TWI499353B - 光罩 - Google Patents

光罩 Download PDF

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Publication number
TWI499353B
TWI499353B TW099116671A TW99116671A TWI499353B TW I499353 B TWI499353 B TW I499353B TW 099116671 A TW099116671 A TW 099116671A TW 99116671 A TW99116671 A TW 99116671A TW I499353 B TWI499353 B TW I499353B
Authority
TW
Taiwan
Prior art keywords
shadow mask
mask portion
tension
frame
screw
Prior art date
Application number
TW099116671A
Other languages
English (en)
Chinese (zh)
Other versions
TW201138537A (en
Inventor
Yuko Kato
Masashi Kikuchi
Kouji Kamesaki
Tomohiko Okayama
Eisuke Hori
Miho Shimizu
Keiko Abe
Keisuke Shimoda
Kenji Etou
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Publication of TW201138537A publication Critical patent/TW201138537A/zh
Application granted granted Critical
Publication of TWI499353B publication Critical patent/TWI499353B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electroluminescent Light Sources (AREA)
  • Chemical Vapour Deposition (AREA)
TW099116671A 2010-04-21 2010-05-25 光罩 TWI499353B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010098118 2010-04-21

Publications (2)

Publication Number Publication Date
TW201138537A TW201138537A (en) 2011-11-01
TWI499353B true TWI499353B (zh) 2015-09-01

Family

ID=44833877

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099116671A TWI499353B (zh) 2010-04-21 2010-05-25 光罩

Country Status (3)

Country Link
JP (1) JP5674767B2 (ja)
TW (1) TWI499353B (ja)
WO (1) WO2011132325A1 (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103165828B (zh) * 2011-12-16 2015-08-26 昆山工研院新型平板显示技术中心有限公司 荫罩及其制备方法
CN103206979B (zh) * 2012-01-11 2017-01-25 昆山允升吉光电科技有限公司 掩模板承载架
WO2013140599A1 (ja) * 2012-03-23 2013-09-26 株式会社島津製作所 成膜用マスク及び成膜装置
TWI440728B (zh) * 2012-09-06 2014-06-11 Au Optronics Corp 可調式固定裝置
JP6028926B2 (ja) * 2013-03-14 2016-11-24 パナソニックＩｐマネジメント株式会社 成膜マスクおよび成膜装置
JP2015069806A (ja) * 2013-09-27 2015-04-13 株式会社ジャパンディスプレイ 有機エレクトロルミネッセンス表示装置の製造方法
JP6310705B2 (ja) * 2014-01-22 2018-04-11 株式会社アルバック 基板保持装置および成膜装置
KR102265206B1 (ko) * 2014-11-27 2021-06-14 엘지디스플레이 주식회사 화학기상 증착용 마스크
KR102618351B1 (ko) * 2016-07-19 2023-12-28 삼성디스플레이 주식회사 패턴위치조정기구가 구비된 마스크 프레임 조립체 및 그것을 이용한 패턴 위치 조정 방법
JP7233954B2 (ja) * 2019-02-19 2023-03-07 株式会社ジャパンディスプレイ 蒸着マスク

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003068456A (ja) * 2001-08-29 2003-03-07 Dainippon Printing Co Ltd 有機ｅｌ素子製造に用いる真空蒸着用金属マスク
JP2005281821A (ja) * 2004-03-30 2005-10-13 Tokyo Parts Ind Co Ltd 製膜装置
TW201013305A (en) * 2008-09-01 2010-04-01 Samsung Mobile Display Co Ltd Mask for thin film deposition and method of manufacturing OLED using the same

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03121038U (ja) * 1990-03-23 1991-12-11
JP4590748B2 (ja) * 2001-02-08 2010-12-01 ソニー株式会社 マスク
JP2004006257A (ja) * 2002-04-26 2004-01-08 Tohoku Pioneer Corp 真空蒸着用マスク及びこれを用いて製造された有機ｅｌディスプレイパネル
JP3996439B2 (ja) * 2002-05-16 2007-10-24 大日本印刷株式会社 有機ｅｌ素子製造に用いる真空蒸着用マスク装置
JP4439203B2 (ja) * 2003-05-09 2010-03-24 大日本印刷株式会社 多面付けマスク装置及びその組立方法
JP4860909B2 (ja) * 2004-05-25 2012-01-25 キヤノン株式会社 マスク構造体
JP2006009858A (ja) * 2004-06-23 2006-01-12 Daido Metal Co Ltd 油圧緩衝器
JP4656886B2 (ja) * 2004-07-23 2011-03-23 大日本印刷株式会社 金属薄板の枠貼り方法及び装置
JP3121038U (ja) * 2006-01-23 2006-04-27 大亜真空株式会社 フィルムホルダ

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003068456A (ja) * 2001-08-29 2003-03-07 Dainippon Printing Co Ltd 有機ｅｌ素子製造に用いる真空蒸着用金属マスク
JP2005281821A (ja) * 2004-03-30 2005-10-13 Tokyo Parts Ind Co Ltd 製膜装置
TW201013305A (en) * 2008-09-01 2010-04-01 Samsung Mobile Display Co Ltd Mask for thin film deposition and method of manufacturing OLED using the same

Also Published As

Publication number Publication date
TW201138537A (en) 2011-11-01
WO2011132325A1 (ja) 2011-10-27
JPWO2011132325A1 (ja) 2013-07-18
JP5674767B2 (ja) 2015-02-25

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