TWI566930B - Laminate, metal-clad laminate, printed wiring board, and multilayer printed wiring board - Google Patents

Laminate, metal-clad laminate, printed wiring board, and multilayer printed wiring board Download PDF

Info

Publication number
TWI566930B
TWI566930B TW102137718A TW102137718A TWI566930B TW I566930 B TWI566930 B TW I566930B TW 102137718 A TW102137718 A TW 102137718A TW 102137718 A TW102137718 A TW 102137718A TW I566930 B TWI566930 B TW I566930B
Authority
TW
Taiwan
Prior art keywords
laminate
printed wiring
wiring board
filler
particle diameter
Prior art date
Application number
TW102137718A
Other languages
Chinese (zh)
Other versions
TW201438900A (en
Inventor
井上博晴
岸野光寿
北村武士
宇野稔
小山雅也
Original Assignee
松下知識產權經營股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 松下知識產權經營股份有限公司 filed Critical 松下知識產權經營股份有限公司
Publication of TW201438900A publication Critical patent/TW201438900A/en
Application granted granted Critical
Publication of TWI566930B publication Critical patent/TWI566930B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/24Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
    • C08J5/241Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres
    • C08J5/244Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres using glass fibres
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Reinforced Plastic Materials (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Description

積層板、覆金屬積層板、印刷配線板、多層印刷配線板 Laminated board, metal-clad laminate, printed wiring board, multilayer printed wiring board

本發明係關於被使用在製造印刷配線板等的積層板及覆金屬積層板、以及使用該等所製造的印刷配線板及多層印刷配線板。 The present invention relates to a laminated board and a metal-clad laminated board used for manufacturing a printed wiring board or the like, and a printed wiring board and a multilayer printed wiring board manufactured using the same.

以往,以滿足低熱膨脹性等的積層板而言,已開發出各種。 In the past, various types of laminates have been developed to satisfy low thermal expansion properties and the like.

例如,專利文獻1所記載之積層板係藉由將含有預定的雙馬來亞醯胺衍生物的熱硬化性樹脂組成物含浸、塗裝在纖維薄片狀補強基材,進行B-stage化而得預浸材後,使用該預浸材來進行積層成形而得。 For example, the laminated plate described in Patent Document 1 is B-staged by impregnating and coating a thermosetting resin composition containing a predetermined bismaleimide derivative on a fibrous sheet-like reinforcing substrate. After the prepreg is obtained, the prepreg is used for lamination molding.

此外,專利文獻2所記載之積層板係將含有預定的熱硬化性樹脂與熔融矽石的熱硬化性樹脂組成物含浸或塗佈在基材而得預浸材之後,藉由將該預浸材積層預定枚數而形成。 Further, the laminated board described in Patent Document 2 is obtained by impregnating or coating a thermosetting resin composition containing a predetermined thermosetting resin and molten vermiculite on a substrate to obtain a prepreg, and then prepreg the prepreg. The material layer is formed by a predetermined number of sheets.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特開2011-195476號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2011-195476

[專利文獻2]日本特開2012-52110號公報 [Patent Document 2] Japanese Laid-Open Patent Publication No. 2012-52110

但是,尤其對於CSP(chip size package)等封裝體所使用的積層板,由生產性及連接可靠性的觀點來看,不僅圖求降低熱膨脹係數(CTE:coefficient of thermal expansion),亦圖求提高彈性係數。為實現此,考慮使樹脂組成物中的無機填充材的摻合量增加,但是實際上,因樹脂組成物的增黏,生產性會降低,因此在無機填充材的增量會有界限。 However, in particular, for laminates used in packages such as CSP (chip size package), from the viewpoint of productivity and connection reliability, not only the coefficient of thermal expansion (CTE) but also the coefficient of thermal expansion (CTE) is improved. Elastic coefficient. In order to achieve this, it is considered that the blending amount of the inorganic filler in the resin composition is increased. However, in actuality, productivity is lowered due to the viscosity increase of the resin composition, and thus there is a limit in the increment of the inorganic filler.

此外,僅使無機填充材增量,樹脂與無機填充材會分離而在積層板容易發生外觀不良。 Further, only the inorganic filler is increased, and the resin and the inorganic filler are separated, and the appearance of the laminate is likely to be poor.

本發明係鑑於上述情形而研創者,目的在提供可降低熱膨脹係數、提高彈性係數,並且外觀良好的積層板、覆金屬積層板、印刷配線板及多層印刷配線板。 The present invention has been made in view of the above circumstances, and it is an object of the invention to provide a laminate, a metal-clad laminate, a printed wiring board, and a multilayer printed wiring board which can reduce the coefficient of thermal expansion, improve the modulus of elasticity, and have a good appearance.

本發明之積層板係使由含有無機填充材的無機成分及有機成分所構成的樹脂組成物含浸在基材,並且進行加熱加壓所形成的積層板,其特徵為:相對於前述積層板全量,含有前述有機成分5~20質量%,並且以前述無機填 充材而言,由平均粒子徑為未達0.2μm的第一填充材、平均粒子徑為0.2μm以上、未達1.0μm的第二填充材、平均粒子徑為1.0μm以上的第三填充材的群組之中含有至少2種類以上者。 The laminated board of the present invention is a laminated board formed by impregnating a base material and containing a resin composition comprising an inorganic component and an organic component containing an inorganic filler, and heating and pressurizing, and is characterized by a total amount of the laminate , containing the above organic component 5 to 20% by mass, and using the aforementioned inorganic filler The filler is a first filler having an average particle diameter of less than 0.2 μm, a second filler having an average particle diameter of 0.2 μm or more, less than 1.0 μm, and a third filler having an average particle diameter of 1.0 μm or more. At least two or more types are included in the group.

在前述積層板中,較佳為前述無機填充材含有Si成分。 In the above laminated sheet, it is preferred that the inorganic filler contains a Si component.

在前述積層板中,較佳為前述積層板的熱分解溫度(5%重量減少溫度)為400℃以上。 In the above laminated sheet, it is preferred that the laminated sheet has a thermal decomposition temperature (5% weight reduction temperature) of 400 ° C or higher.

在前述積層板中,較佳為前述積層板的玻璃轉化溫度(Tg)為250℃以上。 In the above laminate, it is preferred that the laminate has a glass transition temperature (Tg) of 250 ° C or higher.

在前述積層板中,較佳為前述有機成分含有在150℃的ICI黏度為0.3Pa.s以下的樹脂。 In the above laminated sheet, it is preferred that the organic component contains an ICI viscosity of 0.3 Pa at 150 ° C. The resin below s.

在前述積層板中,較佳為前述基材的厚度為10~200μm。 In the above laminate, it is preferred that the substrate has a thickness of 10 to 200 μm.

