TWI549159B - A packing method with a substrate having an adsorbent layer and a packer and a packing device having a substrate having an adsorbent layer - Google Patents
A packing method with a substrate having an adsorbent layer and a packer and a packing device having a substrate having an adsorbent layer Download PDFInfo
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Description
本發明係關於一種帶有吸附層之基板之捆包方法及捆包體以及帶有吸附層之基板之捆包裝置。 The present invention relates to a packing method of a substrate with an adsorption layer, a packing body, and a packing device for a substrate with an adsorption layer.
伴隨顯示面板、太陽電池、薄膜二次電池等電子元件之薄型化、輕量化,而期望使用於該等電子元件之玻璃板、樹脂板、金屬板等基板之薄板化。 In order to reduce the thickness and weight of electronic components such as a display panel, a solar cell, and a thin film secondary battery, it is desirable to use a thin plate for a substrate such as a glass plate, a resin plate, or a metal plate.
然而,若基板之厚度變薄,則基板之操作性惡化,故於基板之正面形成電子元件用功能層(薄膜電晶體(TFT:Thin Film Transistor)、彩色濾光片(CF:Color Filter))變得困難。 However, when the thickness of the substrate is reduced, the handleability of the substrate is deteriorated, so that a functional layer for an electronic component (TFT: Thin Film Transistor, CF: Color Filter) is formed on the front surface of the substrate. It has become difficult.
因此,提出有如下方法:使用於正面具備吸附層之補強板(基板),使基板之背面吸附於該補強板上之吸附層,而構成藉由補強板而對基板進行補強之積層體,並以積層體之狀態於基板之正面形成功能層(參照專利文獻1)。該方法中,基板之操作性提高,故於基板之正面可良好地形成功能層。而且,於正面具備吸附層之補強板係於形成功能層後被自基板剝離,所剝離之上述補強板係以複數片為單位積層收納於托板(捆包容器)。 Therefore, there has been proposed a method in which a reinforcing plate (substrate) having an adsorption layer on the front surface is used, and a back surface of the substrate is adsorbed on the adsorption layer on the reinforcing plate to form a laminate which reinforces the substrate by the reinforcing plate, and A functional layer is formed on the front surface of the substrate in a state of a laminate (see Patent Document 1). In this method, since the handleability of the substrate is improved, the functional layer can be favorably formed on the front surface of the substrate. Further, the reinforcing plate having the adsorption layer on the front surface is peeled off from the substrate after forming the functional layer, and the reinforced reinforcing plate which is peeled off is stacked in a plurality of sheets in a pallet (a packaging container).
[專利文獻1]國際公開第2010/090147號 [Patent Document 1] International Publication No. 2010/090147
然而,先前,於自托板逐片地取出收納於托板之補強板時,鄰接之補強板彼此藉由吸附層而吸附,故自托板逐片地取出補強板較為困難。為了消除此種不良情況,若於鄰接之2片補強板之間介隔間隔紙等片材則可消除。然而,該方法存在另外需要片材並且片材被吸附於吸附層之情形,因此產生另外需要卸除片材之作業之問題。 However, in the past, when the reinforcing plate accommodated in the pallet was taken out one by one from the pallet, the adjacent reinforcing plates were adsorbed by the adsorption layer, and it was difficult to take out the reinforcing plate piece by piece from the pallet. In order to eliminate such a problem, if a sheet such as a spacer paper is interposed between two adjacent reinforcing plates, it can be eliminated. However, this method has a case where a sheet is additionally required and the sheet is adsorbed to the adsorption layer, thus causing a problem that an operation for additionally removing the sheet is required.
本發明係鑒於上述課題而完成者,其目的在於提供一種於將在正面具備吸附層之複數個基板不介隔片材地收納於捆包容器之情形時亦可自捆包容器容易地逐片取出基板的帶有吸附層之基板之捆包方法及捆包體以及帶有吸附層之基板之捆包裝置。 The present invention has been made in view of the above problems, and an object of the present invention is to provide a case where a plurality of substrates having an adsorption layer on the front surface are accommodated in a packaging container without interposing a sheet, and the package can be easily piece by piece from the package container. A packing method for removing a substrate with an adsorption layer of a substrate, a packing body, and a packing device for a substrate having an adsorption layer.
為了達成上述目的,本發明之帶有吸附層之基板之捆包方法的一態樣之特徵在於:準備於正面形成有吸附層之複數個基板,並於上述複數個基板之各個吸附層之正面形成痕跡,將上述複數個基板積層收納於捆包容器。 In order to achieve the above object, an aspect of the method for packaging a substrate with an adsorption layer of the present invention is characterized in that a plurality of substrates prepared with an adsorption layer on the front surface are prepared, and are formed on the front side of each of the plurality of substrates Traces are formed, and the plurality of substrate layers are stacked in a packaging container.
於本發明中說明之所謂「刮痕」,係藉由痕跡賦予機構之刮劃動作而形成之痕跡。詳細而言,本發明之基板係藉由痕跡賦予機構之刮劃動作而於吸附層之正面形成有溝槽部、且於溝槽部之兩側形成有因形成溝槽部而隆起所形成之山部。溝槽部之深度及山部之高度係基於吸附層之厚度(數微米至數十微米),單位微米。本發明之技術特徵在於:藉由在吸附層之正面形成「刮痕」,而使吸附層之吸附面積減少,使基板彼此之吸附力下降。 The "scratch" described in the present invention is a trace formed by the scratching action of the mark imparting mechanism. Specifically, in the substrate of the present invention, a groove portion is formed on the front surface of the adsorption layer by the scratching operation of the mark applying mechanism, and a groove portion is formed on both sides of the groove portion by the formation of the groove portion. Mountain department. The depth of the groove portion and the height of the mountain portion are based on the thickness of the adsorption layer (several micrometers to tens of micrometers) in micrometers. The technical feature of the present invention is that by forming a "scratch" on the front surface of the adsorption layer, the adsorption area of the adsorption layer is reduced, and the adsorption force between the substrates is lowered.
再者,為了使基板彼此之吸附力更下降,較佳為於吸附層之正面形成複數條「刮痕」。又,於吸附層之正面可規則性地形成「刮痕」,亦可隨意地形成「刮痕」。進而,為了使基板彼此之吸附力更進 一步下降,較佳為於吸附層之正面均勻地形成「刮痕」。 Further, in order to lower the adsorption force between the substrates, it is preferable to form a plurality of "scratches" on the front surface of the adsorption layer. Further, "scratches" can be formed regularly on the front surface of the adsorption layer, and "scratches" can be formed arbitrarily. Furthermore, in order to make the adsorption force of the substrates more advanced It is preferable to form a "scratch" uniformly on the front surface of the adsorption layer in one step.
如上所述,根據本發明之一態樣,藉由在吸附層之正面形成刮痕,而使基板彼此之吸附力下降,因此於將在正面具備吸附層之複數個基板不介隔片材地收納於捆包容器之情形時亦可自捆包容器容易地逐片取出基板。 As described above, according to one aspect of the present invention, by forming a scratch on the front surface of the adsorption layer, the adsorption force between the substrates is lowered, so that the plurality of substrates having the adsorption layer on the front side are not interposed between the sheets. In the case of being stored in a bale container, the substrate can be easily taken out one by one from the bale container.
