TWI512391B - A manufacturing method of an electronic device, a manufacturing method of a display device, a method of manufacturing a mask, and a mask - Google Patents

A manufacturing method of an electronic device, a manufacturing method of a display device, a method of manufacturing a mask, and a mask Download PDF

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Publication number
TWI512391B
TWI512391B TW102131117A TW102131117A TWI512391B TW I512391 B TWI512391 B TW I512391B TW 102131117 A TW102131117 A TW 102131117A TW 102131117 A TW102131117 A TW 102131117A TW I512391 B TWI512391 B TW I512391B
Authority
TW
Taiwan
Prior art keywords
pattern
film
light
photomask
semi
Prior art date
Application number
TW102131117A
Other languages
English (en)
Chinese (zh)
Other versions
TW201415160A (zh
Inventor
山口昇
Original Assignee
Ｈｏｙａ股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ｈｏｙａ股份有限公司 filed Critical Ｈｏｙａ股份有限公司
Publication of TW201415160A publication Critical patent/TW201415160A/zh
Application granted granted Critical
Publication of TWI512391B publication Critical patent/TWI512391B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80—Etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW102131117A 2012-10-12 2013-08-29 A manufacturing method of an electronic device, a manufacturing method of a display device, a method of manufacturing a mask, and a mask TWI512391B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012227309A JP6157832B2 (ja) 2012-10-12 2012-10-12 電子デバイスの製造方法、表示装置の製造方法、フォトマスクの製造方法、及びフォトマスク

Publications (2)

Publication Number Publication Date
TW201415160A TW201415160A (zh) 2014-04-16
TWI512391B true TWI512391B (zh) 2015-12-11

Family

ID=50452966

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102131117A TWI512391B (zh) 2012-10-12 2013-08-29 A manufacturing method of an electronic device, a manufacturing method of a display device, a method of manufacturing a mask, and a mask

Country Status (4)

Country Link
JP (1) JP6157832B2 (https=)
KR (1) KR101560452B1 (https=)
CN (3) CN103728832B (https=)
TW (1) TWI512391B (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI919218B (zh) 2023-03-20 2026-03-21 日商Ｓｋ電子股份有限公司 光罩及光罩的製造方法

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JP6726553B2 (ja) * 2015-09-26 2020-07-22 Hoya株式会社 フォトマスクの製造方法、及び表示装置の製造方法
JP6718225B2 (ja) * 2015-12-02 2020-07-08 株式会社エスケーエレクトロニクス フォトマスクおよびその製造方法
JP6514143B2 (ja) * 2016-05-18 2019-05-15 Hoya株式会社 フォトマスクの製造方法、フォトマスク、及び表示装置の製造方法
TW201823855A (zh) * 2016-09-21 2018-07-01 日商Ｈｏｙａ股份有限公司 光罩之製造方法、光罩、及顯示裝置之製造方法
KR101918380B1 (ko) 2017-01-06 2018-11-13 가부시키가이샤 에스케이 일렉트로닉스 얼라이먼트 패턴을 갖는 포토 마스크 블랭크 및 이를 이용한 포토 마스크 및 그 제조 방법
JP6744955B2 (ja) * 2019-06-19 2020-08-19 Hoya株式会社 フォトマスクの製造方法、フォトマスク及び表示装置の製造方法
JP7261709B2 (ja) * 2019-09-13 2023-04-20 Hoya株式会社 フォトマスク、フォトマスクの製造方法及び表示装置の製造方法
CN112526818B (zh) * 2020-12-02 2024-12-20 北海惠科光电技术有限公司 半色调掩膜版和薄膜晶体管阵列基板制造方法

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TW201025420A (en) * 2003-08-15 2010-07-01 Hoya Corp Photo mask blank
TW201215998A (en) * 2010-05-24 2012-04-16 Hoya Corp Method of manufacturing a multi-tone photomask and pattern transfer method

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JP3586647B2 (ja) * 2000-12-26 2004-11-10 Ｈｏｙａ株式会社 グレートーンマスク及びその製造方法
WO2003046659A1 (fr) * 2001-11-27 2003-06-05 Hoya Corporation Blanc de masque de dephasage en similigravure, masque de dephasage en similigravure, et procede de fabrication correspondant
US7160649B2 (en) * 2002-07-11 2007-01-09 Hitachi Via Mechanics, Ltd. Gray level imaging masks, optical imaging apparatus for gray level imaging masks and methods for encoding mask and use of the masks
TWI286663B (en) * 2003-06-30 2007-09-11 Hoya Corp Method for manufacturing gray tone mask, and gray tone mask
WO2005124455A1 (ja) * 2004-06-22 2005-12-29 Hoya Corporation マスクブランク用透光性基板の製造方法、マスクブランクの製造方法、露光用マスクの製造方法、半導体装置の製造方法及び液晶表示装置の製造方法、並びに露光用マスクの欠陥修正方法
JP2006084507A (ja) 2004-09-14 2006-03-30 Matsushita Electric Ind Co Ltd 位相シフトマスク及び位相シフトマスクの製造方法
JP2007123356A (ja) * 2005-10-25 2007-05-17 Sharp Corp 半導体装置の製造方法
KR101255616B1 (ko) * 2006-07-28 2013-04-16 삼성디스플레이 주식회사 다중톤 광마스크, 이의 제조방법 및 이를 이용한박막트랜지스터 기판의 제조방법
JP4864776B2 (ja) * 2007-03-14 2012-02-01 株式会社東芝 フォトマスク
JP2009229893A (ja) * 2008-03-24 2009-10-08 Hoya Corp 多階調フォトマスクの製造方法及びパターン転写方法
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JP4878379B2 (ja) * 2009-02-09 2012-02-15 Ｈｏｙａ株式会社 グレートーンマスクの製造方法
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JP2011027878A (ja) * 2009-07-23 2011-02-10 Hoya Corp 多階調フォトマスク、多階調フォトマスクの製造方法、及びパターン転写方法
JP2011081326A (ja) * 2009-10-10 2011-04-21 Hoya Corp 多階調フォトマスクの製造方法及び多階調フォトマスク用ブランク、並びに電子デバイスの製造方法
TWI502623B (zh) * 2010-01-07 2015-10-01 Ｈｏｙａ股份有限公司 光罩之製造方法、光罩、及顯示裝置之製造方法
JP2012008546A (ja) * 2010-05-24 2012-01-12 Hoya Corp 多階調フォトマスクの製造方法、及びパターン転写方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201025420A (en) * 2003-08-15 2010-07-01 Hoya Corp Photo mask blank
TW201215998A (en) * 2010-05-24 2012-04-16 Hoya Corp Method of manufacturing a multi-tone photomask and pattern transfer method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI919218B (zh) 2023-03-20 2026-03-21 日商Ｓｋ電子股份有限公司 光罩及光罩的製造方法

Also Published As

Publication number Publication date
CN110147029B (zh) 2022-06-07
CN110147029A (zh) 2019-08-20
CN105892226A (zh) 2016-08-24
CN103728832B (zh) 2017-07-14
CN103728832A (zh) 2014-04-16
TW201415160A (zh) 2014-04-16
CN105892226B (zh) 2019-08-02
KR101560452B1 (ko) 2015-10-14
JP6157832B2 (ja) 2017-07-05
KR20140047534A (ko) 2014-04-22
JP2014081409A (ja) 2014-05-08

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