JP2015120543A - Method for packaging substrate having adsorption layer, package, and apparatus for packaging substrate having adsorption layer - Google Patents

Method for packaging substrate having adsorption layer, package, and apparatus for packaging substrate having adsorption layer Download PDF

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JP2015120543A
JP2015120543A JP2013266491A JP2013266491A JP2015120543A JP 2015120543 A JP2015120543 A JP 2015120543A JP 2013266491 A JP2013266491 A JP 2013266491A JP 2013266491 A JP2013266491 A JP 2013266491A JP 2015120543 A JP2015120543 A JP 2015120543A
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substrate
adsorption layer
substrates
reinforcing plate
resin layer
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JP6176591B2 (en
JP2015120543A5 (en
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泰則 伊藤
Yasunori Ito
泰則 伊藤
優貴 立山
Yuki Tateyama
優貴 立山
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AGC Inc
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Asahi Glass Co Ltd
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Priority to KR1020140188487A priority patent/KR101720846B1/en
Priority to CN201410820199.2A priority patent/CN104743400B/en
Priority to TW103145565A priority patent/TWI549159B/en
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Abstract

PROBLEM TO BE SOLVED: To provide a method for packaging a substrate having an adsorption layer, capable of easily taking out the substrate one by one from a package container, even in a case of storing the plurality of substrates having the adsorption layer on a surface thereof in the package container without an intervening sheet, to provide a package, and to provide an apparatus for packaging the substrate having the adsorption layer.SOLUTION: A package apparatus includes a scratching device 10 and a robot 28. A reinforcing plate 3 is moved under a roll brush 12 by the scratching device 10 by placing a rear surface 3b of the reinforcing plate 3 on rollers 20 and rotating the rollers 20. At this time, a resin layer 4 of the reinforcing plate 3 is pressed to a brush 18 of the roll brush 12, and scratches caused by the brush 18 are applied on a surface of the resin layer 4 by the rotating roll brush 12. Then, the reinforcing plate 3 is stored on a pallet 36 by the robot 28.

Description

本発明は、吸着層付き基板の梱包方法及び梱包体並びに吸着層付き基板の梱包装置に関する。   The present invention relates to a method for packing a substrate with an adsorption layer, a packing body, and a packing device for a substrate with an adsorption layer.

表示パネル、太陽電池、薄膜二次電池等の電子デバイスの薄型化、軽量化に伴い、これらの電子デバイスに用いられるガラス板、樹脂板、金属板等の基板の薄板化が要望されている。   With the reduction in thickness and weight of electronic devices such as display panels, solar cells, and thin film secondary batteries, there is a demand for thinner substrates such as glass plates, resin plates, and metal plates used in these electronic devices.

しかしながら、基板の厚さが薄くなると、基板のハンドリング性が悪化するため、基板の表面に電子デバイス用の機能層(薄膜トランジスタ(TFT: Thin Film Transistor)、カラーフィルタ(CF:Color Filter))を形成することが困難になる。   However, since the handling of the substrate deteriorates as the substrate becomes thinner, functional layers for electronic devices (thin film transistor (TFT), color filter (CF)) are formed on the surface of the substrate. It becomes difficult to do.

そこで、表面に吸着層が備えられた補強板(基板)を使用し、この補強板の吸着層に基板の裏面を吸着させて、基板を補強板により補強した積層体を構成し、積層体の状態で基板の表面に機能層を形成する方法が提案されている(特許文献1参照)。この方法では、基板のハンドリング性が向上するため、基板の表面に機能層を良好に形成できる。そして、補強板は、機能層の形成後に基板から剥離され、剥離された補強板は、パレット(梱包容器)に複数枚単位で積層されて収納される。   Accordingly, a reinforcing plate (substrate) provided with an adsorption layer on the surface is used, and a laminated body in which the back surface of the substrate is adsorbed on the adsorption layer of the reinforcing plate to reinforce the substrate with the reinforcing plate is used. A method of forming a functional layer on the surface of a substrate in a state has been proposed (see Patent Document 1). In this method, since the handling property of the substrate is improved, the functional layer can be favorably formed on the surface of the substrate. The reinforcing plate is peeled off from the substrate after the functional layer is formed, and the peeled reinforcing plate is stacked and stored in units of a plurality of pallets (packaging containers).

国際公開第2010/090147号International Publication No. 2010/090147

しかしながら、従来においては、パレットに収納された補強板をパレットから1枚ずつ取り出す際に、隣接する補強板同士が、吸着層によって吸着されているため、補強板をパレットから1枚ずつ取り出すことが困難であった。このような不具合を解消するには、隣接する2枚の補強板の間に合紙等のシートを介在させれば解消できる。しかしながら、この方法では、シートが別途必要になるとともに、シートが吸着層に吸着される場合があるので、シートの取り外し作業が別途必要になるという問題が発生する。   However, conventionally, when the reinforcing plates stored in the pallet are taken out one by one from the pallet, the adjacent reinforcing plates are adsorbed by the adsorption layer, so that the reinforcing plates can be taken out from the pallet one by one. It was difficult. In order to solve such a problem, it can be solved by interposing a sheet such as a slip sheet between two adjacent reinforcing plates. However, this method requires a separate sheet and may cause the sheet to be adsorbed to the adsorption layer. This causes a problem that a separate work for removing the sheet is necessary.

本発明は、このような課題に鑑みてなされたものであり、表面に吸着層が備えられた複数の基板を、シートを介在させることなく梱包容器に収納した場合であっても、梱包容器から基板を1枚ずつ容易に取り出すことが可能な吸着層付き基板の梱包方法及び梱包体並びに吸着層付き基板の梱包装置を提供することを目的とする。   The present invention has been made in view of such a problem, and even when a plurality of substrates each having an adsorption layer on the surface are stored in a packaging container without interposing a sheet, It is an object of the present invention to provide a packing method for a substrate with an adsorption layer, a packing body, and a packaging device for the substrate with an adsorption layer, which can easily take out the substrates one by one.

本発明の吸着層付き基板の梱包方法の一態様は、前記目的を達成するために、表面に吸着層が形成された複数の基板を用意し、前記複数の基板のそれぞれの吸着層の表面に引っ掻き疵を付けた後、前記複数の基板を梱包容器に積層して収納することを特徴とする。   In one aspect of the method for packing a substrate with an adsorption layer according to the present invention, in order to achieve the above object, a plurality of substrates each having an adsorption layer formed thereon are prepared, and the surface of each adsorption layer of the plurality of substrates is provided. A plurality of substrates are stacked and stored in a packaging container after the scratching ridge is attached.

