TWI574783B - 製造研磨墊之方法與製造研磨墊之研磨層之方法 - Google Patents
製造研磨墊之方法與製造研磨墊之研磨層之方法 Download PDFInfo
- Publication number
- TWI574783B TWI574783B TW102112533A TW102112533A TWI574783B TW I574783 B TWI574783 B TW I574783B TW 102112533 A TW102112533 A TW 102112533A TW 102112533 A TW102112533 A TW 102112533A TW I574783 B TWI574783 B TW I574783B
- Authority
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- Taiwan
- Prior art keywords
- layer
- layers
- abrasive
- polishing
- pad
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
- B24D18/009—Tools not otherwise provided for
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/112—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using individual droplets, e.g. from jetting heads
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
- B29C64/205—Means for applying layers
- B29C64/209—Heads; Nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/30—Auxiliary operations or equipment
- B29C64/386—Data acquisition or data processing for additive manufacturing
- B29C64/393—Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y30/00—Apparatus for additive manufacturing; Details thereof or accessories therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y50/00—Data acquisition or data processing for additive manufacturing
- B33Y50/02—Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y80/00—Products made by additive manufacturing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
- B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2075/00—Use of PU, i.e. polyureas or polyurethanes or derivatives thereof, as moulding material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2105/00—Condition, form or state of moulded material or of the material to be shaped
- B29K2105/0002—Condition, form or state of moulded material or of the material to be shaped monomers or prepolymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2105/00—Condition, form or state of moulded material or of the material to be shaped
- B29K2105/06—Condition, form or state of moulded material or of the material to be shaped containing reinforcements, fillers or inserts
- B29K2105/16—Fillers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2509/00—Use of inorganic materials not provided for in groups B29K2503/00 - B29K2507/00, as filler
- B29K2509/02—Ceramics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2031/00—Other particular articles
- B29L2031/736—Grinding or polishing equipment
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- Toxicology (AREA)
- Oral & Maxillofacial Surgery (AREA)
- Thermal Sciences (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261638461P | 2012-04-25 | 2012-04-25 | |
| US13/591,051 US9067299B2 (en) | 2012-04-25 | 2012-08-21 | Printed chemical mechanical polishing pad |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201350265A TW201350265A (zh) | 2013-12-16 |
| TWI574783B true TWI574783B (zh) | 2017-03-21 |
Family
ID=49476099
Family Applications (7)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102112533A TWI574783B (zh) | 2012-04-25 | 2013-04-09 | 製造研磨墊之方法與製造研磨墊之研磨層之方法 |
| TW107106518A TWI731225B (zh) | 2012-04-25 | 2013-04-09 | 製造研磨墊之研磨層的設備及用於形成化學機械研磨墊之研磨層之方法 |
