviolet (euv) photolithography apparatus
CN103765997B (zh) 用于器件制造的光刻设备的辐射源以及方法
JP2013524464A (ja) レーザ生成プラズマｅｕｖ光源におけるターゲット材料送出保護のためのシステム及び方法
JP7169302B2 (ja) 極端紫外線光源のための供給システム
WO2010117801A1 (en) Systems and methods for protecting an euv light source chamber from high pressure source material leaks
CN113273314B (zh) 用于控制将euv目标材料引入到euv腔室中的装置
CN113812215B (zh) 用于极紫外光源的保护系统
KR102825332B1 (ko) 타겟 재료 공급 장치 및 방법
JP7538698B2 (ja) ターゲット供給装置、極端紫外光生成装置、及び電子デバイスの製造方法
KR102759799B1 (ko) Euv 챔버 내로의 euv 타겟 물질의 도입을 제어하기 위한 장치 및 방법
EP1739490A1 (en) Radiation energy sensor with extended lifetime
KR20240127452A (ko) 극자외선 광 소스에서의 파편 완화