本発明で説明する「引っ掻き疵」とは、疵付与手段による引っ掻き動作によって付けられた疵である。詳述すれば、本発明の基板は、疵付与手段による引っ掻き動作によって、吸着層の表面に溝部と、溝部の両側に、溝部を形成した所以によって隆起して形成される山部とが形成されたものである。溝部の深さ及び山部の高さは、吸着層の厚さ(数ミクロンから数十ミクロン)に基づきミクロン単位である。本発明では、吸着層の表面に「引っ掻き疵」を付けることにより、吸着層の吸着面積を減少させて、基板同士の吸着力を低下させたことに技術的な特徴がある。   The “scratch scissors” described in the present invention is a scissors attached by a scratching operation by a scissors applying means. More specifically, the substrate of the present invention is formed with a groove portion on the surface of the adsorption layer and a peak portion formed by being raised due to the formation of the groove portion on both sides of the groove portion by the scratching operation by the wrinkle applying means. It is a thing. The depth of the groove and the height of the peak are in units of microns based on the thickness of the adsorption layer (several microns to tens of microns). The present invention has a technical feature in that the adsorption area between the substrates is reduced by attaching “scratches” to the surface of the adsorption layer, thereby reducing the adsorption area of the adsorption layer.

なお、基板同士の吸着力をより低下させるためには、吸着層の表面に付けられる「引っ掻き疵」を複数本付けることが好ましい。また、吸着層の表面において、「引っ掻き疵」を規則的に付けてもよく、無作為に付けてもよい。更に、基板同士の吸着力をより一層低下させるためには、吸着層の表面において、「引っ掻き疵」を均一に付けることが好ましい。   In order to further reduce the adsorption force between the substrates, it is preferable to attach a plurality of “scratch scissors” attached to the surface of the adsorption layer. Further, “scratch candy” may be regularly or randomly attached on the surface of the adsorption layer. Furthermore, in order to further reduce the adsorption force between the substrates, it is preferable to uniformly apply “scratches” on the surface of the adsorption layer.

このように本発明の一態様によれば、吸着層の表面に引っ掻き疵を付けることにより、基板同士の吸着力を低下させたので、表面に吸着層が備えられた複数の基板を、シートを介在させることなく梱包容器に収納した場合であっても、梱包容器から基板を1枚ずつ容易に取り出すことができる。   As described above, according to one aspect of the present invention, since the adsorption force between the substrates is reduced by scratching the surface of the adsorption layer, a plurality of substrates having adsorption layers on the surface are attached to the sheet. Even when it is stored in a packaging container without being interposed, the substrates can be easily taken out from the packaging container one by one.

本発明の一態様は、前記引っ掻き疵は、ロールブラシによって形成された疵であることが好ましい。   In one aspect of the present invention, it is preferable that the scratched ridge is a ridge formed by a roll brush.

本発明の一態様によれば、ロールブラシによって引っ掻き疵を容易に付けることができる。   According to one embodiment of the present invention, a scratch can be easily attached with a roll brush.

本発明の一態様は、前記基板は、厚さが0.7mm以下のガラス板であることが好ましい。   In one embodiment of the present invention, the substrate is preferably a glass plate having a thickness of 0.7 mm or less.

本発明の一態様によれば、基板として、電子デバイス用基板を補強する補強板に好適である。   According to one embodiment of the present invention, the substrate is suitable for a reinforcing plate that reinforces an electronic device substrate.

本発明の一態様は、前記吸着層は、シリコーン樹脂又はポリイミド樹脂からなることが好ましい。   In one embodiment of the present invention, the adsorption layer is preferably made of a silicone resin or a polyimide resin.

本発明の一態様によれば、シリコーン樹脂又はポリイミド樹脂からなる吸着層の表面に引っ掻き疵を付けて複数の基板を梱包容器に収納する。   According to one embodiment of the present invention, a plurality of substrates are housed in a packing container with a scratched surface attached to the surface of an adsorption layer made of a silicone resin or a polyimide resin.

本発明の梱包体は、前記目的を達成するために、本発明の吸着層付き基板の梱包方法によって引っ掻き疵が付けられた複数の基板と、前記複数の基板を積層して収納する梱包容器とを備えたことを特徴とする。   In order to achieve the above object, the packaging body of the present invention includes a plurality of substrates that are scratched by the packaging method for a substrate with an adsorption layer of the present invention, and a packaging container that stacks and stores the plurality of substrates. It is provided with.

本発明の一態様によれば、表面に吸着層が備えられた複数の基板を、シートを介在させることなく梱包容器に収納した場合であっても、梱包容器から基板を1枚ずつ容易に取り出すことができる。   According to one embodiment of the present invention, even when a plurality of substrates having adsorption layers on the surface are stored in a packaging container without interposing sheets, the substrates are easily taken out one by one from the packaging container. be able to.

本発明の一態様は、前記梱包容器に収納される前記複数の基板は、基板の表面及び裏面が同じ向きに積層されることが好ましい。   In one embodiment of the present invention, it is preferable that the plurality of substrates housed in the packing container are stacked in the same direction on the front surface and the back surface of the substrate.

本発明の一態様によれば、隣接する2枚の基板は、一方の基板の裏面と他方の基板の吸着層とが接触する。よって、基板の裏面同士の接触を防止できるので、基板の損傷を防止できる。本発明の一態様は、基板がガラス板の場合に好適である。   According to one embodiment of the present invention, two adjacent substrates are in contact with the back surface of one substrate and the adsorption layer of the other substrate. Therefore, contact between the back surfaces of the substrates can be prevented, and damage to the substrates can be prevented. One embodiment of the present invention is suitable when the substrate is a glass plate.

本発明の吸着層付き基板の梱包装置は、前記目的を達成するために、吸着層が表面に形成された基板の前記吸着層に引っ掻き疵を付ける疵付与手段と、前記疵付与手段を前記基板の前記吸着層に押圧当接させ、前記疵付与手段及び前記基板を前記吸着層に沿って相対移動させる移動手段と、前記疵付与手段によって引っ掻き疵が付けられた前記基板を、梱包容器に収納する収納手段と、を備えたことを特徴とする。   In order to achieve the above object, the packing device for a substrate with an adsorption layer according to the present invention is provided with a wrinkle applying means for scratching the adsorbing layer of the substrate having the adsorption layer formed on the surface, and the wrinkle applying means with the substrate. And a moving means for causing the wrinkle applying means and the substrate to move relative to each other along the adsorbing layer, and the substrate to which scratches have been attached by the wrinkle applying means. And storing means.