| TW110115706A TWI767681B (zh) | 2012-04-25 | 2013-04-09 | 製造研磨墊之研磨層的設備及用於形成化學機械研磨墊之研磨層之方法 |
| TW112103439A TWI823764B (zh) | 2012-04-25 | 2013-04-09 | 製造研磨墊之研磨層的設備及用於形成化學機械研磨墊之研磨層之方法 |
| TW111117140A TWI795287B (zh) | 2012-04-25 | 2013-04-09 | 製造研磨墊之研磨層的設備及用於形成化學機械研磨墊之研磨層之方法 |
| TW105139914A TWI620617B (zh) | 2012-04-25 | 2013-04-09 | 製造研磨墊之方法與製造研磨墊之研磨層之方法 |
| TW108142269A TWI729578B (zh) | 2012-04-25 | 2013-04-09 | 製造研磨墊之研磨層的設備及用於形成化學機械研磨墊之研磨層之方法 |
Family Applications After (6)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW107106518A TWI731225B (zh) | 2012-04-25 | 2013-04-09 | 製造研磨墊之研磨層的設備及用於形成化學機械研磨墊之研磨層之方法 |
| TW110115706A TWI767681B (zh) | 2012-04-25 | 2013-04-09 | 製造研磨墊之研磨層的設備及用於形成化學機械研磨墊之研磨層之方法 |
| TW112103439A TWI823764B (zh) | 2012-04-25 | 2013-04-09 | 製造研磨墊之研磨層的設備及用於形成化學機械研磨墊之研磨層之方法 |
| TW111117140A TWI795287B (zh) | 2012-04-25 | 2013-04-09 | 製造研磨墊之研磨層的設備及用於形成化學機械研磨墊之研磨層之方法 |
| TW105139914A TWI620617B (zh) | 2012-04-25 | 2013-04-09 | 製造研磨墊之方法與製造研磨墊之研磨層之方法 |
| TW108142269A TWI729578B (zh) | 2012-04-25 | 2013-04-09 | 製造研磨墊之研磨層的設備及用於形成化學機械研磨墊之研磨層之方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (8) | US9067299B2 (enExample) |
| EP (2) | EP3961675A1 (enExample) |
| JP (4) | JP6180512B2 (enExample) |
| KR (6) | KR20230141957A (enExample) |
| CN (2) | CN104285281B (enExample) |
| SG (2) | SG10201700369XA (enExample) |
| TW (7) | TWI574783B (enExample) |
| WO (1) | WO2013162856A1 (enExample) |
Families Citing this family (81)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7674671B2 (en) | 2004-12-13 | 2010-03-09 | Optomec Design Company | Aerodynamic jetting of aerosolized fluids for fabrication of passive structures |
| US9067299B2 (en) * | 2012-04-25 | 2015-06-30 | Applied Materials, Inc. | Printed chemical mechanical polishing pad |
| US9421666B2 (en) * | 2013-11-04 | 2016-08-23 | Applied Materials, Inc. | Printed chemical mechanical polishing pad having abrasives therein |
| US9993907B2 (en) * | 2013-12-20 | 2018-06-12 | Applied Materials, Inc. | Printed chemical mechanical polishing pad having printed window |
| US20160354896A1 (en) * | 2014-02-10 | 2016-12-08 | President And Fellows Of Harvard College | 3d-printed polishing pad for chemical-mechanical planarization (cmp) |
| US9738032B2 (en) * | 2014-06-06 | 2017-08-22 | Xerox Corporation | System for controlling operation of a printer during three-dimensional object printing with reference to a distance from the surface of object |
| JP6329437B2 (ja) * | 2014-06-10 | 2018-05-23 | キヤノン株式会社 | インプリント装置、インプリント方法、および物品の製造方法 |
| JP2017530251A (ja) * | 2014-07-09 | 2017-10-12 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 付加製造における、層別加熱、ライン別加熱、プラズマ加熱、及び複数の供給材料 |
| CN106716604A (zh) * | 2014-10-09 | 2017-05-24 | 应用材料公司 | 具有内部通道的化学机械研磨垫 |
| US9873180B2 (en) | 2014-10-17 | 2018-01-23 | Applied Materials, Inc. | CMP pad construction with composite material properties using additive manufacturing processes |
| TWI652735B (zh) | 2014-10-09 | 2019-03-01 | 美商應用材料股份有限公司 | 具有內部通道的化學機械研磨墊 |
| US10875153B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Advanced polishing pad materials and formulations |
| US10821573B2 (en) | 2014-10-17 | 2020-11-03 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
