TWI472404B - 2-axis drive mechanism and wafer bonding machine - Google Patents

2-axis drive mechanism and wafer bonding machine Download PDF

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TWI472404B
TWI472404B TW100131259A TW100131259A TWI472404B TW I472404 B TWI472404 B TW I472404B TW 100131259 A TW100131259 A TW 100131259A TW 100131259 A TW100131259 A TW 100131259A TW I472404 B TWI472404 B TW I472404B
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wafer
axis
movable portion
bonding machine
drive mechanism
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TW201302379A (zh
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Koji Hosaka
shingo Fukasawa
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Hitachi High Tech Instr Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67132Apparatus for placing on an insulating substrate, e.g. tape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
    • H01L24/75Apparatus for connecting with bump connectors or layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67144Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67721Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/75Apparatus for connecting with bump connectors or layer connectors
    • H01L2224/7565Means for transporting the components to be connected
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/75Apparatus for connecting with bump connectors or layer connectors
    • H01L2224/758Means for moving parts
    • H01L2224/75821Upper part of the bonding apparatus, i.e. bonding head
    • H01L2224/75824Translational mechanism
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8319Arrangement of the layer connectors prior to mounting
    • H01L2224/83192Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on another item or body to be connected to the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/17Surface bonding means and/or assemblymeans with work feeding or handling means
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/17Surface bonding means and/or assemblymeans with work feeding or handling means
    • Y10T156/1798Surface bonding means and/or assemblymeans with work feeding or handling means with liquid adhesive or adhesive activator applying means

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Die Bonding (AREA)

