TWI536044B - 光學裝置、投影光學系統、曝光裝置以及製造物品的方法 - Google Patents
光學裝置、投影光學系統、曝光裝置以及製造物品的方法 Download PDFInfo
- Publication number
- TWI536044B TWI536044B TW103131920A TW103131920A TWI536044B TW I536044 B TWI536044 B TW I536044B TW 103131920 A TW103131920 A TW 103131920A TW 103131920 A TW103131920 A TW 103131920A TW I536044 B TWI536044 B TW I536044B
- Authority
- TW
- Taiwan
- Prior art keywords
- actuators
- mirror
- optical device
- actuator
- bottom plate
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims description 114
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 238000006073 displacement reaction Methods 0.000 claims description 42
- 239000011159 matrix material Substances 0.000 claims description 25
- 239000000758 substrate Substances 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 15
- 230000008859 change Effects 0.000 claims description 10
- 238000012545 processing Methods 0.000 claims description 3
- 230000008878 coupling Effects 0.000 description 17
- 238000010168 coupling process Methods 0.000 description 17
- 238000005859 coupling reaction Methods 0.000 description 17
- 230000007246 mechanism Effects 0.000 description 14
- 238000001514 detection method Methods 0.000 description 7
- 230000004075 alteration Effects 0.000 description 5
- 239000013598 vector Substances 0.000 description 5
- 238000005286 illumination Methods 0.000 description 4
- 239000000523 sample Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000002068 genetic effect Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 230000000452 restraining effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0858—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by piezoelectric means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
- G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Elements Other Than Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013205353A JP6168957B2 (ja) | 2013-09-30 | 2013-09-30 | 光学装置、投影光学系、露光装置および物品の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201512704A TW201512704A (zh) | 2015-04-01 |
| TWI536044B true TWI536044B (zh) | 2016-06-01 |
Family
ID=52739844
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103131920A TWI536044B (zh) | 2013-09-30 | 2014-09-16 | 光學裝置、投影光學系統、曝光裝置以及製造物品的方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9568729B2 (enExample) |
| JP (1) | JP6168957B2 (enExample) |
| KR (1) | KR101743806B1 (enExample) |
| CN (1) | CN104516212B (enExample) |
| TW (1) | TWI536044B (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014225639A (ja) * | 2013-04-16 | 2014-12-04 | キヤノン株式会社 | ミラーユニット及び露光装置 |
| JP6336274B2 (ja) * | 2013-12-25 | 2018-06-06 | キヤノン株式会社 | 光学装置、投影光学系、露光装置、および物品の製造方法 |
| JP6484853B2 (ja) * | 2014-04-17 | 2019-03-20 | 株式会社ブイ・テクノロジー | 露光装置用反射鏡ユニット及び露光装置 |
| JP2017129685A (ja) * | 2016-01-19 | 2017-07-27 | キヤノン株式会社 | 光学装置、投影光学系、露光装置およびデバイス製造方法 |
| JP6929024B2 (ja) * | 2016-07-06 | 2021-09-01 | キヤノン株式会社 | 光学装置、露光装置及び物品の製造方法 |
| JP2018013510A (ja) * | 2016-07-19 | 2018-01-25 | キヤノン株式会社 | 光学装置、リソグラフィ装置及び物品の製造方法 |
| JP6853659B2 (ja) * | 2016-12-09 | 2021-03-31 | キヤノン株式会社 | 決定方法、光学装置、投影光学系、露光装置及び物品の製造方法 |
| CN110581984A (zh) * | 2018-06-08 | 2019-12-17 | 深圳光峰科技股份有限公司 | 投影设备 |
| DE102018212508A1 (de) * | 2018-07-26 | 2020-01-30 | Carl Zeiss Smt Gmbh | Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage, sowie Verfahren zum Betreiben eines deformierbaren Spiegels |