| US9776361B2 (en) | 2014-10-17 | 2017-10-03 | Applied Materials, Inc. | Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles |
| TWI689406B (zh) * | 2014-10-17 | 2020-04-01 | 美商應用材料股份有限公司 | 研磨墊及製造其之方法 |
| WO2016061585A1 (en) * | 2014-10-17 | 2016-04-21 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
| WO2016060712A1 (en) * | 2014-10-17 | 2016-04-21 | Applied Materials, Inc. | Cmp pad construction with composite material properties using additive manufacturing processes |
| US11745302B2 (en) | 2014-10-17 | 2023-09-05 | Applied Materials, Inc. | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process |
| US10399201B2 (en) | 2014-10-17 | 2019-09-03 | Applied Materials, Inc. | Advanced polishing pads having compositional gradients by use of an additive manufacturing process |
| US10875145B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
| WO2016130709A1 (en) * | 2015-02-10 | 2016-08-18 | Optomec, Inc. | Fabrication of three-dimensional structures by in-flight curing of aerosols |
| CN107614202B (zh) * | 2015-05-13 | 2019-12-03 | 阪东化学株式会社 | 研磨垫及研磨垫的制造方法 |
| PL3313617T3 (pl) | 2015-06-25 | 2023-08-14 | 3M Innovative Properties Company | Sposoby wytwarzania wyrobów ściernych z metalicznym środkiem wiążącym oraz wyroby ścierne z metalicznym środkiem wiążącym |
| US9969049B2 (en) * | 2015-06-29 | 2018-05-15 | Iv Technologies Co., Ltd. | Polishing layer of polishing pad and method of forming the same and polishing method |
| CN108136568B (zh) * | 2015-10-16 | 2020-10-09 | 应用材料公司 | 使用增材制造工艺形成先进抛光垫的方法和设备 |
| US10618141B2 (en) * | 2015-10-30 | 2020-04-14 | Applied Materials, Inc. | Apparatus for forming a polishing article that has a desired zeta potential |
| US10593574B2 (en) * | 2015-11-06 | 2020-03-17 | Applied Materials, Inc. | Techniques for combining CMP process tracking data with 3D printed CMP consumables |
| US10189143B2 (en) * | 2015-11-30 | 2019-01-29 | Taiwan Semiconductor Manufacturing Company Limited | Polishing pad, method for manufacturing polishing pad, and polishing method |
| US10391605B2 (en) | 2016-01-19 | 2019-08-27 | Applied Materials, Inc. | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
| KR20240015161A (ko) * | 2016-01-19 | 2024-02-02 | 어플라이드 머티어리얼스, 인코포레이티드 | 다공성 화학적 기계적 연마 패드들 |
| EP3869538A1 (en) * | 2016-03-09 | 2021-08-25 | Applied Materials, Inc. | Correction of fabricated shapes in additive manufacturing |
| US12325208B2 (en) | 2016-07-22 | 2025-06-10 | Virginia Tech Intellectual Properties, Inc. | Corrugated three dimensional (3D) additive manufacturing |
| TWI595968B (zh) * | 2016-08-11 | 2017-08-21 | 宋建宏 | 研磨墊及其製造方法 |
| US20180079153A1 (en) * | 2016-09-20 | 2018-03-22 | Applied Materials, Inc. | Control of dispensing operations for additive manufacturing of a polishing pad |
| CN106239943B (zh) * | 2016-09-26 | 2018-10-16 | 华侨大学 | 一种针对熔融沉积制造fdm成型件的抛光机及其使用方法 |
| TWI647070B (zh) * | 2017-02-20 | 2019-01-11 | 詠巨科技有限公司 | 組合式修整器及其製造方法 |
| CN110337347B (zh) | 2017-02-28 | 2022-07-12 | 3M创新有限公司 | 金属粘结磨料制品及制备金属粘结磨料制品的方法 |
| US10596763B2 (en) | 2017-04-21 | 2020-03-24 | Applied Materials, Inc. | Additive manufacturing with array of energy sources |