本發明之覆金屬積層板之特徵為:在前述積層板的雙面或單面積層金屬箔而形成。 The metal-clad laminate of the present invention is characterized in that it is formed on the double-sided or single-layer metal foil of the laminate.

本發明之印刷配線板之特徵為:在前述積層板或前述覆金屬積層板的雙面或單面設置導體圖案而形成。 The printed wiring board of the present invention is characterized in that a conductor pattern is provided on both sides or one surface of the laminated board or the metal-clad laminate.

本發明之多層印刷配線板之特徵為:使用前述印刷配線板,設置前述導體圖案之層至少3層以上而形成。 The multilayer printed wiring board of the present invention is characterized in that at least three or more layers of the conductor pattern are provided using the printed wiring board.

藉由本發明,可得可降低熱膨脹係數、提高彈性係數,並且外觀良好者。 According to the present invention, it is possible to reduce the coefficient of thermal expansion, increase the modulus of elasticity, and have a good appearance.

1‧‧‧樹脂組成物 1‧‧‧Resin composition

2‧‧‧基材 2‧‧‧Substrate

3‧‧‧積層板 3‧‧‧Laminated boards

4‧‧‧預浸材 4‧‧‧Prepreg

5‧‧‧金屬箔 5‧‧‧metal foil

圖1係顯示本發明之積層板之一例者,(a)為雙面覆金屬積層板的剖面圖,(b)為單面覆金屬積層板的剖面圖,(c)為未積層有金屬箔的積層板的剖面圖。 1 is a cross-sectional view showing a laminated board of the present invention, (a) is a sectional view of a double-sided metal-clad laminate, (b) is a sectional view of a single-sided metal-clad laminate, and (c) is a metal foil which is not laminated. A sectional view of the laminate.

以下說明本發明之實施形態。 Embodiments of the present invention will be described below.

本發明之積層板係重疊1枚或複數枚預浸材4,將此進行加熱加壓所形成。此外,本發明之覆金屬積層板係在上述積層板3的雙面或單面積層金屬箔5所形成。亦即,在1枚預浸材4或將複數枚預浸材4重疊者的雙面重疊金屬箔5,將此進行加熱加壓,藉此可形成圖1(a)所示之雙面覆金屬積層板。此外,在1枚預浸材4或將複數枚預浸材4重疊者的單面重疊金屬箔5,將此進行加熱加壓,藉此可形成圖1(b)所示之單面覆金屬積層板。以上述金屬箔5而言,係可使用例如銅箔、鋁箔、不銹鋼箔等。其中,圖1(c)所示者係未積層有金屬箔5的積層板。 The laminated board of the present invention is formed by laminating one or a plurality of prepregs 4 and heating and pressurizing the prepreg. Further, the metal-clad laminate of the present invention is formed on the double-sided or single-layer metal foil 5 of the laminate 3 described above. In other words, the metal foil 5 is superimposed on one surface of one prepreg 4 or a plurality of prepregs 4, and this is heated and pressurized to form a double-sided cover as shown in Fig. 1(a). Metal laminate. Further, the metal foil 5 is superposed on one surface of one prepreg 4 or a plurality of prepregs 4, and this is heated and pressurized to form a single-sided metal as shown in Fig. 1(b). Laminated board. For the metal foil 5 described above, for example, a copper foil, an aluminum foil, a stainless steel foil or the like can be used. Among them, the laminate shown in Fig. 1(c) is a laminate in which the metal foil 5 is not laminated.

上述預浸材4係可藉由使樹脂組成物1含浸在基材2,並且將其進行加熱乾燥至成為半硬化狀態(B-stage狀態)為止來製造。 The prepreg 4 can be produced by impregnating the resin composition 1 with the substrate 2 and heating and drying it to a semi-hardened state (B-stage state).

以上述基材2而言,例如可使用如玻璃布、玻璃紙、玻璃墊等般由無機纖維所成者、或如醯胺布等般由有機纖維所成者。基材2的厚度較佳為10~200μm。如上所示, 由於基材2的厚度為10μm以上,藉此可更加提高積層板3的彈性係數。此外,基材2的厚度為200μm以下,藉此可達成封裝體的薄型化。 The base material 2 can be formed, for example, of an inorganic fiber such as glass cloth, cellophane, or a glass mat, or an organic fiber such as a guanamine cloth. The thickness of the substrate 2 is preferably from 10 to 200 μm. As shown above, Since the thickness of the substrate 2 is 10 μm or more, the elastic modulus of the laminated plate 3 can be further improved. Further, the thickness of the substrate 2 is 200 μm or less, whereby the thickness of the package can be reduced.

上述樹脂組成物1係由無機成分及有機成分所構成。 The resin composition 1 is composed of an inorganic component and an organic component.

上述無機成分係包含無機填充材。以無機填充材而言,由第一填充材、第二填充材、第三填充材之群組之中,至少含有2種類以上者。第一填充材係平均粒子徑為未達0.2μm(下限為0.01μm左右),第二填充材係平均粒子徑為0.2μm以上、未達1.0μm,第三填充材係平均粒子徑為1.0μm以上(上限為5.0μm左右)。如上所示,將平均粒子徑不同的無機填充材組合使用時,會在粒子徑較大的無機填充材間的間隙填充粒子徑較小的無機填充材。 藉此可使樹脂組成物1中的無機填充材的含有量增加,可降低積層板3的熱膨脹係數、提高彈性係數,並且可得良好的外觀。 The above inorganic component contains an inorganic filler. In the inorganic filler, at least two types of the first filler, the second filler, and the third filler are included in the group. The first filler material has an average particle diameter of less than 0.2 μm (the lower limit is about 0.01 μm), the second filler has an average particle diameter of 0.2 μm or more and less than 1.0 μm, and the third filler has an average particle diameter of 1.0 μm. Above (the upper limit is about 5.0 μm). As described above, when inorganic fillers having different average particle diameters are used in combination, an inorganic filler having a small particle diameter is filled in a gap between inorganic fillers having a large particle diameter. Thereby, the content of the inorganic filler in the resin composition 1 can be increased, the thermal expansion coefficient of the laminated plate 3 can be lowered, the elastic modulus can be improved, and a good appearance can be obtained.

以無機填充材的材質而言,可使用例如矽石、氫氧化鋁、氫氧化鎂、碳酸鈣、滑石、氧化鋁等。尤其無機填充材係如矽石般以含有Si成分為佳。藉此可更加降低積層板3的熱膨脹係數。 As the material of the inorganic filler, for example, vermiculite, aluminum hydroxide, magnesium hydroxide, calcium carbonate, talc, alumina, or the like can be used. In particular, the inorganic filler is preferably a Si component as in the case of vermiculite. Thereby, the coefficient of thermal expansion of the laminated board 3 can be further reduced.

