CN104516212B - 光学装置、投影光学系统、曝光装置及物品的制造方法 - Google Patents

光学装置、投影光学系统、曝光装置及物品的制造方法 Download PDF

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Publication number
CN104516212B
CN104516212B CN201410497939.3A CN201410497939A CN104516212B CN 104516212 B CN104516212 B CN 104516212B CN 201410497939 A CN201410497939 A CN 201410497939A CN 104516212 B CN104516212 B CN 104516212B
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CN
China
Prior art keywords
actuator
mirror
optical devices
reflecting surface
base plate
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CN201410497939.3A
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English (en)
Chinese (zh)
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CN104516212A (zh
Inventor
崔长植
井本浩平
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Canon Inc
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Canon Inc
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Publication of CN104516212A publication Critical patent/CN104516212A/zh
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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0858—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by piezoelectric means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201410497939.3A 2013-09-30 2014-09-25 光学装置、投影光学系统、曝光装置及物品的制造方法 Active CN104516212B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013205353A JP6168957B2 (ja) 2013-09-30 2013-09-30 光学装置、投影光学系、露光装置および物品の製造方法
JP2013-205353 2013-09-30

Publications (2)

Publication Number Publication Date
CN104516212A CN104516212A (zh) 2015-04-15
CN104516212B true CN104516212B (zh) 2017-06-30

Family

ID=52739844

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410497939.3A Active CN104516212B (zh) 2013-09-30 2014-09-25 光学装置、投影光学系统、曝光装置及物品的制造方法

Country Status (5)

Country Link
US (1) US9568729B2 (enExample)
JP (1) JP6168957B2 (enExample)
KR (1) KR101743806B1 (enExample)
CN (1) CN104516212B (enExample)
TW (1) TWI536044B (enExample)

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JP2014225639A (ja) * 2013-04-16 2014-12-04 キヤノン株式会社 ミラーユニット及び露光装置
JP6336274B2 (ja) * 2013-12-25 2018-06-06 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法
JP6484853B2 (ja) * 2014-04-17 2019-03-20 株式会社ブイ・テクノロジー 露光装置用反射鏡ユニット及び露光装置
JP2017129685A (ja) * 2016-01-19 2017-07-27 キヤノン株式会社 光学装置、投影光学系、露光装置およびデバイス製造方法
JP6929024B2 (ja) * 2016-07-06 2021-09-01 キヤノン株式会社 光学装置、露光装置及び物品の製造方法
JP2018013510A (ja) * 2016-07-19 2018-01-25 キヤノン株式会社 光学装置、リソグラフィ装置及び物品の製造方法
JP6853659B2 (ja) * 2016-12-09 2021-03-31 キヤノン株式会社 決定方法、光学装置、投影光学系、露光装置及び物品の製造方法
CN110581984A (zh) * 2018-06-08 2019-12-17 深圳光峰科技股份有限公司 投影设备
DE102018212508A1 (de) * 2018-07-26 2020-01-30 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage, sowie Verfahren zum Betreiben eines deformierbaren Spiegels
DE102020201724A1 (de) * 2020-02-12 2021-08-12 Carl Zeiss Smt Gmbh Optisches system und lithographieanlage
DE102020210024B4 (de) * 2020-08-07 2024-02-08 Carl Zeiss Smt Gmbh Optische Baugruppe und Projektionsbelichtungsanlage
US12181660B2 (en) * 2020-11-11 2024-12-31 Northrop Grumman Systems Corporation Actively deformable metamirror

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US6840638B2 (en) * 2002-07-03 2005-01-11 Nikon Corporation Deformable mirror with passive and active actuators
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JP4432839B2 (ja) 2005-06-20 2010-03-17 船井電機株式会社 形状可変ミラー及びそれを備えた光ピックアップ装置
WO2007017089A1 (en) * 2005-07-25 2007-02-15 Carl Zeiss Smt Ag Projection objective of a microlithographic projection exposure apparatus
JP2007103657A (ja) * 2005-10-04 2007-04-19 Canon Inc 光学素子保持装置、露光装置およびデバイス製造方法
JP2007316132A (ja) 2006-05-23 2007-12-06 Canon Inc 反射装置
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JP2008270569A (ja) 2007-04-20 2008-11-06 Canon Inc 露光装置及びその制御方法並びに製造方法
JP2009026862A (ja) * 2007-07-18 2009-02-05 Canon Inc 光学素子位置決めシステム、投影光学系及び露光装置
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CN103207440B (zh) 2013-04-18 2015-04-08 大连理工大学 一种双向多拱形大口径空间反射镜

Also Published As

Publication number Publication date
JP2015070214A (ja) 2015-04-13
US9568729B2 (en) 2017-02-14
US20150092172A1 (en) 2015-04-02
TWI536044B (zh) 2016-06-01
KR20150037610A (ko) 2015-04-08
JP6168957B2 (ja) 2017-07-26
KR101743806B1 (ko) 2017-06-05
TW201512704A (zh) 2015-04-01
CN104516212A (zh) 2015-04-15

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