本發明之一態樣較佳為上述刮痕為藉由輥刷而形成之痕跡。 In one aspect of the invention, it is preferred that the scratches are traces formed by a roller brush.
根據本發明之一態樣,可藉由輥刷而容易地形成刮痕。 According to an aspect of the invention, the scratch can be easily formed by the roller brush.
本發明之一態樣較佳為上述基板為厚度為0.7mm以下之玻璃板。 In one aspect of the invention, it is preferred that the substrate be a glass plate having a thickness of 0.7 mm or less.
根據本發明之一態樣,作為基板,適合於對電子元件用基板進行補強之補強板。 According to an aspect of the present invention, a substrate is suitable as a reinforcing plate for reinforcing a substrate for an electronic component.
本發明之一態樣較佳為上述吸附層包含聚矽氧樹脂或聚醯亞胺樹脂。 In one aspect of the invention, it is preferred that the adsorption layer comprises a polyoxyn resin or a polyimide resin.
根據本發明之一態樣,於包含聚矽氧樹脂或聚醯亞胺樹脂之吸附層之正面形成刮痕並將複數個基板收納於捆包容器。 According to an aspect of the present invention, a scratch is formed on a front surface of an adsorption layer containing a polyoxymethylene resin or a polyimide resin, and a plurality of substrates are housed in a packaging container.
為了達成上述目的,本發明之捆包體之特徵在於具備:複數個基板,其等係在正面形成有吸附層之基板,藉由在上述吸附層形成痕跡之處理作業而在上述吸附層之正面形成痕跡;及捆包容器,其係將上述複數個基板積層而收納。 In order to achieve the above object, a package according to the present invention includes a plurality of substrates which are formed on a front surface of a substrate on which an adsorption layer is formed, and which is formed on the front side of the adsorption layer by a processing operation for forming a mark on the adsorption layer. And forming a mark; and a packaging container, wherein the plurality of substrates are stacked and stored.
根據本發明之一態樣,於將在正面具備吸附層之複數個基板不介隔片材地收納於捆包容器之情形時亦可自捆包容器容易地逐片取出基板。 According to an aspect of the present invention, when a plurality of substrates having an adsorption layer on the front surface are accommodated in a packaging container without interposing a sheet, the substrate can be easily taken out one by one from the packaging container.
本發明之一態樣較佳為收納於上述捆包容器之上述複數個基板係各個基板之正面及背面向同一方向積層。 In one aspect of the invention, it is preferable that the front surface and the back surface of each of the plurality of substrate substrates accommodated in the packaging container are stacked in the same direction.
根據本發明之一態樣,鄰接之2片基板係一基板之背面與另一基板之吸附層接觸。藉此,可防止基板之背面彼此之接觸,因此可防止 基板之損傷。本發明之一態樣係適於基板為玻璃板之情形。 According to an aspect of the present invention, the two substrates adjacent to each other are in contact with the adsorption layer of the other substrate. Thereby, the back surfaces of the substrates can be prevented from contacting each other, thereby preventing Damage to the substrate. One aspect of the present invention is suitable for the case where the substrate is a glass plate.
本發明之一態樣係上述基板為厚度為0.7mm以下之玻璃板較佳。 In one aspect of the invention, the substrate is preferably a glass plate having a thickness of 0.7 mm or less.
本發明之一態樣係上述吸附層係包含丙烯酸系樹脂、聚烯烴樹脂、聚胺基甲酸酯樹脂、聚醯亞胺樹脂、聚矽氧樹脂、或聚醯亞胺聚矽氧樹脂之有機膜;或包含選自由金屬矽化物、氮化物、碳化物、及碳氮化物所組成之群中之至少1種之無機膜。 In one aspect of the invention, the adsorption layer comprises an organic resin, a polyolefin resin, a polyurethane resin, a polyimide resin, a polyoxymethylene resin, or an organic polyimide resin. a film; or an inorganic film containing at least one selected from the group consisting of metal tellurides, nitrides, carbides, and carbonitrides.
為了達成上述目的,本發明之帶有吸附層之基板之捆包裝置的特徵在於具備:痕跡賦予機構,其於在正面形成有吸附層之基板之上述吸附層形成刮痕;移動機構,其將上述痕跡賦予機構推壓抵接於形成於上述基板上之上述吸附層,而使上述痕跡賦予機構及上述基板沿上述吸附層相對移動;及收納機構,其將於正面具有藉由上述痕跡賦予機構而形成有刮痕之吸附層的上述基板收納於捆包容器。 In order to achieve the above object, a packaging apparatus for a substrate with an adsorption layer according to the present invention includes: a mark applying mechanism that forms a scratch on the adsorption layer of a substrate on which an adsorption layer is formed on the front surface; and a moving mechanism that will The mark applying mechanism presses the adsorption layer formed on the substrate to move the mark providing mechanism and the substrate relatively along the adsorption layer, and the storage mechanism has a mark applying mechanism on the front surface The substrate on which the scratched adsorption layer is formed is housed in a packaging container.
根據本發明之一態樣,使用痕跡賦予機構及移動機構於基板上之吸附層之正面形成痕跡。即,一方面藉由移動機構而使痕跡賦予機構及基板沿基板上之吸附層相對移動,一方面藉由痕跡賦予機構而於基板上之吸附層形成刮痕。繼而,藉由收納機構而將具有形成有刮痕之吸附層之基板收納於捆包容器。藉此,可將對吸附層形成痕跡之處理作業、及具有形成有痕跡之吸附層之基板之收納作業連續地實施,因此可謀求一連串之作業(處理作業及收納作業)之效率化。 According to an aspect of the present invention, the trace imparting mechanism and the moving mechanism are used to form a mark on the front surface of the adsorption layer on the substrate. That is, on the one hand, the trace imparting mechanism and the substrate are relatively moved along the adsorption layer on the substrate by the moving mechanism, and the scratch-receiving layer is formed on the adsorption layer on the substrate by the trace imparting mechanism. Then, the substrate having the adsorption layer in which the scratches are formed is housed in the packaging container by the storage mechanism. Thereby, the processing operation for forming the trace on the adsorption layer and the storage operation of the substrate having the adsorption layer on which the trace is formed can be continuously performed, so that the efficiency of the series of operations (processing work and storage operation) can be improved.
本發明之一態樣較佳為上述痕跡賦予機構為旋轉自如之輥狀刷構件,上述移動機構為載置上述基板之背面(與上述形成有吸附層之面為相反側之面)並使上述基板沿上述吸附層移動之輸送機。 In one aspect of the invention, it is preferable that the mark applying mechanism is a roll-shaped brush member that is rotatable, and the moving mechanism is a back surface on which the substrate is placed (a surface opposite to a surface on which the adsorption layer is formed) A conveyor on which the substrate moves along the adsorption layer.