上述有機成分係包含例如熱硬化性樹脂、硬化劑及硬化促進劑等。如上所示之有機成分係相對於積層板3全量含有5~20質量%。若有機成分的含有量未達5質量%,無機成分相對過多,樹脂組成物1增黏而難以含浸在基材2,積層板3的生產性會降低。若有機成分的含有量超過 20質量%,無機成分相對過少,積層板3的熱膨脹係數會變高,並且彈性係數會變低。其中,在上述積層板3全量雖包含基材2的質量,但是並未包含金屬箔5的質量。 The organic component includes, for example, a thermosetting resin, a curing agent, a curing accelerator, and the like. The organic component as described above is contained in an amount of 5 to 20% by mass based on the total amount of the laminate. When the content of the organic component is less than 5% by mass, the inorganic component is relatively excessive, and the resin composition 1 is thickened and is difficult to be impregnated into the substrate 2, and the productivity of the laminated sheet 3 is lowered. If the content of organic ingredients exceeds 20% by mass, the inorganic component is relatively too small, the thermal expansion coefficient of the laminated sheet 3 becomes high, and the elastic modulus becomes low. However, the mass of the base material 2 is included in the total amount of the laminated plate 3, but the quality of the metal foil 5 is not included.

以熱硬化性樹脂而言,可使用例如環氧樹脂、酚樹脂、氰酸酯樹脂、三聚氰胺樹脂、醯亞胺樹脂等。尤其以環氧樹脂而言,係可使用例如多官能環氧樹脂、雙酚型環氧樹脂、酚醛型環氧樹脂、聯苯型環氧樹脂等。 As the thermosetting resin, for example, an epoxy resin, a phenol resin, a cyanate resin, a melamine resin, a quinone imide resin, or the like can be used. In particular, in the case of an epoxy resin, for example, a polyfunctional epoxy resin, a bisphenol epoxy resin, a novolac epoxy resin, a biphenyl epoxy resin, or the like can be used.

尤其有機成分較佳為包含在150℃的ICI黏度為0.3Pa.s以下的樹脂。ICI黏度愈低愈佳,因此下限並未特別限定。若併用ICI黏度為0.3Pa.s以下的樹脂、與ICI黏度為超過0.3Pa.s的樹脂時,ICI黏度為0.3Pa.s以下的樹脂較佳為相對於有機成分全量,為含有5~70質量%。如上所示,由於有機成分含有低黏度的樹脂,可提高樹脂組成物1對基材2的含浸性。因此,即使在無機填充材間殘留有較小的間隙,亦可使有機成分填充在該間隙,可使積層板3的外觀提升。此外,亦可抑制積層板3的生產性降低。其中,ICI黏度係可使用例如Research Equipment(London)Limited製的ICI黏度計來進行測定。 In particular, the organic component preferably has an ICI viscosity of 0.3 Pa at 150 ° C. The resin below s. The lower the ICI viscosity, the lower the limit is not particularly limited. If the combined ICI viscosity is 0.3Pa. The resin below s, and the ICI viscosity is more than 0.3Pa. When the resin is s, the ICI viscosity is 0.3Pa. The resin of s or less is preferably contained in an amount of 5 to 70% by mass based on the total amount of the organic component. As described above, since the organic component contains a resin having a low viscosity, the impregnation property of the resin composition 1 with respect to the substrate 2 can be improved. Therefore, even if a small gap remains between the inorganic fillers, the organic component can be filled in the gap, and the appearance of the laminate 3 can be improved. Further, it is also possible to suppress the decrease in productivity of the laminated board 3. Among them, the ICI viscosity can be measured using, for example, an ICI viscometer manufactured by Research Equipment (London) Limited.

以硬化劑而言,係可使用例如酚系硬化劑、二氰二胺硬化劑等。 As the hardener, for example, a phenolic hardener, a dicyandiamine hardener, or the like can be used.

以硬化促進劑而言,係可使用例如咪唑類、酚化合物、胺類、有機膦類等。 As the hardening accelerator, for example, an imidazole, a phenol compound, an amine, an organic phosphine or the like can be used.

接著,可藉由摻合上述無機成分及有機成分,來調製 樹脂組成物1,此外可利用溶劑將其稀釋,藉此調製樹脂組成物1的清漆。以溶劑而言,係可使用例如甲基乙基酮、甲苯、苯乙烯、甲氧基丙醇等。 Then, it can be prepared by blending the above inorganic component and organic component The resin composition 1 is further diluted with a solvent to prepare a varnish of the resin composition 1. As the solvent, for example, methyl ethyl ketone, toluene, styrene, methoxypropanol or the like can be used.

接著,預浸材4係可使上述樹脂組成物1含浸在基材2,並且將其進行加熱乾燥,至成為半硬化狀態為止來進行製造。 Next, the prepreg 4 is obtained by impregnating the resin composition 1 with the base material 2, heating it, and drying it until it is semi-hardened.

接著,本發明之積層板3係藉由重疊1枚或複數枚預浸材4,可視需要另外重疊金屬箔5,將其進行加熱加壓成形來製造。預浸材4係硬化而成為絕緣層。此時的加熱加壓成形係可使用例如多段真空壓製、雙帶壓製、線壓輥、真空層疊裝置等來進行。成形條件係例如溫度為140~350℃、壓力為0.5~6.0MPa、時間為1~240分鐘。 Next, the laminated board 3 of the present invention is produced by laminating one or a plurality of prepregs 4, and if necessary, by additionally laminating the metal foil 5 and subjecting it to heat and pressure molding. The prepreg 4 is hardened to form an insulating layer. The heat and pressure forming system at this time can be carried out using, for example, multi-stage vacuum pressing, double belt pressing, a line press roll, a vacuum lamination apparatus, or the like. The molding conditions are, for example, a temperature of 140 to 350 ° C, a pressure of 0.5 to 6.0 MPa, and a time of 1 to 240 minutes.

如上述所得的積層板3的熱分解溫度(5%重量減少溫度)較佳為400℃以上(上限為600℃左右)。若相對積層板3全量的有機成分的含有量為20質量%以下時,如上所述,積層板3的熱分解溫度易於成為400℃以上。 如上所示,由於熱分解溫度高,可使積層板3的耐熱性提升,可減少藉由有機成分的分解所發生的低分子成分。其中,上述熱分解溫度係使用熱重量分析(TGA)裝置,將積層板3以升溫速度10℃/分鐘進行加熱時,重量減少率成為5%的溫度。 The thermal decomposition temperature (5% weight reduction temperature) of the laminated plate 3 obtained as described above is preferably 400 ° C or higher (the upper limit is about 600 ° C). When the content of the total amount of the organic component in the laminated plate 3 is 20% by mass or less, as described above, the thermal decomposition temperature of the laminated plate 3 is likely to be 400 ° C or higher. As described above, since the thermal decomposition temperature is high, the heat resistance of the laminated plate 3 can be improved, and the low molecular component which is generated by the decomposition of the organic component can be reduced. In the above, the thermal decomposition temperature is a temperature of 5% when the laminated plate 3 is heated at a temperature increase rate of 10 ° C /min using a thermogravimetric analysis (TGA) apparatus.

