JP5997133B2 - 窒化物被覆を剥離する方法 - Google Patents
窒化物被覆を剥離する方法 Download PDFInfo
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- JP5997133B2 JP5997133B2 JP2013504967A JP2013504967A JP5997133B2 JP 5997133 B2 JP5997133 B2 JP 5997133B2 JP 2013504967 A JP2013504967 A JP 2013504967A JP 2013504967 A JP2013504967 A JP 2013504967A JP 5997133 B2 JP5997133 B2 JP 5997133B2
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- release coating
- coating
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- stripping
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- 238000000576 coating method Methods 0.000 title claims description 104
- 239000011248 coating agent Substances 0.000 title claims description 86
- 238000000034 method Methods 0.000 title claims description 54
- 150000004767 nitrides Chemical class 0.000 title claims description 23
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 33
- 229910010037 TiAlN Inorganic materials 0.000 claims description 27
- 229910052751 metal Inorganic materials 0.000 claims description 23
- 239000002184 metal Substances 0.000 claims description 23
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 21
- 239000000243 solution Substances 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 10
- 239000003792 electrolyte Substances 0.000 claims description 9
- 229910000623 nickel–chromium alloy Inorganic materials 0.000 claims description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 8
- 239000008151 electrolyte solution Substances 0.000 claims description 8
- 229910010038 TiAl Inorganic materials 0.000 claims description 6
- 239000007864 aqueous solution Substances 0.000 claims description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 239000011651 chromium Substances 0.000 claims description 4
- 239000000356 contaminant Substances 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims description 3
- 238000009792 diffusion process Methods 0.000 claims description 3
- 238000005498 polishing Methods 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims description 2
- 238000004544 sputter deposition Methods 0.000 claims 2
- 238000007740 vapor deposition Methods 0.000 claims 1
- 239000011521 glass Substances 0.000 description 28
- 239000010410 layer Substances 0.000 description 25
- 230000008569 process Effects 0.000 description 11
- 239000000126 substance Substances 0.000 description 10
- 229910045601 alloy Inorganic materials 0.000 description 8
- 239000000956 alloy Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- 230000006378 damage Effects 0.000 description 6
- 238000000635 electron micrograph Methods 0.000 description 6
- 239000011229 interlayer Substances 0.000 description 6
- 238000000465 moulding Methods 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 238000005240 physical vapour deposition Methods 0.000 description 5
- 238000005382 thermal cycling Methods 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 238000003486 chemical etching Methods 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 229910000816 inconels 718 Inorganic materials 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000002344 surface layer Substances 0.000 description 4
- 239000012670 alkaline solution Substances 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 239000007900 aqueous suspension Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000002848 electrochemical method Methods 0.000 description 2
- 238000004299 exfoliation Methods 0.000 description 2