根據本發明之一態樣,於作為移動機構之輸送機載置基板之背面,藉由輸送機而使基板移動,並且藉由痕跡賦予機構即旋轉自如之輥狀刷構件而於吸附層形成刮痕。藉此,於吸附層可容易地形成刮 痕。又,藉由使用輥狀刷構件及輸送機,而可於複數個基板連續地實施於吸附層形成痕跡之處理作業,因此可謀求上述處理作業之效率化。 According to an aspect of the present invention, the substrate is moved by the conveyor on the back surface of the conveyor mounting substrate as the moving mechanism, and the scraping brush member is rotatably formed by the trace imparting mechanism, and the scraping layer is formed on the adsorption layer. mark. Thereby, the scraping can be easily formed on the adsorption layer mark. Further, by using the roller-shaped brush member and the conveyor, the plurality of substrates can be continuously subjected to the processing operation for forming the traces on the adsorption layer, so that the efficiency of the above-described processing can be improved.
根據本發明之帶有吸附層之基板之捆包方法及捆包體以及帶有吸附層之基板之捆包裝置,於將在正面具備吸附層之複數個基板不介隔片材地收納於捆包容器之情形時,亦可自捆包容器容易地逐片取出基板。 According to the packing method of the substrate with an adsorption layer of the present invention, and the packing device of the package and the substrate with the adsorption layer, the plurality of substrates having the adsorption layer on the front side are accommodated in the bundle without interposing the sheet. In the case of a container, the substrate can be easily taken out one by one from the package container.
1‧‧‧積層體 1‧‧ ‧ laminated body
2‧‧‧基板 2‧‧‧Substrate
2a‧‧‧基板之正面 2a‧‧‧front of the substrate
2b‧‧‧基板之背面 2b‧‧‧Back of the substrate
3‧‧‧補強板 3‧‧‧ reinforcing plate
3a‧‧‧補強板之正面 3a‧‧‧ Strengthening the front of the board
3b‧‧‧補強板之背面 3b‧‧‧ Back of the reinforcing plate
4‧‧‧樹脂層 4‧‧‧ resin layer
10‧‧‧痕跡形成裝置 10‧‧‧ Trace forming device
12‧‧‧輥刷 12‧‧‧ Roller brush
14‧‧‧輥式輸送機 14‧‧‧Roller conveyor
16‧‧‧芯材 16‧‧‧ core material
18‧‧‧刷毛 18‧‧‧ bristles
20‧‧‧輥 20‧‧‧roll
22‧‧‧從動輥 22‧‧‧ driven roller
24‧‧‧定位銷 24‧‧‧Locating pin
26‧‧‧搬出部 26‧‧‧ Moving out
28‧‧‧機器人 28‧‧‧ Robot
30‧‧‧托板搭載台 30‧‧‧Board loading platform
32‧‧‧臂 32‧‧‧ Arm
34‧‧‧吸附墊 34‧‧‧Adsorption pad
36‧‧‧托板 36‧‧‧ pallet
A‧‧‧箭頭 A‧‧‧ arrow
L‧‧‧長度 L‧‧‧ length
W‧‧‧寬度 W‧‧‧Width
圖1係表示積層體之一例之主要部分放大側視圖。 Fig. 1 is an enlarged side elevational view showing an essential part of an example of a laminated body.
圖2係本實施形態之痕跡形成裝置之立體圖。 Fig. 2 is a perspective view of the mark forming apparatus of the embodiment.
圖3係表示本實施形態之痕跡形成裝置之整體構成的說明圖。 Fig. 3 is an explanatory view showing an overall configuration of a mark forming apparatus of the embodiment.
圖4(A)係形成有刮痕之樹脂層之圖像,圖4(B)係表示形成有刮痕之樹脂層之正面性狀的曲線圖。 4(A) is an image of a resin layer in which a scratch is formed, and FIG. 4(B) is a graph showing a front surface property of a resin layer on which a scratch is formed.
以下,根據隨附圖式,對本發明之帶有吸附層之基板之捆包方法及捆包體以及帶有吸附層之基板之捆包裝置的實施形態進行說明。 Hereinafter, an embodiment of a packaging method of a substrate with an adsorption layer, a package body, and a packaging device with a substrate having an adsorption layer according to the present invention will be described with reference to the accompanying drawings.
以下,對將本發明之帶有吸附層之基板之捆包方法及捆包體以及帶有吸附層之基板之捆包裝置於電子元件之製造工廠使用的形態進行說明。 Hereinafter, a mode in which the packaging method of the substrate with an adsorption layer of the present invention, and the package of the package and the substrate with the adsorption layer are placed in a manufacturing plant of the electronic component will be described.
所謂電子元件,係顯示面板、太陽電池、薄膜二次電池等電子零件。作為顯示面板,可例示液晶顯示面板(LCD:Liquid Crystal Display)、電漿顯示面板(PDP:Plasma Display Panel)、及有機EL顯示面板(OELD:Organic Electro Luminescence Display)。 The electronic component is an electronic component such as a display panel, a solar cell, or a thin film secondary battery. As the display panel, a liquid crystal display panel (LCD: Liquid Crystal Display), a plasma display panel (PDP: Plasma Display Panel), and an organic EL display panel (OELD: Organic Electro Luminescence Display) can be exemplified.
電子元件係藉由在玻璃製、樹脂製、金屬製等之基板之正面形成電子元件用功能層(若為LCD,則為薄膜電晶體(TFT)、彩色濾光片 (CF))而製造。 The electronic component is formed of a functional layer for an electronic component on the front surface of a substrate made of glass, resin, or metal (in the case of an LCD, a thin film transistor (TFT), a color filter) (CF)) manufactured.
上述基板係於形成功能層前,背面(與形成功能層之面為相反側之面)吸附於形成在補強板(基板)上之吸附層而構成積層體。此後,以積層體之狀態於基板之正面形成功能層。繼而,於形成功能層後,自基板剝離補強板及吸附層。 The substrate is attached to the adsorption layer formed on the reinforcing plate (substrate) to form a laminate before the functional layer is formed, and the back surface (the surface opposite to the surface on which the functional layer is formed) is adsorbed. Thereafter, a functional layer is formed on the front surface of the substrate in a state of a laminate. Then, after the functional layer is formed, the reinforcing plate and the adsorption layer are peeled off from the substrate.
[積層體1] [Layer 1]
圖1係表示積層體1之一例之主要部分放大側視圖。 Fig. 1 is an enlarged side elevational view showing an essential part of an example of the laminated body 1.
積層體1具備形成有功能層之基板2、及對基板2進行補強之補強板(基板)3。又,補強板3係於正面3a具備樹脂層(吸附層)4,於樹脂層4吸附基板2之背面2b。即,基板2係藉由作用於其與樹脂層4之間之凡得瓦力、或樹脂層4之黏著力而介隔樹脂層4吸附於補強板3。 The laminated body 1 includes a substrate 2 on which a functional layer is formed, and a reinforcing plate (substrate) 3 that reinforces the substrate 2. Moreover, the reinforcing plate 3 is provided with a resin layer (adsorption layer) 4 on the front surface 3a, and the back surface 2b of the substrate 2 is adsorbed on the resin layer 4. That is, the substrate 2 is adsorbed to the reinforcing plate 3 via the resin layer 4 by the van der Waals force acting between the resin layer 4 and the resin layer 4 or the adhesion of the resin layer 4.