| US11084143B2 (en) | 2017-05-25 | 2021-08-10 | Applied Materials, Inc. | Correction of fabricated shapes in additive manufacturing using modified edge |
| US10967482B2 (en) | 2017-05-25 | 2021-04-06 | Applied Materials, Inc. | Fabrication of polishing pad by additive manufacturing onto mold |
| DE202018104180U1 (de) | 2017-07-20 | 2018-10-25 | DIT Diamanttechnik GmbH & Co. KG | Generativ gefertigtes Schleifwerkzeug zur Bearbeitung von Hartstoffen und Composites |
| US11471999B2 (en) | 2017-07-26 | 2022-10-18 | Applied Materials, Inc. | Integrated abrasive polishing pads and manufacturing methods |
| US11072050B2 (en) | 2017-08-04 | 2021-07-27 | Applied Materials, Inc. | Polishing pad with window and manufacturing methods thereof |
| WO2019032286A1 (en) | 2017-08-07 | 2019-02-14 | Applied Materials, Inc. | ABRASIVE DISTRIBUTION POLISHING PADS AND METHODS OF MAKING SAME |
| JP2020536142A (ja) | 2017-10-02 | 2020-12-10 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | 制御された機械的および化学的特性を有するuv硬化性組成物、方法、およびそれらから得られた物品 |
| TWI781232B (zh) * | 2017-10-10 | 2022-10-21 | 美商應用材料股份有限公司 | 分配系統與在積層製造設備中分配粉末的方法 |
| KR20200087196A (ko) | 2017-11-13 | 2020-07-20 | 옵토멕 인코포레이티드 | 에어로졸 스트림의 셔터링 |
| JP2019107839A (ja) * | 2017-12-20 | 2019-07-04 | キヤノン株式会社 | 画像処理装置、画像処理方法及びプログラム |
| CN108274123B (zh) * | 2017-12-28 | 2020-07-07 | 北京航空航天大学 | 一种用于激光增材构件内壁的增材-抛光一体化加工方法 |
| CN111684571A (zh) | 2018-02-05 | 2020-09-18 | 应用材料公司 | 用于3d打印的cmp垫的压电终点指示 |
| JP7373503B2 (ja) | 2018-05-07 | 2023-11-02 | アプライド マテリアルズ インコーポレイテッド | 親水性及びゼータ電位の調節可能な化学機械研磨パッド |
| CN112654655A (zh) | 2018-09-04 | 2021-04-13 | 应用材料公司 | 先进抛光垫配方 |
| KR102633514B1 (ko) * | 2018-11-19 | 2024-02-02 | 어플라이드 머티어리얼스, 인코포레이티드 | 3d 프린팅을 위한 저 점도 uv-경화가능 제제 |
| US11851570B2 (en) | 2019-04-12 | 2023-12-26 | Applied Materials, Inc. | Anionic polishing pads formed by printing processes |
| JP7758572B2 (ja) | 2019-05-31 | 2025-10-22 | アプライド マテリアルズ インコーポレイテッド | 研磨プラテン及び研磨プラテンの製造方法 |
| US11322381B2 (en) * | 2019-06-28 | 2022-05-03 | Applied Materials, Inc. | Method for substrate registration and anchoring in inkjet printing |
| US11965103B2 (en) | 2019-08-21 | 2024-04-23 | Applied Materials, Inc. | Additive manufacturing of polishing pads |
| US12006442B2 (en) | 2019-09-11 | 2024-06-11 | Applied Materials, Inc. | Additive manufacturing of polishing pads |
| US20230364742A1 (en) * | 2019-10-16 | 2023-11-16 | Saint-Gobain Abrasives, Inc. | Abrasive articles and methods of forming |
| US11813712B2 (en) | 2019-12-20 | 2023-11-14 | Applied Materials, Inc. | Polishing pads having selectively arranged porosity |
| CN113070810A (zh) * | 2020-01-03 | 2021-07-06 | 铨科光电材料股份有限公司 | 晶圆抛光垫 |
| JP7479668B2 (ja) * | 2020-01-28 | 2024-05-09 | 株式会社東邦鋼機製作所 | 触媒パッド、その製造方法および製造装置 |
| JP2023523022A (ja) * | 2020-04-21 | 2023-06-01 | スマート パッド エルエルシー | 突出構造を有する化学的機械研磨パッド |
| WO2021217044A1 (en) | 2020-04-23 | 2021-10-28 | Saint-Gobain Abrasives, Inc. | System and method for conducting an abrasive operation |
| US11638979B2 (en) | 2020-06-09 | 2023-05-02 | Applied Materials, Inc. | Additive manufacturing of polishing pads |
| US11612978B2 (en) | 2020-06-09 | 2023-03-28 | Applied Materials, Inc. | Additive manufacturing of polishing pads |