此外,積層板3的玻璃轉化溫度(Tg)較佳為250℃以上(上限為400℃程度)。若相對積層板3全量的有機成分的含有量為20質量%以下時,如上所述,積層板3 的玻璃轉化溫度(Tg)易於成為250℃以上。如上所示,由於玻璃轉化溫度(Tg)高,可使積層板3的耐熱性更加提升,可減小熱膨脹係數或彈性係數等物性的變化量。其中,玻璃轉化溫度(Tg)係可藉由DMA法來測定。 Further, the glass transition temperature (Tg) of the laminated sheet 3 is preferably 250 ° C or more (the upper limit is about 400 ° C). When the content of the entire organic component of the laminated board 3 is 20% by mass or less, as described above, the laminated board 3 The glass transition temperature (Tg) tends to be above 250 °C. As described above, since the glass transition temperature (Tg) is high, the heat resistance of the laminated plate 3 can be further improved, and the amount of change in physical properties such as the thermal expansion coefficient or the elastic modulus can be reduced. Among them, the glass transition temperature (Tg) can be determined by the DMA method.

接著,本發明之印刷配線板雖省略圖示,但是在上述積層板3或覆金屬積層板的雙面或單面設置導體圖案而形成。例如,可藉由加成法等,將導體圖案形成在上述積層板3的表面,藉此製造印刷配線板。此外,亦可藉由減成法等,將導體圖案形成在上述覆金屬積層板的表面,藉此製造印刷配線板。如上述所製造的印刷配線板亦為熱膨脹係數低、彈性係數高者。 Next, although the printed wiring board of the present invention is not shown, a conductor pattern is formed on both sides or one surface of the laminated board 3 or the metal-clad laminate. For example, a conductor pattern can be formed on the surface of the above-mentioned laminated board 3 by an additive method or the like, thereby manufacturing a printed wiring board. Further, a printed wiring board can be manufactured by forming a conductor pattern on the surface of the above-mentioned metal-clad laminate by a subtractive method or the like. The printed wiring board manufactured as described above also has a low thermal expansion coefficient and a high modulus of elasticity.

此外,本發明之多層印刷配線板係使用上述印刷配線板,將導體圖案之層至少設置3層以上所形成。印刷配線板通常導體圖案之層為2層以下,但是如下所示可製造導體圖案之層為3層以上的多層印刷配線板。 Further, in the multilayer printed wiring board of the present invention, the printed wiring board is used, and at least three or more layers of the conductor pattern are formed. In the printed wiring board, the layer of the conductor pattern is usually two or less layers. However, as described below, the layer in which the conductor pattern can be produced is a multilayer printed wiring board of three or more layers.

亦即,雖圖示省略,本發明之多層印刷配線板係可在上述印刷配線板的雙面或單面,透過上述預浸材4積層金屬箔5,將該金屬箔的不必要部分去除來設置導體圖案之層而形成。此時,較佳為使用上述預浸材4,但是亦可使用其他預浸材。此外,以金屬箔5而言,係可使用與上述相同者。積層成形及成形條件係與製造上述積層板3時相同。導體圖案的形成係可與製造印刷配線板時同樣地進行。亦即,若有金屬箔5時,係可藉由減成法來形成導體圖案之層,若沒有金屬箔5時,則可藉由加成法來形成導 體圖案之層。如上述所製造的多層印刷配線板亦為熱膨脹係數低、彈性係數高者。其中,導體圖案的層數並未特別限定。 In other words, the multilayer printed wiring board of the present invention can laminate the metal foil 5 through the prepreg 4 on both sides or one side of the printed wiring board, thereby removing unnecessary portions of the metal foil. It is formed by providing a layer of a conductor pattern. At this time, it is preferable to use the above-mentioned prepreg 4, but other prepregs can also be used. Further, in the case of the metal foil 5, the same as described above can be used. The build-up molding and molding conditions are the same as those in the production of the above laminated sheet 3. The formation of the conductor pattern can be performed in the same manner as in the case of manufacturing a printed wiring board. That is, if the metal foil 5 is present, the layer of the conductor pattern can be formed by a subtractive method. If the metal foil 5 is not present, the lead can be formed by an additive method. The layer of the body pattern. The multilayer printed wiring board manufactured as described above also has a low coefficient of thermal expansion and a high modulus of elasticity. However, the number of layers of the conductor pattern is not particularly limited.

之後,在上述印刷配線板或多層印刷配線板構裝半導體元件來進行封裝,藉此可製造CSP(chip size package)等封裝體。 Thereafter, a semiconductor element is packaged on the printed wiring board or the multilayer printed wiring board to be packaged, whereby a package such as a CSP (chip size package) can be manufactured.

[實施例] [Examples]

以下藉由實施例,具體說明本發明。 The invention will be specifically described below by way of examples.

〔無機成分〕 [inorganic component]

以構成樹脂組成物1的無機成分而言,使用以下所示之第一填充材、第二填充材及第三填充材。 For the inorganic component constituting the resin composition 1, the first filler, the second filler, and the third filler shown below are used.

(第一填充材) (first filler)

.Admatechs股份有限公司製「YA010C-MFF」(矽石,平均粒子徑0.01μm) . "YA010C-MFF" manufactured by Admatechs Co., Ltd. (meteorite, average particle diameter 0.01 μm)

.Admatechs股份有限公司製「YC100C-MLE」(矽石,平均粒子徑0.1μm) . "YC100C-MLE" manufactured by Admatechs Co., Ltd. (meteorite, average particle diameter 0.1 μm)

(第二填充材) (second filler)

.Admatechs股份有限公司製「S0-25R」(矽石,平均粒子徑0.5μm) . "S0-25R" made of Admatechs Co., Ltd. (meteorite, average particle diameter 0.5μm)

.堺化學工業股份有限公司製「MGZ-5」(氫氧化鎂,平均粒子徑0.8μm) . "MGZ-5" (magnesium hydroxide, average particle diameter 0.8 μm) manufactured by Suga Chemical Industry Co., Ltd.