本発明の一態様によれば、疵付与手段と移動手段とを使用して、基板の吸着層の表面に疵を付ける。つまり、移動手段によって疵付与手段及び基板を、基板の吸着層に沿って相対移動させながら、疵付与手段によって基板の吸着層に引っ掻き疵を付ける。次に、引っ掻き疵が付けられた基板を、収納手段によって梱包容器に収納する。よって、吸着層に疵を付ける処理作業と、吸着層に疵が付けられた基板の収納作業とを連続的に実施できるので、一連の作業(処理作業と収納作業)の効率化を図ることができる。   According to one aspect of the present invention, wrinkles are attached to the surface of the adsorption layer of the substrate using wrinkle applying means and moving means. That is, the wrinkle applying means and the substrate are relatively moved along the adsorption layer of the substrate by the moving means, and the scratching flaw is applied to the adsorption layer of the substrate by the wrinkle application means. Next, the board | substrate with which the scratch flaw was attached is accommodated in a packing container by an accommodating means. Therefore, since the processing operation for attaching the wrinkles to the adsorption layer and the storage operation for the substrate with the wrinkles on the adsorption layer can be carried out continuously, it is possible to improve the efficiency of a series of operations (processing operations and storage operations). it can.

本発明の一態様は、前記疵付与手段は、回転自在なロール状ブラシ部材であり、前記移動手段は、前記基板の裏面が載置されて前記基板を前記吸着層に沿って移動させるコンベアであることが好ましい。   In one aspect of the present invention, the wrinkle applying means is a rotatable roll-shaped brush member, and the moving means is a conveyor on which the back surface of the substrate is placed and moves the substrate along the adsorption layer. Preferably there is.

本発明の一態様によれば、移動手段であるコンベアに基板の裏面を載置し、コンベアによって基板を移動させながら、疵付与手段である回転自在なロール状ブラシ部材によって吸着層に引っ掻き疵を付ける。よって、吸着層に引っ掻き疵を容易に付けることができる。また、ロール状ブラシ部材とコンベアとを使用することによって、吸着層に疵を付ける処理作業を、複数の基板において連続的に実施できるので、前記処理作業の効率化を図ることができる。   According to one aspect of the present invention, the back surface of the substrate is placed on a conveyor that is a moving unit, and the substrate is moved by the conveyor. wear. Therefore, a scratch can be easily attached to the adsorption layer. In addition, by using the roll-shaped brush member and the conveyor, the processing operation for attaching the wrinkles to the adsorption layer can be continuously performed on a plurality of substrates, so that the efficiency of the processing operation can be improved.

本発明の吸着層付き基板の梱包方法及び梱包体並びに吸着層付き基板の梱包装置によれば、表面に吸着層が備えられた複数の基板を、シートを介在させることなく梱包容器に収納した場合であっても、梱包容器から基板を1枚ずつ容易に取り出すことができる。   According to the packaging method and packaging body for a substrate with an adsorption layer and the packaging device for a substrate with an adsorption layer according to the present invention, when a plurality of substrates having adsorption layers on the surface are stored in a packaging container without interposing a sheet Even so, the substrates can be easily taken out one by one from the packaging container.

積層体の一例を示す要部拡大側面図The principal part enlarged side view which shows an example of a laminated body 実施形態の疵付け装置の斜視図The perspective view of the brazing apparatus of embodiment 実施形態の疵付け装置の全体構成を示した説明図Explanatory drawing which showed the whole structure of the brazing apparatus of embodiment (A)は引っ掻き疵が付けられた樹脂層の画像、(B)は、引っ掻き疵が付けられた樹脂層の表面性状を示したグラフ(A) is an image of a resin layer to which scratches are attached, and (B) is a graph showing the surface properties of the resin layer to which scratches are attached.

以下、添付図面に従って、本発明の吸着層付き基板の梱包方法及び梱包体並びに吸着層付き基板の梱包装置の実施形態について説明する。   DESCRIPTION OF EMBODIMENTS Hereinafter, embodiments of a packing method and a packing body for a substrate with an adsorption layer and a packaging apparatus for a substrate with an adsorption layer according to the present invention will be described with reference to the accompanying drawings.

以下においては、本発明に係る吸着層付き基板の梱包方法及び梱包体並びに吸着層付き基板の梱包装置を、電子デバイスの製造工場にて使用する形態について説明する。   Below, the form which uses the packing method of a board | substrate with an adsorption layer and packing body which concern on this invention, and the packing apparatus of the board | substrate with an adsorption layer in the manufacturing factory of an electronic device is demonstrated.

電子デバイスとは、表示パネル、太陽電池、薄膜二次電池等の電子部品をいう。表示パネルとしては、液晶ディスプレイパネル(LCD:Liquid Crystal Display)、プラズマディスプレイパネル(PDP:Plasma Display Panel)、及び有機ELディスプレイパネル(OELD:Organic Electro Luminescence Display)を例示できる。   An electronic device means electronic components, such as a display panel, a solar cell, and a thin film secondary battery. As a display panel, a liquid crystal display panel (LCD: Liquid Crystal Display), a plasma display panel (PDP: Plasma Display Panel), and an organic EL display panel (OELD: Organic Electro Luminescence Display) can be illustrated.

電子デバイスは、ガラス製、樹脂製、金属製等の基板の表面に電子デバイス用の機能層(LCDであれば、薄膜トランジスタ(TFT)、カラーフィルタ(CF))を形成することにより製造される。   An electronic device is manufactured by forming a functional layer for an electronic device (in the case of LCD, a thin film transistor (TFT) and a color filter (CF)) on the surface of a substrate made of glass, resin, metal, or the like.

前記基板は、機能層の形成前に、裏面が補強板(基板)の吸着層に吸着されて積層体に構成される。その後、積層体の状態で基板の表面に機能層が形成される。そして、機能層の形成後、基板から補強板が剥離される。   Before forming the functional layer, the back surface of the substrate is adsorbed by the adsorption layer of the reinforcing plate (substrate) to form a laminate. Thereafter, a functional layer is formed on the surface of the substrate in the state of the laminate. Then, after the functional layer is formed, the reinforcing plate is peeled from the substrate.

〔積層体1〕
図1は、積層体1の一例を示した要部拡大側面図である。
[Laminate 1]
FIG. 1 is an enlarged side view of an essential part showing an example of a laminated body 1.

積層体1は、機能層が形成される基板2と、基板2を補強する補強板(基板)3とを備える。また、補強板3は、表面3aに樹脂層(吸着層)4が備えられ、樹脂層4に基板2の裏面2bが吸着される。すなわち、基板2は、樹脂層4との間に作用するファンデルワールス力、又は樹脂層4の粘着力によって、補強板3に樹脂層4を介して吸着される。   The laminate 1 includes a substrate 2 on which a functional layer is formed, and a reinforcing plate (substrate) 3 that reinforces the substrate 2. Further, the reinforcing plate 3 is provided with a resin layer (adsorption layer) 4 on the front surface 3 a, and the back surface 2 b of the substrate 2 is adsorbed on the resin layer 4. That is, the substrate 2 is adsorbed to the reinforcing plate 3 through the resin layer 4 by van der Waals force acting between the resin layer 4 or the adhesive force of the resin layer 4.

