KR101560452B1 - 전자 디바이스의 제조 방법, 표시 장치의 제조 방법, 포토마스크의 제조 방법 및 포토마스크 - Google Patents

전자 디바이스의 제조 방법, 표시 장치의 제조 방법, 포토마스크의 제조 방법 및 포토마스크 Download PDF

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KR101560452B1
KR101560452B1 KR1020130118827A KR20130118827A KR101560452B1 KR 101560452 B1 KR101560452 B1 KR 101560452B1 KR 1020130118827 A KR1020130118827 A KR 1020130118827A KR 20130118827 A KR20130118827 A KR 20130118827A KR 101560452 B1 KR101560452 B1 KR 101560452B1
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South Korea
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pattern
thin film
photomask
film
light
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Korean (ko)
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KR20140047534A (ko
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노보루 야마구찌
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호야 가부시키가이샤
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80—Etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020130118827A 2012-10-12 2013-10-04 전자 디바이스의 제조 방법, 표시 장치의 제조 방법, 포토마스크의 제조 방법 및 포토마스크 Active KR101560452B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2012-227309 2012-10-12
JP2012227309A JP6157832B2 (ja) 2012-10-12 2012-10-12 電子デバイスの製造方法、表示装置の製造方法、フォトマスクの製造方法、及びフォトマスク

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Publication Number Publication Date
KR20140047534A KR20140047534A (ko) 2014-04-22
KR101560452B1 true KR101560452B1 (ko) 2015-10-14

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JP (1) JP6157832B2 (https=)
KR (1) KR101560452B1 (https=)
CN (3) CN103728832B (https=)
TW (1) TWI512391B (https=)

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JP6726553B2 (ja) * 2015-09-26 2020-07-22 Hoya株式会社 フォトマスクの製造方法、及び表示装置の製造方法
JP6718225B2 (ja) * 2015-12-02 2020-07-08 株式会社エスケーエレクトロニクス フォトマスクおよびその製造方法
JP6514143B2 (ja) * 2016-05-18 2019-05-15 Hoya株式会社 フォトマスクの製造方法、フォトマスク、及び表示装置の製造方法
TW201823855A (zh) * 2016-09-21 2018-07-01 日商Ｈｏｙａ股份有限公司 光罩之製造方法、光罩、及顯示裝置之製造方法
KR101918380B1 (ko) 2017-01-06 2018-11-13 가부시키가이샤 에스케이 일렉트로닉스 얼라이먼트 패턴을 갖는 포토 마스크 블랭크 및 이를 이용한 포토 마스크 및 그 제조 방법
JP6744955B2 (ja) * 2019-06-19 2020-08-19 Hoya株式会社 フォトマスクの製造方法、フォトマスク及び表示装置の製造方法
JP7261709B2 (ja) * 2019-09-13 2023-04-20 Hoya株式会社 フォトマスク、フォトマスクの製造方法及び表示装置の製造方法
CN112526818B (zh) * 2020-12-02 2024-12-20 北海惠科光电技术有限公司 半色调掩膜版和薄膜晶体管阵列基板制造方法

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JP2006084507A (ja) 2004-09-14 2006-03-30 Matsushita Electric Ind Co Ltd 位相シフトマスク及び位相シフトマスクの製造方法

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JP3586647B2 (ja) * 2000-12-26 2004-11-10 Ｈｏｙａ株式会社 グレートーンマスク及びその製造方法
WO2003046659A1 (fr) * 2001-11-27 2003-06-05 Hoya Corporation Blanc de masque de dephasage en similigravure, masque de dephasage en similigravure, et procede de fabrication correspondant
US7160649B2 (en) * 2002-07-11 2007-01-09 Hitachi Via Mechanics, Ltd. Gray level imaging masks, optical imaging apparatus for gray level imaging masks and methods for encoding mask and use of the masks
TWI286663B (en) * 2003-06-30 2007-09-11 Hoya Corp Method for manufacturing gray tone mask, and gray tone mask
JP4443873B2 (ja) * 2003-08-15 2010-03-31 Ｈｏｙａ株式会社 位相シフトマスクの製造方法
WO2005124455A1 (ja) * 2004-06-22 2005-12-29 Hoya Corporation マスクブランク用透光性基板の製造方法、マスクブランクの製造方法、露光用マスクの製造方法、半導体装置の製造方法及び液晶表示装置の製造方法、並びに露光用マスクの欠陥修正方法
JP2007123356A (ja) * 2005-10-25 2007-05-17 Sharp Corp 半導体装置の製造方法
KR101255616B1 (ko) * 2006-07-28 2013-04-16 삼성디스플레이 주식회사 다중톤 광마스크, 이의 제조방법 및 이를 이용한박막트랜지스터 기판의 제조방법
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JP2009229893A (ja) * 2008-03-24 2009-10-08 Hoya Corp 多階調フォトマスクの製造方法及びパターン転写方法
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JP5215019B2 (ja) * 2008-03-28 2013-06-19 Ｈｏｙａ株式会社 多階調フォトマスク及びその製造方法、並びにパターン転写方法
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TWI502623B (zh) * 2010-01-07 2015-10-01 Ｈｏｙａ股份有限公司 光罩之製造方法、光罩、及顯示裝置之製造方法
JP2012008546A (ja) * 2010-05-24 2012-01-12 Hoya Corp 多階調フォトマスクの製造方法、及びパターン転写方法
JP2012008545A (ja) * 2010-05-24 2012-01-12 Hoya Corp 多階調フォトマスクの製造方法、及びパターン転写方法

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TWI512391B (zh) 2015-12-11
CN110147029B (zh) 2022-06-07
CN110147029A (zh) 2019-08-20
CN105892226A (zh) 2016-08-24
CN103728832B (zh) 2017-07-14
CN103728832A (zh) 2014-04-16
TW201415160A (zh) 2014-04-16
CN105892226B (zh) 2019-08-02
JP6157832B2 (ja) 2017-07-05
KR20140047534A (ko) 2014-04-22
JP2014081409A (ja) 2014-05-08

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