Description

2軸驅動機構及晶片黏著機
本發明,是有關包含昇降軸的2軸驅動機構及晶片黏著機,特別是有關於謀求包含昇降軸的2軸驅動機構也就是黏著頭的高速化且生產性高的晶片黏著機。
在半導體製造裝置之中具有將半導體晶片黏著在導線架等的基板上的晶片黏著機。在晶片黏著機中,由黏著頭將晶片真空吸附、高速上昇、水平移動、下降而貼裝在基板。該情況,是由昇降(Z)驅動軸進行上昇、下降。
最近,要求晶片黏著機的高精度、高速化,特別是要求黏著的心臟部也就是黏著頭的高速化。
可符合此要求的技術如專利文獻1。一般將裝置高速化的話,由高速移動物體所產生的振動會變大,因為此振動會使裝置欲獲得目的的精度成為困難。在專利文獻1中,由反動吸收裝置減少此振動,來維持精度並達成高速化。
[先行技術文獻] [專利文獻]
[專利文獻1]日本特開2004-263825號公報
但是使用如專利文獻1的滾珠螺桿的伺服馬達驅動的話,具有高速化的上限。在此,檢討由適合高速化的線性馬達進行驅動。只是採用線性馬達驅動的話,如第7圖所示,Z軸驅動的Z軸線性馬達的定子及可動子皆會成為水平方向例如後述Y方向的Y驅動軸的負荷。加大Y驅動軸的扭矩的話消耗電力會變大,減小Z軸驅動的線性馬達的定子及可動子的重量的話,Z軸的扭矩變小而無法實現預定的高速化。
因此,本發明的目的,是提供一種包含不需加大水平驅動軸的扭矩就可實現昇降軸的高速化Z軸的2軸驅動機構及使用其的晶片黏著機。
本發明,為了達成上述的目的,至少具有以下的特徵。
本發明的第1特徵,是具有:處理部;及第1線性馬達,是設有供將前述處理部沿著第1線性導引昇降用的第1可動部及第1固定部;及第2線性馬達,是設有供將前述處理部朝與前述昇降的方向垂直的水平方向移動用的第2可動部及第2固定部;及連結部,是將前述第1可動部透過前述第1線性導引連結,將前述第2可動部直接或間接地連結;及第2線性導引,是使前述第1可動部、前述第2可動部及前述連結部成為一體地朝前述水平方向移動的;及支撐體,是將前述第1固定部及前述第2固定部在前述水平方向由預定的長度彼此平行地固定。
且本發明的第2特徵,是前述第1可動部及前述第2可動部是彼此平行或垂直地設置。
進一步,本發明的第3特徵,是將前述第2線性導引設在被設於前述第2固定部下部的前述支撐體。
且本發明的第4特徵,是將前述第2線性導引設在前述連結部的上部的前述支撐體。
進一步,本發明的第5特徵,是在前述第1可動部且在前述昇降的方向使N極、S極交互地複數組設置的電磁鐵,是被設在前述水平方向的預定領域。
且本發明的第6特徵,是在前述第1固定部或第2固定部及前述連結部之間設有第3線性導引。
進一步,本發明的第7特徵,是藉由如第1至第6特徵的2軸驅動機構的前述處理部處理基板。
且本發明的第8特徵,是前述處理部是將晶片從晶圓拾取並黏著在基板的黏著頭、或將晶片黏著劑塗抹於前述基板的針。
進一步,本發明的第9特徵,是如第5特徵的前述預定領域,是前述拾取的領域及前述黏著的領域。
且本發明的第10特徵,是將使前述處理部以前述昇降的方向作為旋轉軸旋轉的旋轉手段設在前述第1可動部。
依據本發明,可以提供一種不需加大水平驅動軸的扭矩就可實現昇降軸的高速化的包含Z軸的2軸驅動機構及使用其的晶片黏著機。
以下,依據圖面,說明本發明的實施例。
第1圖,是將本發明的一實施例的晶片黏著機10從上所見的概念圖。晶片黏著機是大致具有:晶圓供給部1、及工件供給‧搬運部2、及晶片黏著部3。
晶圓供給部1,是具有晶圓卡匣昇降機11及拾取裝置12。晶圓卡匣昇降機11是具有晶圓環被充填的晶圓卡匣(無圖示),並依序將晶圓環供給至拾取裝置12。拾取裝置12,是將晶圓環移動,使可以將所期的晶片從晶圓環拾取。
工件供給‧搬運部2是具有:堆疊裝載器21、及框進給機22、及卸載器23,將工件(導線架等的基板)朝箭頭方向搬運。堆疊裝載器21,是將黏著了晶片的工件供給至框進給機22。框進給機22,是將工件透過框進給機22上的2處的處理位置朝卸載器23搬運。卸載器23,是保管被搬運的工件。