- 238000007496 glass forming Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 230000027756 respiratory electron transport chain Effects 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 230000002730 additional effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000005358 alkali aluminosilicate glass Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 238000013034 coating degradation Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 230000009970 fire resistant effect Effects 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 229910000753 refractory alloy Inorganic materials 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000006276 transfer reaction Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F1/00—Electrolytic cleaning, degreasing, pickling or descaling
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F5/00—Electrolytic stripping of metallic layers or coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Physical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Description
52 電解質
54 加工物
54a TiAlN離型被覆
56 対電極
58 電源
60 超音波振動子
Claims (12)
- 金属加工物から部分酸化した窒化物離型被覆を剥離する方法であって、
前記離型被覆上の表面酸化層を破壊して、該離型被覆の導電率を増加させる工程、および
前記離型被覆上の表面酸化層を破壊して、前記離型被覆の導電率を増加させる工程に続けて、前記加工物、離型被覆および対電極がアルカリ性電解質水溶液中に浸漬されている間に、該加工物および離型被覆から該対電極に電流を流す工程、
を有してなる方法。 - 前記離型被覆が、TiN、TiAlN、CrN、TiAlCrN、TiAlSiNおよびAlNからなる群より選択される1種類以上の窒化物から実質的になることを特徴とする請求項1記載の方法。
- 前記離型被覆が、蒸着またはスパッタリングにより堆積されたTiAlN被覆であり、前記加工物がニッケル・クロム合金からなることを特徴とする請求項1記載の方法。
- 前記アルカリ性電解質水溶液が、水酸化カリウムおよび水酸化ナトリウムからなる群より選択される化合物を少なくとも1種類含むことを特徴とする請求項1から3いずれか1項記載の方法。
- 前記表面酸化層を破壊する工程が、前記層を少なくともある程度溶解させるのに十分な時間に亘り、前記離型被覆上の前記表面酸化層を、電圧を印加せずに濃縮されたアルカリ金属水酸化物の水溶液に暴露する工程を含むことを特徴とする請求項1から3いずれか1項記載の方法。
- 前記濃縮されたアルカリ金属水酸化物の水溶液が、水酸化カリウムおよび水酸化ナトリウムからなる群から選択されることを特徴とする請求項5記載の方法。
- 前記表面酸化層を破壊する工程が、前記離型被覆の表面を、電圧を印加せずに研磨して、そこから酸化材料を少なくともある程度除去する工程を含むことを特徴とする請求項1から3いずれか1項記載の方法。
- 前記表面酸化層を破壊する工程が、前記金属加工物がアルカリ性電解質水溶液中に浸漬されている間に前記離型被覆を横切って高電圧パルスを印加する工程を含むことを特徴とする請求項1から3いずれか1項記載の方法。
- 前記アルカリ性電解質水溶液が、水酸化カリウムおよび水酸化ナトリウムからなる群から選択されることを特徴とする請求項8記載の方法。
- 前記加工物が、前記離型被覆と該加工物との間に配置された中間層を含み、前記方法が、前記中間層の少なくとも一部分を除去する工程をさらに含み、前記中間層が、蒸着またはスパッタリングにより堆積されたTiAl、Ti、またはAl中間層であることを特徴とする請求項1から3いずれか1項記載の方法。
- 前記中間層が、鉄、ニッケルおよびクロムからなる群より選択される拡散金属混入物を少なくとも1つ含有することを特徴とする請求項10記載の方法。
- 前記中間層の少なくとも一部分を除去する工程が、前記中間層を溶解させるのに十分な時間に亘り前記加工物に反対の極性の電流パルスを流すまたは前記中間層を研磨する工程を含むことを特徴とする請求項10記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US32452610P | 2010-04-15 | 2010-04-15 | |
US61/324,526 | 2010-04-15 | ||
PCT/US2011/031874 WO2011130135A2 (en) | 2010-04-15 | 2011-04-11 | Method for stripping nitride coatings |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2013527317A JP2013527317A (ja) | 2013-06-27 |
JP2013527317A5 JP2013527317A5 (ja) | 2014-05-29 |
JP5997133B2 true JP5997133B2 (ja) | 2016-09-28 |
Family
ID=44788541
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013504967A Expired - Fee Related JP5997133B2 (ja) | 2010-04-15 | 2011-04-11 | 窒化物被覆を剥離する方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9903040B2 (ja) |
EP (1) | EP2558621B1 (ja) |
JP (1) | JP5997133B2 (ja) |
KR (1) | KR101770012B1 (ja) |
TW (1) | TWI507573B (ja) |
WO (1) | WO2011130135A2 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8887532B2 (en) * | 2010-08-24 | 2014-11-18 | Corning Incorporated | Glass-forming tools and methods |
US20130125590A1 (en) * | 2011-11-23 | 2013-05-23 | Jiangwei Feng | Reconditioning glass-forming molds |
WO2015139731A1 (de) * | 2014-03-18 | 2015-09-24 | Platit Ag | Verfahren zum entschichten von keramischen hartstoffschichten von stahl- und hartmetall-substraten |
TW201739704A (zh) * | 2016-01-20 | 2017-11-16 | 康寧公司 | 塑形玻璃基材料之具高溫用途之塗層之模具 |
TWI658506B (zh) * | 2016-07-13 | 2019-05-01 | 美商英奧創公司 | 電化學方法、元件及組成 |
CN107815638B (zh) * | 2017-11-07 | 2019-07-12 | 福建工程学院 | 一种含有多层结构的AlTiCrCN纳米硬质涂层及其制备方法 |
US11377745B2 (en) | 2018-08-21 | 2022-07-05 | Oerlikon Surface Solutions Ag, Pfäffikon | Stripping of coatings Al-containing coatings |
