TWI477466B - 玻璃薄形化系統 - Google Patents

玻璃薄形化系統 Download PDF

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Publication number
TWI477466B
TWI477466B TW100139973A TW100139973A TWI477466B TW I477466 B TWI477466 B TW I477466B TW 100139973 A TW100139973 A TW 100139973A TW 100139973 A TW100139973 A TW 100139973A TW I477466 B TWI477466 B TW I477466B
Authority
TW
Taiwan
Prior art keywords
glass
etching
chamber
storage tank
cleaning
Prior art date
Application number
TW100139973A
Other languages
English (en)
Chinese (zh)
Other versions
TW201302647A (zh
Inventor
Seung-Il Chang
Bo-Soong Yoon
Jong-Choon Choi
Sang-Uook Lee
Byeong-Pil Lee
Original Assignee
M M Tech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by M M Tech Co Ltd filed Critical M M Tech Co Ltd
Publication of TW201302647A publication Critical patent/TW201302647A/zh
Application granted granted Critical
Publication of TWI477466B publication Critical patent/TWI477466B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133302—Rigid substrates, e.g. inorganic substrates

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
TW100139973A 2011-07-08 2011-11-02 玻璃薄形化系統 TWI477466B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020110067633A KR101277161B1 (ko) 2011-07-08 2011-07-08 글라스 박형화 시스템

Publications (2)

Publication Number Publication Date
TW201302647A TW201302647A (zh) 2013-01-16
TWI477466B true TWI477466B (zh) 2015-03-21

Family

ID=47442328

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100139973A TWI477466B (zh) 2011-07-08 2011-11-02 玻璃薄形化系統

Country Status (3)

Country Link
KR (1) KR101277161B1 (ko)
CN (1) CN102863153B (ko)
TW (1) TWI477466B (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101665537B1 (ko) * 2015-03-05 2016-10-13 주식회사엠시스 유리기판용 식각 시스템 및 이를 이용한 식각방법
CN110357445B (zh) * 2019-08-23 2024-02-09 泰兴美视智能光电有限公司 一种柔性电子玻璃基板的制备装置及基于其的制备方法
CN111453998B (zh) * 2020-05-25 2022-07-12 福建和达玻璃技术有限公司 高效率玻璃机壳金属质感表面处理设备及方法
CN115159820B (zh) * 2022-07-12 2024-03-05 河北视窗玻璃有限公司 一种玻璃插片冷弯装置及其使用方法
CN116375353B (zh) * 2023-04-04 2023-10-20 惠州吉祥达机械设备有限公司 一种玻璃液抛装置及生产线

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6551443B2 (en) * 2000-12-30 2003-04-22 Lg.Philips Lcd Co., Ltd. Apparatus for etching glass substrate in fabrication of LCD
TW200932695A (en) * 2008-01-09 2009-08-01 Econy Co Ltd An apparatus for etching a glass wafer, and a glass sheet manufactured by the same
WO2009107332A1 (ja) * 2008-02-29 2009-09-03 三洋電機株式会社 排水処理装置および排水処理方法
CN101255012B (zh) * 2007-02-27 2010-08-18 睿明科技股份有限公司 Tft lcd玻璃基板的蚀刻装置及其蚀刻方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3194245B2 (ja) * 1996-12-26 2001-07-30 松下電器産業株式会社 非晶質シリコン層を形成された基板の処理方法
JP4071220B2 (ja) * 2004-03-17 2008-04-02 西山ステンレスケミカル株式会社 ガラス基板の製造方法
ATE388149T1 (de) 2004-10-14 2008-03-15 Hoffmann La Roche Neue azaindol-thiazolinone als krebsmittel
KR100835745B1 (ko) * 2006-12-29 2008-06-09 최찬규 하향식 유리 박형화 방법
KR20090070792A (ko) * 2007-12-27 2009-07-01 주식회사 디에스티 유리기판의 식각장치
JP2011071385A (ja) 2009-09-28 2011-04-07 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6551443B2 (en) * 2000-12-30 2003-04-22 Lg.Philips Lcd Co., Ltd. Apparatus for etching glass substrate in fabrication of LCD
CN101255012B (zh) * 2007-02-27 2010-08-18 睿明科技股份有限公司 Tft lcd玻璃基板的蚀刻装置及其蚀刻方法
TW200932695A (en) * 2008-01-09 2009-08-01 Econy Co Ltd An apparatus for etching a glass wafer, and a glass sheet manufactured by the same
WO2009107332A1 (ja) * 2008-02-29 2009-09-03 三洋電機株式会社 排水処理装置および排水処理方法

Also Published As

Publication number Publication date
KR101277161B1 (ko) 2013-06-20
CN102863153A (zh) 2013-01-09
TW201302647A (zh) 2013-01-16
CN102863153B (zh) 2015-09-02
KR20130005929A (ko) 2013-01-16

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