晶片黏著部3是具有預製部(晶片膠塗抹裝置)31及黏著頭部32。預製部31是在藉由框進給機22被搬運來的工件例如導線架上由針塗抹晶片黏著劑。黏著頭部32,是從拾取裝置12將晶片拾取並上昇,將晶片移動直到框進給機22上的黏著點為止。且,黏著頭部32是將晶片下降至黏著點,將晶片黏著於被塗抹了晶片黏著劑的工件上。
黏著頭部32,是具有:將黏著頭35(第2圖參照)朝Z(高度)方向昇降並朝Y方向移動的ZY驅動軸60、及朝X方向移動的X驅動軸70。ZY驅動軸60,是具有:朝Y方向即將黏著頭與晶圓環支架12內的拾取位置及黏著點之間往復的Y驅動軸40、及為了將晶片從晶圓拾取或使黏著在基板地昇降的Z驅動軸50。X驅動軸70,是將ZY驅動軸60整體朝將工件搬運的方向也就是X方向移動。X驅動軸70,是由伺服馬達驅動滾珠螺桿的構成也可以,由ZY驅動軸60即線性馬達驅動也可以。
以下,使用圖式說明本發明的特徵也就是ZY驅動軸60的實施例。第2圖、第3圖是顯示第1實施例的ZY驅動軸60A的基本構成的圖。第2圖,是ZY驅動軸60A的黏著頭35存在的第1圖所示的位置的A-A剖面圖。第3圖,是將第2圖所示的ZY驅動軸60A從B的方向所見的箭頭視圖。
第1實施例的ZY驅動軸60A,是具有:Y驅動軸40、及Z驅動軸50、及將Y驅動軸40的Y軸可動部41及Z驅動軸50的X軸可動部51連結的連結部61、及處理部也就是黏著頭35、及將黏著頭35朝Z軸中心旋轉的旋轉驅動部80、及將這些整體支撐的橫L字狀的支撐體62。又,為了容易了解以下的說明,被固定於支撐體62的部分是由斜線顯示,成為與Y軸可動部41、X軸可動部51及連結部61一體地移動的部分由外框字顯示。且,支撐體62是具有:上部支撐體62a、及側部支撐體62b、及下部支撐體62c。
Y驅動軸40,是具有:設有使N極及S極的電磁鐵交互地在Y方向多數被配列的上下的固定磁鐵部47u、47d(以後,未指定整體或位置時只顯示47)的逆字狀的Y軸固定部42、及在前述配列方向具有至少1組的N極及S極的電磁鐵並朝逆字狀的凹部被插入並在凹部內移動的Y軸可動部41、及將Y軸可動部41支撐的連結部61、及被固定於連結部61並具備被設在與下部的支撐體62c之間的Y軸線性導引43的Y軸導引部44。Y軸固定部42,是橫跨第1圖的虛線所示的Y驅動軸40大致全域地設置,使Y軸可動部41可以進行預定的範圍移動。且,Y軸線性導引43,是具有在朝Y方向延伸的2個線性軌道43a及線性軌道上移動的線性滑件43b。
Z驅動軸50,是與Y驅動軸40同樣地,具有:設有N極及S極的電磁鐵交互地在Z方向多數被配列的左右的固定磁鐵部57h、57m(第4圖參照,以後,未指定整體或位置時只顯示57)的逆U的字狀的Z軸固定部52、及在Z軸固定部52的配列方向將至少1組的N極及S極的電磁鐵形成於上部並朝逆U的字狀的凹部被插入並在凹部內移動的Z軸可動部51、及在Z軸可動部51及連結部61之間具有與Y軸線性導引43同樣的構造的Z軸線性導引53。Z軸線性導引53,是具有:被固定於連結部61並朝Z方向延伸的2個線性軌道53a、及被固定於Z軸可動部51並在線性軌道上移動的線性滑件53b。
Z軸可動部51是透過連結部61與Y軸可動部41連繫,Y軸可動部41若朝Y方向移動的話Z軸可動部51也一起朝Y方向移動。且有需要使Z軸可動部51(黏著頭35)可以昇降至移動目的地的預定的位置。
在第4圖中,顯示在預定的位置可以將黏著頭昇降的左右的固定磁鐵部57(57h、57m)的構成例的意示圖。在本實施例中,至少,在黏著領域及拾取領域朝Y方向將細長的N極、S極交互地設置。細長的N極、S極是短地被分割設置也可以。當然,橫跨Y方向的全域,朝Y方向將細長的N極、S極交互地設置也可以。
黏著頭35,是藉由旋轉驅動部80透過齒輪35b可旋轉地被設在Z軸可動部51的先端,在本身的先端具有晶片吸附用的真空吸具35a。且,旋轉驅動部80,是由被固定於Z軸可動部51的馬達81透過齒輪82、35b控制黏著頭35的旋轉姿勢。