CN111621841B (zh) * | 2020-05-21 | 2022-05-10 | 南京理工大学 | 一种基于TiAl单晶EBSD样品的电解抛光液及其电解方法 |
CN112008501B (zh) * | 2020-08-14 | 2021-10-29 | 苏州珂玛材料科技股份有限公司 | 一种提高氮化铝陶瓷磨削表面平面度的方法 |
CN113073293B (zh) * | 2021-03-11 | 2023-01-03 | 南通大学 | 一种改善e690钢摩擦学性能的结构及方法 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
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US3554881A (en) * | 1966-04-23 | 1971-01-12 | Roberto Piontelli | Electrochemical process for the surface treatment of titanium,alloys thereof and other analogous metals |
US4747864A (en) * | 1986-06-19 | 1988-05-31 | Corning Glass Works | Process for the precision molding of glass articles |
DD295879A5 (de) * | 1988-03-31 | 1991-11-14 | Rathenower Optische Werke Gmbh,De | Verfahren zum abloesen von titancarbid- und titannitridschichten |
JPH059743A (ja) * | 1991-06-27 | 1993-01-19 | Aichi Steel Works Ltd | AlおよびAl合金への無電解Niめつき方法 |
JP3320965B2 (ja) * | 1995-03-29 | 2002-09-03 | エムエムシーコベルコツール株式会社 | 硬質膜の剥離方法および該方法によって得られる再被覆部材 |
JP3678295B2 (ja) * | 1995-04-27 | 2005-08-03 | 日立金属株式会社 | 鋼材の表面清浄化方法および鋼材 |
JPH09301722A (ja) * | 1996-05-14 | 1997-11-25 | Fuji Photo Optical Co Ltd | 離型膜形成方法 |
TW591125B (en) * | 1998-02-13 | 2004-06-11 | Mitsubishi Heavy Ind Ltd | Method and apparatus for removing Ti-derived film |
JP2000044259A (ja) * | 1998-07-22 | 2000-02-15 | Olympus Optical Co Ltd | 光学素子成形方法 |
JP2000319028A (ja) * | 1999-04-30 | 2000-11-21 | Canon Inc | ガラス光学素子プレス成形用型の再生方法 |
JP2004035359A (ja) * | 2002-07-05 | 2004-02-05 | Pentax Corp | 光学素子成形型保護膜の再生方法 |
US6969457B2 (en) | 2002-10-21 | 2005-11-29 | General Electric Company | Method for partially stripping a coating from the surface of a substrate, and related articles and compositions |
US7077918B2 (en) | 2004-01-29 | 2006-07-18 | Unaxis Balzers Ltd. | Stripping apparatus and method for removal of coatings on metal surfaces |
JP4905131B2 (ja) * | 2004-05-27 | 2012-03-28 | コニカミノルタオプト株式会社 | 光学素子形成用成形型並びにその製造方法及び再生方法 |
WO2005121038A2 (en) * | 2004-06-07 | 2005-12-22 | Colorado School Of Mines | Coating for glass molding dies and forming tools |
JP4463656B2 (ja) * | 2004-10-15 | 2010-05-19 | 住友重機械工業株式会社 | 成形用金型の再生方法 |
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US20060226025A1 (en) * | 2005-03-16 | 2006-10-12 | Colorado School Of Mines | Electrochemical removal of die coatings |
US20070186589A1 (en) * | 2006-02-10 | 2007-08-16 | Ether Precision, Inc. | Mold for press-molding glass elements |
DE112006003841B4 (de) | 2006-04-10 | 2015-02-05 | Osg Corp. | Verfahren zur Entfernung eines Hartbeschichtungsfilms |
US8361290B2 (en) * | 2006-09-05 | 2013-01-29 | Oerlikon Trading, Ag, Trubbach | Coating removal installation and method of operating it |
-
2011
- 2011-04-07 TW TW100111921A patent/TWI507573B/zh not_active IP Right Cessation
- 2011-04-11 KR KR1020127029640A patent/KR101770012B1/ko active IP Right Grant
- 2011-04-11 WO PCT/US2011/031874 patent/WO2011130135A2/en active Application Filing
- 2011-04-11 EP EP11715816.2A patent/EP2558621B1/en not_active Not-in-force
- 2011-04-11 JP JP2013504967A patent/JP5997133B2/ja not_active Expired - Fee Related
- 2011-04-12 US US13/084,802 patent/US9903040B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20110256807A1 (en) | 2011-10-20 |
WO2011130135A3 (en) | 2012-12-27 |
EP2558621B1 (en) | 2017-06-14 |
US9903040B2 (en) | 2018-02-27 |
KR20130051445A (ko) | 2013-05-20 |
EP2558621A2 (en) | 2013-02-20 |
TWI507573B (zh) | 2015-11-11 |
TW201207163A (en) | 2012-02-16 |
KR101770012B1 (ko) | 2017-08-21 |
WO2011130135A2 (en) | 2011-10-20 |
JP2013527317A (ja) | 2013-06-27 |
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