TWI443474B - 光學系統、包含此類型光學系統之用於微蝕刻的投影曝光裝置、以及以此類型投影曝光裝置製造微結構組件之方法 - Google Patents

光學系統、包含此類型光學系統之用於微蝕刻的投影曝光裝置、以及以此類型投影曝光裝置製造微結構組件之方法 Download PDF

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Publication number
TWI443474B
TWI443474B TW097140946A TW97140946A TWI443474B TW I443474 B TWI443474 B TW I443474B TW 097140946 A TW097140946 A TW 097140946A TW 97140946 A TW97140946 A TW 97140946A TW I443474 B TWI443474 B TW I443474B
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TW
Taiwan
Prior art keywords
optical system
field
component group
image
object field
Prior art date
Application number
TW097140946A
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English (en)
Chinese (zh)
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TW200923596A (en
Inventor
Hans-Juergen Mann
Original Assignee
Zeiss Carl Smt Gmbh
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Publication date
Application filed by Zeiss Carl Smt Gmbh filed Critical Zeiss Carl Smt Gmbh
Publication of TW200923596A publication Critical patent/TW200923596A/zh
Application granted granted Critical
Publication of TWI443474B publication Critical patent/TWI443474B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0836—Catadioptric systems using more than three curved mirrors
    • G02B17/084—Catadioptric systems using more than three curved mirrors on-axis systems with at least one of the mirrors having a central aperture

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW097140946A 2007-10-26 2008-10-24 光學系統、包含此類型光學系統之用於微蝕刻的投影曝光裝置、以及以此類型投影曝光裝置製造微結構組件之方法 TWI443474B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102007051669A DE102007051669A1 (de) 2007-10-26 2007-10-26 Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage

Publications (2)

Publication Number Publication Date
TW200923596A TW200923596A (en) 2009-06-01
TWI443474B true TWI443474B (zh) 2014-07-01

Family

ID=40490317

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097140946A TWI443474B (zh) 2007-10-26 2008-10-24 光學系統、包含此類型光學系統之用於微蝕刻的投影曝光裝置、以及以此類型投影曝光裝置製造微結構組件之方法

Country Status (7)

Country Link
US (1) US8558991B2 (cg-RX-API-DMAC7.html)
JP (1) JP5431345B2 (cg-RX-API-DMAC7.html)
KR (1) KR101542268B1 (cg-RX-API-DMAC7.html)
CN (2) CN102354045B (cg-RX-API-DMAC7.html)
DE (1) DE102007051669A1 (cg-RX-API-DMAC7.html)
TW (1) TWI443474B (cg-RX-API-DMAC7.html)
WO (1) WO2009052925A1 (cg-RX-API-DMAC7.html)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8305559B2 (en) 2008-06-10 2012-11-06 Nikon Corporation Exposure apparatus that utilizes multiple masks
JP5946190B2 (ja) * 2010-07-30 2016-07-05 カール・ツァイス・エスエムティー・ゲーエムベーハー 結像光学系及びこの種の結像光学系を有するマイクロリソグラフィのための投影露光装置
DE102010043498A1 (de) 2010-11-05 2012-05-10 Carl Zeiss Smt Gmbh Projektionsobjektiv einer für EUV ausgelegten mikrolithographischen Projektionsbelichtungsanlage, sowie Verfahren zum optischen Justieren eines Projektionsobjektives
DE102011076752A1 (de) * 2011-05-31 2012-12-06 Carl Zeiss Smt Gmbh Abbildende Optik
EP2579100A3 (en) 2011-10-03 2017-12-06 ASML Holding N.V. Inspection apparatus, lithographic apparatus, and device manufacturing method
DE102012206153A1 (de) * 2012-04-16 2013-10-17 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
US9448343B2 (en) * 2013-03-15 2016-09-20 Kla-Tencor Corporation Segmented mirror apparatus for imaging and method of using the same
CA2998101C (en) 2014-09-08 2022-12-06 Christopher Robert Debone Grid tied, real time adaptive, distributed intermittent power

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KR100772701B1 (ko) 2006-09-28 2007-11-02 주식회사 하이닉스반도체 반도체 메모리 장치

Also Published As

Publication number Publication date
TW200923596A (en) 2009-06-01
DE102007051669A1 (de) 2009-04-30
KR101542268B1 (ko) 2015-08-06
JP2011501446A (ja) 2011-01-06
JP5431345B2 (ja) 2014-03-05
KR20100069700A (ko) 2010-06-24
US20100231884A1 (en) 2010-09-16
CN102354045B (zh) 2014-09-24
WO2009052925A1 (en) 2009-04-30
CN101836151A (zh) 2010-09-15
US8558991B2 (en) 2013-10-15
CN102354045A (zh) 2012-02-15
CN101836151B (zh) 2012-12-05

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