如以上說明,依據本實施例的ZY驅動軸60A,Z軸固定部52雖是設在大致全域,但是與第7圖所示的構成相比,重量體也就是Z軸固定部52本身因為不會移動,所以對於Y方向的移動的負荷可被大幅地減少,不需加大水平驅動軸的扭矩,就可以實現昇降軸的高速化。
第5圖是顯示第2實施例的ZY驅動軸60B的基本構成的圖。在第5圖中,具有與第1實施例相同構成或功能者基本上是附加同一符號。
與ZY驅動軸60B的第1實施例的ZY驅動軸60A不同的點,第1是,可進行Y軸可動部41的Y方向的移動的將Y軸線性導引43支撐的Y軸導引部44,是從下部支撐體62c朝上部支撐體62a移動的點。第2是,Z軸固定部52是從U字狀改為I字狀,固定磁鐵部57h、57m是成為只有一側的固定磁鐵部57的點。
其他的點,基本上是與第1實施例60A相同。
第6圖是顯示第3實施例的ZY驅動軸60C的基本構成的圖。對於圖面的符號是與第5圖同樣。與ZY驅動軸60C的第2實施例的ZY驅動軸60B不同的點,第1是,Y軸固定部42是與第2實施例的Z軸固定部52同樣地形成I字狀,Y軸的固定磁鐵部是只有一側的47的點。第2是,設有固定於Y軸可動部41及連結部61的Y軸可動部固定部45的點。第3是,為了防止Y方向的移動時的左右的擺動,在Y軸固定部42及連結部61之間設有線性導引46的點。
又,在第1實施例、第2實施例中,為了使這種移動穩定的線性導引46,是被設在Y軸固定部42或Z軸固定部52及連結部61之間也可以。
其他的點,基本上是與第2實施例60B相同。又,在第3實施例中,使用第1實施例的逆字狀的Y驅動軸40也可以。
在以上說明的第2、第3實施例中,也與第1實施例同樣,與第7圖所示的構成相比,重量體也就是Z軸固定部52本身因為不會移動,所以對於Y方向的移動的負荷可大幅地減少,不需加大水平驅動軸的扭矩,就可以實現昇降軸的高速化。
在以上的說明中,將進行處理的處理部雖以黏著頭為例進行說明。基本上,可適用在需要具有昇降軸的2軸驅動機構及需要的處理部。例如,在晶片黏著機中可適用於將晶片黏著劑塗抹在基板用的針。
如以上雖說明了本發明的實施例,但是本行業者可依據上述的說明進行各種的替代例、修正或變形,本發明是在不脫離其宗旨範圍,也包含前述的各種的替代例、修正或變形。
1...晶圓供給部
2...工件供給‧搬運部
3...晶片黏著部
10...晶片黏著機
32...黏著頭部
35...黏著頭
40...Y驅動軸
41...Y軸可動部
42...Y軸固定部
43...Y軸線性導引
44...Y軸導引
45...Y軸可動部固定部
46...線性導引
47、47d、47u...固定磁鐵部
50...Z驅動軸
51...Z軸可動部
52...Z軸固定部
53...Z軸線性導引
57、57h、57m...固定磁鐵部
60、60A、60B、60C...ZY驅動軸
61...連結部
62、62a、62b、62c...支撐體
70...X驅動軸
80...旋轉驅動部
[第1圖]將本發明的一實施例的晶片黏著機從上所見的概念圖。
[第2圖]第1圖所示的ZY驅動軸的黏著頭存在的位置的A-A剖面圖。
[第3圖]將第2圖所示的ZY驅動軸從B的方向所見的箭頭視圖。
[第4圖]可以在預定的位置將黏著頭昇降的左右的固定磁鐵部的構成例的意示圖。
[第5圖]顯示第2實施例的ZY驅動軸60B的基本構成的圖。
[第6圖]顯示第3實施例的ZY驅動軸60C的基本構成的圖。
[第7圖]顯示Z軸成為負荷的2軸驅動機構的圖。
35...黏著頭
35b...齒輪
35a...真空吸具
40...Y驅動軸
41...Y軸可動部
42...Y軸固定部
43...Y軸線性導引
43a...線性軌道
43b...線性滑件
44...Y軸導引部
47...固定磁鐵部
47u,47d...固定磁鐵部
50...Z驅動軸
51...Z軸可動部
52...Z軸固定部
53...Z軸線性導引
53a...線性軌道
53b...線性滑件
57...固定磁鐵部
57h,57m...固定磁鐵部
60A...ZY驅動軸
61...連結部
62...支撐體
62a...上部支撐體
62b...側部支撐體
62c...下部支撐體

