TWI580769B - 包含氧化鈰磨料之拋光組合物 - Google Patents
包含氧化鈰磨料之拋光組合物 Download PDFInfo
- Publication number
- TWI580769B TWI580769B TW105106807A TW105106807A TWI580769B TW I580769 B TWI580769 B TW I580769B TW 105106807 A TW105106807 A TW 105106807A TW 105106807 A TW105106807 A TW 105106807A TW I580769 B TWI580769 B TW I580769B
- Authority
- TW
- Taiwan
- Prior art keywords
- polishing composition
- ppm
- polishing
- abrasive particles
- chemical mechanical
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
- B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/04—Aqueous dispersions
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/06—Other polishing compositions
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/06—Etching, surface-brightening or pickling compositions containing an inorganic acid with organic material
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
-
- H10P52/402—
-
- H10P52/403—
-
- H10P95/062—
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Dispersion Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/639,564 US9505952B2 (en) | 2015-03-05 | 2015-03-05 | Polishing composition containing ceria abrasive |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201641661A TW201641661A (zh) | 2016-12-01 |
| TWI580769B true TWI580769B (zh) | 2017-05-01 |
Family
ID=56848507
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW105106807A TWI580769B (zh) | 2015-03-05 | 2016-03-04 | 包含氧化鈰磨料之拋光組合物 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US9505952B2 (enExample) |
| EP (1) | EP3265534B1 (enExample) |
| JP (1) | JP6748096B2 (enExample) |
| KR (1) | KR102650942B1 (enExample) |
| CN (1) | CN107427988B (enExample) |
| TW (1) | TWI580769B (enExample) |
| WO (1) | WO2016140968A1 (enExample) |
Families Citing this family (46)
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| US9873180B2 (en) | 2014-10-17 | 2018-01-23 | Applied Materials, Inc. | CMP pad construction with composite material properties using additive manufacturing processes |
| US11745302B2 (en) | 2014-10-17 | 2023-09-05 | Applied Materials, Inc. | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process |
| US9776361B2 (en) | 2014-10-17 | 2017-10-03 | Applied Materials, Inc. | Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles |
| US10875153B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Advanced polishing pad materials and formulations |
| KR102630261B1 (ko) | 2014-10-17 | 2024-01-29 | 어플라이드 머티어리얼스, 인코포레이티드 | 애디티브 제조 프로세스들을 이용한 복합 재료 특성들을 갖는 cmp 패드 구성 |
| KR102463863B1 (ko) * | 2015-07-20 | 2022-11-04 | 삼성전자주식회사 | 연마용 조성물 및 이를 이용한 반도체 장치의 제조 방법 |
| US9597768B1 (en) * | 2015-09-09 | 2017-03-21 | Cabot Microelectronics Corporation | Selective nitride slurries with improved stability and improved polishing characteristics |
| KR20230169424A (ko) | 2015-10-30 | 2023-12-15 | 어플라이드 머티어리얼스, 인코포레이티드 | 원하는 제타 전위를 가진 연마 제품을 형성하는 장치 및 방법 |
| US10593574B2 (en) | 2015-11-06 | 2020-03-17 | Applied Materials, Inc. | Techniques for combining CMP process tracking data with 3D printed CMP consumables |
| US10391605B2 (en) | 2016-01-19 | 2019-08-27 | Applied Materials, Inc. | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