(第三填充材) (third filler)

.堺化學工業股份有限公司製「MGZ-6」(氫氧化 鎂,平均粒子徑1.6μm) . MGChemical Industries Co., Ltd. "MGZ-6" (Hydroxide Magnesium, average particle diameter 1.6μm)

.Admatechs股份有限公司製「S0-C6」(矽石,平均粒子徑2.0μm) . "S0-C6" manufactured by Admatechs Co., Ltd. (meteorite, average particle diameter 2.0 μm)

.住友化學股份有限公司製「CL-303」(氫氧化鋁,平均粒子徑4.0μm) . Sumitomo Chemical Co., Ltd. "CL-303" (aluminum hydroxide, average particle diameter 4.0 μm)

〔有機成分〕 [organic ingredients]

以構成樹脂組成物1的有機成分而言,使用如以下所示之熱硬化性樹脂、硬化劑及硬化促進劑。 As the organic component constituting the resin composition 1, a thermosetting resin, a curing agent, and a curing accelerator as described below are used.

(熱硬化性樹脂) (thermosetting resin)

.DIC股份有限公司製「830S」(環氧樹脂,在150℃的ICI黏度<0.01Pa.s(檢測下限以下)) . "830S" manufactured by DIC Co., Ltd. (epoxy resin, ICI viscosity at 150 ° C <0.01Pa.s (below the detection limit))

.DIC股份有限公司製「HP9500」(環氧樹脂,在150℃的ICI黏度2.6Pa.s) . "HP9500" manufactured by DIC Co., Ltd. (epoxy resin, ICI viscosity at 150 ° C 2.6 Pa.s)

.DIC股份有限公司製「N540」(環氧樹脂,在150℃的ICI黏度0.04Pa.s) . "N540" made of DIC Co., Ltd. (epoxy resin, ICI viscosity at 150 ° C 0.04Pa.s)

.日本化藥股份有限公司製「EPPN502H」(環氧樹脂,在150℃的ICI黏度0.2Pa.s) . "EPPN502H" manufactured by Nippon Kayaku Co., Ltd. (epoxy resin, ICI viscosity at 150 ° C 0.2 Pa.s)

.LONZA公司製「BADCy」(氰酸酯樹脂,在150℃的ICI黏度<0.01Pa.s(檢測下限以下)) . "BADCy" manufactured by LONZA Co., Ltd. (cyanate resin, ICI viscosity at 150 ° C <0.01Pa.s (below the detection limit))

.丸善石油化學股份有限公司製「BANI-M」(醯亞胺樹脂,在150℃的ICI黏度0.7Pa.s) . "BANI-M" manufactured by Maruzen Petrochemical Co., Ltd. (Imine amide resin, ICI viscosity at 150 ° C 0.7 Pa.s)

.大和化成股份有限公司製「BMI2300」(醯亞胺樹脂,在150℃的ICI黏度0.08Pa.s) . "BMI2300" manufactured by Daiwa Kasei Co., Ltd. (醯Imine resin, ICI viscosity at 150 ° C 0.08 Pa.s)

(硬化劑) (hardener)

.DIC股份有限公司製「TD2090」(酚性硬化劑) . TD Corporation's "TD2090" (phenolic hardener)

.DIC股份有限公司製「HPC9500」(酚性硬化劑) . DIC Co., Ltd. "HPC9500" (phenolic hardener)

.明和化成股份有限公司製「MEH7600」(酚性硬化劑) . "MEH7600" (phenolic hardener) manufactured by Minghe Chemical Co., Ltd.

(硬化促進劑) (hardening accelerator)

.四國化成工業股份有限公司製「2E4MZ」(咪唑) . "2E4MZ" (imidazole) manufactured by Shikoku Chemical Industry Co., Ltd.

〔基材〕 [substrate]

使用如以下所示者作為基材2。 The substrate 2 as shown below was used.

.日東紡紗股份有限公司製「1037」(玻璃布,厚度27μm) . Nitto Spinning Co., Ltd. "1037" (glass cloth, thickness 27μm)

.日東紡紗股份有限公司製「1036」(玻璃布,厚度28μm) . Nitto Spinning Co., Ltd. "1036" (glass cloth, thickness 28μm)

.日東紡紗股份有限公司製「2116」(玻璃布,厚度94μm) . Nippon Spinning Co., Ltd. "2116" (glass cloth, thickness 94μm)

.日東紡紗股份有限公司製「1017」(玻璃布,厚度15μm) . Nitto Spinning Co., Ltd. "1017" (glass cloth, thickness 15μm)

〔預浸材〕 [prepreg]

以表1~表3所示之摻合量(質量份)摻合上述無機成分及有機成分,另外以溶劑(甲基乙基酮)稀釋,藉此調製樹脂組成物1的清漆。 The inorganic component and the organic component were blended in a blending amount (parts by mass) shown in Tables 1 to 3, and diluted with a solvent (methyl ethyl ketone) to prepare a varnish of the resin composition 1.

接著,使上述樹脂組成物1含浸在基材2,並且將其至成為半硬化狀態為止,以100~200℃、1~5分鐘、在乾燥爐內進行加熱乾燥,藉此製造預浸材4。 Then, the resin composition 1 is impregnated into the substrate 2, and is dried in a drying oven at 100 to 200 ° C for 1 to 5 minutes until it is in a semi-hardened state, thereby producing a prepreg 4 . .

〔積層板〕 [Laminated board]

將上述預浸材4重疊2枚,在該雙面重疊銅箔(三井金屬鑛業股份有限公司製「3EC-VLP」,厚度12μm)作為金屬箔5來進行加熱加壓成形,藉此製造覆銅積層板(CCL)作為積層板3(實施例1~10、12~14)。上述加熱加壓成形係使用多段真空壓製來進行。成形條件係溫度為230℃、壓力為4MPa、時間為120分鐘。 Two sheets of the prepreg 4 were stacked, and the double-sided copper foil ("3EC-VLP" manufactured by Mitsui Mining Co., Ltd., thickness: 12 μm) was used as the metal foil 5 to perform heat-pressure molding to produce copper-clad. A laminate (CCL) is used as the laminate 3 (Examples 1 to 10, 12 to 14). The above-described heating and press forming is performed using multi-stage vacuum pressing. The molding conditions were a temperature of 230 ° C, a pressure of 4 MPa, and a time of 120 minutes.

〔印刷配線板〕 [Printed wiring board]

除了將預浸材4的枚數設為1枚以外’與上述同樣地,製作覆銅積層板(CCL)作為積層板3(實施例11)。接著,藉由減成法,將導體圖案形成在該積層板3的雙面,藉此製造印刷配線板。 A copper-clad laminate (CCL) was produced as the laminate 3 (Example 11) except that the number of the prepreg 4 was one. Next, a conductor pattern is formed on both sides of the laminated board 3 by a subtractive method, thereby manufacturing a printed wiring board.

