TWI507573B - 剝除氮化物塗膜之方法 - Google Patents
剝除氮化物塗膜之方法 Download PDFInfo
- Publication number
- TWI507573B TWI507573B TW100111921A TW100111921A TWI507573B TW I507573 B TWI507573 B TW I507573B TW 100111921 A TW100111921 A TW 100111921A TW 100111921 A TW100111921 A TW 100111921A TW I507573 B TWI507573 B TW I507573B
- Authority
- TW
- Taiwan
- Prior art keywords
- coating
- release coating
- intermediate layer
- mold
- stripping
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title claims description 104
- 238000000034 method Methods 0.000 title claims description 55
- 150000004767 nitrides Chemical class 0.000 title claims description 24
- 239000011248 coating agent Substances 0.000 claims description 88
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 30
- 239000011521 glass Substances 0.000 claims description 29
- 229910010037 TiAlN Inorganic materials 0.000 claims description 27
- 229910052751 metal Inorganic materials 0.000 claims description 26
- 239000002184 metal Substances 0.000 claims description 26
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 18
- 239000000243 solution Substances 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 14
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 10
- 239000008151 electrolyte solution Substances 0.000 claims description 9
- 229910000623 nickel–chromium alloy Inorganic materials 0.000 claims description 9
- 229910010038 TiAl Inorganic materials 0.000 claims description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 7
- 238000005260 corrosion Methods 0.000 claims description 6
- 230000007797 corrosion Effects 0.000 claims description 6
- 230000002441 reversible effect Effects 0.000 claims description 6
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 239000010936 titanium Substances 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 239000011651 chromium Substances 0.000 claims description 4
- 239000000356 contaminant Substances 0.000 claims description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 238000005498 polishing Methods 0.000 claims description 3
- 238000005507 spraying Methods 0.000 claims description 3
- 238000009834 vaporization Methods 0.000 claims description 3
- 230000008016 vaporization Effects 0.000 claims description 3
- 229910000851 Alloy steel Inorganic materials 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims description 2
- 239000012736 aqueous medium Substances 0.000 claims description 2
- 239000000788 chromium alloy Substances 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 238000009792 diffusion process Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 31
- 239000003792 electrolyte Substances 0.000 description 21
- 239000000126 substance Substances 0.000 description 10
- 230000008569 process Effects 0.000 description 9
- 238000011282 treatment Methods 0.000 description 9
- 238000005382 thermal cycling Methods 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- 238000005240 physical vapour deposition Methods 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 239000002344 surface layer Substances 0.000 description 6
- 238000004090 dissolution Methods 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 238000003486 chemical etching Methods 0.000 description 4
- 238000000635 electron micrograph Methods 0.000 description 4
- 229910000816 inconels 718 Inorganic materials 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 239000012670 alkaline solution Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 229910001120 nichrome Inorganic materials 0.000 description 3
- 230000002035 prolonged effect Effects 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002848 electrochemical method Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 229910001092 metal group alloy Inorganic materials 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 230000027756 respiratory electron transport chain Effects 0.000 description 2
- 238000010301 surface-oxidation reaction Methods 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000005358 alkali aluminosilicate glass Substances 0.000 description 1
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 238000013034 coating degradation Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000012864 cross contamination Methods 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000009970 fire resistant effect Effects 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000005300 metallic glass Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000005555 metalworking Methods 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 238000013341 scale-up Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000006276 transfer reaction Methods 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 201000008827 tuberculosis Diseases 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F1/00—Electrolytic cleaning, degreasing, pickling or descaling
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F5/00—Electrolytic stripping of metallic layers or coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Physical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US32452610P | 2010-04-15 | 2010-04-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201207163A TW201207163A (en) | 2012-02-16 |
