TWI477839B - - Google Patents
Info
- Publication number
- TWI477839B TWI477839B TW100148828A TW100148828A TWI477839B TW I477839 B TWI477839 B TW I477839B TW 100148828 A TW100148828 A TW 100148828A TW 100148828 A TW100148828 A TW 100148828A TW I477839 B TWI477839 B TW I477839B
- Authority
- TW
- Taiwan
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
- H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
- H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
- H10P76/2041—Photolithographic processes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Lenses (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010619283.XA CN102540419B (zh) | 2010-12-31 | 2010-12-31 | 一种大视场投影光刻物镜 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201235729A TW201235729A (en) | 2012-09-01 |
| TWI477839B true TWI477839B (https=) | 2015-03-21 |
Family
ID=46347698
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW100148828A TW201235729A (en) | 2010-12-31 | 2011-12-27 | Large view field projection lithography objective |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20130293859A1 (https=) |
| EP (1) | EP2660638B1 (https=) |
| JP (1) | JP2014506341A (https=) |
| KR (1) | KR101685655B1 (https=) |
| CN (1) | CN102540419B (https=) |
| TW (1) | TW201235729A (https=) |
| WO (1) | WO2012089002A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6511701B2 (ja) * | 2014-01-22 | 2019-05-15 | リソテック株式会社 | 投影光学系、投影露光装置、及びデバイス製造方法 |
| US10139735B2 (en) | 2014-06-23 | 2018-11-27 | Asml Netherlands B.V. | Lithographic apparatus and method |
| CN105527701B (zh) * | 2014-09-28 | 2018-06-29 | 上海微电子装备（集团）股份有限公司 | 大视场投影光刻物镜 |
| CN113900227B (zh) * | 2021-10-09 | 2022-07-05 | 中国科学院苏州生物医学工程技术研究所 | 一种大视场高分辨宽波段的物镜 |
| JP2024055043A (ja) * | 2022-10-06 | 2024-04-18 | 株式会社エビデント | 対物レンズ |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000199850A (ja) * | 1999-01-07 | 2000-07-18 | Nikon Corp | 投影光学系及び投影露光装置並びにデバイスの製造方法 |
| TW579433B (en) * | 2001-04-27 | 2004-03-11 | Seiko Epson Corp | Projection zoom lens |
| US20060126048A1 (en) * | 2004-11-18 | 2006-06-15 | Yuhei Sumiyoshi | Projection optical system and exposure apparatus having the same |
| CN101231378A (zh) * | 2007-12-21 | 2008-07-30 | 上海微电子装备有限公司 | 一种全折射式投影光学系统 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01262513A (ja) * | 1988-04-13 | 1989-10-19 | Ricoh Co Ltd | 複写用可変焦点レンズ |
| JP3454390B2 (ja) * | 1995-01-06 | 2003-10-06 | 株式会社ニコン | 投影光学系、投影露光装置及び投影露光方法 |
| US5808814A (en) * | 1996-07-18 | 1998-09-15 | Nikon Corporation | Short wavelength projection optical system |
| US5986824A (en) * | 1998-06-04 | 1999-11-16 | Nikon Corporation | Large NA projection lens system with aplanatic lens element for excimer laser lithography |
| US5969803A (en) * | 1998-06-30 | 1999-10-19 | Nikon Corporation | Large NA projection lens for excimer laser lithographic systems |
| DE19905203A1 (de) * | 1999-02-09 | 2000-08-10 | Zeiss Carl Fa | Reduktions-Projektionsobjektiv der Mikrolithographie |
| JP2000356741A (ja) * | 1999-06-14 | 2000-12-26 | Canon Inc | 投影光学系 |
| JP2004012825A (ja) * | 2002-06-07 | 2004-01-15 | Fuji Photo Optical Co Ltd | 投影光学系およびそれを用いた投影露光装置 |
| JP2005109286A (ja) * | 2003-10-01 | 2005-04-21 | Nikon Corp | 投影光学系、露光装置、および露光方法 |
| JP2008527403A (ja) * | 2004-12-30 | 2008-07-24 | カール・ツァイス・エスエムティー・アーゲー | 投影光学系 |
| JP4779394B2 (ja) | 2005-03-23 | 2011-09-28 | 株式会社ニコン | 投影光学系、露光装置、および露光方法 |
| JP4792779B2 (ja) * | 2005-03-29 | 2011-10-12 | 株式会社ニコン | ズームレンズ |
| JP2007079015A (ja) | 2005-09-13 | 2007-03-29 | Nikon Corp | 投影光学系、露光装置及びマイクロデバイスの製造方法 |
| JP5522520B2 (ja) * | 2006-05-05 | 2014-06-18 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 光学レンズ系 |
| KR101428136B1 (ko) * | 2007-08-03 | 2014-08-07 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피용 투사 대물렌즈, 투사 노광 장치, 투사 노광 방법 및 광학 보정 플레이트 |
-
2010
- 2010-12-31 CN CN201010619283.XA patent/CN102540419B/zh active Active
-
2011
- 2011-12-07 EP EP11852300.0A patent/EP2660638B1/en active Active
- 2011-12-07 JP JP2013546574A patent/JP2014506341A/ja active Pending
- 2011-12-07 KR KR1020137018676A patent/KR101685655B1/ko active Active
- 2011-12-07 WO PCT/CN2011/083616 patent/WO2012089002A1/zh not_active Ceased
- 2011-12-07 US US13/976,353 patent/US20130293859A1/en not_active Abandoned
- 2011-12-27 TW TW100148828A patent/TW201235729A/zh unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000199850A (ja) * | 1999-01-07 | 2000-07-18 | Nikon Corp | 投影光学系及び投影露光装置並びにデバイスの製造方法 |
| TW579433B (en) * | 2001-04-27 | 2004-03-11 | Seiko Epson Corp | Projection zoom lens |
| US20060126048A1 (en) * | 2004-11-18 | 2006-06-15 | Yuhei Sumiyoshi | Projection optical system and exposure apparatus having the same |
| CN101231378A (zh) * | 2007-12-21 | 2008-07-30 | 上海微电子装备有限公司 | 一种全折射式投影光学系统 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2660638B1 (en) | 2015-12-02 |
| CN102540419A (zh) | 2012-07-04 |
| KR101685655B1 (ko) | 2016-12-12 |
| KR20130141643A (ko) | 2013-12-26 |
| TW201235729A (en) | 2012-09-01 |
| CN102540419B (zh) | 2014-01-22 |
| JP2014506341A (ja) | 2014-03-13 |
| EP2660638A4 (en) | 2014-06-25 |
| US20130293859A1 (en) | 2013-11-07 |
| WO2012089002A1 (zh) | 2012-07-05 |
| EP2660638A1 (en) | 2013-11-06 |