[基板2] [Substrate 2]
基板2係於正面2a形成有功能層。作為基板2,可例示玻璃基板、陶瓷基板、樹脂基板、金屬基板、半導體基板。於該等基板中,玻璃基板係耐化學品性、耐透濕性優異,且線膨脹係數較小,因此適於作為電子元件用基板2。又,亦具有如下優點:隨著線膨脹係數變小,於高溫下形成之功能層之圖案於冷卻時變得不易移動。 The substrate 2 is formed with a functional layer on the front surface 2a. The substrate 2 can be exemplified by a glass substrate, a ceramic substrate, a resin substrate, a metal substrate, and a semiconductor substrate. Among these substrates, the glass substrate is excellent in chemical resistance and moisture permeability resistance, and has a small coefficient of linear expansion. Therefore, it is suitable as the substrate 2 for electronic components. Further, it has the advantage that as the coefficient of linear expansion becomes smaller, the pattern of the functional layer formed at a high temperature becomes less likely to move upon cooling.
作為玻璃基板之玻璃,可例示無鹼玻璃、硼矽酸玻璃、鈉鈣玻璃、高二氧化矽玻璃、其他以氧化矽為主要成分之氧化物系玻璃。作為氧化物系玻璃,較佳為氧化物換算之氧化矽之含量為40~90質量%之玻璃。 Examples of the glass of the glass substrate include alkali-free glass, borosilicate glass, soda lime glass, high cerium oxide glass, and other oxide-based glass containing cerium oxide as a main component. The oxide-based glass is preferably a glass having a content of cerium oxide in an amount of 40 to 90% by mass in terms of oxide.
玻璃基板之玻璃較佳為選擇採用適於製造之電子元件之種類的玻璃。例如,於液晶面板用玻璃基板,較佳為採用實質上不包含鹼金屬成分之玻璃(無鹼玻璃)。 The glass of the glass substrate is preferably selected from the group of electronic components suitable for manufacturing. For example, in the glass substrate for liquid crystal panels, it is preferable to use a glass (alkali-free glass) which does not substantially contain an alkali metal component.
基板2之厚度係根據基板2之種類而設定。例如,於基板2採用玻璃基板之情形時,為了電子元件之輕量化、薄板化,基板2之厚度較 佳為設定為0.7mm以下,更佳為設定為0.3mm以下,進而較佳為設定為0.1mm以下。於厚度為0.3mm以下之情形時,可對玻璃基板賦予良好之可撓性。進而,於厚度為0.1mm以下之情形時,可將玻璃基板捲取成捲狀,但就玻璃基板之製造之觀點、及玻璃基板之處理之觀點而言,玻璃基板之厚度較佳為0.03mm以上。 The thickness of the substrate 2 is set according to the type of the substrate 2. For example, when the substrate 2 is a glass substrate, the thickness of the substrate 2 is thinner for the weight reduction and thinning of the electronic component. It is preferably set to 0.7 mm or less, more preferably set to 0.3 mm or less, and further preferably set to 0.1 mm or less. When the thickness is 0.3 mm or less, good flexibility can be imparted to the glass substrate. Further, when the thickness is 0.1 mm or less, the glass substrate can be wound into a roll shape. However, from the viewpoint of the production of the glass substrate and the treatment of the glass substrate, the thickness of the glass substrate is preferably 0.03 mm. the above.
再者,於圖1中,基板2係以1片基板構成,但基板2亦可為由複數片基板構成者。即,基板2亦可由積層有複數片基板之積層體構成。於該情形時,構成積層體之所有基板之合計厚度成為上述厚度範圍。又,於該情形時,構成積層體之基板之種類亦可不同。 Further, in FIG. 1, the substrate 2 is composed of one substrate, but the substrate 2 may be composed of a plurality of substrates. That is, the substrate 2 may be composed of a laminate in which a plurality of substrates are laminated. In this case, the total thickness of all the substrates constituting the laminate is in the above thickness range. Further, in this case, the types of the substrates constituting the laminated body may be different.
[補強板3] [Reinforcing board 3]
作為補強板3,可例示玻璃基板、陶瓷基板、樹脂基板、金屬基板、半導體基板、或積層有該等板狀體之板狀體。 The reinforcing plate 3 may, for example, be a glass substrate, a ceramic substrate, a resin substrate, a metal substrate, a semiconductor substrate, or a plate-like body in which the plate-like bodies are laminated.
補強板3之種類係根據製造之電子元件之種類、使用於電子元件之基板2之種類等而選定。若補強板3與基板2為相同之材質,則可減少因溫度變化引起之翹曲、剝離。 The type of the reinforcing plate 3 is selected depending on the type of electronic component to be manufactured, the type of the substrate 2 used for the electronic component, and the like. When the reinforcing plate 3 and the substrate 2 are made of the same material, warpage and peeling due to temperature change can be reduced.
補強板3與基板2之平均線膨脹係數之差(絕對值)係根據基板2之尺寸形狀等而適當設定,較佳為35×10-7/℃以下。此處,所謂「平均線膨脹係數」係指50~300℃之溫度範圍內之平均線膨脹係數(JIS R3102:1995)。再者,JIS R3102:1995之內容係以參照之形式引用於此。 The difference (absolute value) between the average linear expansion coefficients of the reinforcing plate 3 and the substrate 2 is appropriately set depending on the size and shape of the substrate 2, and is preferably 35 × 10 -7 / ° C or less. Here, the "average linear expansion coefficient" means an average linear expansion coefficient in a temperature range of 50 to 300 ° C (JIS R3102: 1995). Furthermore, the contents of JIS R3102:1995 are incorporated herein by reference.
補強板3之厚度較佳為設定為0.7mm以下,且根據補強板3之種類、補強之基板2之種類、厚度等而設定。再者,補強板3之厚度可厚於基板2,亦可薄於基板2,但為了對基板2進行補強,較佳為0.4mm以上。 The thickness of the reinforcing plate 3 is preferably set to 0.7 mm or less, and is set according to the type of the reinforcing plate 3, the type and thickness of the reinforcing substrate 2, and the like. Further, the reinforcing plate 3 may have a thickness thicker than the substrate 2 or may be thinner than the substrate 2. However, in order to reinforce the substrate 2, it is preferably 0.4 mm or more.
再者,本例中補強板3由1片基板構成,但補強板3亦可由積層有複數片基板之積層體構成。於該情形時,構成積層體之所有補強板之 合計厚度成為上述厚度範圍。又,於該情形時,構成積層體之補強板之種類亦可不同。 Further, in the present embodiment, the reinforcing plate 3 is composed of one substrate, but the reinforcing plate 3 may be composed of a laminated body in which a plurality of substrates are laminated. In this case, all the reinforcing plates constituting the laminated body The total thickness becomes the above thickness range. Further, in this case, the type of the reinforcing plate constituting the laminated body may be different.
