TWI560523B - An underlayer composition and process thereof - Google Patents

An underlayer composition and process thereof

Info

Publication number
TWI560523B
TWI560523B TW101122288A TW101122288A TWI560523B TW I560523 B TWI560523 B TW I560523B TW 101122288 A TW101122288 A TW 101122288A TW 101122288 A TW101122288 A TW 101122288A TW I560523 B TWI560523 B TW I560523B
Authority
TW
Taiwan
Prior art keywords
underlayer composition
underlayer
composition
Prior art date
Application number
TW101122288A
Other languages
English (en)
Chinese (zh)
Other versions
TW201312281A (zh
Inventor
Huirong Yao
Guanyang Lin
Zachary Bogusz
Pinghung Lu
Wookyu Kim
Mark Neisser
Original Assignee
Merck Patent Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Merck Patent Gmbh filed Critical Merck Patent Gmbh
Publication of TW201312281A publication Critical patent/TW201312281A/zh
Application granted granted Critical
Publication of TWI560523B publication Critical patent/TWI560523B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C08L101/06—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0091—Complexes with metal-heteroatom-bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/56—Organo-metallic compounds, i.e. organic compounds containing a metal-to-carbon bond
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L37/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen; Compositions of derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Paints Or Removers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
TW101122288A 2011-06-21 2012-06-21 An underlayer composition and process thereof TWI560523B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/164,869 US8568958B2 (en) 2011-06-21 2011-06-21 Underlayer composition and process thereof

Publications (2)

Publication Number Publication Date
TW201312281A TW201312281A (zh) 2013-03-16
TWI560523B true TWI560523B (en) 2016-12-01

Family

ID=46465239

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101122288A TWI560523B (en) 2011-06-21 2012-06-21 An underlayer composition and process thereof

Country Status (8)

Country Link
US (1) US8568958B2 (enExample)
EP (1) EP2723809B1 (enExample)
JP (1) JP6122426B2 (enExample)
KR (1) KR101824763B1 (enExample)
CN (1) CN103582665B (enExample)
SG (1) SG194106A1 (enExample)
TW (1) TWI560523B (enExample)
WO (1) WO2012176043A1 (enExample)

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JP5889568B2 (ja) 2011-08-11 2016-03-22 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ 酸化タングステン膜形成用組成物およびそれを用いた酸化タングステン膜の製造法
US9315636B2 (en) 2012-12-07 2016-04-19 Az Electronic Materials (Luxembourg) S.A.R.L. Stable metal compounds, their compositions and methods
US9201305B2 (en) * 2013-06-28 2015-12-01 Az Electronic Materials (Luxembourg) S.A.R.L. Spin-on compositions of soluble metal oxide carboxylates and methods of their use
US9296922B2 (en) 2013-08-30 2016-03-29 Az Electronic Materials (Luxembourg) S.A.R.L. Stable metal compounds as hardmasks and filling materials, their compositions and methods of use
US9418836B2 (en) * 2014-01-14 2016-08-16 Az Electronic Materials (Luxembourg) S.A.R.L. Polyoxometalate and heteropolyoxometalate compositions and methods for their use
US9409793B2 (en) 2014-01-14 2016-08-09 Az Electronic Materials (Luxembourg) S.A.R.L. Spin coatable metallic hard mask compositions and processes thereof
EP3122792B1 (en) * 2014-03-28 2018-10-17 Versalis S.P.A. Vinyl polymers having a flame-retardant function
JP2015199916A (ja) * 2014-04-02 2015-11-12 Jsr株式会社 膜形成用組成物及びパターン形成方法
US9499698B2 (en) * 2015-02-11 2016-11-22 Az Electronic Materials (Luxembourg)S.A.R.L. Metal hardmask composition and processes for forming fine patterns on semiconductor substrates
US9957339B2 (en) * 2015-08-07 2018-05-01 Rohm And Haas Electronic Materials Llc Copolymer and associated layered article, and device-forming method
US9929012B1 (en) 2016-12-14 2018-03-27 International Business Machines Corporation Resist having tuned interface hardmask layer for EUV exposure
TWI737872B (zh) 2016-12-21 2021-09-01 德商馬克專利公司 用於嵌段共聚物之自組裝之新穎組合物及方法
KR102456279B1 (ko) 2017-03-16 2022-10-18 메르크 파텐트 게엠베하 리소그래피 조성물 및 이의 사용 방법
KR102399362B1 (ko) 2017-09-06 2022-05-18 메르크 파텐트 게엠베하 하드 마스크로서 유용한 스핀-온 무기 산화물 함유 조성물 및 개선된 열적 안정성을 지닌 충전 재료
US10998191B2 (en) 2018-11-13 2021-05-04 International Business Machines Corporation Graded hardmask interlayer for enhanced extreme ultraviolet performance
JP7550211B2 (ja) 2019-07-08 2024-09-12 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング 洗浄剤並びにエッジ保護層及び残留金属ハードマスク成分を除去するためのそれの使用
DE102019134535B4 (de) * 2019-08-05 2023-09-07 Taiwan Semiconductor Manufacturing Co., Ltd. Materialien für unteren antireflexbelag
JP2025113918A (ja) * 2024-01-23 2025-08-04 信越化学工業株式会社 金属含有膜形成用組成物、パターン形成方法

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EP1798599A1 (en) * 2005-12-14 2007-06-20 Shinetsu Chemical Co., Ltd. Antireflection film composition, patterning process and substrate using the same
US20090286188A1 (en) * 2008-05-15 2009-11-19 Shin-Etsu Chemical Co., Ltd. Patterning process
CN101796146A (zh) * 2007-09-07 2010-08-04 3M创新有限公司 包含经表面改性的高折射率纳米粒子的自组装抗反射涂层

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CN1816575A (zh) * 2003-07-02 2006-08-09 3M创新有限公司 氟化短链丙烯酸酯或甲基丙烯酸酯的氟化聚合物及以其为基础的斥油和斥水组合物
EP1798599A1 (en) * 2005-12-14 2007-06-20 Shinetsu Chemical Co., Ltd. Antireflection film composition, patterning process and substrate using the same
CN101796146A (zh) * 2007-09-07 2010-08-04 3M创新有限公司 包含经表面改性的高折射率纳米粒子的自组装抗反射涂层
US20090286188A1 (en) * 2008-05-15 2009-11-19 Shin-Etsu Chemical Co., Ltd. Patterning process

Also Published As

Publication number Publication date
EP2723809B1 (en) 2020-01-08
EP2723809A1 (en) 2014-04-30
KR101824763B1 (ko) 2018-02-02
SG194106A1 (en) 2013-11-29
US8568958B2 (en) 2013-10-29
KR20140056178A (ko) 2014-05-09
WO2012176043A1 (en) 2012-12-27
JP6122426B2 (ja) 2017-04-26
TW201312281A (zh) 2013-03-16
CN103582665A (zh) 2014-02-12
CN103582665B (zh) 2015-07-08
JP2014526060A (ja) 2014-10-02
US20120328990A1 (en) 2012-12-27

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