JP6784737B2 - レーザ生成プラズマeuv光源におけるソース材料送出の装置及び方法 - Google Patents
レーザ生成プラズマeuv光源におけるソース材料送出の装置及び方法 Download PDFInfo
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/006—X-ray radiation generated from plasma being produced from a liquid or gas details of the ejection system, e.g. constructional details of the nozzle
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
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- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
Description
Claims (10)
- チャンバと、
ソース材料解放点を有し、前記ソース材料解放点と前記チャンバ内の照射領域との間の経路に沿ってソース材料のストリームを前記照射領域に送出するように適合されているソース材料送出システムと、
前記チャンバ内で前記経路の少なくとも一部に沿ってガスを流すように適合されている第1のガス送出システムと、
を備え、
前記ソース材料送出システムが、前記ソース材料解放点から前記経路に対して平行に固体シュラウド端部まで延出して前記ストリームの少なくとも一部を保護する固体シュラウドを含み、
前記第1のガス送出システムが、前記チャンバ内で前記経路の少なくとも一部に沿って、前記固体シュラウドの内部で及び前記固体シュラウド端部から出て前記照射領域の方へ、ガスを流すように適合されている、
デバイス。 - コレクタミラーを含むEUV光学部品をさらに備える、請求項1に記載のデバイス。
- 前記EUV光学部品の方向から前記ストリームの方へガスを流すように適合されている第2のガス送出システムをさらに備え、前記第2のガス送出システムが、前記EUV光学部品の中央アパーチャを通してガスを流すように適合されている、請求項2に記載のデバイス。
- 前記EUV光学部品の方向から前記ストリームの方へガスを流すように適合されている第2のガス送出システムをさらに備え、前記第2のガス送出システムが、前記照射領域に面した前記EUV光学部品の実質的に半径方向に対称的な表面に隣接して配置されると共に前記EUV光学部品の中央アパーチャと前記EUV光学部品の外周縁との間の距離の少なくとも一部で実質的に半径方向に延出するガス送出ラインを備える、請求項2に記載のデバイス。
- チャンバと、
ソース材料解放点を有し、前記ソース材料解放点と前記チャンバ内の照射領域との間の経路に沿ってソース材料のストリームを前記照射領域内のプラズマバブルに送出するように適合され、前記ソース材料解放点から前記経路に対して平行に固体シュラウド端部まで延出して前記ストリームの少なくとも一部を保護する固体シュラウドを含む、ソース材料送出システムと、
前記固体シュラウド端部と前記プラズマバブルとの間に画定されるギャップであって、前記チャンバ内で前記固体シュラウド端部と前記照射領域との間の前記経路の少なくとも一部に沿ってガスを流すように適合されている第1のガス送出システムからの前記ガスによって所定の幅が維持される、ギャップと、
を備え、
前記第1のガス送出システムが、前記チャンバ内で前記経路の少なくとも一部に沿って、前記固体シュラウドの内部で及び前記固体シュラウド端部から出て前記照射領域の方へ、ガスを流すように適合されている、
デバイス。 - EUV光学部品と、前記EUV光学部品の方向から前記ストリームの方へガスを流す第2のガス送出システムと、を備え、
前記EUV光学部品が、コレクタミラーを含む、請求項5に記載のデバイス。 - 前記第2のガス送出システムが、前記照射領域に面した前記EUV光学部品の実質的に半径方向に対称的な表面に隣接して配置されると共に前記EUV光学部品の中央アパーチャと前記EUV光学部品の外周縁との間の距離の少なくとも一部で実質的に半径方向に延出するガス送出ラインを備え、
前記ガス送出ラインは、前記EUV光学部品の前記表面から実質的に直交して離れるようにガスを方向付けるオリフィスを有する、請求項6に記載のデバイス。 - 前記ガス送出ラインは、前記固体シュラウドによって遮蔽される前記EUV光学部品の前記表面の部分の近くに位置付けられる、請求項7に記載のデバイス。
- チャンバ内のソース材料解放点と前記チャンバ内の照射領域との間の固体シュラウドを通る経路に沿ってソース材料のストリームを送出するステップと、
前記チャンバ内で前記経路に少なくとも一部に沿って、前記固体シュラウドの端部と前記照射領域内のプラズマバブルとによって画定されるギャップへと、前記固体シュラウドの前記端部から前記プラズマバブルに向かう方向で、所定の幅の前記ギャップを維持するために、ガスをストリーム化するステップと、
を含み、
前記ソース材料は、EUVソース材料を含み、
前記ストリーム化するステップが、前記チャンバ内で前記経路の少なくとも一部に沿って、前記固体シュラウドの内部で及び前記固体シュラウド端部から出て前記照射領域の方へガスを流すことを含む、
方法。 - 前記ストリーム化ステップと同時に、EUV光学部品の方向から前記経路の方へガスを流すステップをさらに含む、請求項9に記載の方法。
Applications Claiming Priority (2)
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US14/094,361 US9301382B2 (en) | 2013-12-02 | 2013-12-02 | Apparatus for and method of source material delivery in a laser produced plasma EUV light source |
US14/094,361 | 2013-12-02 |
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JP2016529425A Division JP6423430B2 (ja) | 2013-12-02 | 2014-11-06 | レーザ生成プラズマeuv光源におけるソース材料送出の装置 |
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JP2019012293A JP2019012293A (ja) | 2019-01-24 |
JP6784737B2 true JP6784737B2 (ja) | 2020-11-11 |
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JP2016529425A Active JP6423430B2 (ja) | 2013-12-02 | 2014-11-06 | レーザ生成プラズマeuv光源におけるソース材料送出の装置 |
JP2018196403A Active JP6784737B2 (ja) | 2013-12-02 | 2018-10-18 | レーザ生成プラズマeuv光源におけるソース材料送出の装置及び方法 |
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Country Status (6)
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US (2) | US9301382B2 (ja) |
JP (2) | JP6423430B2 (ja) |
KR (2) | KR102438937B1 (ja) |
CN (2) | CN110062515B (ja) |
TW (2) | TWI711344B (ja) |
WO (1) | WO2015082997A1 (ja) |
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TW201535060A (zh) | 2015-09-16 |
CN110062515A (zh) | 2019-07-26 |
KR102438937B1 (ko) | 2022-08-31 |
US20150156855A1 (en) | 2015-06-04 |
WO2015082997A1 (en) | 2015-06-11 |
CN105981482B (zh) | 2019-04-12 |
JP6423430B2 (ja) | 2018-11-14 |
CN105981482A (zh) | 2016-09-28 |
CN110062515B (zh) | 2023-11-28 |
JP2016540346A (ja) | 2016-12-22 |
US9795023B2 (en) | 2017-10-17 |
TWI649629B (zh) | 2019-02-01 |
KR20220042250A (ko) | 2022-04-04 |
TW201907753A (zh) | 2019-02-16 |
TWI711344B (zh) | 2020-11-21 |
JP2019012293A (ja) | 2019-01-24 |
US9301382B2 (en) | 2016-03-29 |
KR20160093066A (ko) | 2016-08-05 |
KR102379661B1 (ko) | 2022-03-25 |
US20160174352A1 (en) | 2016-06-16 |
WO2015082997A4 (en) | 2015-10-15 |
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