TWI455899B - 用於塗佈簡易清洗塗層之基板元件 - Google Patents

用於塗佈簡易清洗塗層之基板元件 Download PDF

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TWI455899B
TWI455899B TW101119489A TW101119489A TWI455899B TW I455899 B TWI455899 B TW I455899B TW 101119489 A TW101119489 A TW 101119489A TW 101119489 A TW101119489 A TW 101119489A TW I455899 B TWI455899 B TW I455899B
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layer
adhesion promoter
coating
substrate
substrate component
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TW201305079A (zh
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Marten Walther
Marta Krzyzak
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Schott Ag
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
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    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
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    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
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    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
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    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1212—Zeolites, glasses
    • C—CHEMISTRY; METALLURGY
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1225—Deposition of multilayers of inorganic material
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    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1229—Composition of the substrate
    • C23C18/1245—Inorganic substrates other than metallic
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1254—Sol or sol-gel processing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • E—FIXED CONSTRUCTIONS
    • E04—BUILDING
    • E04C—STRUCTURAL ELEMENTS; BUILDING MATERIALS
    • E04C2/00—Building elements of relatively thin form for the construction of parts of buildings, e.g. sheet materials, slabs, or panels
    • E04C2/54—Slab-like translucent elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
    • C—CHEMISTRY; METALLURGY
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    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
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    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249967—Inorganic matrix in void-containing component
