TWI535836B - 用於鎢拋光之組合物 - Google Patents

用於鎢拋光之組合物 Download PDF

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Publication number
TWI535836B
TWI535836B TW104109036A TW104109036A TWI535836B TW I535836 B TWI535836 B TW I535836B TW 104109036 A TW104109036 A TW 104109036A TW 104109036 A TW104109036 A TW 104109036A TW I535836 B TWI535836 B TW I535836B
Authority
TW
Taiwan
Prior art keywords
composition
acid
polishing
colloidal ceria
abrasive particles
Prior art date
Application number
TW104109036A
Other languages
English (en)
Chinese (zh)
Other versions
TW201546252A (zh
Inventor
琳 富
傑佛瑞 戴薩
史帝芬 葛倫拜
Original Assignee
卡博特微電子公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 卡博特微電子公司 filed Critical 卡博特微電子公司
Publication of TW201546252A publication Critical patent/TW201546252A/zh
Application granted granted Critical
Publication of TWI535836B publication Critical patent/TWI535836B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
    • B01J23/74—Iron group metals
    • B01J23/745—Iron
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F3/00—Brightening metals by chemical means
    • C23F3/04—Heavy metals
    • C23F3/06—Heavy metals with acidic solutions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
TW104109036A 2014-03-21 2015-03-20 用於鎢拋光之組合物 TWI535836B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US14/222,086 US9309442B2 (en) 2014-03-21 2014-03-21 Composition for tungsten buffing

Publications (2)

Publication Number Publication Date
TW201546252A TW201546252A (zh) 2015-12-16
TWI535836B true TWI535836B (zh) 2016-06-01

Family

ID=54141489

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104109036A TWI535836B (zh) 2014-03-21 2015-03-20 用於鎢拋光之組合物

Country Status (7)

Country Link
US (1) US9309442B2 (enExample)
EP (1) EP3120380B1 (enExample)
JP (1) JP6616394B2 (enExample)
KR (1) KR102390227B1 (enExample)
CN (1) CN106133881B (enExample)
TW (1) TWI535836B (enExample)
WO (1) WO2015143270A1 (enExample)

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Also Published As

Publication number Publication date
US9309442B2 (en) 2016-04-12
TW201546252A (zh) 2015-12-16
EP3120380A4 (en) 2017-12-13
EP3120380B1 (en) 2019-03-06
EP3120380A1 (en) 2017-01-25
KR102390227B1 (ko) 2022-04-25
CN106133881B (zh) 2019-01-08
WO2015143270A1 (en) 2015-09-24
US20150267081A1 (en) 2015-09-24
JP2017517900A (ja) 2017-06-29
CN106133881A (zh) 2016-11-16
JP6616394B2 (ja) 2019-12-04
KR20160135767A (ko) 2016-11-28

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