[基板2]
基板2は、表面2aに機能層が形成される。基板2としては、ガラス基板、セラミックス基板、樹脂基板、金属基板、半導体基板を例示できる。これらの基板のなかでも、ガラス基板は、耐薬品性、耐透湿性に優れ、かつ、線膨張係数が小さいので、電子デバイス用の基板2として好適である。また、線膨張係数が小さくなるに従い、高温下で形成される機能層のパターンが冷却時に、ずれ難くなる利点もある。
[Substrate 2]
The substrate 2 has a functional layer formed on the surface 2a. Examples of the substrate 2 include a glass substrate, a ceramic substrate, a resin substrate, a metal substrate, and a semiconductor substrate. Among these substrates, a glass substrate is suitable as the substrate 2 for an electronic device because it is excellent in chemical resistance and moisture permeability and has a small linear expansion coefficient. Further, as the linear expansion coefficient becomes smaller, there is an advantage that the pattern of the functional layer formed at a high temperature is less likely to be displaced during cooling.

ガラス基板のガラスとしては、無アルカリガラス、ホウケイ酸ガラス、ソーダライムガラス、高シリカガラス、その他の酸化ケイ素を主な成分とする酸化物系ガラスを例示できる。酸化物系ガラスとしては、酸化物換算による酸化ケイ素の含有量が40〜90質量%のガラスが好ましい。   Examples of the glass of the glass substrate include alkali-free glass, borosilicate glass, soda lime glass, high silica glass, and other oxide-based glasses mainly composed of silicon oxide. As the oxide glass, a glass having a silicon oxide content of 40 to 90% by mass in terms of oxide is preferable.

ガラス基板のガラスは、製造する電子デバイスの種類に適したガラスを選択して採用することが好ましい。たとえば、液晶パネル用のガラス基板には、アルカリ金属成分を実質的に含まないガラス(無アルカリガラス)を採用することが好ましい。   As the glass of the glass substrate, it is preferable to select and employ a glass suitable for the type of electronic device to be manufactured. For example, it is preferable to employ glass (non-alkali glass) that does not substantially contain an alkali metal component for the glass substrate for a liquid crystal panel.

基板2の厚さは、基板2の種類に応じて設定される。たとえば、基板2にガラス基板を採用する場合、基板2の厚さは、電子デバイスの軽量化、薄板化のため、好ましくは0.7mm以下、より好ましくは0.3mm以下、さらに好ましくは0.1mm以下に設定される。厚さが0.3mm以下の場合、ガラス基板に良好なフレキシブル性を与えることができる。更に、厚さが0.1mm以下の場合、ガラス基板をロール状に巻き取ることができるが、ガラス基板の製造の観点、及びガラス基板の取り扱いの観点から、ガラス基板の厚さは0.03mm以上であることが好ましい。   The thickness of the substrate 2 is set according to the type of the substrate 2. For example, when a glass substrate is employed as the substrate 2, the thickness of the substrate 2 is preferably 0.7 mm or less, more preferably 0.3 mm or less, and even more preferably 0. It is set to 1 mm or less. When the thickness is 0.3 mm or less, good flexibility can be imparted to the glass substrate. Furthermore, when the thickness is 0.1 mm or less, the glass substrate can be wound into a roll, but from the viewpoint of manufacturing the glass substrate and handling the glass substrate, the thickness of the glass substrate is 0.03 mm. The above is preferable.

なお、図1では基板2が1枚の基板で構成されているが、基板2は、複数枚の基板で構成されたものでもよい。すなわち、基板2は、複数枚の基板を積層した積層体で構成することもできる。   In FIG. 1, the substrate 2 is composed of a single substrate, but the substrate 2 may be composed of a plurality of substrates. That is, the board | substrate 2 can also be comprised with the laminated body which laminated | stacked the several board | substrate.

[補強板3]
補強板3としては、ガラス基板、セラミックス基板、樹脂基板、金属基板、半導体基板、又はこれらの板状体を積層した板状体を例示できる。
[Reinforcement plate 3]
Examples of the reinforcing plate 3 include a glass substrate, a ceramic substrate, a resin substrate, a metal substrate, a semiconductor substrate, or a plate-like body obtained by stacking these plate-like bodies.

補強板3の種類は、製造する電子デバイスの種類、電子デバイスに使用する基板2の種類等に応じて選定される。補強板3と基板2とが同一の材質であると、温度変化による反り、剥離を低減できる。   The type of the reinforcing plate 3 is selected according to the type of electronic device to be manufactured, the type of the substrate 2 used for the electronic device, and the like. When the reinforcing plate 3 and the substrate 2 are made of the same material, warpage due to temperature change and peeling can be reduced.

補強板3と基板2との平均線膨張係数の差(絶対値)は、基板2の寸法形状等に応じて適宜設定されるが、35×10−7/℃以下であることが好ましい。ここで、「平均線膨張係数」とは、50〜300℃の温度範囲における平均線膨張係数(JIS R3102)をいう。 The difference (absolute value) in the average linear expansion coefficient between the reinforcing plate 3 and the substrate 2 is appropriately set according to the dimensional shape of the substrate 2 and the like, but is preferably 35 × 10 −7 / ° C. or less. Here, the “average linear expansion coefficient” refers to an average linear expansion coefficient (JIS R3102) in a temperature range of 50 to 300 ° C.

補強板3の厚さは、0.7mm以下に設定され、補強板3の種類、補強する基板2の種類、厚さ等に応じて設定される。なお、補強板3の厚さは、基板2よりも厚くてもよいし、薄くてもよいが、基板2を補強するため、0.4mm以上であることが好ましい。   The thickness of the reinforcing plate 3 is set to 0.7 mm or less, and is set according to the type of the reinforcing plate 3, the type of the substrate 2 to be reinforced, the thickness, and the like. The reinforcing plate 3 may be thicker or thinner than the substrate 2, but is preferably 0.4 mm or more in order to reinforce the substrate 2.

なお、本例では補強板3が1枚の基板で構成されているが、補強板3は、複数枚の基板を積層した積層体で構成することもできる。   In this example, the reinforcing plate 3 is constituted by a single substrate, but the reinforcing plate 3 can also be constituted by a laminated body in which a plurality of substrates are laminated.

[樹脂層4]
樹脂層4は、樹脂層4と補強板3との間で剥離するのを防止するため、補強板3との間の結合力が、基板2との間の結合力よりも高く設定される。これにより、樹脂層4と基板2との間で、基板2から補強板3が剥離される。
[Resin layer 4]
In order to prevent the resin layer 4 from peeling between the resin layer 4 and the reinforcing plate 3, the bonding force between the resin layer 4 and the reinforcing plate 3 is set higher than the bonding force between the resin layer 4 and the substrate 2. Thereby, the reinforcing plate 3 is peeled from the substrate 2 between the resin layer 4 and the substrate 2.

