TWI534853B - A charged particle beam rendering device and a drawing chamber - Google Patents

A charged particle beam rendering device and a drawing chamber Download PDF

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Publication number
TWI534853B
TWI534853B TW103121246A TW103121246A TWI534853B TW I534853 B TWI534853 B TW I534853B TW 103121246 A TW103121246 A TW 103121246A TW 103121246 A TW103121246 A TW 103121246A TW I534853 B TWI534853 B TW I534853B
Authority
TW
Taiwan
Prior art keywords
platform
support
chamber
bottom plate
charged particle
Prior art date
Application number
TW103121246A
Other languages
English (en)
Chinese (zh)
Other versions
TW201515050A (zh
Inventor
Hiroyasu Saito
Yoshinori Nakagawa
Seiichi Nakazawa
Original Assignee
Nuflare Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nuflare Technology Inc filed Critical Nuflare Technology Inc
Publication of TW201515050A publication Critical patent/TW201515050A/zh
Application granted granted Critical
Publication of TWI534853B publication Critical patent/TWI534853B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
TW103121246A 2013-07-17 2014-06-19 A charged particle beam rendering device and a drawing chamber TWI534853B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013148593 2013-07-17

Publications (2)

Publication Number Publication Date
TW201515050A TW201515050A (zh) 2015-04-16
TWI534853B true TWI534853B (zh) 2016-05-21

Family

ID=52481922

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103121246A TWI534853B (zh) 2013-07-17 2014-06-19 A charged particle beam rendering device and a drawing chamber

Country Status (2)

Country Link
KR (1) KR101638231B1 (ko)
TW (1) TWI534853B (ko)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003229350A (ja) 2002-02-01 2003-08-15 Nikon Corp ステージ装置及び露光装置
JP4074224B2 (ja) * 2003-06-26 2008-04-09 住友重機械工業株式会社 真空装置及び電子ビーム近接露光装置
KR101173572B1 (ko) * 2006-01-19 2012-08-13 주성엔지니어링(주) 완충챔버를 가지는 로드락챔버
JP4936368B2 (ja) 2006-11-21 2012-05-23 株式会社リコー 真空チャンバ及び電子線描画装置

Also Published As

Publication number Publication date
KR101638231B1 (ko) 2016-07-08
TW201515050A (zh) 2015-04-16
KR20150009920A (ko) 2015-01-27

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MM4A Annulment or lapse of patent due to non-payment of fees