| US11806829B2 (en) | 2020-06-19 | 2023-11-07 | Applied Materials, Inc. | Advanced polishing pads and related polishing pad manufacturing methods |
| KR20230059798A (ko) | 2020-09-03 | 2023-05-03 | 바스프 에스이 | 반응성 폴리우레탄 엘라스토머 |
| US11878389B2 (en) | 2021-02-10 | 2024-01-23 | Applied Materials, Inc. | Structures formed using an additive manufacturing process for regenerating surface texture in situ |
| WO2022187720A1 (en) | 2021-03-05 | 2022-09-09 | Saint-Gobain Abrasives, Inc. | Abrasive articles and methods for forming same |
| JP2024509813A (ja) | 2021-03-05 | 2024-03-05 | サンーゴバン アブレイシブズ,インコーポレイティド | 研磨物品及びそれを形成するための方法 |
| TW202247905A (zh) | 2021-04-29 | 2022-12-16 | 美商阿普托麥克股份有限公司 | 用於氣溶膠噴射裝置之高可靠性鞘護輸送路徑 |
| US11679531B2 (en) | 2021-10-13 | 2023-06-20 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Chemical mechanical polishing pad and preparation thereof |
| US12220784B2 (en) | 2021-10-13 | 2025-02-11 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Chemical mechanical polishing pad and preparation thereof |
| US20250043056A1 (en) | 2021-12-08 | 2025-02-06 | Basf Se | Photocurable resins with high heat deflection temperatures |
| CN118541240B (zh) | 2021-12-30 | 2025-11-07 | 圣戈班磨料磨具有限公司 | 磨料制品及其形成方法 |
| US12064850B2 (en) | 2021-12-30 | 2024-08-20 | Saint-Gobain Abrasives, Inc. | Abrasive articles and methods for forming same |
| US20250091260A1 (en) | 2022-01-31 | 2025-03-20 | Kuraray Co., Ltd. | Method for manufacturing resin sheet by using 3d printer, and polishing pad having polishing layer obtained thereby |
| US20240227120A1 (en) * | 2022-12-22 | 2024-07-11 | Applied Materials, Inc. | Uv curable printable formulations for high performance 3d printed cmp pads |
| US12500094B2 (en) | 2023-09-01 | 2025-12-16 | Applied Materials, Inc. | Modular fluid delivery assembly |
| CN118305724B (zh) * | 2024-05-15 | 2025-10-14 | 安徽禾臣新材料有限公司 | 一种用于晶体表面抛光的压纹白垫及其生产工艺 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060019587A1 (en) * | 2004-07-21 | 2006-01-26 | Manish Deopura | Methods for producing in-situ grooves in Chemical Mechanical Planarization (CMP) pads, and novel CMP pad designs |
| US20070128991A1 (en) * | 2005-12-07 | 2007-06-07 | Yoon Il-Young | Fixed abrasive polishing pad, method of preparing the same, and chemical mechanical polishing apparatus including the same |
| TW201234466A (en) * | 2010-10-22 | 2012-08-16 | Sumco Corp | Planarization method for hard and brittle wafer and polishing pad for planarization |
Family Cites Families (56)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5387380A (en) * | 1989-12-08 | 1995-02-07 | Massachusetts Institute Of Technology | Three-dimensional printing techniques |
| US5257478A (en) | 1990-03-22 | 1993-11-02 | Rodel, Inc. | Apparatus for interlayer planarization of semiconductor material |
| MY114512A (en) | 1992-08-19 | 2002-11-30 | Rodel Inc | Polymeric substrate with polymeric microelements |
| US5906863A (en) * | 1994-08-08 | 1999-05-25 | Lombardi; John | Methods for the preparation of reinforced three-dimensional bodies |
| JPH0950974A (ja) * | 1995-08-07 | 1997-02-18 | Sony Corp | 研磨布及び半導体装置の製造方法 |
| JP3042593B2 (ja) * | 1995-10-25 | 2000-05-15 | 日本電気株式会社 | 研磨パッド |