[樹脂層4] [Resin layer 4]
樹脂層4係為了防止於樹脂層4與補強板3之間發生剝離,而其與補強板3之間之結合力設定為高於其與基板2之間之結合力。藉此,於樹脂層4與基板2之間,補強板3自基板2剝離。 In order to prevent peeling between the resin layer 4 and the reinforcing plate 3, the resin layer 4 is set to have a bonding force with the reinforcing plate 3 higher than the bonding force with the substrate 2. Thereby, between the resin layer 4 and the substrate 2, the reinforcing plate 3 is peeled off from the substrate 2.
構成樹脂層4之樹脂並無特別限定,可例示丙烯酸系樹脂、聚烯烴樹脂、聚胺基甲酸酯樹脂、聚醯亞胺樹脂、聚矽氧樹脂、聚醯亞胺聚矽氧樹脂。亦可混合使用若干種樹脂。其中,就耐熱性或剝離性之觀點而言,較佳為聚矽氧樹脂、聚醯亞胺樹脂、聚醯亞胺聚矽氧樹脂,就耐熱性及高溫處理後之剝離性之觀點而言,較佳為聚矽氧樹脂或聚醯亞胺樹脂。本實施形態中,例示聚矽氧樹脂層作為樹脂層4。 The resin constituting the resin layer 4 is not particularly limited, and examples thereof include an acrylic resin, a polyolefin resin, a polyurethane resin, a polyimide resin, a polyoxymethylene resin, and a polyimide resin. Several kinds of resins can also be used in combination. Among them, from the viewpoint of heat resistance or peelability, a polyoxyxylene resin, a polyimide resin, and a polyimide polyimide resin are preferable from the viewpoint of heat resistance and peelability after high-temperature treatment. Preferably, it is a polyoxymethylene resin or a polyimide resin. In the present embodiment, a polyoxynitride resin layer is exemplified as the resin layer 4.
本發明中所使用之聚矽氧樹脂較佳為日本專利特開2011-046174號公報中所揭示者。例如,上述聚矽氧樹脂為包含下述線狀有機聚矽氧烷(a)及下述線狀有機聚矽氧烷(b)之硬化性聚矽氧樹脂組成物之硬化物,較佳為使用藉由使上述硬化性聚矽氧樹脂組成物於上述補強板之正面硬化而形成之硬化聚矽氧樹脂層。 The polyoxyxylene resin used in the present invention is preferably disclosed in Japanese Laid-Open Patent Publication No. 2011-046174. For example, the polyoxyxylene resin is a cured product of a curable polyanthracene resin composition comprising the linear organopolyoxane (a) and the linear organopolyoxane (b) described below, preferably A cured polyoxyalkylene resin layer formed by curing the curable polyoxyxene resin composition on the front surface of the reinforcing plate is used.
線狀有機聚矽氧烷(a):於每個分子中具有至少2個烯基之線狀有機聚矽氧烷。 Linear organopolyoxane (a): a linear organopolyoxane having at least 2 alkenyl groups per molecule.
線狀有機聚矽氧烷(b):於每個分子中具有至少3個鍵結於矽原子之氫原子的線狀有機聚矽氧烷,且上述鍵結於矽原子之氫原子中之至少1個存在於分子末端之矽原子。 a linear organopolyoxane (b): a linear organopolyoxane having at least 3 hydrogen atoms bonded to a halogen atom in each molecule, and at least one of the above-mentioned hydrogen atoms bonded to a halogen atom One helium atom present at the end of the molecule.
樹脂層4之厚度並無特別限定,但較佳為設定為1~50μm,更佳為設定為4~20μm。藉由將樹脂層4之厚度設為1μm以上,於在樹脂層4與基板2之間混入有氣泡或異物時,可藉由樹脂層4之變形而吸收氣泡或異物之厚度。另一方面,藉由將樹脂層4之厚度設為50μm以 下,可縮短樹脂層4之形成時間,進而不會必要以上地使用樹脂層4之樹脂,故較為經濟。 The thickness of the resin layer 4 is not particularly limited, but is preferably set to 1 to 50 μm, and more preferably set to 4 to 20 μm. When the thickness of the resin layer 4 is 1 μm or more, when bubbles or foreign matters are mixed between the resin layer 4 and the substrate 2, the thickness of the bubbles or foreign matter can be absorbed by the deformation of the resin layer 4. On the other hand, by setting the thickness of the resin layer 4 to 50 μm In this case, the formation time of the resin layer 4 can be shortened, and it is not necessary to use the resin of the resin layer 4 as described above, which is economical.
再者,樹脂層4之外形較佳為與補強板3之外形相同、或小於補強板3之外形,以便補強板3可支持樹脂層4之整體。又,樹脂層4之外形較佳為與基板2之外形相同、或大於基板2之外形,以便樹脂層4可將基板2之整體密接。 Further, the outer shape of the resin layer 4 is preferably the same as or smaller than the outer shape of the reinforcing plate 3, so that the reinforcing plate 3 can support the entirety of the resin layer 4. Further, the outer shape of the resin layer 4 is preferably the same as the outer shape of the substrate 2 or larger than the outer shape of the substrate 2, so that the resin layer 4 can adhere the entirety of the substrate 2.
又,於圖1中,樹脂層4由1層構成,但樹脂層4亦可由2層以上構成。於該情形時,構成樹脂層4之所有層之合計厚度成為樹脂層之厚度。又,於該情形時,構成各層之樹脂之種類亦可不同。 Further, in Fig. 1, the resin layer 4 is composed of one layer, but the resin layer 4 may be composed of two or more layers. In this case, the total thickness of all the layers constituting the resin layer 4 becomes the thickness of the resin layer. Moreover, in this case, the kind of the resin which comprises each layer may differ.
進而,本實施形態中將作為有機膜之樹脂層4用作吸附層,但亦可使用無機層代替樹脂層4。構成無機層之無機膜例如包含選自由金屬矽化物、氮化物、碳化物、及碳氮化物所組成之群中之至少1種。 Further, in the present embodiment, the resin layer 4 as an organic film is used as the adsorption layer, but an inorganic layer may be used instead of the resin layer 4. The inorganic film constituting the inorganic layer contains, for example, at least one selected from the group consisting of metal halides, nitrides, carbides, and carbonitrides.
金屬矽化物為例如包含選自由W、Fe、Mn、Mg、Mo、Cr、Ru、Re、Co、Ni、Ta、Ti、Zr、及Ba所組成之群中之至少1種者,較佳為矽化鎢。 The metal halide is, for example, at least one selected from the group consisting of W, Fe, Mn, Mg, Mo, Cr, Ru, Re, Co, Ni, Ta, Ti, Zr, and Ba, preferably Tungsten carbide.
氮化物為例如包含選自由Si、Hf、Zr、Ta、Ti、Nb、Na、Co、Al、Zn、Pb、Mg、Sn、In、B、Cr、Mo、及Ba所組成之群中之至少1種者,較佳為氮化鋁、氮化鈦、或氮化矽。 The nitride is, for example, at least one selected from the group consisting of Si, Hf, Zr, Ta, Ti, Nb, Na, Co, Al, Zn, Pb, Mg, Sn, In, B, Cr, Mo, and Ba. One type is preferably aluminum nitride, titanium nitride, or tantalum nitride.
碳化物為例如包含選自由Ti、W、Si、Zr、及Nb所組成之群中之至少1種者,較佳為碳化矽。 The carbide is, for example, at least one selected from the group consisting of Ti, W, Si, Zr, and Nb, and preferably ruthenium carbide.