| KR101823083B1 (ko) * | 2016-09-07 | 2018-01-30 | 주식회사 케이씨텍 | 표면개질된 콜로이달 세리아 연마입자, 그의 제조방법 및 그를 포함하는 연마 슬러리 조성물 |
| TWI673357B (zh) * | 2016-12-14 | 2019-10-01 | Cabot Microelectronics Corporation | 自化學機械平坦化基板移除殘留物之組合物及方法 |
| JP7326166B2 (ja) * | 2017-06-15 | 2023-08-15 | ローディア オペレーションズ | セリウム系粒子 |
| KR102336865B1 (ko) * | 2017-07-06 | 2021-12-09 | 오씨아이 주식회사 | 식각 조성물 및 이를 이용한 식각 방법 |
| CN109251674B (zh) * | 2017-07-13 | 2021-12-17 | 安集微电子科技(上海)股份有限公司 | 一种化学机械抛光液 |
| CN109251672B (zh) * | 2017-07-13 | 2022-02-18 | 安集微电子科技(上海)股份有限公司 | 一种化学机械抛光液 |
| US11471999B2 (en) * | 2017-07-26 | 2022-10-18 | Applied Materials, Inc. | Integrated abrasive polishing pads and manufacturing methods |
| US11072050B2 (en) | 2017-08-04 | 2021-07-27 | Applied Materials, Inc. | Polishing pad with window and manufacturing methods thereof |
| WO2019032286A1 (en) | 2017-08-07 | 2019-02-14 | Applied Materials, Inc. | ABRASIVE DISTRIBUTION POLISHING PADS AND METHODS OF MAKING SAME |
| KR102541313B1 (ko) * | 2018-01-12 | 2023-06-13 | 후지필름 가부시키가이샤 | 약액, 기판의 처리 방법 |
| US10584266B2 (en) * | 2018-03-14 | 2020-03-10 | Cabot Microelectronics Corporation | CMP compositions containing polymer complexes and agents for STI applications |
| US11549034B2 (en) | 2018-08-09 | 2023-01-10 | Versum Materials Us, Llc | Oxide chemical mechanical planarization (CMP) polishing compositions |
| JP7299970B2 (ja) | 2018-09-04 | 2023-06-28 | アプライド マテリアルズ インコーポレイテッド | 改良型研磨パッドのための配合物 |
| JP7326048B2 (ja) * | 2018-09-28 | 2023-08-15 | 花王株式会社 | 酸化珪素膜用研磨液組成物 |
| US11814547B2 (en) | 2018-09-28 | 2023-11-14 | Kao Corporation | Polishing liquid composition for silicon oxide film |
| JP7209583B2 (ja) * | 2019-05-08 | 2023-01-20 | 花王株式会社 | 酸化珪素膜用研磨液組成物 |
| KR102814738B1 (ko) * | 2019-08-06 | 2025-05-30 | 삼성디스플레이 주식회사 | 연마 슬러리, 이를 이용한 표시 장치의 제조방법 및 표시 장치 |
| EP4041845A4 (en) | 2019-10-09 | 2023-11-22 | Entegris, Inc. | WET ETCH COMPOSITION AND METHOD |
| EP4048747A4 (en) * | 2019-10-22 | 2023-10-25 | CMC Materials, Inc. | COMPOSITION AND AUTO-STOP POLISHING METHOD |
| EP4048748A4 (en) | 2019-10-22 | 2023-11-08 | CMC Materials, Inc. | Composition and method for selective oxide cmp |
| KR20220088749A (ko) * | 2019-10-24 | 2022-06-28 | 버슘머트리얼즈 유에스, 엘엘씨 | 높은 산화물 제거율을 지닌 얕은 트렌치 절연 화학 기계적 평탄화 조성물 |
| IL292956A (en) | 2019-11-26 | 2022-07-01 | Rhodia Operations | Liquid and powder dispersion of cerium-based core-shell particles, process for their production and use in polishing |
| KR20220110799A (ko) * | 2019-12-04 | 2022-08-09 | 버슘머트리얼즈 유에스, 엘엘씨 | 높은 산화막 제거율의 얕은 트렌치 격리(sti) 화학적 기계적 평탄화(cmp) 연마 |
| KR102859110B1 (ko) | 2020-01-07 | 2025-09-12 | 씨엠씨 머티리얼즈 엘엘씨 | 유도체화된 폴리아미노산 |
| TWI896411B (zh) * | 2020-08-31 | 2025-09-01 | 南韓商秀博瑞殷股份有限公司 | 氧化鈰粒子、其製造方法、包含其的化學機械研磨用漿料組合物以及半導體器件的製造方法 |
| WO2022070314A1 (ja) | 2020-09-30 | 2022-04-07 | 昭和電工マテリアルズ株式会社 | スラリ及び研磨方法 |
| CN114621682A (zh) * | 2020-12-11 | 2022-06-14 | 安集微电子(上海)有限公司 | 一种化学机械抛光液及其使用方法 |
| US11878389B2 (en) | 2021-02-10 | 2024-01-23 | Applied Materials, Inc. | Structures formed using an additive manufacturing process for regenerating surface texture in situ |
| JP7682008B2 (ja) * | 2021-04-16 | 2025-05-23 | 花王株式会社 | 酸化珪素膜用研磨液組成物 |