| DE102020201724A1 (de) * | 2020-02-12 | 2021-08-12 | Carl Zeiss Smt Gmbh | Optisches system und lithographieanlage |
| DE102020210024B4 (de) * | 2020-08-07 | 2024-02-08 | Carl Zeiss Smt Gmbh | Optische Baugruppe und Projektionsbelichtungsanlage |
| US12181660B2 (en) * | 2020-11-11 | 2024-12-31 | Northrop Grumman Systems Corporation | Actively deformable metamirror |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1139831C (zh) | 2001-06-05 | 2004-02-25 | 中国科学院国家天文台南京天文光学技术研究所 | 大型天文望远镜镜面位移控制系统 |
| US6840638B2 (en) * | 2002-07-03 | 2005-01-11 | Nikon Corporation | Deformable mirror with passive and active actuators |
| US6842277B2 (en) | 2002-07-23 | 2005-01-11 | Nikon Corporation | Deformable mirror with high-bandwidth servo for rigid body control |
| JP4817702B2 (ja) * | 2005-04-14 | 2011-11-16 | キヤノン株式会社 | 光学装置及びそれを備えた露光装置 |
| JP4432839B2 (ja) | 2005-06-20 | 2010-03-17 | 船井電機株式会社 | 形状可変ミラー及びそれを備えた光ピックアップ装置 |
| WO2007017089A1 (en) * | 2005-07-25 | 2007-02-15 | Carl Zeiss Smt Ag | Projection objective of a microlithographic projection exposure apparatus |
| JP2007103657A (ja) * | 2005-10-04 | 2007-04-19 | Canon Inc | 光学素子保持装置、露光装置およびデバイス製造方法 |
| JP2007316132A (ja) | 2006-05-23 | 2007-12-06 | Canon Inc | 反射装置 |
| JP2007317713A (ja) | 2006-05-23 | 2007-12-06 | Canon Inc | 光学素子駆動装置 |
| JP2008040299A (ja) | 2006-08-09 | 2008-02-21 | Funai Electric Co Ltd | 形状可変ミラー及び形状可変ミラーの製造方法 |
| JP2008270569A (ja) | 2007-04-20 | 2008-11-06 | Canon Inc | 露光装置及びその制御方法並びに製造方法 |
| JP2009026862A (ja) * | 2007-07-18 | 2009-02-05 | Canon Inc | 光学素子位置決めシステム、投影光学系及び露光装置 |
| CN100587547C (zh) | 2007-11-29 | 2010-02-03 | 上海交通大学 | 压电驱动的可变形反射镜及其制造方法 |
| US8553207B2 (en) | 2008-12-31 | 2013-10-08 | Asml Holdings N.V. | Optically compensated unidirectional reticle bender |
| CN101504487A (zh) | 2009-03-20 | 2009-08-12 | 中国科学院光电技术研究所 | 大口径可拆卸压电变形反射镜 |
| WO2011074319A1 (ja) | 2009-12-14 | 2011-06-23 | 株式会社ニコン | デフォーマブルミラー、照明光学系、露光装置、およびデバイス製造方法 |
| JP2011171386A (ja) * | 2010-02-16 | 2011-09-01 | Nikon Corp | 変位センサ、駆動装置、露光装置、及びデバイスの製造方法 |
| CN201615788U (zh) | 2010-03-18 | 2010-10-27 | 杭州创惠仪器有限公司 | 分布光度计测量用的反光镜 |
| CN101923214A (zh) | 2010-08-04 | 2010-12-22 | 中国科学院光电技术研究所 | 基于压电驱动器的变形次镜 |
| DE102011075393B4 (de) * | 2011-05-06 | 2013-08-14 | Carl Zeiss Smt Gmbh | Anordnung zur Aktuierung eines Elementes in einer Projektionsbelichtungsanlage |
| JP2013106017A (ja) * | 2011-11-17 | 2013-05-30 | Nikon Corp | 光学素子保持装置、光学装置、及び露光装置 |
| CN202393061U (zh) | 2011-12-29 | 2012-08-22 | 中国华能集团清洁能源技术研究院有限公司 | 一种线聚焦太阳能反射框架双层复合式自平衡结构 |
| JP2013161992A (ja) * | 2012-02-06 | 2013-08-19 | Nikon Corp | 変形可能な反射光学素子、光学系、及び露光装置 |
| CN103207440B (zh) | 2013-04-18 | 2015-04-08 | 大连理工大学 | 一种双向多拱形大口径空间反射镜 |
-
2013
- 2013-09-30 JP JP2013205353A patent/JP6168957B2/ja active Active
-
2014
- 2014-09-16 TW TW103131920A patent/TWI536044B/zh active
- 2014-09-22 US US14/492,111 patent/US9568729B2/en active Active
- 2014-09-25 CN CN201410497939.3A patent/CN104516212B/zh active Active
- 2014-09-29 KR KR1020140129975A patent/KR101743806B1/ko active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN104516212B (zh) | 2017-06-30 |
| JP2015070214A (ja) | 2015-04-13 |
| US9568729B2 (en) | 2017-02-14 |
| US20150092172A1 (en) | 2015-04-02 |
| KR20150037610A (ko) | 2015-04-08 |
| JP6168957B2 (ja) | 2017-07-26 |
| KR101743806B1 (ko) | 2017-06-05 |
| TW201512704A (zh) | 2015-04-01 |
| CN104516212A (zh) | 2015-04-15 |
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