| US5738574A (en) | 1995-10-27 | 1998-04-14 | Applied Materials, Inc. | Continuous processing system for chemical mechanical polishing |
| US6244575B1 (en) * | 1996-10-02 | 2001-06-12 | Micron Technology, Inc. | Method and apparatus for vaporizing liquid precursors and system for using same |
| EP0984846B1 (en) | 1997-01-13 | 2004-11-24 | Rodel, Inc. | Method of manufacturing a polymeric polishing pad having photolithographically induced surface pattern |
| US5940674A (en) * | 1997-04-09 | 1999-08-17 | Massachusetts Institute Of Technology | Three-dimensional product manufacture using masks |
| US5921855A (en) | 1997-05-15 | 1999-07-13 | Applied Materials, Inc. | Polishing pad having a grooved pattern for use in a chemical mechanical polishing system |
| DE19834559A1 (de) * | 1998-07-31 | 2000-02-03 | Friedrich Schiller Uni Jena Bu | Verfahren zur Herstellung von Werkzeugen für die Bearbeitung von Oberflächen |
| US20010046834A1 (en) * | 2000-02-28 | 2001-11-29 | Anuradha Ramana | Pad surface texture formed by solid phase droplets |
| US7300619B2 (en) | 2000-03-13 | 2007-11-27 | Objet Geometries Ltd. | Compositions and methods for use in three dimensional model printing |
| US6569373B2 (en) | 2000-03-13 | 2003-05-27 | Object Geometries Ltd. | Compositions and methods for use in three dimensional model printing |
| ES2230086T3 (es) * | 2000-03-24 | 2005-05-01 | Voxeljet Technology Gmbh | Metodo y aparato para fabricar una pieza estructural mediante la tecnica de deposicion multi-capa y moldeo macho fabricado con el metodo. |
| DE60109601T2 (de) | 2000-05-27 | 2006-02-09 | Rohm and Haas Electronic Materials CMP Holdings, Inc., Wilmington | Rillen-polierkissen zum chemisch-mechanischen planarisieren |
| JP2002028849A (ja) | 2000-07-17 | 2002-01-29 | Jsr Corp | 研磨パッド |
| US6736869B1 (en) | 2000-08-28 | 2004-05-18 | Micron Technology, Inc. | Method for forming a planarizing pad for planarization of microelectronic substrates |
| US6641471B1 (en) * | 2000-09-19 | 2003-11-04 | Rodel Holdings, Inc | Polishing pad having an advantageous micro-texture and methods relating thereto |
| KR100905266B1 (ko) | 2000-12-01 | 2009-06-29 | 도요 고무 고교 가부시키가이샤 | 연마 패드 |
| US20020111707A1 (en) * | 2000-12-20 | 2002-08-15 | Zhimin Li | Droplet deposition method for rapid formation of 3-D objects from non-cross-linking reactive polymers |
| GB0103754D0 (en) * | 2001-02-15 | 2001-04-04 | Vantico Ltd | Three-dimensional structured printing |
| GB0127252D0 (en) * | 2001-11-13 | 2002-01-02 | Vantico Ag | Production of composite articles composed of thin layers |
| DE10224981B4 (de) * | 2002-06-05 | 2004-08-19 | Generis Gmbh | Verfahren zum schichtweisen Aufbau von Modellen |
| US20060111807A1 (en) * | 2002-09-12 | 2006-05-25 | Hanan Gothait | Device, system and method for calibration in three-dimensional model printing |
| IL156094A0 (en) | 2003-05-25 | 2003-12-23 | J G Systems Inc | Fixed abrasive cmp pad with built-in additives |
| US20050012247A1 (en) * | 2003-07-18 | 2005-01-20 | Laura Kramer | Systems and methods for using multi-part curable materials |
| US7120512B2 (en) * | 2003-08-25 | 2006-10-10 | Hewlett-Packard Development Company, L.P. | Method and a system for solid freeform fabricating using non-reactive powder |
