CN102881603A - 双轴驱动机构和模片结合器 - Google Patents
双轴驱动机构和模片结合器 Download PDFInfo
- Publication number
- CN102881603A CN102881603A CN2011102712825A CN201110271282A CN102881603A CN 102881603 A CN102881603 A CN 102881603A CN 2011102712825 A CN2011102712825 A CN 2011102712825A CN 201110271282 A CN201110271282 A CN 201110271282A CN 102881603 A CN102881603 A CN 102881603A
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- mentioned
- movable part
- axle drive
- line slideway
- fixed part
- Prior art date
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- Granted
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- 239000011159 matrix material Substances 0.000 claims description 20
- 241000309551 Arthraxon hispidus Species 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 12
- 239000007767 bonding agent Substances 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000005303 weighing Methods 0.000 description 2
- 102000000584 Calmodulin Human genes 0.000 description 1
- 108010041952 Calmodulin Proteins 0.000 description 1
- 241000196324 Embryophyta Species 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67144—Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
- H01L24/75—Apparatus for connecting with bump connectors or layer connectors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/75—Apparatus for connecting with bump connectors or layer connectors
- H01L2224/7565—Means for transporting the components to be connected
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/75—Apparatus for connecting with bump connectors or layer connectors
- H01L2224/758—Means for moving parts
- H01L2224/75821—Upper part of the bonding apparatus, i.e. bonding head
- H01L2224/75824—Translational mechanism
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8319—Arrangement of the layer connectors prior to mounting
- H01L2224/83192—Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on another item or body to be connected to the semiconductor or solid-state body
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/17—Surface bonding means and/or assemblymeans with work feeding or handling means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/17—Surface bonding means and/or assemblymeans with work feeding or handling means
- Y10T156/1798—Surface bonding means and/or assemblymeans with work feeding or handling means with liquid adhesive or adhesive activator applying means
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Die Bonding (AREA)
Abstract
Description
Claims (11)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011-156662 | 2011-07-15 | ||
JP2011156662A JP2013026268A (ja) | 2011-07-15 | 2011-07-15 | 2軸駆動機構及びダイボンダ |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102881603A true CN102881603A (zh) | 2013-01-16 |
CN102881603B CN102881603B (zh) | 2015-09-02 |
Family
ID=47482884
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201110271282.5A Expired - Fee Related CN102881603B (zh) | 2011-07-15 | 2011-09-06 | 双轴驱动机构和模片结合器 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20130014904A1 (zh) |
JP (1) | JP2013026268A (zh) |
KR (1) | KR101348445B1 (zh) |
CN (1) | CN102881603B (zh) |
TW (1) | TWI472404B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103943520A (zh) * | 2013-01-21 | 2014-07-23 | 贝思瑞士股份公司 | 具有可加热和可冷却抽吸构件的结合头 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120207570A1 (en) * | 2011-02-15 | 2012-08-16 | Atomic Energy Council-Institute Of Nuclear Energy Research | Automatic Apparatus for Feeding and Measuring Radioactive Medicine |
JP5941705B2 (ja) * | 2012-02-29 | 2016-06-29 | ファスフォードテクノロジ株式会社 | 2軸駆動機構及びダイボンダ |
JP2014056979A (ja) * | 2012-09-13 | 2014-03-27 | Hitachi High-Tech Instruments Co Ltd | 水平軸駆動機構、2軸駆動機構及びダイボンダ |
CN113291813B (zh) * | 2020-02-21 | 2022-05-27 | 长鑫存储技术有限公司 | 晶圆加工系统、半导体机台自动调平装置及其调平方法 |
JP7471027B1 (ja) | 2023-01-16 | 2024-04-19 | 株式会社大橋製作所 | 実装装置 |
CN116683694B (zh) * | 2023-06-01 | 2024-02-06 | 伊瑟半导体科技(江苏)股份有限公司 | 一种浮动驱动装置 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4960485A (en) * | 1987-06-19 | 1990-10-02 | Enya Mfg. Co., Ltd. | Automatic wafer mounting device |