Claims (11)

  1. 一種2軸驅動機構,其特徵為,具有:處理部;及第1線性馬達,是設有供將前述處理部沿著第1線性導引昇降用的第1可動部及第1固定部;及第2線性馬達,是設有供將前述處理部朝與前述昇降的方向垂直的水平方向移動用的第2可動部及第2固定部;及連結部,是將前述第1可動部透過前述第1線性導引連結,將前述第2可動部直接或間接地連結;及第2線性導引,使前述第1可動部、前述第2可動部及前述連結部成為一體地朝前述水平方向移動;及支撐體,是將前述第1固定部及前述第2固定部在前述水平方向由預定的長度彼此平行地固定。
  2. 如申請專利範圍第1項的2軸驅動機構,其中,前述第1可動部及前述第2可動部是彼此平行或垂直地設置。
  3. 如申請專利範圍第1項的2軸驅動機構,其中,將前述第2線性導引設在被設於前述第2固定部下部的前述支撐體。
  4. 如申請專利範圍第1項的2軸驅動機構,其中,將前述第2線性導引設在前述連結部的上部的前述支撐體。
  5. 如申請專利範圍第1項的2軸驅動機構,其中,在前述第1可動部且在前述昇降的方向使N極、S極交互地 複數組設置的電磁鐵,是被設在前述水平方向的預定領域。
  6. 如申請專利範圍第1項的2軸驅動機構,其中,在前述第1固定部或第2固定部及前述連結部之間設有第3線性導引。
  7. 一種晶片黏著機,其特徵為:具備如申請專利範圍第1至6的其中任一項的2軸驅動機構,並藉由前述處理部處理基板。
  8. 如申請專利範圍第7項的晶片黏著機,其中,前述處理部是將晶片從晶圓拾取並黏著在前述基板的黏著頭。
  9. 一種晶片黏著機,其特徵為:具備如申請專利範圍第5項的2軸驅動機構,前述處理部是將晶片從晶圓拾取並黏著在前述基板的黏著頭,前述預定領域,是將晶片從晶圓拾取的領域及朝基板黏著的領域。
  10. 如申請專利範圍第7項的晶片黏著機,其中,前述處理部,是將晶片黏著劑塗抹在前述基板的針。
  11. 如申請專利範圍第7項的晶片黏著機,其中,將使前述處理部以前述昇降的方向作為旋轉軸旋轉的旋轉手段設在前述第1可動部。
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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120207570A1 (en) * 2011-02-15 2012-08-16 Atomic Energy Council-Institute Of Nuclear Energy Research Automatic Apparatus for Feeding and Measuring Radioactive Medicine
JP5941705B2 (ja) * 2012-02-29 2016-06-29 ファスフォードテクノロジ株式会社 2軸駆動機構及びダイボンダ
JP2014056979A (ja) * 2012-09-13 2014-03-27 Hitachi High-Tech Instruments Co Ltd 水平軸駆動機構、2軸駆動機構及びダイボンダ
CH707480B1 (de) * 2013-01-21 2016-08-31 Besi Switzerland Ag Bondkopf mit einem heiz- und kühlbaren Saugorgan.
CN113291813B (zh) 2020-02-21 2022-05-27 长鑫存储技术有限公司 晶圆加工系统、半导体机台自动调平装置及其调平方法
JP7471027B1 (ja) 2023-01-16 2024-04-19 株式会社大橋製作所 実装装置
CN116683694B (zh) * 2023-06-01 2024-02-06 伊瑟半导体科技(江苏)股份有限公司 一种浮动驱动装置