    • Y10T428/249969—Of silicon-containing material [e.g., glass, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • Y10T428/00—Stock material or miscellaneous articles
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Claims (33)

  1. 一種用於塗佈簡易清洗塗層之基板元件(11，12，13)，包括載體材料(2)及防反射塗層(3，4，5)，其特徵在於，該防反射塗層(3，4，5)由一層(5)或至少兩層(31，32，33，41，42，43，44)構成，該一層(5)或該等至少兩層的最上層(31，41)為可與簡易清洗塗層進行相互作用的助黏劑層，以及，該助黏劑層包含混氧化物。
  2. 如申請專利範圍第1項之基板元件，其中，該助黏劑層(5，31，41)為液相塗層，特別是熱加固溶膠-凝膠層。
  3. 如申請專利範圍第1項之基板元件，其中，該助黏劑層(5，31，41)為CVD塗層或火焰裂解層。
  4. 如申請專利範圍第1項之基板元件，其中，該助黏劑層(5，31，41)為PVD塗層，特別是濺鍍層。
  5. 如申請專利範圍第1至4項中任一項之基板元件，其中，該防反射塗層(3，4，5)之至少一單層之厚度可變(較佳減小)，以便透過隨後為該基板元件塗佈簡易清洗塗層來在波譜範圍內達到完整的期望防反射效果。
  6. 如申請專利範圍第1至4項中任一項之基板元件，其中，該防反射塗層(3，4)藉由CVD工藝或PVD工藝(特別是濺鍍工藝)、壓印技術、噴塗技術或汽化滲鍍製成，較佳藉由液相塗佈，尤佳藉由溶膠-凝膠塗佈製成。
  7. 如申請專利範圍第1至4項中任一項之基板元件，其 中，該助黏劑層(31，41)及該防反射塗層的其他層(32，33，42，43，44)透過將多種工藝相結合而製成。
  8. 如申請專利範圍第1至4項中任一項之基板元件，其中，該防反射塗層(3，4)實施為不完整的防反射層組，該防反射層組採用某種方案，使得透過塗佈一助黏劑層及一簡易清洗塗層便可將該防反射層組光學完整化。
  9. 如申請專利範圍第1至4項中任一項之基板元件，其中，該防反射塗層(3)由三或三個以上交替分佈的中折射率-高折射率-低折射率層(31，32，33)構成，該助黏劑層(31)為低折射率層。
  10. 如申請專利範圍第1至4項中任一項之基板元件，其中，該防反射塗層(4)由兩或兩個以上交替分佈的高折射率-低折射率層(41，42，43，44)構成，該助黏劑層(41)為低折射率層。
  11. 如申請專利範圍第1至4項中任一項之基板元件，其中，該防反射塗層由一低折射率層、特別是一多孔單層防反射體、一氟化鎂層或一氟化鎂-混氧化矽層構成，該助黏劑層為低折射率層，其層厚小於10nm，較佳小於8nm，尤佳小於6nm。
  12. 如申請專利範圍第1至4項中任一項之基板元件，其 中，該防反射塗層之至少一層(較佳該助黏劑層(5，31，41))被一或多個中間層分隔為多個分層，該一或多個中間層的折射率與該等分層的折射率大致相等。
  13. 如申請專利範圍第1至4項中任一項之基板元件，其中，該助黏劑層(5，31，41)之折射率為1.35至1.7，較佳1.35至1.6，尤佳1.35至1.56。
  14. 如申請專利範圍第1至4項中任一項之基板元件，其中，該防反射塗層(5)由一實施為助黏劑層(5)之層構成，該層之折射率為該載體材料表面之折射率之平方根的±10%，較佳±5%，尤佳±2%。
  15. 如申請專利範圍第1至4項中任一項之基板元件，其中，該防反射塗層(5)由折射率為1.2至1.38，較佳1.25至1.38，尤佳1.28至1.38的一層構成，該層至少在其面對空氣的表面區域包含一可與簡易清洗塗層進行相互作用以實現該簡易清洗塗層之耐久性的混氧化物。
  16. 如申請專利範圍第1至4項中任一項之基板元件，其中，該助黏劑層(5，31，41)為混氧化矽層，特別是混有鋁、錫、鎂、磷、鈰、鋯、鈦、銫、鋇、鍶、鈮、鋅、硼等元素中至少一元素的氧化物及/或混有氟化鎂的氧化矽層，其中，元素鋁的較佳至少一氧化物包含在內。
  17. 如申請專利範圍第1至4項中任一項之基板元件，其中，該助黏劑層(5，31，41)之厚度大於1nm，較佳大於10 nm，尤佳大於20nm。
  18. 如申請專利範圍第1至4項中任一項之基板元件，其中，該助黏劑層(5，31，41)上設有覆蓋層(6)，該覆蓋層(6)為顆粒層或多孔層。
  19. 如申請專利範圍第18項之基板元件，其中，該覆蓋層(6)由氧化矽或混氧化矽構成。
  20. 如申請專利範圍第1至4項中任一項之基板元件，其中，該載體材料(2)為金屬、塑膠、晶體、陶瓷、玻璃、玻璃陶瓷或複合材料。
  21. 如申請專利範圍第1至4項中任一項之基板元件，其中，該載體材料(2)為鋰-鋁矽玻璃、鈣鈉矽玻璃、硼矽玻璃、鹼性鋁矽玻璃、無鹼鋁矽玻璃或低鹼鋁矽玻璃。
  22. 如申請專利範圍第1至4項中任一項之基板元件，其中，該載體材料(2)的表面(20)經結構化處理，該載體材料特定言之具有蝕刻表面。
