TWI550807B - 接合結構及方法 - Google Patents
接合結構及方法 Download PDFInfo
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- TWI550807B TWI550807B TW100121478A TW100121478A TWI550807B TW I550807 B TWI550807 B TW I550807B TW 100121478 A TW100121478 A TW 100121478A TW 100121478 A TW100121478 A TW 100121478A TW I550807 B TWI550807 B TW I550807B
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/191—Disposition
- H01L2924/19101—Disposition of discrete passive components
- H01L2924/19105—Disposition of discrete passive components in a side-by-side arrangement on a common die mounting substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/35—Mechanical effects
- H01L2924/351—Thermal stress
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Die Bonding (AREA)
- Powder Metallurgy (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Pressure Welding/Diffusion-Bonding (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MYPI2010003445A MY160373A (en) | 2010-07-21 | 2010-07-21 | Bonding structure and method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201205764A TW201205764A (en) | 2012-02-01 |
| TWI550807B true TWI550807B (zh) | 2016-09-21 |
Family
ID=45496354
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW100121478A TWI550807B (zh) | 2010-07-21 | 2011-06-20 | 接合結構及方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US20120018864A1 (enExample) |
| JP (2) | JP5882618B2 (enExample) |
| CN (1) | CN102347252B (enExample) |
| MY (1) | MY160373A (enExample) |
| TW (1) | TWI550807B (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013187843A1 (en) * | 2012-06-15 | 2013-12-19 | Agency For Science, Technology And Research | Embossing method and embossing arrangement |
| WO2014091517A1 (ja) * | 2012-12-10 | 2014-06-19 | 株式会社ニッシン | 接合方法 |
| JP6245933B2 (ja) * | 2013-10-17 | 2017-12-13 | Dowaエレクトロニクス株式会社 | 接合用銀シートおよびその製造方法並びに電子部品接合方法 |
| JP6415381B2 (ja) | 2015-04-30 | 2018-10-31 | 三菱電機株式会社 | 半導体装置の製造方法 |
| US9576922B2 (en) * | 2015-05-04 | 2017-02-21 | Globalfoundries Inc. | Silver alloying post-chip join |
| US9881895B2 (en) * | 2015-08-18 | 2018-01-30 | Lockheed Martin Corporation | Wire bonding methods and systems incorporating metal nanoparticles |
| US20170309549A1 (en) * | 2016-04-21 | 2017-10-26 | Texas Instruments Incorporated | Sintered Metal Flip Chip Joints |
| JP6763708B2 (ja) * | 2016-06-30 | 2020-09-30 | 大陽日酸株式会社 | 接合材、接合材の製造方法、及び接合体 |
| US10347507B2 (en) * | 2017-09-29 | 2019-07-09 | Lg Innotek Co., Ltd. | Printed circuit board |
| KR102531762B1 (ko) | 2017-09-29 | 2023-05-12 | 엘지이노텍 주식회사 | 인쇄회로기판 및 이의 제조 방법 |
| DE102018128748A1 (de) * | 2018-11-15 | 2020-05-20 | Infineon Technologies Ag | Verfahren zur herstellung einer halbleitervorrichtung mit einerpastenschicht und halbleitervorrichtung |
| US10914018B2 (en) * | 2019-03-12 | 2021-02-09 | Infineon Technologies Ag | Porous Cu on Cu surface for semiconductor packages |
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| TW200536654A (en) * | 2004-03-31 | 2005-11-16 | Ebara Corp | Joining method and joined article |
| US20080160183A1 (en) * | 2006-12-28 | 2008-07-03 | Eiichi Ide | Conductive sintered layer forming composition and conductive coating film forming method and bonding method using the same |
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| JPS62123607A (ja) * | 1985-11-25 | 1987-06-04 | シャープ株式会社 | 異方導電性テ−プの製造方法 |
| JPH05329681A (ja) * | 1991-12-10 | 1993-12-14 | Nec Corp | 多層ろう材とその製造方法および接続方法 |