〔多層印刷配線板〕 [Multilayer printed wiring board]

在上述印刷配線板的單面重疊1枚預浸材4,另外重疊1枚銅箔(三井金屬鑛業股份有限公司製「3EC-VLP」,厚度12μm)作為金屬箔5來進行加熱加壓成形,藉此製造多層印刷配線板(實施例15)。上述加熱加壓成形係使用多段真空壓製來進行。成形條件係溫度為220℃、壓力為6.0MPa、時間為160分鐘。 One prepreg 4 is placed on one surface of the printed wiring board, and one copper foil ("3EC-VLP" manufactured by Mitsui Mining Co., Ltd., thickness: 12 μm) is placed as a metal foil 5 to perform heat and pressure molding. Thereby, a multilayer printed wiring board (Example 15) was produced. The above-described heating and press forming is performed using multi-stage vacuum pressing. The molding conditions were a temperature of 220 ° C, a pressure of 6.0 MPa, and a time of 160 minutes.

(CCL外觀) (CCL appearance)

將積層板3的金屬箔5藉由蝕刻進行去除,藉由目視來觀察去除面,藉此如下所示判定外觀良否。 The metal foil 5 of the laminated board 3 was removed by etching, and the removed surface was visually observed, whereby the appearance was judged as follows.

「○」:未發現孔洞、污點、樹脂分離者 "○": No holes, stains, or resin separators were found

「△」:雖未發現孔洞、污點,但發現樹脂分離者 "△": Although no holes or stains were found, the resin separator was found.

「×」:發現孔洞或污點者 "X": find holes or stains

(玻璃轉化溫度(Tg)) (glass transition temperature (Tg))

依據JIS C 6481,藉由DMA法(dynamic mechanical analysis method,動態機械分析法)來測定積層板3的玻璃轉化溫度(Tg)。具體而言,首先藉由蝕刻,去除積層板3的金屬箔5來製作試料。接著,針對該試料,使用動態黏彈性測定裝置(SII Nano Technology股份有限公司製「DMS6100」),以5℃/分鐘的條件升溫,將tanδ的峰值位置設為玻璃轉化溫度(Tg)。 The glass transition temperature (Tg) of the laminated plate 3 was measured by a DMA method (dynamic mechanical analysis method) in accordance with JIS C 6481. Specifically, first, the metal foil 5 of the laminated plate 3 is removed by etching to prepare a sample. Then, a dynamic viscoelasticity measuring apparatus ("DMS6100" manufactured by SII Nano Technology Co., Ltd.) was used for the sample, and the temperature was raised at 5 ° C /min, and the peak position of tan δ was defined as the glass transition temperature (Tg).

(熱膨脹係數) (Thermal expansion coefficient)

依據JIS C 6481,藉由TMA法(thermal mechanical analysis method,熱機械強度分析法)來測定積層板3的熱膨脹係數。 The thermal expansion coefficient of the laminated plate 3 was measured by a TMA method (thermal mechanical strength analysis method) in accordance with JIS C 6481.

(彈性係數) (elastic coefficient)

將積層板3的彈性係數,藉由DMA法,形成為25℃的儲藏彈性係數(E')來進行測定。 The elastic modulus of the laminated plate 3 was measured by a DMA method to form a storage elastic modulus (E ' ) at 25 °C.

(熱分解溫度) (thermal decomposition temperature)

將積層板3的熱分解溫度,使用熱重量分析(TGA)裝置,將積層板3以升溫速度10℃/分鐘進行加熱時,形成為重量減少率成為5%的溫度來進行測定。 When the laminated plate 3 was heated at a temperature increase rate of 10 ° C /min using a thermogravimetric analysis (TGA) apparatus, the thermal decomposition temperature of the laminated plate 3 was measured at a temperature at which the weight reduction rate was 5%.

其中,針對實施例15,即使將外部的金屬箔5去除,亦存在有在內部具有導體圖案的部位,但是在測定玻璃轉化溫度(Tg)、熱膨脹係數、彈性係數、熱分解溫度時,係使用在內部沒有導體圖案的部位。 In the fifteenth embodiment, even if the outer metal foil 5 is removed, there is a portion having a conductor pattern inside, but when the glass transition temperature (Tg), thermal expansion coefficient, elastic modulus, and thermal decomposition temperature are measured, it is used. A portion where there is no conductor pattern inside.

將以上結果顯示於表1~表3。 The above results are shown in Tables 1 to 3.

由表1及表2可知,在實施例1~15中,係可得熱膨脹係數低、彈性係數高、外觀良好的積層板。但是,如表3所示,在比較例1~3中,並無法獲得外觀良好的積層板,此外在比較例4中,原本即難以製造積層板,此外在比較例5中,積層板的熱膨脹係數變高、彈性係數變低。 As is apparent from Tables 1 and 2, in Examples 1 to 15, a laminate having a low coefficient of thermal expansion, a high modulus of elasticity, and a good appearance was obtained. However, as shown in Table 3, in Comparative Examples 1 to 3, a laminate having a good appearance could not be obtained, and in Comparative Example 4, it was difficult to manufacture a laminate, and in Comparative Example 5, thermal expansion of the laminate. The coefficient becomes higher and the modulus of elasticity becomes lower.

1‧‧‧樹脂組成物 1‧‧‧Resin composition

2‧‧‧基材 2‧‧‧Substrate

3‧‧‧積層板 3‧‧‧Laminated boards

4‧‧‧預浸材 4‧‧‧Prepreg

5‧‧‧金屬箔 5‧‧‧metal foil

Claims (11)