碳氮化物為例如包含選自由Ti、W、Si、Zr、及Nb所組成之群中之至少1種者,較佳為碳氮化矽。 The carbonitride is, for example, at least one selected from the group consisting of Ti, W, Si, Zr, and Nb, and is preferably lanthanum carbonitride.
金屬矽化物、氮化物、碳化物、及碳氮化物係包含於其材料之Si、N或C、與包含於其材料之其他元素之間陰電性之差較小,分極較小。因此,無機膜與水之反應性較低,於無機膜之正面難以產生羥基。藉此,良好地保持無機膜與作為玻璃基板之基板2之脫模性。 The metal halides, nitrides, carbides, and carbonitrides are included in the Si, N, or C of the material, and the difference in the electrical and electrical properties between the other elements contained in the material is small, and the polarization is small. Therefore, the reactivity of the inorganic film with water is low, and it is difficult to generate a hydroxyl group on the front side of the inorganic film. Thereby, the release property of the inorganic film and the substrate 2 as a glass substrate is favorably maintained.
於積層體1之基板2之正面2a形成功能層。作為形成功能層之方法,可使用CVD(Chemical Vapor Deposition,化學氣相沈積)法、PVD(Physical Vapor Deposition,物理氣相沈積)法等蒸鍍法、濺鍍法。功能層係藉由光微影法、蝕刻法而形成為特定圖案。於在基板2之正面2a形成功能層後,補強板3及樹脂層4被自基板2剝離。 A functional layer is formed on the front surface 2a of the substrate 2 of the laminated body 1. As a method of forming the functional layer, a vapor deposition method such as a CVD (Chemical Vapor Deposition) method or a PVD (Physical Vapor Deposition) method or a sputtering method can be used. The functional layer is formed into a specific pattern by a photolithography method or an etching method. After the functional layer is formed on the front surface 2a of the substrate 2, the reinforcing plate 3 and the resin layer 4 are peeled off from the substrate 2.
[痕跡形成裝置10之構成] [Configuration of Trace Forming Device 10]
繼而,對在自基板2剝離之補強板3上之樹脂層4形成刮痕之痕跡形成裝置10進行說明。 Next, the trace forming device 10 for forming a scratch on the resin layer 4 on the reinforcing plate 3 peeled off from the substrate 2 will be described.
圖2係表示痕跡形成裝置10之一例之立體圖,圖3係表示痕跡形成裝置10之整體構成之說明圖。 2 is a perspective view showing an example of the mark forming device 10, and FIG. 3 is an explanatory view showing an overall configuration of the mark forming device 10.
痕跡形成裝置10具備作為痕跡賦予機構之旋轉自如之輥刷(輥狀刷構件)12、及作為移動機構之輥式輸送機14等而構成。 The mark forming apparatus 10 includes a roll brush (roller-shaped brush member) 12 that is rotatable as a mark applying mechanism, a roll conveyor 14 as a moving mechanism, and the like.
輥刷12係藉由在圓盤或圓柱狀之芯材16周圍植設刷毛18而構成。又,輥刷12之長度L係構成為長於補強板3之寬度W。藉此,可於補強板3上之樹脂層4之整個區域形成輥刷12之刮痕。 The roller brush 12 is constructed by arranging the bristles 18 around the disk or the cylindrical core material 16. Further, the length L of the roller brush 12 is configured to be longer than the width W of the reinforcing plate 3. Thereby, the scratch of the roller brush 12 can be formed in the entire area of the resin layer 4 on the reinforcing plate 3.
輥式輸送機14由配置於水平方向之複數支輥20構成,被傳達來自未圖示之驅動源之動力而旋轉。 The roller conveyor 14 is composed of a plurality of rollers 20 arranged in the horizontal direction, and is rotated by transmitting power from a driving source (not shown).
如圖3,補強板3係以補強板3之背面3b載置於輥20,藉由輥20之旋轉而使輥刷12之下方向箭頭A方向移動。此時,補強板3上之樹脂層4被壓抵至輥刷12之刷毛18,且藉由旋轉之輥刷12一面於樹脂層4之正面形成刷毛18之刮痕一面通過輥刷12之下方。藉此,可容易地於樹脂層4之整個面形成刮痕(參照圖4(A))。 As shown in Fig. 3, the reinforcing plate 3 is placed on the roller 20 with the back surface 3b of the reinforcing plate 3, and the roller brush 12 is moved in the direction of the arrow A in the downward direction by the rotation of the roller 20. At this time, the resin layer 4 on the reinforcing plate 3 is pressed against the bristles 18 of the roller brush 12, and the scratches of the bristles 18 are formed on the front surface of the resin layer 4 by the rotating roller brush 12 while passing under the roller brush 12. . Thereby, scratches can be easily formed on the entire surface of the resin layer 4 (refer to FIG. 4(A)).
又,藉由使用輥刷12及輥式輸送機14,可於複數個補強板3連續地實施於樹脂層4形成刮痕之處理作業,因此可謀求上述處理作業之效率化。 Further, by using the roller brush 12 and the roller conveyor 14, the plurality of reinforcing plates 3 can be continuously subjected to the processing for forming the scratches on the resin layer 4, so that the efficiency of the above-described processing can be improved.
再者,本實施形態之痕跡形成裝置10係藉由輥式輸送機14而使 補強板3沿樹脂層4之正面移動,但亦可固定補強板3而使輥刷12沿樹脂層4之正面移動。又,亦可使用如剃刀之前端銳利構件、或梳齒狀構件來代替輥刷12。即,只要為可於樹脂層4形成刮痕之痕跡賦予機構,均可用作痕跡賦予機構。 Further, the mark forming device 10 of the present embodiment is made by the roller conveyor 14. The reinforcing plate 3 is moved along the front surface of the resin layer 4, but the reinforcing plate 3 may be fixed to move the roller brush 12 along the front surface of the resin layer 4. Further, instead of the roller brush 12, a sharp member such as a razor front end or a comb-tooth member may be used. In other words, any trace applying mechanism can be used as long as it is a trace applying mechanism capable of forming a scratch on the resin layer 4.
另一方面,於輥式輸送機14之下游側具備包含複數個從動輥22及2支定位銷24之搬出部26。 On the other hand, on the downstream side of the roller conveyor 14, a carry-out portion 26 including a plurality of driven rollers 22 and two positioning pins 24 is provided.
藉由輥式輸送機14移動而來之補強板3係自輥式輸送機14之末端被移載至從動輥22。此後,補強板3藉由慣性力而於從動輥22上移動,於移動速度下降後之處抵接於定位銷24,由搬出部26定位。 The reinforcing plate 3, which is moved by the roller conveyor 14, is transferred from the end of the roller conveyor 14 to the driven roller 22. Thereafter, the reinforcing plate 3 moves on the driven roller 22 by the inertial force, and abuts against the positioning pin 24 at a position where the moving speed is lowered, and is positioned by the carrying-out portion 26.