| EP1661690A4 (en) * | 2003-08-27 | 2009-08-12 | Fujifilm Corp | METHOD FOR PRODUCING A THREE-DIMENSIONAL MODEL |
| GB0323462D0 (en) * | 2003-10-07 | 2003-11-05 | Fujifilm Electronic Imaging | Providing a surface layer or structure on a substrate |
| KR20050038835A (ko) * | 2003-10-23 | 2005-04-29 | 동부아남반도체 주식회사 | 패드 그루브 구조 |
| KR100576465B1 (ko) | 2003-12-01 | 2006-05-08 | 주식회사 하이닉스반도체 | 연마입자 함침 조성물을 이용한 연마 패드 |
| US7216009B2 (en) * | 2004-06-14 | 2007-05-08 | Micron Technology, Inc. | Machine vision systems for use with programmable material consolidation system and associated methods and structures |
| JP2006095680A (ja) * | 2004-09-14 | 2006-04-13 | Zhiguo Long | 切割研磨シートとその製造方法 |
| KR100606457B1 (ko) * | 2004-11-11 | 2006-11-23 | 한국기계연구원 | 3차원 프린팅 조형시스템 |
| TWI385050B (zh) * | 2005-02-18 | 2013-02-11 | 奈平科技股份有限公司 | 用於cmp之特製拋光墊及其製造方法及其用途 |
| US7875091B2 (en) * | 2005-02-22 | 2011-01-25 | Saint-Gobain Abrasives, Inc. | Rapid tooling system and methods for manufacturing abrasive articles |
| US7524345B2 (en) | 2005-02-22 | 2009-04-28 | Saint-Gobain Abrasives, Inc. | Rapid tooling system and methods for manufacturing abrasive articles |
| US7829000B2 (en) * | 2005-02-25 | 2010-11-09 | Hewlett-Packard Development Company, L.P. | Core-shell solid freeform fabrication |
| US20080306022A1 (en) | 2005-10-12 | 2008-12-11 | Kenji Miyamoto | Agent for Applying to Mucosa and Method for the Production Thereof |
| KR100761847B1 (ko) * | 2005-12-07 | 2007-09-28 | 삼성전자주식회사 | 연마 입자가 내재된 연마 패드, 이의 제조 방법, 및 이를포함하는 화학적 기계적 연마 장치 |
| US20070212979A1 (en) | 2006-03-09 | 2007-09-13 | Rimpad Tech Ltd. | Composite polishing pad |
| US20070235904A1 (en) * | 2006-04-06 | 2007-10-11 | Saikin Alan H | Method of forming a chemical mechanical polishing pad utilizing laser sintering |
| KR100842486B1 (ko) | 2006-10-30 | 2008-07-01 | 동부일렉트로닉스 주식회사 | Cmp 장비의 폴리싱패드와 이의 제조장치 |
| US7862320B2 (en) * | 2007-07-17 | 2011-01-04 | Seiko Epson Corporation | Three-dimensional object forming apparatus and method for forming three dimensional object |
| EP2188114B1 (en) * | 2007-07-25 | 2018-09-12 | Stratasys Ltd. | Solid freeform fabrication using a plurality of modeling materials |
| TWI411495B (zh) * | 2007-08-16 | 2013-10-11 | Cabot Microelectronics Corp | 拋光墊 |
| WO2009145069A1 (ja) * | 2008-05-26 | 2009-12-03 | ソニー株式会社 | 造形装置および造形方法 |
| US8282866B2 (en) * | 2008-06-30 | 2012-10-09 | Seiko Epson Corporation | Method and device for forming three-dimensional model, sheet material processing method, and sheet material processing device |
| KR20100073095A (ko) * | 2008-12-22 | 2010-07-01 | 주식회사 하이닉스반도체 | 화학기계적 연마용 연마 패드 |
| CN102281990A (zh) | 2009-01-16 | 2011-12-14 | 应用材料股份有限公司 | 具有窗口支撑件的研磨垫与系统 |
| US8793522B2 (en) | 2011-06-11 | 2014-07-29 | Aliphcom | Power management in a data-capable strapband |
| WO2013128452A1 (en) | 2012-03-01 | 2013-09-06 | Stratasys Ltd. | Cationic polymerizable compositions and methods of use thereof |
| US9067299B2 (en) | 2012-04-25 | 2015-06-30 | Applied Materials, Inc. | Printed chemical mechanical polishing pad |
| US9421666B2 (en) * | 2013-11-04 | 2016-08-23 | Applied Materials, Inc. | Printed chemical mechanical polishing pad having abrasives therein |