樹脂層4を構成する樹脂は、特に限定されないが、アクリル樹脂、ポリオレフィン樹脂、ポリウレタン樹脂、ポリイミド樹脂、シリコーン樹脂、ポリイミドシリコーン樹脂を例示できる。いくつかの種類の樹脂を混合して用いることもできる。そのなかでも、耐熱性や剥離性の観点から、シリコーン樹脂、ポリイミドシリコーン樹脂が好ましい。実施形態では、樹脂層4としてシリコーン樹脂層を例示する。   Although resin which comprises the resin layer 4 is not specifically limited, Acrylic resin, polyolefin resin, polyurethane resin, a polyimide resin, a silicone resin, and a polyimide silicone resin can be illustrated. Several types of resins can be mixed and used. Of these, silicone resins and polyimide silicone resins are preferred from the viewpoints of heat resistance and peelability. In the embodiment, a silicone resin layer is exemplified as the resin layer 4.

本発明で用いられるシリコーン樹脂は、特開2011−046174号公報に開示のものが好ましい。例えば、前記シリコーン樹脂は、下記線状オルガノポリシロキサン(a)と下記線状オルガノポリシロキサン(b)とを含む硬化性シリコーン樹脂組成物の硬化物であり、前記硬化性シリコーン樹脂組成物を前記補強板の表面で硬化させることにより形成された硬化シリコーン樹脂層を用いることが好ましい。   The silicone resin used in the present invention is preferably the one disclosed in JP 2011-046174 A. For example, the silicone resin is a cured product of a curable silicone resin composition containing the following linear organopolysiloxane (a) and the following linear organopolysiloxane (b), and the curable silicone resin composition is It is preferable to use a cured silicone resin layer formed by curing on the surface of the reinforcing plate.

線状オルガノポリシロキサン(a):アルケニル基を1分子あたり少なくとも2個有する線状オルガノポリシロキサン。   Linear organopolysiloxane (a): A linear organopolysiloxane having at least two alkenyl groups per molecule.

線状オルガノポリシロキサン(b):ケイ素原子に結合した水素原子を1分子あたり少なくとも3個有する線状オルガノポリシロキサンであって、かつ、前記ケイ素原子に結合した水素原子の少なくとも1個が分子末端のケイ素原子に存在している線状オルガノポリシロキサン。   Linear organopolysiloxane (b): a linear organopolysiloxane having at least three hydrogen atoms bonded to silicon atoms per molecule, and at least one of the hydrogen atoms bonded to the silicon atoms is a molecular end. A linear organopolysiloxane present in the silicon atom.

樹脂層4の厚さは、特に限定されないが、好ましくは1〜50μmに設定され、より好ましくは4〜20μmに設定される。樹脂層4の厚さを1μm以上とすることにより、樹脂層4と基板2との間に気泡や異物が混入した際、樹脂層4の変形によって、気泡や異物の厚さを吸収できる。一方、樹脂層4の厚さを50μm以下とすることにより、樹脂層4の形成時間を短縮でき、更に樹脂層4の樹脂を必要以上に使用しないため経済的である。   Although the thickness of the resin layer 4 is not specifically limited, Preferably it is set to 1-50 micrometers, More preferably, it is set to 4-20 micrometers. By setting the thickness of the resin layer 4 to 1 μm or more, when bubbles or foreign matters are mixed between the resin layer 4 and the substrate 2, the thickness of the bubbles or foreign matters can be absorbed by the deformation of the resin layer 4. On the other hand, when the thickness of the resin layer 4 is 50 μm or less, the formation time of the resin layer 4 can be shortened, and the resin of the resin layer 4 is not used more than necessary, which is economical.

なお、樹脂層4の外形は、補強板3が樹脂層4の全体を支持できるように、補強板3の外形と同一であるか、補強板3の外形よりも小さいことが好ましい。また、樹脂層4の外形は、樹脂層4が基板2の全体を密着できるように、基板2の外形と同一であるか、基板2の外形よりも大きいことが好ましい。   The outer shape of the resin layer 4 is preferably the same as the outer shape of the reinforcing plate 3 or smaller than the outer shape of the reinforcing plate 3 so that the reinforcing plate 3 can support the entire resin layer 4. In addition, the outer shape of the resin layer 4 is preferably the same as or larger than the outer shape of the substrate 2 so that the resin layer 4 can adhere the entire substrate 2.

また、図1では樹脂層4が1層で構成されているが、樹脂層4は2層以上で構成することもできる。この場合、樹脂層4を構成する全ての層の合計の厚さが、樹脂層の厚さとなる。また、この場合、各層を構成する樹脂の種類は異なっていてもよい。   Moreover, although the resin layer 4 is comprised by 1 layer in FIG. 1, the resin layer 4 can also be comprised by two or more layers. In this case, the total thickness of all the layers constituting the resin layer 4 is the thickness of the resin layer. In this case, the type of resin constituting each layer may be different.

更に、実施形態では、吸着層として有機膜である樹脂層4を用いたが、樹脂層4に代えて無機層を用いてもよい。無機層を構成する無機膜は、例えばメタルシリサイド、窒化物、炭化物、及び炭窒化物からなる群から選択される少なくとも1種を含む。   Furthermore, in the embodiment, the resin layer 4 that is an organic film is used as the adsorption layer, but an inorganic layer may be used instead of the resin layer 4. The inorganic film constituting the inorganic layer includes, for example, at least one selected from the group consisting of metal silicide, nitride, carbide, and carbonitride.

メタルシリサイドは、例えばW、Fe、Mn、Mg、Mo、Cr、Ru、Re、Co、Ni、Ta、Ti、Zr、及びBaからなる群から選択される少なくとも1種を含むものであり、好ましくはタングステンシリサイドである。   The metal silicide includes, for example, at least one selected from the group consisting of W, Fe, Mn, Mg, Mo, Cr, Ru, Re, Co, Ni, Ta, Ti, Zr, and Ba. Is tungsten silicide.

窒化物は、例えばSi、Hf、Zr、Ta、Ti、Nb、Na、Co、Al、Zn、Pb、Mg、Sn、In、B、Cr、Mo、及びBaからなる群から選択される少なくとも1種を含むものであり、好ましくは窒化アルミニウム、窒化チタン、または窒化ケイ素である。   The nitride is, for example, at least one selected from the group consisting of Si, Hf, Zr, Ta, Ti, Nb, Na, Co, Al, Zn, Pb, Mg, Sn, In, B, Cr, Mo, and Ba. It contains seeds, preferably aluminum nitride, titanium nitride, or silicon nitride.