| JPH08325543A (ja) * | 1995-06-05 | 1996-12-10 | Soken Chem & Eng Co Ltd | 異方導電性接着剤 |
| JPH09326416A (ja) * | 1996-06-05 | 1997-12-16 | Kokusai Electric Co Ltd | 半導体素子の実装方法およびその製品 |
| US6344271B1 (en) * | 1998-11-06 | 2002-02-05 | Nanoenergy Corporation | Materials and products using nanostructured non-stoichiometric substances |
| US7083850B2 (en) | 2001-10-18 | 2006-08-01 | Honeywell International Inc. | Electrically conductive thermal interface |
| EP1508261B1 (en) | 2002-05-23 | 2010-09-22 | 3M Innovative Properties Company | Electronic assembly and method of making an electronic assembly |
| JP3837104B2 (ja) * | 2002-08-22 | 2006-10-25 | 日精樹脂工業株式会社 | カーボンナノ材と金属材料の複合成形方法及び複合金属製品 |
| TWI284581B (en) | 2002-09-18 | 2007-08-01 | Ebara Corp | Bonding material and bonding method |
| EP1662022A4 (en) * | 2003-06-11 | 2008-10-01 | Mitsubishi Electric Corp | DEVICE AND METHOD FOR COATING BY ELECTRICAL DISCHARGE |
| EP1697790B1 (en) * | 2003-12-22 | 2011-08-31 | LG Chem, Ltd. | Electrochromic material |
| US8257795B2 (en) * | 2004-02-18 | 2012-09-04 | Virginia Tech Intellectual Properties, Inc. | Nanoscale metal paste for interconnect and method of use |
| JP2006202938A (ja) * | 2005-01-20 | 2006-08-03 | Kojiro Kobayashi | 半導体装置及びその製造方法 |
| JP2006265686A (ja) | 2005-03-25 | 2006-10-05 | Nissan Motor Co Ltd | 金属/カーボンナノチューブ複合焼結体の製造方法 |
| JP4231493B2 (ja) * | 2005-05-27 | 2009-02-25 | 日精樹脂工業株式会社 | カーボンナノ複合金属材料の製造方法 |
| JP5041787B2 (ja) * | 2005-11-11 | 2012-10-03 | 株式会社半導体エネルギー研究所 | 圧着方法及び半導体装置の作製方法 |
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| CN101070571B (zh) * | 2006-05-12 | 2011-04-20 | 日精树脂工业株式会社 | 制造碳纳米材料和金属材料的复合材料的方法 |
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| WO2008065728A1 (en) * | 2006-11-29 | 2008-06-05 | Nihon Handa Co., Ltd. | Sintering metal particle composition having plasticity, method of producing the same, bonding agent and bonding method |
| JP5063176B2 (ja) * | 2007-04-27 | 2012-10-31 | 日精樹脂工業株式会社 | カーボンナノ複合金属材料の製造方法 |
| JP5012239B2 (ja) * | 2007-06-13 | 2012-08-29 | 株式会社デンソー | 接合方法及び接合体 |
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| JP2010098156A (ja) * | 2008-10-17 | 2010-04-30 | Seiko Epson Corp | 半導体装置、半導体装置の製造方法、電子機器 |
-
2010
- 2010-07-21 MY MYPI2010003445A patent/MY160373A/en unknown
- 2010-10-11 US US12/901,684 patent/US20120018864A1/en not_active Abandoned
-
2011
- 2011-06-20 TW TW100121478A patent/TWI550807B/zh active
- 2011-07-06 CN CN201110187482.2A patent/CN102347252B/zh active Active
- 2011-07-20 JP JP2011159078A patent/JP5882618B2/ja active Active
-
2015
- 2015-08-14 JP JP2015160138A patent/JP6101758B2/ja active Active
-
2017
- 2017-07-30 US US15/663,802 patent/US9997485B2/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| TW200536654A (en) * | 2004-03-31 | 2005-11-16 | Ebara Corp | Joining method and joined article |
| US20080160183A1 (en) * | 2006-12-28 | 2008-07-03 | Eiichi Ide | Conductive sintered layer forming composition and conductive coating film forming method and bonding method using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| US20170352635A1 (en) | 2017-12-07 |
| MY160373A (en) | 2017-03-15 |
| US20120018864A1 (en) | 2012-01-26 |
| JP6101758B2 (ja) | 2017-03-22 |
| CN102347252B (zh) | 2017-04-12 |
| JP2012028774A (ja) | 2012-02-09 |
| TW201205764A (en) | 2012-02-01 |
| JP5882618B2 (ja) | 2016-03-09 |
| US9997485B2 (en) | 2018-06-12 |
| JP2016021578A (ja) | 2016-02-04 |
| CN102347252A (zh) | 2012-02-08 |
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