TWI491622B - 光可固化之聚合介電質及其製備方法與用途 - Google Patents
光可固化之聚合介電質及其製備方法與用途 Download PDFInfo
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- TWI491622B TWI491622B TW098139975A TW98139975A TWI491622B TW I491622 B TWI491622 B TW I491622B TW 098139975 A TW098139975 A TW 098139975A TW 98139975 A TW98139975 A TW 98139975A TW I491622 B TWI491622 B TW I491622B
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- group
- alkyl
- aryl
- alkenyl
- divalent
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Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
- H10K10/471—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising only organic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F118/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an acyloxy radical of a saturated carboxylic acid, of carbonic acid or of a haloformic acid
- C08F118/02—Esters of monocarboxylic acids
- C08F118/12—Esters of monocarboxylic acids with unsaturated alcohols containing three or more carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F12/02—Monomers containing only one unsaturated aliphatic radical
- C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F12/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
- C08F12/22—Oxygen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
- C08F212/22—Oxygen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/32—Monomers containing only one unsaturated aliphatic radical containing two or more rings
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F216/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
- C08F216/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an alcohol radical
- C08F216/10—Carbocyclic compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
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- C09D125/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Coating compositions based on derivatives of such polymers
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- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/44—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins
- H01B3/447—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins from acrylic compounds
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- C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F12/02—Monomers containing only one unsaturated aliphatic radical
- C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F12/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
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- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
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- Y10T428/00—Stock material or miscellaneous articles
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| JP6161636B2 (ja) * | 2012-02-07 | 2017-07-12 | フレックステラ， インコーポレイテッドＦｌｅｘｔｅｒｒａ， Ｉｎｃ． | 光硬化性高分子材料および関連電子デバイス |
| US9171961B2 (en) | 2012-07-11 | 2015-10-27 | Polyera Corporation | Coating materials for oxide thin film transistors |
| EP3382745A1 (en) * | 2013-06-07 | 2018-10-03 | FUJIFILM Corporation | Composition for forming gate insulating film, organic thin film transistor, electronic paper, and display device |
| KR20160103083A (ko) | 2013-12-24 | 2016-08-31 | 폴리에라 코퍼레이션 | 탈부착형 2차원 플렉서블 전자 기기용 지지 구조물 |
| JP6034326B2 (ja) * | 2014-03-26 | 2016-11-30 | 富士フイルム株式会社 | 半導体素子及び絶縁層形成用組成物 |
| US10261634B2 (en) | 2014-03-27 | 2019-04-16 | Flexterra, Inc. | Infrared touch system for flexible displays |
| WO2015183567A1 (en) | 2014-05-28 | 2015-12-03 | Polyera Corporation | Low power display updates |
| US9606439B2 (en) | 2014-07-15 | 2017-03-28 | Eastman Kodak Company | Forming conductive metal patterns using water-soluble polymers |
| EP3198614B1 (en) * | 2014-09-25 | 2019-02-27 | Basf Se | Ether-based polymers as photo-crosslinkable dielectrics |
| CN107003608B (zh) | 2014-10-24 | 2020-09-25 | 飞利斯有限公司 | 可光图案化组合物及使用其制造晶体管器件的方法 |
| US9761817B2 (en) | 2015-03-13 | 2017-09-12 | Corning Incorporated | Photo-patternable gate dielectrics for OFET |
| US10254795B2 (en) | 2015-05-06 | 2019-04-09 | Flexterra, Inc. | Attachable, flexible display device with flexible tail |
| EP3133065A1 (en) * | 2015-08-21 | 2017-02-22 | Merck Patent GmbH | Compounds for optically active devices |
| WO2017038948A1 (ja) * | 2015-09-02 | 2017-03-09 | 富士フイルム株式会社 | 有機薄膜トランジスタ、有機薄膜トランジスタの製造方法、有機半導体組成物、有機半導体膜および有機半導体膜の製造方法 |
| DE102015119939A1 (de) | 2015-11-18 | 2017-05-18 | ALTANA Aktiengesellschaft | Vernetzbare polymere Materialien für dielektrische Schichten in elektronischen Bauteilen |
| CN105628262A (zh) * | 2015-12-20 | 2016-06-01 | 华南理工大学 | 基于有机弹性体栅绝缘层的薄膜晶体管压力传感器 |
| CN105810819B (zh) * | 2016-05-04 | 2018-09-04 | 国家纳米科学中心 | 一种有机分子螺旋生长薄膜场效应晶体管及其制备方法和应用 |
| JP6801374B2 (ja) * | 2016-10-31 | 2020-12-16 | 東ソー株式会社 | 重合体、絶縁膜及びこれを含む有機電界効果トランジスタデバイス |
| TWI614505B (zh) * | 2017-02-18 | 2018-02-11 | 以紫外光照射提高矽基表面原生氧化層品質之裝置與方法 | |
| WO2018168676A1 (ja) | 2017-03-16 | 2018-09-20 | 東ソー株式会社 | 光架橋性重合体、絶縁膜、平坦化膜、親撥パターニング膜及びこれを含む有機電界効果トランジスタデバイス |
| EP3597673B1 (en) | 2017-03-16 | 2023-06-07 | Tosoh Corporation | Photocrosslinkable polymer, insulating film, planarization film, lyophilic/liquid repellent patterned film, and organic field effect transistor device comprising same |
| CN107621751B (zh) * | 2017-09-21 | 2021-02-09 | 儒芯微电子材料（上海）有限公司 | 含碱性香豆素结构的聚合物树脂及其光刻胶组合物 |
| KR102540663B1 (ko) * | 2021-04-29 | 2023-06-12 | 이화여자대학교 산학협력단 | 병솔 고분자를 포함하는 트랜지스터 게이트절연층용 고분자 박막 및 이를 포함하는 유기전계효과트랜지스터 |
| US20240400736A1 (en) * | 2021-08-30 | 2024-12-05 | Flexterra, Inc. | Colored dielectric polymer materials and devices using them |
| CN113793901B (zh) * | 2021-09-16 | 2023-11-07 | 南京大学 | 一种基于聚合物掺杂n-型有机半导体的并五苯有机场效应晶体管 |
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| EP1958972A1 (en) * | 2007-02-16 | 2008-08-20 | Samsung Electronics Co., Ltd. | Copolymer, organic insulating layer composition, and organic insulating layer and organic thin film transistor manufactured using the same |
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| CN102224611A (zh) | 2011-10-19 |
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| CN103560206B (zh) | 2016-09-28 |
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| US9923158B2 (en) | 2018-03-20 |
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