TWI437267B - A projection optical system, an exposure apparatus, and a device manufacturing method - Google Patents

A projection optical system, an exposure apparatus, and a device manufacturing method Download PDF

Info

Publication number
TWI437267B
TWI437267B TW099128858A TW99128858A TWI437267B TW I437267 B TWI437267 B TW I437267B TW 099128858 A TW099128858 A TW 099128858A TW 99128858 A TW99128858 A TW 99128858A TW I437267 B TWI437267 B TW I437267B
Authority
TW
Taiwan
Prior art keywords
optical system
magnification
mirror
lens
projection optical
Prior art date
Application number
TW099128858A
Other languages
English (en)
Chinese (zh)
Other versions
TW201118419A (en
Inventor
Kiyoshi Fukami
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of TW201118419A publication Critical patent/TW201118419A/zh
Application granted granted Critical
Publication of TWI437267B publication Critical patent/TWI437267B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW099128858A 2009-10-06 2010-08-27 A projection optical system, an exposure apparatus, and a device manufacturing method TWI437267B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009232865A JP5595001B2 (ja) 2009-10-06 2009-10-06 投影光学系、露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
TW201118419A TW201118419A (en) 2011-06-01
TWI437267B true TWI437267B (zh) 2014-05-11

Family

ID=43886431

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099128858A TWI437267B (zh) 2009-10-06 2010-08-27 A projection optical system, an exposure apparatus, and a device manufacturing method

Country Status (4)

Country Link
JP (1) JP5595001B2 (ja)
KR (1) KR101476871B1 (ja)
CN (1) CN102033315B (ja)
TW (1) TWI437267B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI825339B (zh) * 2019-09-04 2023-12-11 日商佳能股份有限公司 曝光裝置，及物品的製造方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012205096B3 (de) 2012-03-29 2013-08-29 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit mindestens einem Manipulator
JP6041541B2 (ja) * 2012-06-04 2016-12-07 キヤノン株式会社 露光装置及びデバイス製造方法
CN106168738B (zh) * 2012-06-04 2019-08-13 应用材料公司 光学投影阵列曝光系统
JP6410406B2 (ja) * 2012-11-16 2018-10-24 キヤノン株式会社 投影光学系、露光装置および物品の製造方法
JP6386896B2 (ja) 2014-12-02 2018-09-05 キヤノン株式会社 投影光学系、露光装置、および、デバイス製造方法
JP6896404B2 (ja) * 2016-11-30 2021-06-30 キヤノン株式会社 露光装置及び物品の製造方法
JP7005364B2 (ja) * 2018-01-29 2022-01-21 キヤノン株式会社 投影光学系、露光装置、物品の製造方法及び調整方法
JP2023004358A (ja) 2021-06-25 2023-01-17 キヤノン株式会社 投影光学系、露光装置、および物品の製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6235620A (ja) * 1985-08-09 1987-02-16 Canon Inc 光学倍率補正装置
JP3445021B2 (ja) * 1995-04-28 2003-09-08 キヤノン株式会社 光学装置
JP3884098B2 (ja) * 1996-03-22 2007-02-21 株式会社東芝 露光装置および露光方法
JP2002329651A (ja) * 2001-04-27 2002-11-15 Nikon Corp 露光装置、露光装置の製造方法、及びマイクロデバイスの製造方法
JP3465793B2 (ja) * 2002-10-24 2003-11-10 株式会社ニコン 投影露光装置及び投影露光方法
JP4195674B2 (ja) * 2004-03-31 2008-12-10 株式会社オーク製作所 投影光学系および投影露光装置
JP2006337528A (ja) * 2005-05-31 2006-12-14 Fujifilm Holdings Corp 画像露光装置
JP5118407B2 (ja) * 2007-07-31 2013-01-16 キヤノン株式会社 光学系、露光装置及びデバイス製造方法
JP2009098467A (ja) * 2007-10-18 2009-05-07 Adtec Engineeng Co Ltd 露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI825339B (zh) * 2019-09-04 2023-12-11 日商佳能股份有限公司 曝光裝置，及物品的製造方法

Also Published As

Publication number Publication date
KR101476871B1 (ko) 2014-12-26
JP5595001B2 (ja) 2014-09-24
TW201118419A (en) 2011-06-01
JP2011082311A (ja) 2011-04-21
KR20110037857A (ko) 2011-04-13
CN102033315B (zh) 2012-12-12
CN102033315A (zh) 2011-04-27

Similar Documents

Publication Publication Date Title
TWI437267B (zh) A projection optical system, an exposure apparatus, and a device manufacturing method
JP5453806B2 (ja) 露光装置、露光方法及びディスプレイの製造方法
JP2011039172A (ja) 露光装置およびデバイス製造方法
KR20100006533A (ko) 투영 광학계, 노광 장치 및 디바이스 제조 방법
WO2018043423A1 (ja) 照明光学系、リソグラフィ装置、及び物品製造方法
TWI710792B (zh) 投影光學系統、曝光裝置及物品之製造方法
KR101445426B1 (ko) 노광 장치 및 디바이스 제조 방법
JP5118407B2 (ja) 光学系、露光装置及びデバイス製造方法
TWI658333B (zh) Exposure device, exposure method, and article manufacturing method
JP4547714B2 (ja) 投影光学系、露光装置、および露光方法
JP5360529B2 (ja) 投影光学系、露光装置、およびデバイス製造方法
JP2006210623A (ja) 照明光学系及びそれを有する露光装置
JP2006078631A (ja) 投影光学系及びそれを有する露光装置
JP5632685B2 (ja) 露光装置及びデバイス製造方法
CN115524936A (zh) 投影光学系统、曝光装置以及物品的制造方法
JP2006078592A (ja) 投影光学系及びそれを有する露光装置
JP2022185783A (ja) 露光装置、アライメント計測方法、及び物品の製造方法
JP2004086110A (ja) 投影光学系、露光装置及び露光方法
CN113917789A (zh) 成像光学系统、曝光装置和制品制造方法
JP2004354555A (ja) 反射屈折型の投影光学系、露光装置および露光方法
JP2004342711A (ja) 照明光学装置、露光装置、および露光方法
JP2019028223A (ja) 露光装置及び物品製造方法
JP2006100585A (ja) 走査型投影露光装置、マスクステージの走り補正方法及びマイクロデバイスの製造方法
JP2013142890A (ja) 走査型投影露光装置
JP2010002524A (ja) 投影光学系、露光装置、露光方法、およびデバイス製造方法