又,於搬出部26之附近設置有機器人(收納機構)28,於機器人28之附近具備托板(捆包容器)搭載台30。 Further, a robot (storage mechanism) 28 is provided in the vicinity of the carry-out unit 26, and a pallet (package container) mounting table 30 is provided in the vicinity of the robot 28.
由機器人28及痕跡形成裝置10構成本實施形態之捆包裝置。 The robot 28 and the mark forming device 10 constitute the packing device of the present embodiment.
於機器人28之臂32之前端部,複數個吸附墊34安裝於同一平面上。臂32之動作係由未圖示之控制部進行控制,又,亦藉由該控制部而控制吸附墊34之吸附開始、停止。即,控制部係使臂32於可藉由吸附墊34保持由搬出部26定位之補強板3的位置、與搭載於托板搭載台30之托板(捆包容器)36中收納補強板3的位置之間動作。又,控制部係以如下方式對吸附墊34進行控制:於藉由吸附墊34而保持由搬出部26定位之補強板3時,使吸附墊34之吸附動作開始,於將補強板3收納於托板36時,使吸附墊34之吸附動作停止。 At the front end of the arm 32 of the robot 28, a plurality of adsorption pads 34 are mounted on the same plane. The operation of the arm 32 is controlled by a control unit (not shown), and the control unit controls the start and stop of adsorption of the adsorption pad 34. In other words, the control unit causes the arm 32 to hold the reinforcing plate 3 in the tray (the packaging container) 36 mounted on the pallet mounting table 30 by the position of the reinforcing plate 3 that can be positioned by the loading unit 26 by the suction pad 34. The action between the positions. Further, the control unit controls the adsorption pad 34 such that when the reinforcing plate 3 positioned by the carrying-out portion 26 is held by the adsorption pad 34, the adsorption operation of the adsorption pad 34 is started, and the reinforcing plate 3 is housed in the reinforcing plate 3 When the pallet 36 is placed, the adsorption operation of the adsorption pad 34 is stopped.
藉此,可藉由機器人28將具有藉由輥刷12而形成有刮痕之樹脂層4之補強板3收納於托板36。藉此,可將於樹脂層4形成痕跡之處理作業、及具有形成有刮痕之樹脂層4之補強板3之收納作業連續地實施,因此可謀求處理作業及收納作業之效率化。 Thereby, the reinforcing plate 3 having the resin layer 4 in which the scratches are formed by the roller brush 12 can be accommodated in the pallet 36 by the robot 28. Thereby, the processing operation for forming the marks on the resin layer 4 and the storage operation of the reinforcing sheets 3 having the resin layer 4 having the scratches can be continuously performed, so that the processing work and the storage work can be made more efficient.
具有形成有刮痕之樹脂層4之複數個補強板3積層收納於托板36的形態為本實施形態之捆包體。 The plurality of reinforcing plates 3 having the resin layer 4 having the scratches are stacked and stored in the pallet 36 in the form of the package of the embodiment.
又,收納於托板36之複數個補強板3較佳為藉由機器人28而分別以補強板3之正面及背面成為同一方向之方式積層。藉此,於收納於托板36之複數個補強板3中,鄰接之2片補強板3、3係一補強板3之背面與形成於另一補強板3上之樹脂層4接觸。藉此,可防止補強板3之背面彼此之接觸,因此可防止補強板3之損傷。於該情形時,適合補強板3為玻璃板之情形。 Moreover, it is preferable that the plurality of reinforcing plates 3 accommodated in the pallet 36 are laminated by the robot 28 so that the front surface and the back surface of the reinforcing plate 3 are in the same direction. Thereby, in the plurality of reinforcing plates 3 accommodated in the pallet 36, the two rear reinforcing plates 3 and 3 are in contact with the resin layer 4 formed on the other reinforcing plate 3 on the back surface of the reinforcing plate 3. Thereby, the back surfaces of the reinforcing plates 3 can be prevented from coming into contact with each other, so that the damage of the reinforcing plates 3 can be prevented. In this case, it is suitable for the case where the reinforcing plate 3 is a glass plate.
如上所述,根據本實施形態之痕跡形成裝置10,可於樹脂層4形成刮痕,因此可使重疊之補強板3與樹脂層4之吸附力下降。又,於形成刮痕時產生之樹脂層4之微細碎屑介在於補強板3與樹脂層4之間時,亦對使補強板3與樹脂層4之吸附力下降有效。藉此,於將在正面具備樹脂層4之補強板3不介隔片材地積層於托板36之情形時,亦可自托板36容易地逐片取出補強板3。 As described above, according to the mark forming apparatus 10 of the present embodiment, since the scratches can be formed in the resin layer 4, the adsorption force of the reinforcing reinforcing sheets 3 and the resin layer 4 can be lowered. Further, when fine particles of the resin layer 4 which are formed when the scratches are formed are interposed between the reinforcing plate 3 and the resin layer 4, the adsorption force of the reinforcing plate 3 and the resin layer 4 is also effectively reduced. Therefore, when the reinforcing plate 3 having the resin layer 4 on the front surface is laminated on the pallet 36 without interposing the sheet, the reinforcing plate 3 can be easily taken out from the pallet 36 one by one.
再者,於圖3中,例示傾斜豎立地收納補強板3之縱向堆積之托板36,但亦可為水平收納補強板3之水平堆積之托板。 In addition, in FIG. 3, the pallet 36 in which the longitudinal reinforcement of the reinforcing plate 3 is accommodated in the upright position is exemplified, but the horizontally stacked pallet of the horizontal reinforcement plate 3 may be used.
[實施例] [Examples]
[實驗例] [Experimental example]
<輥刷12> <roller brush 12>
刷徑:120mm Brush diameter: 120mm
刷毛材質:尼龍66 Brush material: nylon 66
刷毛之線徑:0.1mm Wire diameter of bristles: 0.1mm
刷毛之線長:12.5mm Line length of bristles: 12.5mm
轉數:100旋轉/分鐘 Number of revolutions: 100 rotations / minute
<輥式輸送機14> <Roller conveyor 14>
周率:約200mm/秒 Weekly rate: about 200mm / sec
於上述條件下,一面藉由輥式輸送機14而搬送於正面形成有樹脂層4之補強板3,一面藉由旋轉之輥刷12而於樹脂層4形成刮痕。 Under the above conditions, the reinforcing plate 3 on which the resin layer 4 is formed on the front surface is conveyed by the roller conveyor 14, and the resin layer 4 is formed with a scratch by the rotating roller brush 12.
圖4(A)係形成有刮痕之樹脂層4之圖像,圖4(B)係表示形成有刮痕之樹脂層4之正面性狀的曲線圖。圖4(B)之縱軸表示刮痕之溝槽之深度、山部之高度,橫軸表示補強板3之寬度尺寸。再者,作為正面性狀測定裝置,使用三鷹光器股份有限公司製造之非接觸正面性狀測定裝置(製品名:PF-60)。又,將測定間距設定為0.1μm,將測定範圍設定為200μm。 4(A) is an image of the resin layer 4 on which the scratches are formed, and FIG. 4(B) is a graph showing the front surface property of the resin layer 4 on which the scratches are formed. The vertical axis of Fig. 4(B) indicates the depth of the groove of the scratch and the height of the mountain portion, and the horizontal axis indicates the width dimension of the reinforcing plate 3. In addition, as the positive property measuring device, a non-contact frontal property measuring device (product name: PF-60) manufactured by Sanying Optical Co., Ltd. was used. Further, the measurement pitch was set to 0.1 μm, and the measurement range was set to 200 μm.