-
2012
- 2012-08-21 US US13/591,051 patent/US9067299B2/en active Active
-
2013
- 2013-04-05 WO PCT/US2013/035513 patent/WO2013162856A1/en not_active Ceased
- 2013-04-05 EP EP21201622.4A patent/EP3961675A1/en not_active Withdrawn
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- 2013-04-05 KR KR1020217002336A patent/KR102344467B1/ko active Active
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- 2013-04-05 CN CN201380023299.6A patent/CN104285281B/zh active Active
- 2013-04-05 KR KR1020217042307A patent/KR102460581B1/ko active Active
- 2013-04-05 KR KR1020227037199A patent/KR102585716B1/ko active Active
- 2013-04-05 EP EP13782401.7A patent/EP2842157B1/en active Active
- 2013-04-05 SG SG10201700369XA patent/SG10201700369XA/en unknown
- 2013-04-05 SG SG11201406448UA patent/SG11201406448UA/en unknown
- 2013-04-05 KR KR1020147033105A patent/KR101975979B1/ko active Active
- 2013-04-05 JP JP2015508994A patent/JP6180512B2/ja active Active
- 2013-04-05 CN CN201710432462.4A patent/CN107030595B/zh active Active
- 2013-04-09 TW TW102112533A patent/TWI574783B/zh active
- 2013-04-09 TW TW107106518A patent/TWI731225B/zh active
- 2013-04-09 TW TW110115706A patent/TWI767681B/zh active
- 2013-04-09 TW TW112103439A patent/TWI823764B/zh active
- 2013-04-09 TW TW111117140A patent/TWI795287B/zh active
- 2013-04-09 TW TW105139914A patent/TWI620617B/zh active
- 2013-04-09 TW TW108142269A patent/TWI729578B/zh active
-
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- 2015-06-11 US US14/737,356 patent/US9457520B2/en active Active
-
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- 2016-08-15 US US15/237,140 patent/US9744724B2/en active Active
-
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- 2017-06-13 JP JP2017116093A patent/JP6620125B2/ja active Active
- 2017-06-13 JP JP2017116092A patent/JP6697419B2/ja active Active
- 2017-08-28 US US15/688,408 patent/US10029405B2/en active Active
-
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- 2018-06-28 US US16/022,167 patent/US10843306B2/en active Active
-
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- 2019-04-02 JP JP2019070349A patent/JP6898379B2/ja active Active
-
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- 2020-11-23 US US17/102,181 patent/US11207758B2/en active Active
-
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- 2021-12-17 US US17/555,056 patent/US11673225B2/en active Active
-
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- 2023-05-11 US US18/316,216 patent/US12011801B2/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060019587A1 (en) * | 2004-07-21 | 2006-01-26 | Manish Deopura | Methods for producing in-situ grooves in Chemical Mechanical Planarization (CMP) pads, and novel CMP pad designs |
| US20070128991A1 (en) * | 2005-12-07 | 2007-06-07 | Yoon Il-Young | Fixed abrasive polishing pad, method of preparing the same, and chemical mechanical polishing apparatus including the same |
| TW201234466A (en) * | 2010-10-22 | 2012-08-16 | Sumco Corp | Planarization method for hard and brittle wafer and polishing pad for planarization |
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