US5110615A (en) * | 1990-01-31 | 1992-05-05 | Asymptotic Technologies, Inc. | Method for dispensing viscous materials a constant height above a workpiece surface |
CN1144720A (zh) * | 1995-07-24 | 1997-03-12 | 松下电器产业株式会社 | 结合剂涂敷方法及其装置 |
CN1169591A (zh) * | 1996-05-07 | 1998-01-07 | 松下电器产业株式会社 | 芯片焊接装置 |
CN1399320A (zh) * | 2001-07-17 | 2003-02-26 | 先进自动器材有限公司 | 用于结合力控制的装置和方法 |
US6920687B2 (en) * | 2000-12-06 | 2005-07-26 | Matsushita Electric Industrial Co., Ltd. | Component mounting method employing temperature maintenance of positioning apparatus |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0951007A (ja) * | 1995-08-09 | 1997-02-18 | Mitsubishi Electric Corp | ダイボンド装置および半導体装置の製造方法 |
KR19980019581A (ko) * | 1998-03-31 | 1998-06-05 | 배종섭 | 반도체 패키지 제조용 디스펜서의 헤드유닛 (head unit of dispenser for producing a ic package) |
JP3992094B2 (ja) * | 2000-12-06 | 2007-10-17 | 松下電器産業株式会社 | 部品実装方法及び部品実装機 |
KR100910188B1 (ko) * | 2001-07-19 | 2009-07-30 | 도레이 카부시키가이샤 | 회로기판, 회로기판용 부재 및 그 제조방법 및가요성필름의 라미네이트방법 |
JP3970135B2 (ja) * | 2002-09-05 | 2007-09-05 | キヤノンマシナリー株式会社 | ダイボンダ |
US20050045914A1 (en) * | 2003-07-09 | 2005-03-03 | Newport Corporation | Flip chip device assembly machine |
JP2005353839A (ja) * | 2004-06-10 | 2005-12-22 | Shinkawa Ltd | ボンディング装置 |
JP4397349B2 (ja) * | 2005-05-20 | 2010-01-13 | 株式会社新川 | チップボンディング装置 |
WO2007066559A1 (ja) * | 2005-12-06 | 2007-06-14 | Toray Engineering Co., Ltd. | チップ実装装置およびチップ実装方法 |
JP4682924B2 (ja) * | 2006-06-08 | 2011-05-11 | 株式会社デンソー | スクリーン印刷方法 |
JP4775133B2 (ja) * | 2006-06-20 | 2011-09-21 | 株式会社デンソー | スクリーン印刷装置及びその印刷方法 |
KR20100093553A (ko) * | 2007-12-03 | 2010-08-25 | 파나소닉 주식회사 | 부품 실장 장치 |
WO2009101852A1 (ja) * | 2008-02-14 | 2009-08-20 | Thk Co., Ltd. | リニアモータ |
JP4946989B2 (ja) * | 2008-07-07 | 2012-06-06 | パナソニック株式会社 | 電子部品ボンディング装置 |
JP5264443B2 (ja) * | 2008-11-28 | 2013-08-14 | 芝浦メカトロニクス株式会社 | 電子部品の実装装置 |
JP5997448B2 (ja) * | 2012-01-31 | 2016-09-28 | ファスフォードテクノロジ株式会社 | ダイボンダ及びボンディング方法 |
-
2011
- 2011-07-15 JP JP2011156662A patent/JP2013026268A/ja active Pending
- 2011-08-31 TW TW100131259A patent/TWI472404B/zh active
- 2011-09-05 KR KR1020110089400A patent/KR101348445B1/ko active IP Right Grant
- 2011-09-06 CN CN201110271282.5A patent/CN102881603B/zh not_active Expired - Fee Related
- 2011-09-06 US US13/226,128 patent/US20130014904A1/en not_active Abandoned
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4960485A (en) * | 1987-06-19 | 1990-10-02 | Enya Mfg. Co., Ltd. | Automatic wafer mounting device |
US5110615A (en) * | 1990-01-31 | 1992-05-05 | Asymptotic Technologies, Inc. | Method for dispensing viscous materials a constant height above a workpiece surface |
CN1144720A (zh) * | 1995-07-24 | 1997-03-12 | 松下电器产业株式会社 | 结合剂涂敷方法及其装置 |
CN1169591A (zh) * | 1996-05-07 | 1998-01-07 | 松下电器产业株式会社 | 芯片焊接装置 |
US6920687B2 (en) * | 2000-12-06 | 2005-07-26 | Matsushita Electric Industrial Co., Ltd. | Component mounting method employing temperature maintenance of positioning apparatus |
CN1399320A (zh) * | 2001-07-17 | 2003-02-26 | 先进自动器材有限公司 | 用于结合力控制的装置和方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103943520A (zh) * | 2013-01-21 | 2014-07-23 | 贝思瑞士股份公司 | 具有可加热和可冷却抽吸构件的结合头 |
CN103943520B (zh) * | 2013-01-21 | 2017-11-17 | 贝思瑞士股份公司 | 具有可加热和可冷却抽吸构件的结合头 |
Also Published As
Publication number | Publication date |
---|---|
TW201302379A (zh) | 2013-01-16 |
KR20130009538A (ko) | 2013-01-23 |
JP2013026268A (ja) | 2013-02-04 |
US20130014904A1 (en) | 2013-01-17 |
CN102881603B (zh) | 2015-09-02 |
TWI472404B (zh) | 2015-02-11 |
KR101348445B1 (ko) | 2014-01-06 |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: JIEJIN TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: HITACHI HIGH TECH INSTR CO., LTD. Effective date: 20150715 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20150715 Address after: Yamanashi Prefecture Applicant after: Fasford Technology Co.,Ltd. Address before: Saitama Prefecture, Japan Applicant before: Hitachi High-Tech Instruments Co.,Ltd. |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150902 |