| TWI507573B true TWI507573B (zh) | 2015-11-11 |
Family
ID=44788541
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW100111921A TWI507573B (zh) | 2010-04-15 | 2011-04-07 | 剝除氮化物塗膜之方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9903040B2 (https=) |
| EP (1) | EP2558621B1 (https=) |
| JP (1) | JP5997133B2 (https=) |
| KR (1) | KR101770012B1 (https=) |
| TW (1) | TWI507573B (https=) |
| WO (1) | WO2011130135A2 (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8887532B2 (en) | 2010-08-24 | 2014-11-18 | Corning Incorporated | Glass-forming tools and methods |
| US20130125590A1 (en) * | 2011-11-23 | 2013-05-23 | Jiangwei Feng | Reconditioning glass-forming molds |
| KR20170004970A (ko) * | 2014-03-18 | 2017-01-11 | 플라티트 아게 | 스틸과 초경합금 기판에서 세라믹 하드 물질층의 디코팅 방법 |
| TW201739704A (zh) * | 2016-01-20 | 2017-11-16 | 康寧公司 | 塑形玻璃基材料之具高溫用途之塗層之模具 |
| JP7358238B2 (ja) | 2016-07-13 | 2023-10-10 | イオントラ インコーポレイテッド | 電気化学的方法、装置及び組成物 |
| CN107815638B (zh) * | 2017-11-07 | 2019-07-12 | 福建工程学院 | 一种含有多层结构的AlTiCrCN纳米硬质涂层及其制备方法 |
| WO2020039011A1 (en) * | 2018-08-21 | 2020-02-27 | Oerlikon Surface Solutions Ag, Pfäffikon | Stripping of coatings al-containing coatings |
| CN111621841B (zh) * | 2020-05-21 | 2022-05-10 | 南京理工大学 | 一种基于TiAl单晶EBSD样品的电解抛光液及其电解方法 |
| CN112008501B (zh) * | 2020-08-14 | 2021-10-29 | 苏州珂玛材料科技股份有限公司 | 一种提高氮化铝陶瓷磨削表面平面度的方法 |
| CN113073293B (zh) * | 2021-03-11 | 2023-01-03 | 南通大学 | 一种改善e690钢摩擦学性能的结构及方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW591125B (en) * | 1998-02-13 | 2004-06-11 | Mitsubishi Heavy Ind Ltd | Method and apparatus for removing Ti-derived film |
| US20070186589A1 (en) * | 2006-02-10 | 2007-08-16 | Ether Precision, Inc. | Mold for press-molding glass elements |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3554881A (en) * | 1966-04-23 | 1971-01-12 | Roberto Piontelli | Electrochemical process for the surface treatment of titanium,alloys thereof and other analogous metals |
| US4747864A (en) * | 1986-06-19 | 1988-05-31 | Corning Glass Works | Process for the precision molding of glass articles |
| DD295879A5 (de) * | 1988-03-31 | 1991-11-14 | Rathenower Optische Werke Gmbh,De | Verfahren zum abloesen von titancarbid- und titannitridschichten |
| JPH059743A (ja) * | 1991-06-27 | 1993-01-19 | Aichi Steel Works Ltd | ＡｌおよびＡｌ合金への無電解Ｎｉめつき方法 |
| JP3320965B2 (ja) * | 1995-03-29 | 2002-09-03 | エムエムシーコベルコツール株式会社 | 硬質膜の剥離方法および該方法によって得られる再被覆部材 |
| JP3678295B2 (ja) * | 1995-04-27 | 2005-08-03 | 日立金属株式会社 | 鋼材の表面清浄化方法および鋼材 |
| JPH09301722A (ja) * | 1996-05-14 | 1997-11-25 | Fuji Photo Optical Co Ltd | 離型膜形成方法 |
| JP2000044259A (ja) * | 1998-07-22 | 2000-02-15 | Olympus Optical Co Ltd | 光学素子成形方法 |
| JP2000319028A (ja) * | 1999-04-30 | 2000-11-21 | Canon Inc | ガラス光学素子プレス成形用型の再生方法 |
| JP2004035359A (ja) * | 2002-07-05 | 2004-02-05 | Pentax Corp | 光学素子成形型保護膜の再生方法 |
| US6969457B2 (en) * | 2002-10-21 | 2005-11-29 | General Electric Company | Method for partially stripping a coating from the surface of a substrate, and related articles and compositions |
| US7077918B2 (en) | 2004-01-29 | 2006-07-18 | Unaxis Balzers Ltd. | Stripping apparatus and method for removal of coatings on metal surfaces |
| JP4905131B2 (ja) * | 2004-05-27 | 2012-03-28 | コニカミノルタオプト株式会社 | 光学素子形成用成形型並びにその製造方法及び再生方法 |
| WO2005121038A2 (en) * | 2004-06-07 | 2005-12-22 | Colorado School Of Mines | Coating for glass molding dies and forming tools |
| JP4463656B2 (ja) * | 2004-10-15 | 2010-05-19 | 住友重機械工業株式会社 | 成形用金型の再生方法 |
| JP4403286B2 (ja) * | 2005-03-15 | 2010-01-27 | 株式会社片桐製作所 | 超硬合金工具材料、およびその製造方法 |
| US20060226025A1 (en) * | 2005-03-16 | 2006-10-12 | Colorado School Of Mines | Electrochemical removal of die coatings |
| JP4652446B2 (ja) | 2006-04-10 | 2011-03-16 | オーエスジー株式会社 | 硬質被膜の脱膜方法 |
| US8361290B2 (en) * | 2006-09-05 | 2013-01-29 | Oerlikon Trading, Ag, Trubbach | Coating removal installation and method of operating it |
-
2011
- 2011-04-07 TW TW100111921A patent/TWI507573B/zh not_active IP Right Cessation
- 2011-04-11 KR KR1020127029640A patent/KR101770012B1/ko not_active Expired - Fee Related
- 2011-04-11 JP JP2013504967A patent/JP5997133B2/ja not_active Expired - Fee Related
- 2011-04-11 WO PCT/US2011/031874 patent/WO2011130135A2/en not_active Ceased
- 2011-04-11 EP EP11715816.2A patent/EP2558621B1/en not_active Not-in-force
- 2011-04-12 US US13/084,802 patent/US9903040B2/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW591125B (en) * | 1998-02-13 | 2004-06-11 | Mitsubishi Heavy Ind Ltd | Method and apparatus for removing Ti-derived film |
| US20070186589A1 (en) * | 2006-02-10 | 2007-08-16 | Ether Precision, Inc. | Mold for press-molding glass elements |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2011130135A3 (en) | 2012-12-27 |
| EP2558621B1 (en) | 2017-06-14 |
| KR101770012B1 (ko) | 2017-08-21 |
| WO2011130135A2 (en) | 2011-10-20 |
| JP5997133B2 (ja) | 2016-09-28 |
| JP2013527317A (ja) | 2013-06-27 |
| US9903040B2 (en) | 2018-02-27 |
| KR20130051445A (ko) | 2013-05-20 |
| TW201207163A (en) | 2012-02-16 |
| EP2558621A2 (en) | 2013-02-20 |
| US20110256807A1 (en) | 2011-10-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |