TWI564112B - 研磨裝置 - Google Patents

研磨裝置 Download PDF

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Publication number
TWI564112B
TWI564112B TW102147895A TW102147895A TWI564112B TW I564112 B TWI564112 B TW I564112B TW 102147895 A TW102147895 A TW 102147895A TW 102147895 A TW102147895 A TW 102147895A TW I564112 B TWI564112 B TW I564112B
Authority
TW
Taiwan
Prior art keywords
pure water
gas
unit
polishing
dissolved
Prior art date
Application number
TW102147895A
Other languages
English (en)
Chinese (zh)
Other versions
TW201436946A (zh
Inventor
石橋知淳
Original Assignee
荏原製作所股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 荏原製作所股份有限公司 filed Critical 荏原製作所股份有限公司
Publication of TW201436946A publication Critical patent/TW201436946A/zh
Application granted granted Critical
Publication of TWI564112B publication Critical patent/TWI564112B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/005—Control means for lapping machines or devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B24B1/04—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes subjecting the grinding or polishing tools, the abrading or polishing medium or work to vibration, e.g. grinding with ultrasonic frequency
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B51/00—Arrangements for automatic control of a series of individual steps in grinding a workpiece
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
TW102147895A 2012-12-28 2013-12-24 研磨裝置 TWI564112B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012287119A JP2014130881A (ja) 2012-12-28 2012-12-28 研磨装置

Publications (2)

Publication Number Publication Date
TW201436946A TW201436946A (zh) 2014-10-01
TWI564112B true TWI564112B (zh) 2017-01-01

Family

ID=51017685

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102147895A TWI564112B (zh) 2012-12-28 2013-12-24 研磨裝置

Country Status (4)

Country Link
US (1) US9162337B2 (enExample)
JP (1) JP2014130881A (enExample)
KR (1) KR101604519B1 (enExample)
TW (1) TWI564112B (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6587379B2 (ja) * 2014-09-01 2019-10-09 株式会社荏原製作所 研磨装置
WO2017139079A1 (en) * 2016-02-12 2017-08-17 Applied Materials, Inc. In-situ temperature control during chemical mechanical polishing with a condensed gas
US9962805B2 (en) * 2016-04-22 2018-05-08 Taiwan Semiconductor Manufacturing Company, Ltd. Chemical mechanical polishing apparatus and method
JP6920849B2 (ja) * 2017-03-27 2021-08-18 株式会社荏原製作所 基板処理方法および装置
CN108818278B (zh) * 2018-06-25 2020-05-19 浙江铁流离合器股份有限公司 一种机械联动式的可调型离合器摩擦片抛光装置
US11597052B2 (en) 2018-06-27 2023-03-07 Applied Materials, Inc. Temperature control of chemical mechanical polishing
TWI838459B (zh) 2019-02-20 2024-04-11 美商應用材料股份有限公司 化學機械拋光裝置及化學機械拋光方法
US11633833B2 (en) 2019-05-29 2023-04-25 Applied Materials, Inc. Use of steam for pre-heating of CMP components
US11628478B2 (en) 2019-05-29 2023-04-18 Applied Materials, Inc. Steam cleaning of CMP components
TWI859239B (zh) 2019-05-29 2024-10-21 美商應用材料股份有限公司 用於化學機械研磨系統的蒸氣處置站的設備及方法
US11897079B2 (en) 2019-08-13 2024-02-13 Applied Materials, Inc. Low-temperature metal CMP for minimizing dishing and corrosion, and improving pad asperity
TW202522580A (zh) 2019-08-13 2025-06-01 美商應用材料股份有限公司 化學機械研磨系統
CN115066316B (zh) 2020-06-29 2024-09-27 应用材料公司 控制化学机械抛光的蒸汽产生
KR20240165485A (ko) 2020-06-29 2024-11-22 어플라이드 머티어리얼스, 인코포레이티드 Cmp에서의 온도 및 슬러리 유량 제어
WO2022006160A1 (en) 2020-06-30 2022-01-06 Applied Materials, Inc. Apparatus and method for cmp temperature control
US11577358B2 (en) 2020-06-30 2023-02-14 Applied Materials, Inc. Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing
CN111975471A (zh) * 2020-08-19 2020-11-24 蚌埠知博自动化技术开发有限公司 一种金属材料表面处理的超声波表面强化处理设备