炭化物は、例えばTi、W、Si、Zr、及びNbからなる群から選択される少なくとも1種を含むものであり、好ましくは炭化ケイ素である。   The carbide includes, for example, at least one selected from the group consisting of Ti, W, Si, Zr, and Nb, and is preferably silicon carbide.

炭窒化物は、例えばTi、W、Si、Zr、及びNbからなる群から選択される少なくとも1種を含むものであり、好ましくは炭窒化ケイ素である。   The carbonitride includes, for example, at least one selected from the group consisting of Ti, W, Si, Zr, and Nb, and is preferably silicon carbonitride.

メタルシリサイド、窒化物、炭化物、及び炭窒化物は、その材料に含まれるSi、N又はCと、その材料に含まれる他の元素との間の電気陰性度の差が小さく、分極が小さい。そのため、無機膜と水との反応性が低く、無機膜の表面に水酸基が生じにくい。よって、無機膜とガラス基板である基板2との離型性が良好に保たれる。   Metal silicide, nitride, carbide, and carbonitride have a small difference in electronegativity between Si, N, or C contained in the material and other elements contained in the material, and have a small polarization. Therefore, the reactivity between the inorganic film and water is low, and hydroxyl groups are unlikely to be generated on the surface of the inorganic film. Therefore, the releasability between the inorganic film and the substrate 2 which is a glass substrate is kept good.

積層体1の基板2の表面2aには、機能層が形成される。機能層の形成方法としては、CVD(Chemical Vapor Deposition)法、PVD(Physical Vapor Deposition)法等の蒸着法、スパッタ法が用いられる。機能層は、フォトリソグラフィ法、エッチング法によって所定のパターンに形成される。基板2の表面2aに機能層が形成された後、補強板3は、基板2から剥離される。   A functional layer is formed on the surface 2 a of the substrate 2 of the laminate 1. As a method for forming the functional layer, a vapor deposition method such as a CVD (Chemical Vapor Deposition) method, a PVD (Physical Vapor Deposition) method, or a sputtering method is used. The functional layer is formed in a predetermined pattern by photolithography or etching. After the functional layer is formed on the surface 2 a of the substrate 2, the reinforcing plate 3 is peeled from the substrate 2.

〔疵付け装置10の構成〕
次に、基板2から剥離された補強板3の樹脂層4に、引っ掻き疵を付ける疵付け装置10について説明する。
[Configuration of the brazing device 10]
Next, the brazing device 10 for scratching the resin layer 4 of the reinforcing plate 3 peeled from the substrate 2 will be described.

図2は、疵付け装置10の一例を示す斜視図であり、図3は、疵付け装置10の全体構成を示した説明図である。   FIG. 2 is a perspective view illustrating an example of the brazing device 10, and FIG. 3 is an explanatory diagram illustrating the overall configuration of the brazing device 10.

疵付け装置10は、疵付与手段である回転自在なロールブラシ(ロール状ブラシ部材)12、及び移動手段であるローラコンベア14等を備えて構成される。   The brazing device 10 is configured to include a rotatable roll brush (roll-like brush member) 12 that is a tacking means, a roller conveyor 14 that is a moving means, and the like.

ロールブラシ12は、円盤又は円柱状の芯材16の周囲にブラシ18が植設されることにより構成される。また、ロールブラシ12の長さLは、補強板3の幅Wよりも長めに構成されている。よって、補強板3の樹脂層4の全域にロールブラシ12による引っ掻き疵を付けることができる。   The roll brush 12 is configured by implanting a brush 18 around a disk or columnar core 16. Further, the length L of the roll brush 12 is configured to be longer than the width W of the reinforcing plate 3. Therefore, scratches by the roll brush 12 can be attached to the entire region of the resin layer 4 of the reinforcing plate 3.

ローラコンベア14は、水平方向に配置された複数本のローラ20によって構成され、不図示の駆動源からの動力が伝達されて回転される。   The roller conveyor 14 is constituted by a plurality of rollers 20 arranged in the horizontal direction, and is rotated by transmission of power from a drive source (not shown).

図3の如く補強板3は、補強板3の裏面3bがローラ20に載置され、ローラ20の回転によって、ロールブラシ12の下方を矢印A方向に移動する。この際に補強板3の樹脂層4は、ロールブラシ12のブラシ18に押し付けられ、かつ回転するロールブラシ12によって、樹脂層4の表面にブラシ18による引っ掻き疵が付けられながらロールブラシ12の下方を通過する。これにより、樹脂層4の全面に引っ掻き疵(図4(A)参照)を容易に付けることができる。   As shown in FIG. 3, the back surface 3 b of the reinforcing plate 3 is placed on the roller 20, and the reinforcing plate 3 moves below the roll brush 12 in the direction of arrow A by the rotation of the roller 20. At this time, the resin layer 4 of the reinforcing plate 3 is pressed against the brush 18 of the roll brush 12, and the surface of the resin layer 4 is scratched by the brush 18 by the rotating roll brush 12, and the lower side of the roll brush 12. Pass through. Thereby, a scratch flaw (refer FIG. 4 (A)) can be easily attached to the whole surface of the resin layer 4. FIG.

また、ロールブラシ12及びローラコンベア14を使用することによって、樹脂層4に引っ掻き疵を付ける処理作業を、複数の補強板3において連続的に実施できるので、前記処理作業の効率化を図ることができる。   Further, by using the roll brush 12 and the roller conveyor 14, the processing operation for scratching the resin layer 4 can be continuously performed on the plurality of reinforcing plates 3, so that the processing operation efficiency can be improved. it can.

なお、実施形態の疵付け装置10は、ローラコンベア14によって補強板3を樹脂層4の表面に沿って移動させたが、補強板3を固定してロールブラシ12を樹脂層4の表面に沿って移動させてもよい。また、ロールブラシ12に代えて、カミソリのような先端鋭利部材、又は櫛歯状部材を適用してもよい。すなわち、樹脂層4に引っ掻き疵を付けることができる疵付与手段であれば、疵付与手段として適用できる。   In the brazing device 10 of the embodiment, the reinforcing plate 3 is moved along the surface of the resin layer 4 by the roller conveyor 14, but the reinforcing plate 3 is fixed and the roll brush 12 is moved along the surface of the resin layer 4. May be moved. Further, instead of the roll brush 12, a sharp tip member such as a razor or a comb-like member may be applied. That is, any wrinkle applying means that can apply a scratch wrinkle to the resin layer 4 can be applied as a wrinkle applying means.

一方、ローラコンベア14の下流側には、複数の従動ローラ22及び2本の位置決め用ピン24からなる搬出部26が備えられる。   On the other hand, on the downstream side of the roller conveyor 14, a carry-out portion 26 including a plurality of driven rollers 22 and two positioning pins 24 is provided.