| CN113201284B (zh) * | 2021-04-24 | 2022-03-11 | 深圳市撒比斯科技有限公司 | 一种高抛光度cmp抛光液及其制备方法 |
| CN117321170A (zh) | 2021-05-17 | 2023-12-29 | 罗地亚经营管理公司 | 基于铈的核-壳颗粒的液体分散体和粉末、其生产方法及其在抛光中的用途 |
| KR102765948B1 (ko) * | 2021-05-20 | 2025-02-11 | 주식회사 한국나노오트 | 연마용 세리아 입자 및 이를 포함하는 슬러리 |
| KR102620964B1 (ko) * | 2021-07-08 | 2024-01-03 | 에스케이엔펄스 주식회사 | 반도체 공정용 연마 조성물 및 이를 이용한 연마된 물품의 제조방법 |
| WO2025132262A1 (en) | 2023-12-21 | 2025-06-26 | Rhodia Operations | Aqueous dispersion comprising particles of cerium oxide with adsorbed polyoxometalates species thereon, process for producing the same and use thereof in polishing |
| WO2025141810A1 (ja) * | 2023-12-27 | 2025-07-03 | 株式会社レゾナック | 研磨液及び研磨方法 |
| WO2025190482A1 (en) | 2024-03-13 | 2025-09-18 | Rhodia Operations | Cerium oxide particles with cotrolled microstructure |
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|---|---|---|---|---|
| TW201307542A (zh) * | 2011-08-05 | 2013-02-16 | 安集微電子(上海)有限公司 | 化學機械拋光液 |
| TW201412908A (zh) * | 2012-07-11 | 2014-04-01 | 卡博特微電子公司 | 用於氮化矽材料之選擇性拋光之組合物及方法 |
| KR101405334B1 (ko) * | 2013-09-12 | 2014-06-11 | 유비머트리얼즈주식회사 | 연마 입자의 제조 방법 및 연마 슬러리의 제조 방법 |
| TW201504415A (zh) * | 2013-07-22 | 2015-02-01 | 卡博特微電子公司 | 用於二氧化矽、氮化矽、以及多晶矽材料之化學機械拋光之組合物及方法 |
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-
2015
- 2015-03-05 US US14/639,564 patent/US9505952B2/en active Active
-
2016
- 2016-03-01 EP EP16759356.5A patent/EP3265534B1/en active Active
- 2016-03-01 KR KR1020177027602A patent/KR102650942B1/ko active Active
- 2016-03-01 JP JP2017546138A patent/JP6748096B2/ja active Active
- 2016-03-01 WO PCT/US2016/020261 patent/WO2016140968A1/en not_active Ceased
- 2016-03-01 CN CN201680013843.2A patent/CN107427988B/zh active Active
- 2016-03-04 TW TW105106807A patent/TWI580769B/zh active
- 2016-10-31 US US15/338,724 patent/US9828528B2/en active Active
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| TW201307542A (zh) * | 2011-08-05 | 2013-02-16 | 安集微電子(上海)有限公司 | 化學機械拋光液 |
| TW201412908A (zh) * | 2012-07-11 | 2014-04-01 | 卡博特微電子公司 | 用於氮化矽材料之選擇性拋光之組合物及方法 |
| TW201504415A (zh) * | 2013-07-22 | 2015-02-01 | 卡博特微電子公司 | 用於二氧化矽、氮化矽、以及多晶矽材料之化學機械拋光之組合物及方法 |
| KR101405334B1 (ko) * | 2013-09-12 | 2014-06-11 | 유비머트리얼즈주식회사 | 연마 입자의 제조 방법 및 연마 슬러리의 제조 방법 |
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| Title |
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| Luo, Jianfeng et al., "Effects of abrasive size distribution in chemical mechanical planarization: modeling and verification", IEEE Transaction on Semiconductor Manufacturing, 2003, Vol. 16, No. 3, pp. 469-476 * |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102650942B1 (ko) | 2024-03-26 |
| WO2016140968A1 (en) | 2016-09-09 |
| JP6748096B2 (ja) | 2020-08-26 |
| EP3265534A1 (en) | 2018-01-10 |
| US9505952B2 (en) | 2016-11-29 |
| US20170044403A1 (en) | 2017-02-16 |
| US20160257856A1 (en) | 2016-09-08 |
| EP3265534A4 (en) | 2018-12-05 |
| KR20170125378A (ko) | 2017-11-14 |
| TW201641661A (zh) | 2016-12-01 |
| CN107427988A (zh) | 2017-12-01 |
| EP3265534B1 (en) | 2021-04-14 |
| CN107427988B (zh) | 2019-09-17 |
| US9828528B2 (en) | 2017-11-28 |
| JP2018512475A (ja) | 2018-05-17 |
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