一種積層板,其係使由含有無機填充材的無機成分及有機成分所構成的樹脂組成物含浸在基材,並且進行加熱加壓所形成的積層板,其特徵為:相對於前述積層板全量,含有前述有機成分5~20質量%,並且以前述無機填充材而言,由平均粒子徑為未達0.2μm的第一填充材、平均粒子徑為0.2μm以上、未達1.0μm的第二填充材、平均粒子徑為1.0μm以上的第三填充材的群組之中含有至少2種類以上者,前述積層板的玻璃轉化溫度(Tg)為250℃以上。 A laminate which is obtained by impregnating a substrate with a resin composition comprising an inorganic component and an organic component containing an inorganic filler and heating and pressurizing, and is characterized in that the laminate is formed in a total amount relative to the laminate The inorganic filler contains 5 to 20% by mass of the organic component, and the inorganic filler has an average particle diameter of less than 0.2 μm, a second filler having an average particle diameter of 0.2 μm or more and less than 1.0 μm. At least two types of the fillers and the third filler having an average particle diameter of 1.0 μm or more are contained in the group, and the glass transition temperature (Tg) of the laminate is 250° C. or more. 如申請專利範圍第1項之積層板,其中,前述無機填充材含有Si成分。 The laminate according to the first aspect of the invention, wherein the inorganic filler contains a Si component. 如申請專利範圍第1項或第2項之積層板,其中,前述積層板的熱分解溫度(5%重量減少溫度)為400℃以上。 The laminate according to claim 1 or 2, wherein the laminate has a thermal decomposition temperature (5% weight reduction temperature) of 400 ° C or higher. 如申請專利範圍第1項或第2項之積層板,其中,前述基材的厚度為10~200μm。 The laminate of claim 1 or 2, wherein the substrate has a thickness of 10 to 200 μm. 一種覆金屬積層板,其特徵為:在如申請專利範圍第1項至第4項中任一項之積層板的雙面或單面積層金屬箔而形成。 A metal-clad laminate which is formed by a double-sided or single-layer metal foil of a laminate according to any one of claims 1 to 4. 一種印刷配線板,其特徵為:在如申請專利範圍第1項至第4項中任一項之積層板或如申請專利範圍第5項之覆金屬積層板的雙面或單面設 置導體圖案而形成。 A printed wiring board characterized by the double-sided or single-sided design of the laminated board according to any one of the first to fourth aspects of the patent application or the metallized laminated board of claim 5 A conductor pattern is formed. 一種多層印刷配線板,其特徵為:使用如申請專利範圍第6項之印刷配線板,設置前述導體圖案之層至少3層以上而形成。 A multilayer printed wiring board comprising: a printed wiring board according to claim 6 of the patent application, wherein at least three or more layers of the conductor pattern are provided. 一種積層板,其係使由含有無機填充材的無機成分及有機成分所構成的樹脂組成物含浸在基材,並且進行加熱加壓所形成的積層板,其特徵為:相對於前述積層板全量,含有前述有機成分5~20質量%,並且以前述無機填充材而言,由平均粒子徑為未達0.2μm的第一填充材、平均粒子徑為0.2μm以上、未達1.0μm的第二填充材、平均粒子徑為1.0μm以上的第三填充材的群組之中含有至少2種類以上者,前述有機成分含有在150℃的ICI黏度為0.3Pa.s以下的樹脂。 A laminate which is obtained by impregnating a substrate with a resin composition comprising an inorganic component and an organic component containing an inorganic filler and heating and pressurizing, and is characterized in that the laminate is formed in a total amount relative to the laminate The inorganic filler contains 5 to 20% by mass of the organic component, and the inorganic filler has an average particle diameter of less than 0.2 μm, a second filler having an average particle diameter of 0.2 μm or more and less than 1.0 μm. The filler and the third filler having an average particle diameter of 1.0 μm or more contain at least two types or more, and the organic component contains an ICI viscosity of 0.3 Pa at 150 ° C. The resin below s. 一種覆金屬積層板,其特徵為:在如申請專利範圍第8項之積層板的雙面或單面積層金屬箔而形成。 A metal-clad laminate characterized by being formed on a double-sided or single-layer metal foil of a laminate as set forth in claim 8 of the patent application. 一種印刷配線板,其特徵為:在如申請專利範圍第8項之積層板或如申請專利範圍第9項之覆金屬積層板的雙面或單面設置導體圖案而形成。 A printed wiring board characterized by being formed by providing a conductor pattern on a double-sided or single-sided side of a metal-clad laminate according to claim 8 or a metal-clad laminate according to claim 9. 一種多層印刷配線板,其特徵為:使用如申請專利範圍第10項之印刷配線板,設置前 述導體圖案之層至少3層以上而形成。 A multilayer printed wiring board characterized by using a printed wiring board as in claim 10 of the patent application, before setting The layer of the conductor pattern is formed by at least three layers or more.
TW102137718A 2012-11-12 2013-10-18 Laminate, metal-clad laminate, printed wiring board, and multilayer printed wiring board TWI566930B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012248684 2012-11-12

Publications (2)

Publication Number Publication Date
TW201438900A TW201438900A (en) 2014-10-16
TWI566930B true TWI566930B (en) 2017-01-21

Family

ID=50700013

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102137718A TWI566930B (en) 2012-11-12 2013-10-18 Laminate, metal-clad laminate, printed wiring board, and multilayer printed wiring board

Country Status (4)

Country Link
JP (2) JP2014111719A (en)
KR (2) KR20140061243A (en)
CN (1) CN103802409B (en)
TW (1) TWI566930B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014111719A (en) * 2012-11-12 2014-06-19 Panasonic Corp Laminate, metal-clad laminate, printed wiring board, and multilayer printed wiring board
JP6695046B2 (en) 2015-09-25 2020-05-20 パナソニックIpマネジメント株式会社 Prepreg, metal-clad laminate, wiring board, and method for measuring thermal stress of wiring board material
MY190857A (en) 2016-01-15 2022-05-12 Jx Nippon Mining & Metals Corp Copper foil, copper-clad laminate board,method for producing printed wiring board,method for producing electronic apparatus,method for producing transmission channel, and method for producing antenna
JP6890301B2 (en) * 2017-02-23 2021-06-18 パナソニックIpマネジメント株式会社 Printed wiring board and manufacturing method of printed wiring board
WO2018168005A1 (en) * 2017-03-13 2018-09-20 リンテック株式会社 Resin composition, resin sheet, laminate, and semiconductor element
JP6989086B6 (en) * 2018-02-13 2022-02-28 エルジー・ケム・リミテッド Thermosetting resin composition for semiconductor packaging and prepreg using this
JP7133955B2 (en) * 2018-03-22 2022-09-09 太陽インキ製造株式会社 Thermosetting resin composition, dry film, cured product, and electronic component
WO2020124452A1 (en) * 2018-12-19 2020-06-25 深圳先进技术研究院 Method for preparing metal nanosheet, metal nanosheet, use, and negative electrode active material

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201109359A (en) * 2009-07-24 2011-03-16 Sumitomo Bakelite Co Resin composition, resin sheet, prepreg, metal-clad laminate, printed wiring board and semiconductor device
TW201128813A (en) * 2010-01-28 2011-08-16 Asahi Glass Co Ltd Substrate for mounting light emitting element, method for producing same, and light emitting device
US20110240325A1 (en) * 2010-03-31 2011-10-06 Daigo Suzuki Printed Wiring Board and Electronic Apparatus