ローラコンベア14によって移動されてきた補強板3は、ローラコンベア14の終端から従動ローラ22に移載される。この後、補強板3は、慣性力によって従動ローラ22上を移動し、移動速度が低下したところで位置決め用ピン24に当接し、搬出部26で位置決めされる。   The reinforcing plate 3 moved by the roller conveyor 14 is transferred to the driven roller 22 from the end of the roller conveyor 14. Thereafter, the reinforcing plate 3 moves on the driven roller 22 by inertial force, contacts the positioning pin 24 when the moving speed decreases, and is positioned by the carry-out portion 26.

また、搬出部26の近傍にはロボット(収納手段)28が設置され、ロボット28の近傍にはパレット(梱包容器)搭載台30が備えられている。   A robot (storage means) 28 is installed in the vicinity of the carry-out unit 26, and a pallet (packing container) mounting table 30 is provided in the vicinity of the robot 28.

ロボット28と疵付け装置10とによって、実施形態の梱包装置が構成される。   The packaging device according to the embodiment is configured by the robot 28 and the brazing device 10.

ロボット28のアーム32の先端部には、複数の吸着パッド34が同一平面上に取り付けられている。アーム32の動作は、不図示の制御部によって制御され、また、この制御部によって吸着パッド34の吸着開始・停止も制御されている。すなわち制御部は、搬出部26で位置決めされた補強板3を吸着パッド34によって保持可能な位置と、パレット搭載台30に搭載されたパレット(梱包容器)36に補強板3を収納する位置との間でアーム32を動作させる。また、制御部は、搬出部26で位置決めされた補強板3を吸着パッド34によって保持する際に、吸着パッド34の吸着動作を開始させ、パレット36に補強板3を収納した際に、吸着パッド34の吸着動作を停止させるように吸着パッド34を制御する。   A plurality of suction pads 34 are attached to the tip of the arm 32 of the robot 28 on the same plane. The operation of the arm 32 is controlled by a control unit (not shown), and the suction start / stop of the suction pad 34 is also controlled by the control unit. That is, the control unit has a position where the reinforcing plate 3 positioned by the carry-out unit 26 can be held by the suction pad 34 and a position where the reinforcing plate 3 is stored in a pallet (packing container) 36 mounted on the pallet mounting table 30. The arm 32 is moved between them. Further, the control unit starts the suction operation of the suction pad 34 when holding the reinforcing plate 3 positioned by the carry-out unit 26 by the suction pad 34, and when the reinforcing plate 3 is stored in the pallet 36, the suction pad 34 The suction pad 34 is controlled so as to stop the suction operation 34.

これにより、ロールブラシ12によって樹脂層4に引っ掻き疵が付けられた補強板3を、ロボット28によってパレット36に収納できる。よって、樹脂層4に疵を付ける処理作業と、樹脂層4に引っ掻き疵が付けられた補強板3の収納作業とを連続的に実施できるので、処理作業と収納作業の効率化を図ることができる。   Thereby, the reinforcing plate 3 in which the resin layer 4 is scratched by the roll brush 12 can be stored in the pallet 36 by the robot 28. Therefore, since the processing operation for attaching the wrinkles to the resin layer 4 and the storing operation of the reinforcing plate 3 with the scratched wrinkles on the resin layer 4 can be carried out continuously, it is possible to improve the efficiency of the processing operations and the storing operations. it can.

引っ掻き疵が付けられた複数の補強板3がパレット36に積層されて収納された形態が実施形態の梱包体である。   A form in which a plurality of reinforcing plates 3 to which scratches are attached is stacked and stored on the pallet 36 is the packaging body of the embodiment.

また、パレット36に収納される複数の補強板3は、ロボット28によって補強板3の表面及び裏面が同じ向きに積層される。よって、パレット36に収納された複数の補強板3において、隣接する2枚の補強板3、3は、一方の補強板3の裏面と他方の補強板3の樹脂層4とが接触する。これにより、補強板3の裏面同士の接触を防止できるので、補強板3の損傷を防止できる。この場合、補強板3がガラス板の場合に好適である。   Further, the plurality of reinforcing plates 3 housed in the pallet 36 are stacked in the same direction on the front and back surfaces of the reinforcing plate 3 by the robot 28. Therefore, in the plurality of reinforcing plates 3 housed in the pallet 36, the two adjacent reinforcing plates 3 and 3 are in contact with the back surface of one reinforcing plate 3 and the resin layer 4 of the other reinforcing plate 3. Thereby, since the contact of the back surfaces of the reinforcement board 3 can be prevented, damage to the reinforcement board 3 can be prevented. In this case, it is suitable when the reinforcing plate 3 is a glass plate.

以上の如く、実施形態の疵付け装置10によれば、樹脂層4に引っ掻き疵を付けることができるので、重なり合った補強板3と樹脂層4との吸着力を低下させることができる。また、引っ掻き疵を付けた際に生じた樹脂層4の微細屑が、補強板3と樹脂層4との間に介在することも、補強板3と樹脂層4との吸着力を低下させるのに効果的である。よって、表面に樹脂層4が備えられた補強板3を、シートを介在させることなくパレット36に積層した場合であっても、補強板3をパレット36から1枚ずつ容易に取り出すことができる。   As described above, according to the brazing device 10 of the embodiment, since the scratches can be attached to the resin layer 4, the adsorption force between the overlapping reinforcing plate 3 and the resin layer 4 can be reduced. In addition, the fact that the fine debris of the resin layer 4 generated when the scratching pad is attached is interposed between the reinforcing plate 3 and the resin layer 4 also reduces the adsorption force between the reinforcing plate 3 and the resin layer 4. It is effective. Therefore, even when the reinforcing plate 3 provided with the resin layer 4 on the surface is laminated on the pallet 36 without interposing a sheet, the reinforcing plates 3 can be easily taken out from the pallet 36 one by one.

なお、図3では、補強板3を斜めに立て掛けて収納する縦積みのパレット36を例示したが、補強板3を水平に収納する平積みのパレットであってもよい。   3 illustrates the vertically stacked pallet 36 that stores the reinforcing plates 3 while leaning diagonally, but a flat pallet that stores the reinforcing plates 3 horizontally may be used.

〔実験例〕
〈ロールブラシ12〉
ブラシ径 :120mm
ブラシ材質:ナイロン66
ブラシ線径:0.1mm
ブラシ線長:12.5mm
回転数 :100回転/分
〈ローラコンベア14〉
周速 :約200mm/秒
上記条件にて補強板3をローラコンベア14によって搬送しながら、回転するロールブラシ12によって補強板3の樹脂層4に引っ掻き疵を付けた。
[Experimental example]
<Roll brush 12>
Brush diameter: 120mm
Brush material: Nylon 66
Brush wire diameter: 0.1mm
Brush wire length: 12.5mm
Number of revolutions: 100 revolutions / minute <Roller conveyor 14>
Peripheral speed: about 200 mm / sec While transporting the reinforcing plate 3 by the roller conveyor 14 under the above conditions, the resin layer 4 of the reinforcing plate 3 was scratched with a rotating roll brush 12.