  23. 如申請專利範圍第1至4項中任一項之基板元件，其中，將簡易清洗塗層鍍覆至該助黏劑層(5，31，41)後，該簡易清洗塗層在中性鹽霧試驗中採用了1.5倍以上(較佳兩倍以上，尤佳三倍以上)作用時間後的水接觸角大於所鍍覆之不含助黏劑層之相同簡易清洗塗層在中性鹽霧試驗中的作用時間較短時的水接觸角。
  24. 一種製造用於塗佈簡易清洗塗層之基板元件(11，12， 13)的方法，包括以下步驟：特定言之用玻璃或玻璃陶瓷製備具至少一表面(20)的載體材料(2)，利用溶膠-凝膠鍍覆技術為該載體材料的至少一表面(20)塗佈一層(5)或塗佈防反射塗層(3，4)的至少兩層，其中，該一層或該等至少兩層的外部最上層構成助黏劑前驅層，對包含該助黏劑前驅層之該防反射塗層進行熱加固並將該助黏劑前驅層轉化為該助黏劑層(5，31，41)，其中，該助黏劑層包含混氧化物，較佳包含混氧化矽，尤佳包含混有鋁、錫、鎂、磷、鈰、鋯、鈦、銫、鋇、鍶、鈮、鋅、硼等元素中至少一元素的氧化物及/或混有氟化鎂的氧化矽，以便利用噴塗法、浸漬法、刮刷法或壓印法往透過上述方式所獲得的基板元件(11，12，13)上鍍覆簡易清洗塗層。
  25. 如申請專利範圍第24項之製造基板元件(11，12，13)的方法，其中，在該載體材料(2)上並在低於該載體材料之軟化溫度的溫度條件下(較佳在低於550℃溫度條件下，特別是350℃至500℃溫度條件下，尤佳於400℃至500℃基板表面溫度條件下)對該助黏劑前驅層進行熱加固處理以及將該助黏劑前驅層轉化為該助黏劑層(5，31，41)。
  26. 如申請專利範圍第24或25項之製造基板元件(11，12，13)的方法，其中，對該助黏劑前驅層之熱加固處理以及將該助黏劑前驅層轉化為該助黏劑層(5，31，41)皆先於 對該助黏劑前驅層之乾燥處理進行，該乾燥處理較佳在低於300℃溫度條件下，尤佳在低於200℃溫度條件下進行。
  27. 如申請專利範圍第24或25項之製造基板元件(12)的方法，其中，對該助黏劑前驅層之熱加固處理以及將該助黏劑前驅層轉化為該助黏劑層(5，31，41)後，特定言之利用火焰裂解往該助黏劑層(5，31，41)上鍍覆覆蓋層(6)，其中，該覆蓋層(6)較佳由氧化矽或混氧化矽構成且該覆蓋層為顆粒層或多孔層，以便利用噴塗法、浸漬法、刮刷法或壓印法往透過上述方式所獲得的基板元件上直接鍍覆簡易清洗塗層。
  28. 一種申請專利範圍第1至23項中任一項之基板元件(11，12，13)的應用，該基板元件包括特定言之由玻璃或玻璃陶瓷構成的載板(2)以及由一層(5)或由至少兩層(31，32，33，41，42)構成的防反射塗層(3，4，5)，其中，該一層(5)或該等至少兩層之最上層(31，41)為助黏劑層，該助黏劑層包含混氧化物，較佳包含混氧化矽，尤佳包含混有鋁、錫、鎂、磷、鈰、鋯、鈦、銫、鋇、鍶、鈮、鋅、硼等元素中至少一元素的氧化物及/或混有氟化鎂的氧化矽，以便塗佈簡易清洗塗層，特別是塗佈有機氟化合物或奈米層系統。
  29. 如申請專利範圍第28項之基板元件(11，12，13)的應用，用於塗佈簡易清洗塗層，特別是塗佈有機氟化合物或奈米層系統，其中，在該助黏劑層(5，31，41)上設有覆蓋層(6)， 該覆蓋層為顆粒層或多孔層，該覆蓋層特定言之由氧化矽或混氧化矽構成。
  30. 如申請專利範圍第28或29項之塗佈有簡易清洗塗層之基板元件(11，12，13)的應用，用於阻止干擾性反射或影響對比度的反射，用作覆蓋物、用作監視器的顯示面板、用作顯示器附屬面板(較佳用作3D顯示器或柔性顯示器)、用作建築物內部及外部區域中的盤片(例如，櫥窗、鑲玻璃圖片、陳列櫃、吧台、製冷設備或難以清潔區域)、用作灶台玻璃、用作廚房、浴室或實驗室等高污染區域中的裝飾性玻璃元件，抑或用作太陽能模組的蓋板。
  31. 如申請專利範圍第28或29項之塗佈有簡易清洗塗層之基板元件(11，12，13)的應用，用於阻止干擾性反射或影響對比度的反射，用作特別是具觸控功能(尤佳採用電阻式、電容式、光學式、紅外式或表面聲波觸控技術)之互動輸入元件的基板，特別是用作具觸控屏幕功能的顯示面板，尤佳用作單點觸控顯示器、雙點觸控顯示器或多點觸控顯示器。
  32. 如申請專利範圍第28或29項之塗佈有簡易清洗塗層之基板元件(11，12，13)的應用，用於阻止干擾性反射或影響對比度的反射，用作複合元件中的基板，該基板藉由光鏈路防止在該複合元件內之鄰接空氣間隙的一或多個分界面上發生反射。
  33. 一種裝置，其顯示元件或操作元件包含申請專利範圍第1至23項中任一項之基板元件。
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JP2017074797A (ja) 2017-04-20
JP2014522329A (ja) 2014-09-04
JP6133277B2 (ja) 2017-05-24
WO2012163946A1 (de) 2012-12-06
GB201320494D0 (en) 2014-01-01
KR20140035420A (ko) 2014-03-21
DE102011076754A1 (de) 2012-12-06
TW201305079A (zh) 2013-02-01
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