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1169591A (zh) * 1996-05-07 1998-01-07 松下电器产业株式会社 芯片焊接装置
TW595276B (en) * 2001-07-19 2004-06-21 Toray Industries A printed-circuit board (PCB), the components and producing method of PCB
TW200511543A (en) * 2003-07-09 2005-03-16 Newport Corp Flip chip device assembly machine
US6920687B2 (en) * 2000-12-06 2005-07-26 Matsushita Electric Industrial Co., Ltd. Component mounting method employing temperature maintenance of positioning apparatus
TW200603298A (en) * 2004-06-10 2006-01-16 Shinkawa K K Bonding equipment
TW200731424A (en) * 2005-12-06 2007-08-16 Toray Eng Co Ltd Chip mounting apparatus and chip mounting method
TW200931543A (en) * 2007-12-03 2009-07-16 Panasonic Corp Chip mounting system
TW200945737A (en) * 2008-02-14 2009-11-01 Thk Co Ltd Linear motor
TWI327110B (zh) * 2006-06-08 2010-07-11 Denso Corp
TWI327109B (zh) * 2006-06-20 2010-07-11 Denso Corp
TWI334627B (zh) * 2005-05-20 2010-12-11 Shinkawa Kk

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH084105B2 (ja) * 1987-06-19 1996-01-17 株式会社エンヤシステム ウェハ接着方法
US5110615A (en) * 1990-01-31 1992-05-05 Asymptotic Technologies, Inc. Method for dispensing viscous materials a constant height above a workpiece surface
CN1095698C (zh) * 1995-07-24 2002-12-11 松下电器产业株式会社 结合剂涂敷装置
JPH0951007A (ja) * 1995-08-09 1997-02-18 Mitsubishi Electric Corp ダイボンド装置および半導体装置の製造方法
KR19980019581A (ko) * 1998-03-31 1998-06-05 배종섭 반도체 패키지 제조용 디스펜서의 헤드유닛 (head unit of dispenser for producing a ic package)
JP3992094B2 (ja) * 2000-12-06 2007-10-17 松下電器産業株式会社 部品実装方法及び部品実装機
US6616031B2 (en) * 2001-07-17 2003-09-09 Asm Assembly Automation Limited Apparatus and method for bond force control
JP3970135B2 (ja) * 2002-09-05 2007-09-05 キヤノンマシナリー株式会社 ダイボンダ
JP4946989B2 (ja) * 2008-07-07 2012-06-06 パナソニック株式会社 電子部品ボンディング装置
JP5264443B2 (ja) * 2008-11-28 2013-08-14 芝浦メカトロニクス株式会社 電子部品の実装装置
JP5997448B2 (ja) * 2012-01-31 2016-09-28 ファスフォードテクノロジ株式会社 ダイボンダ及びボンディング方法

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1169591A (zh) * 1996-05-07 1998-01-07 松下电器产业株式会社 芯片焊接装置
US5876556A (en) * 1996-05-07 1999-03-02 Matsushita Electric Industrial Co., Ltd. Die-bonding device
TW363232B (en) * 1996-05-07 1999-07-01 Matsushita Electric Ind Co Ltd Die-bonding device
CN1109359C (zh) * 1996-05-07 2003-05-21 松下电器产业株式会社 芯片焊接装置和焊接方法
US6920687B2 (en) * 2000-12-06 2005-07-26 Matsushita Electric Industrial Co., Ltd. Component mounting method employing temperature maintenance of positioning apparatus
TW595276B (en) * 2001-07-19 2004-06-21 Toray Industries A printed-circuit board (PCB), the components and producing method of PCB
TW200511543A (en) * 2003-07-09 2005-03-16 Newport Corp Flip chip device assembly machine
TW200603298A (en) * 2004-06-10 2006-01-16 Shinkawa K K Bonding equipment
TWI334627B (zh) * 2005-05-20 2010-12-11 Shinkawa Kk
TW200731424A (en) * 2005-12-06 2007-08-16 Toray Eng Co Ltd Chip mounting apparatus and chip mounting method
TWI327110B (zh) * 2006-06-08 2010-07-11 Denso Corp
TWI327109B (zh) * 2006-06-20 2010-07-11 Denso Corp
TW200931543A (en) * 2007-12-03 2009-07-16 Panasonic Corp Chip mounting system
TW200945737A (en) * 2008-02-14 2009-11-01 Thk Co Ltd Linear motor

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