如圖4(B),於樹脂層4之正面連續地形成有深度為數微米之溝槽及高度為數微米之山部。 As shown in Fig. 4(B), a groove having a depth of several micrometers and a mountain portion having a height of several micrometers are continuously formed on the front surface of the resin layer 4.
將上述具有形成有刮痕之樹脂層4之補強板3不介隔片材地複數片積層於托板36。此後,實施自托板36取出補強板3之作業,結果可逐片取出補強板3。 The reinforcing plate 3 having the resin layer 4 having the scratches formed thereon is laminated on the pallet 36 without interposing the sheets. Thereafter, the operation of taking out the reinforcing plate 3 from the pallet 36 is carried out, and as a result, the reinforcing plate 3 can be taken out one by one.
本申請案係基於2013年12月25日申請之日本專利申請案2013-266491者,其內容係以參照之形式引用於此。 The present application is based on Japanese Patent Application No. 2013-266491, filed on Dec.
3‧‧‧補強板 3‧‧‧ reinforcing plate
4‧‧‧樹脂層 4‧‧‧ resin layer
10‧‧‧痕跡形成裝置 10‧‧‧ Trace forming device
12‧‧‧輥刷 12‧‧‧ Roller brush
14‧‧‧輥式輸送機 14‧‧‧Roller conveyor
16‧‧‧芯材 16‧‧‧ core material
18‧‧‧刷毛 18‧‧‧ bristles
20‧‧‧輥 20‧‧‧roll
22‧‧‧從動輥 22‧‧‧ driven roller
24‧‧‧定位銷 24‧‧‧Locating pin
26‧‧‧搬出部 26‧‧‧ Moving out
L‧‧‧長度 L‧‧‧ length
W‧‧‧寬度 W‧‧‧Width
Claims (11)
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JP2013266491A JP6176591B2 (en) | 2013-12-25 | 2013-12-25 | Packing method and packing body for substrate with adsorption layer and packing apparatus for substrate with adsorption layer |
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TW201541501A TW201541501A (en) | 2015-11-01 |
TWI549159B true TWI549159B (en) | 2016-09-11 |
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JP (1) | JP6176591B2 (en) |
KR (1) | KR101720846B1 (en) |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09105896A (en) * | 1995-10-13 | 1997-04-22 | Sharp Corp | Jig for manufacturing liquid crystal display element and manufacture of liquid crystal display element using the jig |
TW201124317A (en) * | 2010-01-13 | 2011-07-16 | Asahi Glass Co Ltd | Storage container and storage body for plate-like body, plate-like body loading device, and transporting vehicle |
TW201229929A (en) * | 2010-11-26 | 2012-07-16 | Asahi Glass Co Ltd | Plate-shaped body stack plate-shaped body counting device and plate-shaped body stack plate-shaped body counting method |
US8303754B2 (en) * | 2006-07-12 | 2012-11-06 | Asahi Glass Company, Limited | Glass substrate with protective glass, process for producing display device using glass substrate with protective glass, and silicone for release paper |
TW201348795A (en) * | 2012-05-23 | 2013-12-01 | Lg Display Co Ltd | Method of fabricating lightweight and thin liquid crystal display, and processing line for fabricating liquid crystal display |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0755708A (en) * | 1993-08-18 | 1995-03-03 | Daihatsu Motor Co Ltd | Method for testing scratch property of painted film |
KR100568017B1 (en) * | 2004-01-28 | 2006-04-05 | 이진우 | A manufacturing method hot stamp film and equipment therefore |
JP2006123959A (en) * | 2004-10-28 | 2006-05-18 | Fujimori Gijutsu Kenkyusho:Kk | Transfer member and transfer method for glass substrate |
EP1914066B1 (en) * | 2005-08-09 | 2016-09-07 | Asahi Glass Company, Limited | Thin sheet glass laminate and method for manufacturing display using thin sheet glass laminate |
JP4982251B2 (en) * | 2007-05-29 | 2012-07-25 | 日本メクトロン株式会社 | Wiring board plating method and wiring board |
CN101687690A (en) * | 2007-07-11 | 2010-03-31 | 旭硝子株式会社 | Inserting paper for glass plate and glass plate laminate |
CN101435922A (en) * | 2007-11-13 | 2009-05-20 | 上海广电Nec液晶显示器有限公司 | LCD device circuit board structure and method for manufacturing LCD device using the same |
JP5170839B2 (en) * | 2008-07-31 | 2013-03-27 | 日本電気硝子株式会社 | Glass substrate transfer method |
CN102171745B (en) | 2009-02-06 | 2014-10-08 | 旭硝子株式会社 | Method for manufacturing electronic device and separation apparatus used therefor |
WO2011132646A1 (en) * | 2010-04-22 | 2011-10-27 | 旭硝子株式会社 | Glass plate stack, pallet and glass plate package |
JP5489088B2 (en) * | 2010-04-28 | 2014-05-14 | 旭硝子株式会社 | Glass plate package and method for packing glass plate laminate |
JP2013184346A (en) * | 2012-03-07 | 2013-09-19 | Asahi Glass Co Ltd | Glass laminate, and method for producing electronic device |
-
2013
- 2013-12-25 JP JP2013266491A patent/JP6176591B2/en active Active
-
2014
- 2014-12-24 KR KR1020140188487A patent/KR101720846B1/en active IP Right Grant
- 2014-12-25 CN CN201410820199.2A patent/CN104743400B/en active Active
- 2014-12-25 TW TW103145565A patent/TWI549159B/en active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09105896A (en) * | 1995-10-13 | 1997-04-22 | Sharp Corp | Jig for manufacturing liquid crystal display element and manufacture of liquid crystal display element using the jig |
US8303754B2 (en) * | 2006-07-12 | 2012-11-06 | Asahi Glass Company, Limited | Glass substrate with protective glass, process for producing display device using glass substrate with protective glass, and silicone for release paper |
TW201124317A (en) * | 2010-01-13 | 2011-07-16 | Asahi Glass Co Ltd | Storage container and storage body for plate-like body, plate-like body loading device, and transporting vehicle |
TW201229929A (en) * | 2010-11-26 | 2012-07-16 | Asahi Glass Co Ltd | Plate-shaped body stack plate-shaped body counting device and plate-shaped body stack plate-shaped body counting method |
TW201348795A (en) * | 2012-05-23 | 2013-12-01 | Lg Display Co Ltd | Method of fabricating lightweight and thin liquid crystal display, and processing line for fabricating liquid crystal display |
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JP6176591B2 (en) | 2017-08-09 |
KR20150075388A (en) | 2015-07-03 |
JP2015120543A (en) | 2015-07-02 |
CN104743400A (en) | 2015-07-01 |
CN104743400B (en) | 2017-10-27 |
TW201541501A (en) | 2015-11-01 |
KR101720846B1 (en) | 2017-03-28 |
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