図4(A)は引っ掻き疵が付けられた樹脂層4の画像であり、図4(B)は、引っ掻き疵が付けられた樹脂層4の表面性状を示したグラフである。図4(B)の縦軸は引っ掻き疵による溝の深さ、山部の高さを示し、横軸は補強板3の幅寸法を示している。なお、表面性状測定装置として、三鷹光器株式会社製の非接触表面性状測定装置(製品名:PF―60)を使用した。また、測定ピッチを0.1μmに設定し、測定範囲を200μmに設定した。   FIG. 4 (A) is an image of the resin layer 4 with scratches, and FIG. 4 (B) is a graph showing the surface properties of the resin layer 4 with scratches. The vertical axis of FIG. 4 (B) indicates the depth of the groove and the height of the peak portion due to the scratches, and the horizontal axis indicates the width dimension of the reinforcing plate 3. As the surface texture measuring device, a non-contact surface texture measuring device (product name: PF-60) manufactured by Mitaka Kogyo Co., Ltd. was used. The measurement pitch was set to 0.1 μm and the measurement range was set to 200 μm.

図4(B)の如く、樹脂層4の表面には、深さが数ミクロンの溝と高さが数ミクロンの山部が連続的に形成されている。   As shown in FIG. 4B, grooves having a depth of several microns and peaks having a height of several microns are continuously formed on the surface of the resin layer 4.

このような引っ掻き疵が付けられた補強板3をパレット36にシートを介在させることなく複数枚積層した。その後、パレット36から補強板3を取り出す作業を実施したところ、補強板3を1枚ずつ取り出すことができた。   A plurality of reinforcing plates 3 with such scratches were stacked on the pallet 36 without interposing sheets. Thereafter, when the reinforcing plate 3 was taken out from the pallet 36, the reinforcing plates 3 could be taken out one by one.

1…積層体、2…基板、2a…基板の表面、2b…基板の裏面、3…補強板、3a…補強板の表面、3b…補強板の裏面、4…樹脂層、10…疵付け装置、12…ロールブラシ、14…ローラコンベア、16…芯材、18…ブラシ、20…ローラ、22…従動ローラ、24…位置決め用ピン、26…搬出部、28…ロボット、30…パレット搭載台、32…アーム、34…吸着パッド、36…パレット   DESCRIPTION OF SYMBOLS 1 ... Laminated body, 2 ... Board | substrate, 2a ... The surface of a board | substrate, 2b ... The back surface of a board | substrate, 3 ... Reinforcement board, 3a ... The surface of a reinforcement board, 3b ... The back surface of a reinforcement board, 4 ... Resin layer, 10 ... Brazing apparatus , 12 ... Roll brush, 14 ... Roller conveyor, 16 ... Core material, 18 ... Brush, 20 ... Roller, 22 ... Driven roller, 24 ... Positioning pin, 26 ... Unloading part, 28 ... Robot, 30 ... Pallet mounting base, 32 ... Arm, 34 ... Suction pad, 36 ... Pallet

Claims (8)

表面に吸着層が形成された複数の基板を用意し、
前記複数の基板のそれぞれの吸着層の表面に引っ掻き疵を付けた後、前記複数の基板を梱包容器に積層して収納することを特徴とする吸着層付き基板の梱包方法。
Prepare multiple substrates with an adsorption layer on the surface,
A method of packing a substrate with an adsorption layer, comprising: scratching the surface of each adsorption layer of the plurality of substrates and then stacking and storing the plurality of substrates in a packaging container.
前記引っ掻き疵は、ロールブラシによって形成された疵である請求項1に記載の吸着層付き基板の梱包方法。   The method for packing a substrate with an adsorption layer according to claim 1, wherein the scratched ridge is a ridge formed by a roll brush. 前記基板は、厚さが0.7mm以下のガラス板である請求項1又は2に記載の吸着層付き基板の梱包方法。   The method for packing a substrate with an adsorption layer according to claim 1, wherein the substrate is a glass plate having a thickness of 0.7 mm or less. 前記吸着層は、シリコーン樹脂又はポリイミド樹脂からなる請求項1、2又は3に記載の吸着層付き基板の梱包方法。   The said adsorption layer consists of a silicone resin or a polyimide resin, The packaging method of the board | substrate with an adsorption layer of Claim 1, 2, or 3. 請求項1乃至4の何れか一項に記載の吸着層付き基板の梱包方法によって引っ掻き疵が付けられた複数の基板と、前記複数の基板を積層して収納する梱包容器とを備えたことを特徴とする梱包体。   A plurality of substrates that are scratched by the method for packing a substrate with an adsorption layer according to any one of claims 1 to 4, and a packaging container that stores the plurality of substrates in a stacked manner. Characteristic packaging. 前記梱包容器に収納される前記複数の基板は、基板の表面及び裏面が同じ向きに積層される請求項5に記載の梱包体。   The package according to claim 5, wherein the plurality of substrates housed in the packaging container are laminated in the same direction on the front surface and the back surface of the substrate. 吸着層が表面に形成された基板の前記吸着層に引っ掻き疵を付ける疵付与手段と、
前記疵付与手段を前記基板の前記吸着層に押圧当接させ、前記疵付与手段及び前記基板を前記吸着層に沿って相対移動させる移動手段と、
前記疵付与手段によって引っ掻き疵が付けられた前記基板を、梱包容器に収納する収納手段と、
を備えたことを特徴とする吸着層付き基板の梱包装置。
Wrinkle imparting means for scratching the adsorption layer of the substrate having the adsorption layer formed on the surface;
Moving means for causing the wrinkle application means to press-contact with the adsorption layer of the substrate and to move the wrinkle application means and the substrate relative to each other along the adsorption layer;
Storage means for storing the substrate, which has been scratched by the wrinkle applying means, in a packaging container;
An apparatus for packing a substrate with an adsorption layer, comprising:
前記疵付与手段は、回転自在なロール状ブラシ部材であり、前記移動手段は、前記基板の裏面が載置されて前記基板を前記吸着層に沿って移動させるコンベアである請求項7に記載の吸着層付き基板の梱包装置。   The said wrinkle provision means is a rotatable roll-shaped brush member, The said movement means is a conveyor by which the back surface of the said board | substrate is mounted and moves the said board | substrate along the said adsorption layer. Packing device for substrates with adsorption layer.
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