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TW200425329A (en) * 2003-03-12 2004-11-16 Ebara Corp Apparatus for cleaning a substrate having metal
TW200507954A (en) * 2003-06-11 2005-03-01 Goldfinger Technologies Llc Megasonic cleaning using supersaturated cleaning solution
TW201102215A (en) * 2009-05-14 2011-01-16 jian-min Song Methods and systems for water jet assisted CMP processing

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JP3438388B2 (ja) * 1995-03-16 2003-08-18 ソニー株式会社 化学的機械研磨方法および化学的機械研磨装置
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JP3696690B2 (ja) * 1996-04-23 2005-09-21 不二越機械工業株式会社 ウェーハの研磨装置システム
JPH10323631A (ja) * 1997-05-23 1998-12-08 Ebara Corp 洗浄部材のセルフクリーニング装置
US5888124A (en) * 1997-09-26 1999-03-30 Vanguard International Semiconductor Corporation Apparatus for polishing and cleaning a wafer
JP3452471B2 (ja) * 1997-09-29 2003-09-29 アルプス電気株式会社 純水供給システム、洗浄装置及びガス溶解装置
US6227944B1 (en) * 1999-03-25 2001-05-08 Memc Electronics Materials, Inc. Method for processing a semiconductor wafer
JP4440237B2 (ja) * 1999-05-17 2010-03-24 株式会社荏原製作所 ドレッシング装置
KR100304706B1 (ko) * 1999-06-16 2001-11-01 윤종용 화학기계적 연마장치 및 연마 헤드 내부의 오염 물질 세척방법
US6358119B1 (en) * 1999-06-21 2002-03-19 Taiwan Semiconductor Manufacturing Company Way to remove CU line damage after CU CMP
JP2001038614A (ja) * 1999-07-26 2001-02-13 Ebara Corp 研磨装置
JP2001113455A (ja) * 1999-10-14 2001-04-24 Sony Corp 化学的機械研磨装置及び方法
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US6811805B2 (en) * 2001-05-30 2004-11-02 Novatis Ag Method for applying a coating
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JP2007290111A (ja) * 2006-03-29 2007-11-08 Ebara Corp 研磨方法および研磨装置
WO2008097627A1 (en) * 2007-02-07 2008-08-14 Tbw Industries, Inc. Cleaning cup system for chemical mechanical planarization apparatus
JP2008302478A (ja) * 2007-06-08 2008-12-18 Tokyo Seimitsu Co Ltd 研磨ヘッドの洗浄装置及び洗浄方法
SG148960A1 (en) * 2007-06-15 2009-01-29 Tokyo Electron Ltd Substrate cleaning method and substrate cleaning apparatus
WO2010001743A1 (ja) * 2008-07-03 2010-01-07 旭硝子株式会社 ガラス基板の研磨方法及び製造方法
JP4532580B2 (ja) * 2008-08-20 2010-08-25 株式会社カイジョー 超音波洗浄装置
JP2010234298A (ja) * 2009-03-31 2010-10-21 Kurita Water Ind Ltd ガス溶解水供給装置及びガス溶解水の製造方法
JP5585076B2 (ja) * 2009-12-24 2014-09-10 栗田工業株式会社 洗浄方法
JP5866227B2 (ja) * 2012-02-23 2016-02-17 株式会社荏原製作所 基板洗浄方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200425329A (en) * 2003-03-12 2004-11-16 Ebara Corp Apparatus for cleaning a substrate having metal
TW200507954A (en) * 2003-06-11 2005-03-01 Goldfinger Technologies Llc Megasonic cleaning using supersaturated cleaning solution
TW201102215A (en) * 2009-05-14 2011-01-16 jian-min Song Methods and systems for water jet assisted CMP processing

Also Published As

Publication number Publication date
TW201436946A (zh) 2014-10-01
KR101604519B1 (ko) 2016-03-17
US20140187122A1 (en) 2014-07-03
KR20140086839A (ko) 2014-07-08
JP2014130881A (ja) 2014-07-10
US9162337B2 (en) 2015-10-20

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