CN102354045B - 成像光学系统、投射曝光设备、及微结构部件生产方法 - Google Patents

成像光学系统、投射曝光设备、及微结构部件生产方法 Download PDF

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Publication number
CN102354045B
CN102354045B CN201110371663.0A CN201110371663A CN102354045B CN 102354045 B CN102354045 B CN 102354045B CN 201110371663 A CN201110371663 A CN 201110371663A CN 102354045 B CN102354045 B CN 102354045B
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China
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imaging optical
optical system
thing
image
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Expired - Fee Related
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CN201110371663.0A
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English (en)
Chinese (zh)
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CN102354045A (zh
Inventor
汉斯-于尔根.曼
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0836—Catadioptric systems using more than three curved mirrors
    • G02B17/084—Catadioptric systems using more than three curved mirrors on-axis systems with at least one of the mirrors having a central aperture

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201110371663.0A 2007-10-26 2008-10-02 成像光学系统、投射曝光设备、及微结构部件生产方法 Expired - Fee Related CN102354045B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US98285007P 2007-10-26 2007-10-26
US60/982,850 2007-10-26
DE102007051669A DE102007051669A1 (de) 2007-10-26 2007-10-26 Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage
DE102007051669.1 2007-10-26

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN200880113386XA Division CN101836151B (zh) 2007-10-26 2008-10-02 成像光学系统、包括该类型的成像光学系统的用于微光刻的投射曝光设备、以及利用该类型的投射曝光设备生产微结构部件的方法

Publications (2)

Publication Number Publication Date
CN102354045A CN102354045A (zh) 2012-02-15
CN102354045B true CN102354045B (zh) 2014-09-24

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ID=40490317

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201110371663.0A Expired - Fee Related CN102354045B (zh) 2007-10-26 2008-10-02 成像光学系统、投射曝光设备、及微结构部件生产方法
CN200880113386XA Expired - Fee Related CN101836151B (zh) 2007-10-26 2008-10-02 成像光学系统、包括该类型的成像光学系统的用于微光刻的投射曝光设备、以及利用该类型的投射曝光设备生产微结构部件的方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN200880113386XA Expired - Fee Related CN101836151B (zh) 2007-10-26 2008-10-02 成像光学系统、包括该类型的成像光学系统的用于微光刻的投射曝光设备、以及利用该类型的投射曝光设备生产微结构部件的方法

Country Status (7)

Country Link
US (1) US8558991B2 (cg-RX-API-DMAC7.html)
JP (1) JP5431345B2 (cg-RX-API-DMAC7.html)
KR (1) KR101542268B1 (cg-RX-API-DMAC7.html)
CN (2) CN102354045B (cg-RX-API-DMAC7.html)
DE (1) DE102007051669A1 (cg-RX-API-DMAC7.html)
TW (1) TWI443474B (cg-RX-API-DMAC7.html)
WO (1) WO2009052925A1 (cg-RX-API-DMAC7.html)

Families Citing this family (8)

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Publication number Priority date Publication date Assignee Title
US8305559B2 (en) 2008-06-10 2012-11-06 Nikon Corporation Exposure apparatus that utilizes multiple masks
JP5946190B2 (ja) * 2010-07-30 2016-07-05 カール・ツァイス・エスエムティー・ゲーエムベーハー 結像光学系及びこの種の結像光学系を有するマイクロリソグラフィのための投影露光装置
DE102010043498A1 (de) 2010-11-05 2012-05-10 Carl Zeiss Smt Gmbh Projektionsobjektiv einer für EUV ausgelegten mikrolithographischen Projektionsbelichtungsanlage, sowie Verfahren zum optischen Justieren eines Projektionsobjektives
DE102011076752A1 (de) * 2011-05-31 2012-12-06 Carl Zeiss Smt Gmbh Abbildende Optik
EP2579100A3 (en) 2011-10-03 2017-12-06 ASML Holding N.V. Inspection apparatus, lithographic apparatus, and device manufacturing method
DE102012206153A1 (de) * 2012-04-16 2013-10-17 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
US9448343B2 (en) * 2013-03-15 2016-09-20 Kla-Tencor Corporation Segmented mirror apparatus for imaging and method of using the same
CA2998101C (en) 2014-09-08 2022-12-06 Christopher Robert Debone Grid tied, real time adaptive, distributed intermittent power

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CN1704797A (zh) * 2004-06-01 2005-12-07 大日本网目版制造株式会社 投影光学系统和图形描画装置

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JP2890882B2 (ja) 1990-04-06 1999-05-17 キヤノン株式会社 位置付け方法、半導体デバイスの製造方法及びそれを用いた投影露光装置
US6631036B2 (en) 1996-09-26 2003-10-07 Carl-Zeiss-Stiftung Catadioptric objective
TW448487B (en) * 1997-11-22 2001-08-01 Nippon Kogaku Kk Exposure apparatus, exposure method and manufacturing method of device
JPH1184249A (ja) * 1998-07-10 1999-03-26 Nikon Corp 露光装置、及び該装置を用いた露光方法
DE19846928A1 (de) * 1998-10-12 2000-04-13 Zeiss Carl Fa Abbildungssystem mit einem Zylinderlinsenarray
JP2000284494A (ja) * 1999-03-31 2000-10-13 Seiko Epson Corp 露光装置
US6600608B1 (en) 1999-11-05 2003-07-29 Carl-Zeiss-Stiftung Catadioptric objective comprising two intermediate images
JP4714403B2 (ja) * 2001-02-27 2011-06-29 エーエスエムエル ユーエス，インコーポレイテッド デュアルレチクルイメージを露光する方法および装置
DE50208750D1 (de) * 2001-08-01 2007-01-04 Zeiss Carl Smt Ag Reflektives Projektionsobjektiv für EUV-Photolithographie
JP2004107011A (ja) * 2002-09-18 2004-04-08 Asmo Co Ltd 給紙装置
JP2004252363A (ja) * 2003-02-21 2004-09-09 Canon Inc 反射型投影光学系
JP4314054B2 (ja) 2003-04-15 2009-08-12 キヤノン株式会社 露光装置及びデバイスの製造方法
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US7612892B2 (en) 2005-10-06 2009-11-03 Nikon Corporation Imaging optical system configured with through the lens optics for producing control information
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WO2007094414A1 (ja) * 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
US7916270B2 (en) * 2006-03-03 2011-03-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
CN101379593A (zh) * 2006-04-14 2009-03-04 株式会社尼康 曝光装置、元件制造方法以及曝光方法
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US6627365B1 (en) * 1998-03-20 2003-09-30 Nikon Corporation Photomask and projection exposure apparatus
CN1704797A (zh) * 2004-06-01 2005-12-07 大日本网目版制造株式会社 投影光学系统和图形描画装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JP特开2007-206319A 2007.08.16

Also Published As

Publication number Publication date
TW200923596A (en) 2009-06-01
DE102007051669A1 (de) 2009-04-30
KR101542268B1 (ko) 2015-08-06
JP2011501446A (ja) 2011-01-06
JP5431345B2 (ja) 2014-03-05
KR20100069700A (ko) 2010-06-24
US20100231884A1 (en) 2010-09-16
TWI443474B (zh) 2014-07-01
WO2009052925A1 (en) 2009-04-30
CN101836151A (zh) 2010-09-15
US8558991B2 (en) 2013-10-15
CN102354045A (zh) 2012-02-15
CN101836151B (zh) 2012-12-05

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