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0713151B2 (en) * 1990-02-14 1995-02-15 新神戸電機株式会社 Method for manufacturing heat resistant epoxy resin laminate
JP3648750B2 (en) * 1993-09-14 2005-05-18 株式会社日立製作所 Laminated board and multilayer printed circuit board
JPH07258439A (en) * 1994-03-24 1995-10-09 Shin Kobe Electric Mach Co Ltd Flame retardant laminated sheet and its production
JP5055668B2 (en) * 2001-07-19 2012-10-24 凸版印刷株式会社 Thermosetting resin composition for printed wiring board
JP2003192768A (en) * 2001-12-27 2003-07-09 Taiyo Ink Mfg Ltd Flame-retardant epoxy resin composition, its molded product and multi-layer printed-wiring board using the same
JP2005314562A (en) * 2004-04-28 2005-11-10 Kaneka Corp Thermosetting resin composition and its application
US8062750B2 (en) * 2004-11-30 2011-11-22 Matsushita Electric Works, Ltd. Epoxy resin composition for prepreg, prepreg and multilayered printed wiring board
JP5230059B2 (en) * 2005-06-22 2013-07-10 住友ベークライト株式会社 Prepreg, circuit board and semiconductor device
JP2006312751A (en) * 2006-08-10 2006-11-16 Sumitomo Bakelite Co Ltd Resin composition, prepreg and copper-clad laminate using the prepreg
JP2008074934A (en) * 2006-09-20 2008-04-03 Mitsubishi Gas Chem Co Inc Method for producing prepreg
JP2008174610A (en) * 2007-01-17 2008-07-31 Toho Tenax Co Ltd Impact-resistant prepreg and method for producing the same
EP2113524A4 (en) * 2007-02-23 2011-03-30 Panasonic Elec Works Co Ltd Epoxy resin composition, prepreg, laminates and printed wiring boards
JP5260400B2 (en) * 2009-04-24 2013-08-14 パナソニック株式会社 Multilayer board for producing multilayer printed wiring boards
JP5260458B2 (en) * 2009-09-25 2013-08-14 パナソニック株式会社 Epoxy resin composition for prepreg and prepreg, laminate and multilayer board using the same
JP2011153285A (en) * 2009-12-28 2011-08-11 Sekisui Chem Co Ltd Resin composition, b-stage film, laminated film, copper-clad laminated board, and multilayer board
JP5577107B2 (en) * 2010-01-22 2014-08-20 パナソニック株式会社 Resin composition, method for producing resin composition, resin varnish, prepreg, metal-clad laminate, and printed wiring board
JP5589470B2 (en) 2010-03-18 2014-09-17 日立化成株式会社 Bismaleimide derivative and method for producing the same, thermosetting resin composition, prepreg and laminate
JP5402761B2 (en) * 2010-03-23 2014-01-29 Dic株式会社 Curable resin composition, cured product thereof, method for producing phosphorus atom-containing phenols, resin composition for printed wiring board, printed wiring board, resin composition for flexible wiring board, resin composition for semiconductor sealing material, and build Resin composition for interlayer insulation material for up-substrate
JP2011219674A (en) * 2010-04-13 2011-11-04 Sumitomo Bakelite Co Ltd Thermosetting resin composition for circuit board
JP5471931B2 (en) * 2010-07-23 2014-04-16 住友ベークライト株式会社 Printed wiring board, metal-clad laminate, resin sheet and printed wiring board manufacturing method
KR20130095730A (en) 2010-08-06 2013-08-28 히타치가세이가부시끼가이샤 Process for producing compatibilized resin, thermosetting resin composition, prepreg, and laminate
JP5598190B2 (en) * 2010-09-09 2014-10-01 住友ベークライト株式会社 Thermosetting resin composition for circuit board
KR101355777B1 (en) * 2011-01-24 2014-02-04 스미토모 베이클리트 컴퍼니 리미티드 Prepreg, laminate, printed wiring board, and semiconductor device
JP5909808B2 (en) * 2012-01-30 2016-04-27 日立化成株式会社 Pre-preg for heat and pressure molding and laminate
JP2014111719A (en) * 2012-11-12 2014-06-19 Panasonic Corp Laminate, metal-clad laminate, printed wiring board, and multilayer printed wiring board

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201109359A (en) * 2009-07-24 2011-03-16 Sumitomo Bakelite Co Resin composition, resin sheet, prepreg, metal-clad laminate, printed wiring board and semiconductor device
TW201128813A (en) * 2010-01-28 2011-08-16 Asahi Glass Co Ltd Substrate for mounting light emitting element, method for producing same, and light emitting device
US20110240325A1 (en) * 2010-03-31 2011-10-06 Daigo Suzuki Printed Wiring Board and Electronic Apparatus

Also Published As

Publication number Publication date
KR20170094111A (en) 2017-08-17
TW201438900A (en) 2014-10-16
JP2014111719A (en) 2014-06-19
JP6512521B2 (en) 2019-05-15
KR20140061243A (en) 2014-05-21
JP2017189981A (en) 2017-10-19
KR101865286B1 (en) 2018-06-07
CN103802409B (en) 2017-09-05
CN103802409A (en) 2014-05-21

Similar Documents

Publication Publication Date Title
TWI566930B (en) Laminate, metal-clad laminate, printed wiring board, and multilayer printed wiring board
CN107614608B (en) Thermosetting resin composition for semiconductor encapsulation and prepreg using same
TWI538955B (en) Thermosetting resin composition for semiconductor package and prepreg and metal clad laminate using the same
TWI594882B (en) Thermosetting resin composition and prepreg and metal clad laminate using the same
JP6624573B2 (en) Method for manufacturing metal-clad laminate, method for manufacturing printed wiring board, and method for manufacturing multilayer printed wiring board
KR20110008044A (en) Insulating resin sheet and method for manufacturing multilayer printed wiring board using the insulating resin sheet
KR20180135900A (en) Prepreg, metal clad laminate and printed wiring board
KR20150092113A (en) Method for producing metal-foil-clad laminate
TWI829631B (en) Resin compositions, prepregs, metallized laminated boards, printed wiring boards, and flexible rigid printed wiring boards
US10371612B2 (en) Prepreg, metal-clad laminated plate, wiring board, and method for measuring thermal stress of wiring board material
JP2007128955A (en) Printed wiring board and its manufacturing method
KR101641210B1 (en) A method for preparating prepreg having low thermal expansion coefficient and manufacture process of metal clad laminate using the same
JP6989086B6 (en) Thermosetting resin composition for semiconductor packaging and prepreg using this
JP2014070098A (en) Prepreg, laminate and printed wiring board
TWI551632B (en) Prepreg, metal-clad laminate, and printed wiring board,and multilayer printed wiring board
JP2020528471A6 (en) Thermosetting resin composition for semiconductor packaging and prepreg using this
JP2015086293A (en) Prepreg and multilayer printed wiring board
JP2006165095A (en) Printed wiring board and its manufacturing method
JP2010187035A (en) Printed wiring board, and method of manufacturing the same
WO2013015577A1 (en) Heat-curable resin composition, and prepreg and metal foil-stacked plate using same