TWI466735B - 紫外線照射裝置 - Google Patents
紫外線照射裝置 Download PDFInfo
- Publication number
- TWI466735B TWI466735B TW98131385A TW98131385A TWI466735B TW I466735 B TWI466735 B TW I466735B TW 98131385 A TW98131385 A TW 98131385A TW 98131385 A TW98131385 A TW 98131385A TW I466735 B TWI466735 B TW I466735B
- Authority
- TW
- Taiwan
- Prior art keywords
- discharge lamp
- gas
- discharge
- ultraviolet irradiation
- irradiation device
- Prior art date
Links
- 230000007246 mechanism Effects 0.000 claims description 10
- 238000007599 discharging Methods 0.000 claims description 6
- 238000012545 processing Methods 0.000 claims description 6
- 238000007664 blowing Methods 0.000 claims description 3
- 239000007789 gas Substances 0.000 description 52
- 239000011521 glass Substances 0.000 description 33
- 239000000758 substrate Substances 0.000 description 32
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 28
- 229910001873 dinitrogen Inorganic materials 0.000 description 24
- 239000000843 powder Substances 0.000 description 19
- 239000011261 inert gas Substances 0.000 description 18
- 238000004140 cleaning Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 238000011144 upstream manufacturing Methods 0.000 description 7
- 238000001816 cooling Methods 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 241001621399 Lampris Species 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000012216 screening Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005206 flow analysis Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/002—Other surface treatment of glass not in the form of fibres or filaments by irradiation by ultraviolet light
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Materials Engineering (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Optics & Photonics (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning In General (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- General Health & Medical Sciences (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008240090 | 2008-09-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201014660A TW201014660A (en) | 2010-04-16 |
| TWI466735B true TWI466735B (zh) | 2015-01-01 |
Family
ID=42039670
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW98131385A TWI466735B (zh) | 2008-09-18 | 2009-09-17 | 紫外線照射裝置 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5534344B2 (ko) |
| KR (1) | KR101660477B1 (ko) |
| CN (1) | CN102132384B (ko) |
| TW (1) | TWI466735B (ko) |
| WO (1) | WO2010032852A1 (ko) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014193450A (ja) * | 2013-03-29 | 2014-10-09 | Gs Yuasa Corp | 光照射装置 |
| JP5928527B2 (ja) * | 2014-06-05 | 2016-06-01 | ウシオ電機株式会社 | エキシマ光照射装置 |
| JP6711023B2 (ja) * | 2016-03-03 | 2020-06-17 | ウシオ電機株式会社 | 紫外線照射装置 |
| CN108242412B (zh) * | 2016-12-26 | 2020-06-23 | 台湾积体电路制造股份有限公司 | 半导体元件固化装置、基材处理系统以及半导体元件固化方法 |
| JOP20180009A1 (ar) | 2017-02-06 | 2019-01-30 | Gilead Sciences Inc | مركبات مثبط فيروس hiv |
| CN108212950B (zh) * | 2018-01-04 | 2021-01-26 | 京东方科技集团股份有限公司 | 一种极紫外光清洗设备及基材清洗方法 |
| TWI829205B (zh) | 2018-07-30 | 2024-01-11 | 美商基利科學股份有限公司 | 抗hiv化合物 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05226262A (ja) * | 1992-02-14 | 1993-09-03 | Hitachi Ltd | 表面処理装置 |
| US20030076020A1 (en) * | 2001-10-24 | 2003-04-24 | Shinichi Anami | Electrodeless low pressure lamp with multiple ferrite cores and coils |
| TW200418079A (en) * | 2003-01-17 | 2004-09-16 | Ushio Electric Inc | Excimer lamp light-emitting device |
| JP2006134983A (ja) * | 2004-11-04 | 2006-05-25 | Ushio Inc | エキシマ光照射装置 |
| CN1788339A (zh) * | 2003-12-26 | 2006-06-14 | 株式会社杰士汤浅 | 紫外线洗涤装置及洗涤方法 |
| TW200823929A (en) * | 2006-08-21 | 2008-06-01 | Ushio Electric Inc | Excimer lamp device |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04264723A (ja) * | 1991-02-20 | 1992-09-21 | Toshiba Lighting & Technol Corp | 紫外線照射装置 |
| JP5148803B2 (ja) * | 2003-05-21 | 2013-02-20 | 株式会社Ｇｓユアサ | 無声放電ランプ |
| JP2006185656A (ja) * | 2004-12-27 | 2006-07-13 | Harison Toshiba Lighting Corp | 誘電体バリア放電ランプおよび紫外線照射装置 |
-
2009
- 2009-09-17 TW TW98131385A patent/TWI466735B/zh active
- 2009-09-18 WO PCT/JP2009/066452 patent/WO2010032852A1/ja active Application Filing
- 2009-09-18 CN CN200980132822.2A patent/CN102132384B/zh active Active
- 2009-09-18 JP JP2010529827A patent/JP5534344B2/ja active Active
- 2009-09-18 KR KR1020107027778A patent/KR101660477B1/ko active IP Right Grant
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05226262A (ja) * | 1992-02-14 | 1993-09-03 | Hitachi Ltd | 表面処理装置 |
| US20030076020A1 (en) * | 2001-10-24 | 2003-04-24 | Shinichi Anami | Electrodeless low pressure lamp with multiple ferrite cores and coils |
| TW200418079A (en) * | 2003-01-17 | 2004-09-16 | Ushio Electric Inc | Excimer lamp light-emitting device |
| CN1788339A (zh) * | 2003-12-26 | 2006-06-14 | 株式会社杰士汤浅 | 紫外线洗涤装置及洗涤方法 |
| JP2006134983A (ja) * | 2004-11-04 | 2006-05-25 | Ushio Inc | エキシマ光照射装置 |
| TW200823929A (en) * | 2006-08-21 | 2008-06-01 | Ushio Electric Inc | Excimer lamp device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2010032852A1 (ja) | 2012-02-16 |
| CN102132384B (zh) | 2013-08-14 |
| KR101660477B1 (ko) | 2016-09-27 |
| KR20110063712A (ko) | 2011-06-14 |
| WO2010032852A1 (ja) | 2010-03-25 |
| JP5534344B2 (ja) | 2014-06-25 |
| CN102132384A (zh) | 2011-07-20 |
| TW201014660A (en) | 2010-04-16 |
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